• Title/Summary/Keyword: InSnZnO

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A Study on Thermal Stability of Ga-doped ZnO Thin Films with a $TiO_2$ Barrier Layer

  • Park, On-Jeon;Song, Sang-Woo;Lee, Kyung-Ju;Roh, Ji-Hyung;Kim, Hwan-Sun;Moon, Byung-Moo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.434-436
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    • 2013
  • Ga-doped ZnO (GZO) was substitutes of the SnO2:F films on soda lime glass substrate in the photovoltaic devices such as CIGS, CdTe and DSSC due to good properties and low cost. However, it was reported that the electrical resistivity of GZO is unstable above $300^{\circ}C$ in air atmosphere. To improve thermal stability of GZO thin films at high temperature above $300^{\circ}C$ an $TiO_2$ thin film was deposited on the top of GZO thin films as a barrier layer by Pulsed Laser Deposition (PLD) method. $TiO_2$ thin films were deposited at various thicknesses from 25 nm to 100 nm. Subsequently, these films were annealed at temperature of $300^{\circ}C$, $400^{\circ}C$, $500^{\circ}C$ in air atmosphere for 20 min. The XRD measurement results showed all the films had a preferentially oriented ( 0 0 2 ) peak, and the intensity of ( 0 0 2 ) peak nearly did not change both GZO (300 nm) single layer and $TiO_2$ (50 nm)/GZO (300 nm) double layer. The resistivity of GZO (300 nm) single layer increased from $7.6{\times}10^{-4}{\Omega}m$ (RT) to $7.7{\times}10^{-2}{\Omega}m$ ($500^{\circ}C$). However, in the case of the $TiO_2$ (50 nm)/GZO (300 nm) double layer, resistivity showed small change from $7.9{\times}10^{-4}{\Omega}m$ (RT) to $5.2{\times}10^{-3}{\Omega}m$ ($500^{\circ}C$). Meanwhile, the average transmittance of all the films exceeded 80% in the visible spectrum, which suggests that these films will be suitable for photovoltaic devices.

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Sensing Characterization of Metal Oxide Semiconductor-Based Sensor Arrays for Gas Mixtures in Air

  • Jung-Sik Kim
    • Korean Journal of Materials Research
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    • v.33 no.5
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    • pp.195-204
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    • 2023
  • Micro-electronic gas sensor devices were developed for the detection of carbon monoxide (CO), nitrogen oxides (NOx), ammonia (NH3), and formaldehyde (HCHO), as well as binary mixed-gas systems. Four gas sensing materials for different target gases, Pd-SnO2 for CO, In2O3 for NOx, Ru-WO3 for NH3, and SnO2-ZnO for HCHO, were synthesized using a sol-gel method, and sensor devices were then fabricated using a micro sensor platform. The gas sensing behavior and sensor response to the gas mixture were examined for six mixed gas systems using the experimental data in MEMS gas sensor arrays in sole gases and their mixtures. The gas sensing behavior with the mixed gas system suggests that specific adsorption and selective activation of the adsorption sites might occur in gas mixtures, and allow selectivity for the adsorption of a particular gas. The careful pattern recognition of sensing data obtained by the sensor array made it possible to distinguish a gas species from a gas mixture and to measure its concentration.

Transparent Oxide Thin Film Transistors with Transparent ZTO Channel and ZTO/Ag/ZTO Source/Drain Electrodes

  • Choi, Yoon-Young;Choi, Kwang-Hyuk;Kim, Han-Ki
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.127-127
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    • 2011
  • We investigate the transparent TFTs using a transparent ZnSnO3 (ZTO)/Ag/ZTO multilayer electrode as S/D electrodes with low resistivity of $3.24{\times}10^{-5}$ ohm-cm, and high transparency of 86.29% in ZTO based TFTs. The Transparent TFTs (TTFTs) are prepared on glass substrate coated 100 nm of ITO thin film. On atomic layer deposited $Al_2\;O_3$, 50 nm ZTO layer is deposited by RF magnetron sputtering through a shadow mask for channel layer using ZTO target with 1 : 1 molar ratio of ZnO : $SnO_2$. The power of 100W, the working pressure of 2mTorr, and the gas flow of Ar 20 sccm during the ZTO deposition. After channel layer deposition, a ZTO (35 nm)/Ag (12 nm)/ZTO(35 nm) multilayer is deposited by DC/RF magnetron sputtering to form transparent S/D electrodes which are patterned through the shadow mask. Devices are annealed in air at 300$^{\circ}C$ for 30 min following ZTO deposition. Using UV/Visible spectrometer, the optical transmittances of the TTFT using ZTO/Ag/ ZTO multilayer electrodes are compared with TFT using Mo electrode. The structural properties of ZTO based TTFT with ZTO/Ag/ZTO multilayer electrodes are analyzed by high resolution transmission electron microscopy (HREM) and X-ray photoelectron spectroscopy (XPS). The transfer and output characterization of ZTO TTFTs are examined by a customized probe station with HP4145B system in are.

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Study on TCO Coatings for Flexible Display Devices (Flexible 디스플레이용 TCO 코팅 연구)

  • Lee, Geon-Hwan;Kim, Do-Geun;Park, Mi-Rang;Lee, Seong-Hun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.11a
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    • pp.55-56
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    • 2007
  • 디스플레이용 전극 소재로 사용되는 투명 전도막은 높은 가시광 투과율 (89%이상)과 우수한 전기전도성(비저항 10$^{-4}{\Omega}cm$ 이하)을 동시에 가지므로 LCD, PDP, OLED 소자의 핵심소재로 인식되고 있다. 투명 전도막은 광학적 밴드갭이 3.5eV 이상인 wide-gap 반도체로서, 산화인듐($In_2O_3$)에 주석(Sn), 아연(Zn) 등을 치환고용 시킨 ITO, IZO, 산화아연(ZnO)에 Al 혹은 Ga을 치환고용 시킨 AZO, GZO 등 다양한 재료에 대한 연구가 활발하게 진행되고 있다. 본 연구에서는 플라즈마 정밀 제어 기술을 이용하여 80$^{\circ}C$이하의 저온 코팅 공정 조건에서 우수한 비저항( $2{\times}10^{-4}$ ${\Omega} cm $)을 나타낼 수 있는 TCO 코팅 공정 기술을 개발하였으며 이러한 연구결과는 차세대 디스플레이 소자로 예측되고 있는 Flexible 디스플레이 소자의 전극 재료로 활용될 수 있을 것으로 기대된다.

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Identification of Gas Mixture with the MEMS Sensor Arrays by a Pattern Recognition

  • Bum-Joon Kim;Jung-Sik Kim
    • Korean Journal of Materials Research
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    • v.34 no.5
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    • pp.235-241
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    • 2024
  • Gas identification techniques using pattern recognition methods were developed from four micro-electronic gas sensors for noxious gas mixture analysis. The target gases for the air quality monitoring inside vehicles were two exhaust gases, carbon monoxide (CO) and nitrogen oxides (NOx), and two odor gases, ammonia (NH3) and formaldehyde (HCHO). Four MEMS gas sensors with sensing materials of Pd-SnO2 for CO, In2O3 for NOX, Ru-WO3 for NH3, and hybridized SnO2-ZnO material for HCHO were fabricated. In six binary mixed gas systems with oxidizing and reducing gases, the gas sensing behaviors and the sensor responses of these methods were examined for the discrimination of gas species. The gas sensitivity data was extracted and their patterns were determined using principal component analysis (PCA) techniques. The PCA plot results showed good separation among the mixed gas systems, suggesting that the gas mixture tests for noxious gases and their mixtures could be well classified and discriminated changes.

A Study on the Electrochemical Deposition and p-Type Doping of ZnTe Films as a Back Contact Material for CdTe Photovoltaic Solar Cells (CdTe계 태양전지에 응용되는 ZnTe 박막의 전기화학적 제조 및 Cu 도핑 연구)

  • Kim, Dong-Hwan;Jeon, Yong-Seok;Kim, Gang-Jin
    • Korean Journal of Materials Research
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    • v.7 no.10
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    • pp.856-862
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    • 1997
  • 박막형 CdTe/CdS 태양전지의 배면전극(back contacts)물질로서 Cu도핑된 ZnTe 박막(ZnTe:Cu)을 전착법(electroplating)으로 제조하는 연구를 수행하였다. Sulfate계의 전해질 수용액에서 CdTe 기판과 투명전극으로 코팅된 유리(In$_{2}$O$_{3}$: Sn, ITO)기판 위에 ZnTe 박막을 코팅하는 방법으로써 potentiostat와 기판(cathode), Pt counter electrode, Ag/AgCI 표준전극으로 구성된 장치를 사용하여 pH=2.5-4, T=70-8$0^{\circ}C$, 0.02M $Zn^{2+}$ 1x$10^{-4}$M TeO$_{2}$, 0.2M $K_{2}$SO$_{4}$조건에서 -0.800 Vs~-0.975 V 범위의 전압(V$_{a}$ )에 걸쳐 실험하였다. ITO박막을 기판으로 사용하여 cyclic voltammogram을 작성한 결과 약 -0.50 V 에서 Te환원 peak이 나타났다. Auger electron spectroscopy (AES)로 조성분석한 결과 표면에서 Zn signal이 강하게 나왔고 시편의 두께에 따라 Zn의 signal감소하는 반면 Cd signal은 증가하는 것이 확인되었다. SEM 사진으로부터 ZnTe의 표면이 작은 입자 (0.2$\mu\textrm{m}$ 이하)로 구성되어 있으며 낮은 V$_{a}$ 에서는 입자가 작아지면서 조직이 치밀해짐이 관찰되었다. Optical transmission방법에 의하여 ITO기판위에 입혀진 박막의 밴드갭은 2.5 eV으로 측정되었다. 수용액중의 Cu$_{2+}$와 triethanolamine(TEA)은 산성용액에서 착물형성이 이루어지지 않았으며 1,10-phenanthroline과는 pH=2에서도 착물이 형성되었다.

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Electrical and optical properties of Indium Zinc Tin Oxide thin films deposited by RF magnetron sputtering (RF magnetron sputtering에 의해 증착된 Indium Zinc Tin Oxide 박막의 전기적, 광학적 특성.)

  • Nam, Tae-Bang;Choi, Byung-Hyun;Ji, Mi-Jung;Seo, Han;Won, Ju-Yeon;Ju, Byeong-Kwon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.96-96
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    • 2009
  • 투명전도막은 FPD의 전자부품에서 전극으로 널리 사용되고 있으며 현재 대부분의 투명전도막으로는 ITO가 사용되고 있다. 하지만, ITO에 사용되는 In은 희유금속으로 지속적인 사용량 증가로 가격의 급등과 더불어 수급 불안정으로 인해 In을 대체하고자 하는 연구가 집중적으로 이루어지고 있다. 그러나 $In_2O_3$를 대체한 ZnO계 등은 비저항이 높아 대체 적용이 가능하지 못하고 있다. 이에 In의 양을 줄이면서 상대적으로 저가이면서 광학적 특성이 우수한 ZnO을 첨가하여 기존의 ITO에 상응하는 전기전도도와 광투과율을 얻을 수 있는 새로운 3성분계 TCO 에 대한 연구가 활발히 이루어지고 있다. 따라서, 본 연구그룹은 $In_2O_3$을 기본 조성으로 하는 $In_2O_3-ZnO-SnO_2$계를 선정하여 IZTO target을 제조 후 RF magnetron sputtering 방법으로 투명전도막을 제작하였다. 본 연구에서는 RF 파워와 동작압력, 동작시간 그리고 열처리온도의 증착 조건에 따른 IZTO 박막의 특성을 평가하였다. 박막의 특성 및 표면 미세구조를 관찰하기 위해 AFM(Atomic Force Microscope)을 이용하였으며, XRD(X-ray diffraction)을 이용하여 결정성을 분석하였고, 4 point-prove, Hall effect measurement와 UV/Visible spectrometer를 통해 전기적, 광학적 특성을 평가하였다.

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산화물 반도체 ITZO 박막의 산소 영향의 따른 광학적 특성 분석

  • Kim, Sang-Seop;Kim, Hyeon-Gi;Choe, Byeong-Deok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.178.1-178.1
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    • 2013
  • 산화물 반도체는 가시광선영역인 380~780nm에서의 투과율이 80% 이상이고, 3.2eV 이상의 밴드갭과 높은 이동도를 가지는 물질로 투명하고 휘어지는 디스플레이에 전도유망한 물질로 연구되고 있다. $10cm^2/V{\cdot}s$ 이상의 이동도를 확보하기 위해 IGZO에서 Ga대신 Sn을 첨가한 ITZO 산화물 반도체에 대한 연구가 되고 있다. 본 연구에서 ITZO 산화물 반도체 박막 증착 시 가장 중요한 특성으로 알려진 산소의 영향에 따른 광학적 특성을 알아보기 위한 실험이다. RF 마그네트론 스퍼터링을 이용하여 산소 가스 분압에 따라 ITZO 박막을 증착하였다. $(Ar+O_2)$의 합을 20으로 고정하고 $O_2/(Ar+O_2)$의 비율을 0~40%까지 가변하였고, $O_2$의 비율이 증가함에 따라 증착율은 감소하는 경향을 보였다. 투명 소자로서의 가능성을 판단하기 위하여 밴드갭과 투과도를 측정하였다. 광학적 밴드갭은 증착 시 산소 분압이 0%에서 40%로 증가할수록 3.46eV에서 3.32eV로 감소하였고, 또한 투과도가 가시광 영역(380~770nm)에서 87%에서 85% 감소하였다. In, Sn, Zn 의 금속 원자와의 결합 과정에서 산소의 빈자리가 줄어들어 전도도가 감소하여 광학적 밴드갭이 감소함에 따라 투과도가 감소하는 것을 확인하였다.

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Gamma ray exposure buildup factor and shielding features for some binary alloys using MCNP-5 simulation code

  • Rammah, Y.S.;Mahmoud, K.A.;Mohammed, Faras Q.;Sayyed, M.I.;Tashlykov, O.L.;El-Mallawany, R.
    • Nuclear Engineering and Technology
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    • v.53 no.8
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    • pp.2661-2668
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    • 2021
  • Gamma radiation shielding features for three series of binary alloys identified as (Pb-Sn), (Pb-Zn), and (Zn-Sn) have been investigated. The mass attenuation coefficients (µ/ρ) for the selected alloys were simulated using the MCNP-5 code in the energy range between 0.01 and 15 MeV. Moreover, the (µ/ρ) values were computed using WinXCOM database in the same energy range to validate the simulation results. Results reveal a good agreement between the simulated and computed values. The half value layer (HVL), mean free path (MFP), effective atomic number (Zeff) and exposure buildup factor (EBF) were evaluated for the selected binary alloys. Results showed that the PS1, PZ1, and ZS2 alloys have the best shielding parameters and better than the commercially standard and available radiation shielding materials. Therefore, the investigated alloys can be used as effective radiation shielding materials against gamma ray with energies between 0.01 and 15 MeV.

Microscopic characterization of pretransition oxide formed on Zr-Nb-Sn alloy under various Zn and dissolved hydrogen concentrations

  • Kim, Sungyu;Kim, Taeho;Kim, Ji Hyun;Bahn, Chi Bum
    • Nuclear Engineering and Technology
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    • v.50 no.3
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    • pp.416-424
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    • 2018
  • Microstructure of oxide formed on Zr-Nb-Sn tube sample was intensively examined by scanning transmission electron microscopy after exposure to simulated primary water chemistry conditions of various concentrations of Zn (0 or 30 ppb) and dissolved hydrogen ($H_2$) (30 or 50 cc/kg) for various durations without applying desirable heat flux. Microstructural analysis indicated that there was no noticeable change in the microstructure of the oxide corresponding to water chemistry changes within the test duration of 100 days (pretransition stage) and no significant difference in the overall thickness of the oxide layer. Equiaxed grains with nano-size pores along the grain boundaries and microcracks were dominant near the water/oxide interface, regardless of water chemistry conditions. As the metal/oxide interface was approached, the number of pores tended to decrease. However, there was no significant effect of $H_2$ concentration between 30 cc/kg and 50 cc/kg on the corrosion of the oxide after free immersion in water at $360^{\circ}C$. The adsorption of Zn on the cladding surface was observed by X-ray photoelectron spectroscopy and detected as ZnO on the outer oxide surface. From the perspective of $OH^-$ ion diffusion and porosity formation, the absence of noticeable effects was discussed further.