• Journal of Plant Biology
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• v.20 no.1
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• pp.59-61
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• 1977

This experiment was undertaken with the purpose of investigating the effect on the hop yield and dryweight of two Hallertau forma, Shinshuwase by Gibberellin treatment. The concentration of GA applied were 0, 10, 20ppm respectively and they were treated before ten day of flowering of hop. The result as follows; (1) Yield of hop was increased significantly by treatment of GA 10 ppm solution that is Hallertau was increased 17.2% of control plots, and Shinshuwase was increased 23.2% in GA 20ppm. (2) In dry weight was increased significantly by treatment of GA 10ppm solution that is Hallertau was increased 21.6% of control plot and Shinshuwase was increased 25.9% in GA 20ppm.

• Proceedings of the IEEK Conference
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• 2000.11a
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• pp.357-360
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• 2000

This paper describes a parameter extraction method for HBT(Heterojunction Bipolar Transistor) equivalent circuit model without measurements of special test structures or numerical optimizations. Instead, all equivalent circuit parameters are calculated analytically from small-signal S-parameters measured under different bias conditions. These values being extracted from the cutoff mode can be used to extract intrinsic parameters at the active mode. This method yields a deviation of about 1.3 % between the measured and modeled S-parameters.

• Proceedings of the Optical Society of Korea Conference
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• 2000.02a
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• pp.166-167
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• 2000

일반적으로 수십 피코초 레이저 펄스를 이용한 GaAs bulk 상태 시료의 비선형 흡수 관찰 실험에서는 200Mw/$cm^{2b}$ 이하에서는 여기된 자유전하 운반자 흡수효과는 무시한다.$^{(1)}$ 그러나 수 나노초의 레이저 펄스를 이용할 경우, 이광자 흡수에 의해 여기된 자유전하 운반자들이 긴 수명시간으로 인해 재결합되지 않고 여기된 상태에 축적되어 짐에 따라, 레이저 빛을 재흡수 하는 확률이 높아져 낮은 세기의 빛에도 불구하고 비선형 흡수 효과가 크게 나타난다.$^{(2)}$ 불순물이 첨가되지 않은 GaAs bulk 상태의 경우 자유전하 운반자 소멸 시간은 수 나노초 영역으로 알려지고 있다.$^{(4)}$ 본 실험에서는 수 MW/$cm^2$의 매우 낮은 영역의 세기에서 순수한 GaAs의 bulk에 대하여 실험한 결과 비선형 흡수가 나타남을 관찰하였으며, 더불어 자유전하 흡수 계수를 여러 가지 세기의 빛에서 측정한 결과 자유전하 흡수 단면적이 빛의 세기에 따라 변화하는 것을 관찰하였다. (중략)략)

• Proceedings of the Optical Society of Korea Conference
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• 2000.08a
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• pp.252-253
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• 2000

본 실험에서는 수 MW/$ extrm{cm}^2$ 의 매우 낮은 영역의 세기에서 순수한 GaAs의 bulk에 대하여 실험한 결과 비선형 흡수가 나타남을 관찰 하였으며, 더불어 자유전하 흡수 계수를 여러 가지 세기의 빛에서 측정한 결과 자유전하 흡수 단면적이 빛의 세기에 따라 변화하는 것을 관찰하였다.$^{(1)}$ GaAs의 굴절률이 3.6으로 매우 커서 Fabry-Perot 효과가 나타나므로 시료의 한쪽 면을 SiN로 무반사 코팅을 하여 실험 하였다. GaAs의 표면은 쉽게 레이저 빛에 의해 손상을 입는 것을 고려하여 같은 자리에서 여러 번의 실험을 하여 같은 결과가 나오는 것을 확인하여 실험 결과를 얻었다. 사용된 레이저는 Nd:YAG 레이저로서 1.064 $mu extrm{m}$의 파장에서 7 나노초의 펄스를 방출한다. 빛의 세기는 편광기와 half wave plate를 이용하여 변화 시켰다. (중략)

• ETRI Journal
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• v.43 no.5
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• pp.923-931
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• 2021

We studied the influence of GaAs top-layer thickness on the small-signal modulation response and 56 Gb/s four-level pulse-amplitude modulation eye quality of 850 nm vertical-cavity surface-emitting lasers (VCSELs). We considered the proportionality of the gain-saturation coefficient to the photon lifetime. The simulation results that employed the transfer-matrix method and laser rate equations led to the conclusion that the proportionality should be considered for proper explanation of the experimental results. From the obtained optical eyes, we could determine an optimum thickness of the GaAs top layer that rendered the best eye quality of VCSEL. We also compared two results: one result with a fixed gain-saturation coefficient and the other that considered the proportionality. The former result with the constant gain-saturation coefficient demonstrated a better eye quality and a wider optimum range of the GaAs top-layer thickness because the resultant higher damping reduced the relaxation oscillation.

• KOREAN JOURNAL OF CROP SCIENCE
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• v.35 no.2
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• pp.165-170
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• 1990

In order to determine the relationship between dwarf gene and GA$_3$ response, three dwarf cultivars, Fukei 71, Seolak, and Tanginbozu, which were known to have d 50, d 47 and d 35 gene, respectively, were used as parents in this study. Three parents and their F$_1$ and F$_2$ generations were grown. Tillers of each plant were devided into two parts at 15 days after transplanting and was transplanted. One part of them was sprayed with GA$_3$ 50 ppm at booting stage. The internode length were measured at ripening stage in terms of GA$_3$ response. The internode was significantly elongated in Seolak and Tanginbozu, but not in Fukei 71. All F$_1$ plants of the crosses were tall, and their internode and culm were significantly elongated with the spraying of GA$_3$. Dwarf plants which are not responded to GA$_3$ were selected in the F$_2$'s of Seolak/Fukei 71 and Fukei 71/Tanginbozu crosses, and backcrossed to Fukei 71. All of these BC$_1$F$_1$ plants were uniform in the culm length and not responded to GA$_3$ treatment. The dwarf gene, d 50 of Fukei 71 seems to be closely associated with the facter of non-response to GA$_3$.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.312-312
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• 2013

GaN based light emitting diodes (LEDs) are important devices that are being used extensively in our daily life. For example, these devices are used in traffic light lamps, outdoor full-color displays and backlight of liquid crystal display panels. To realize high-brightness GaN based LEDs for solid-state lighting applications, the development of p-type ohmic electrodes that have low contact resistivity, high optical transmittance and high refractive index is essential. To this effect, indiumtin oxide (ITO) have been investigated for LEDs. Among the transparent electrodes for LEDs, ITO has been one of the promising electrodes on p-GaN layers owing to its excellent properties in optical, electrical conductivity, substrate adhesion, hardness, and chemical inertness. Sputtering and e-beam evaporation techniques are the most commonly used deposition methods. Commonly, ITO films on p-GaN by sputtering have better transmittance and resistivity than ITO films on p-GaN by e-bam evaporation. However, ITO films on p-GaN by sputtering have higher specific contact resistance, it has been demonstrated that this is due to possible plasma damage on the p-GaN in the sputtering process. In this paper, we have investigated the advanced sputtering using plasma damage-free p-electrode. Prepared the ITO films on the GaN based LEDs by e-beam evaporation, normal sputtering and advanced sputtering. The ITO films on GaN based LEDs by sputtering showed better transmittance and sheets resistance than ITO films on the GaN based LEDs by e-beam evaporation. Finally, fabricated of GaN based LEDs by using advanced sputtering. And compared the electrical properties (measurement by using C-TLM) and structural properties (HR-TEM and FE-SEM) of ITO films on GaN based LEDs produced by e-beam evaporation, normal sputtering and advanced sputtering. As a result, It is expected to form plasma damage free-electrode, and better light output power and break down voltage than LEDs by e-beam evaporation and normal sputter.

• Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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• v.19 no.2
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• pp.161-176
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• 2021

In this study, the electrochemical behavior of Sm on the binary liquid Al-Ga cathode in the LiCl-KCl molten salt system is investigated. First, the co-reduction process of Sm(III)-Al(III), Sm(III)-Ga(III), and Sm(III)-Ga(III)-Al(III) on the W electrode (inert) were studied using cyclic voltammetry (CV), square-wave voltammetry (SWV) and open circuit potential (OCP) methods, respectively. It was identified that Sm(III) can be co-reduced with Al(III) or Ga(III) to form Al_zSm_y or Ga_xSm_y intermetallic compounds. Subsequently, the under-potential deposition of Sm(III) at the Al, Ga, and Al-Ga active cathode was performed to confirm the formation of Sm-based intermetallic compounds. The X-ray diffraction (XRD) and scanning electron microscopy-energy dispersive spectroscopy (SEM-EDS) analyses indicated that Ga₃Sm and Ga₆Sm intermetallic compounds were formed on the Mo grid electrode (inert) during the potentiostatic electrolysis in LiCl-KCl-SmCl₃-AlCl₃-GaCl₃ melt, while only Ga₆Sm intermetallic compound was generated on the Al-Ga alloy electrode during the galvanostatic electrolysis in LiCl-KCl-SmCl₃ melt. The electrolysis results revealed that the interaction between Sm and Ga was predominant in the Al-Ga alloy electrode, with Al only acting as an additive to lower the melting point.

• Korean Journal of Crystallography
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• v.7 no.1
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• pp.73-80
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• 1996

The single crystal growth has been carried out with the newly designed 1-T HB(single temperature zone horizontal Bridgman) system for GaAs crystals of 2 inch diameter doped with Si, Zn or undoped. With this method, incidence probability of single crystallinity was shown to be 0.73. Lattice defects evaluated from EPD(etch pit density) measurement were in the range of 5,000-20,000/cm2, dependent upon the doping condition. For the undoped GaAs crystals, carrier concentrations from the Hall measurement were ∼1×1016/cm3 at the seed part, which were less than half the concentrations of double of triple temperature zone(2-T, 3-T) HB grown crystals. By the 1-T HB method, therefore, GaAs crystals can be grown successfully with better yield and higher purity.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.29A no.9
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• pp.36-45
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• 1992

The Modified Multi-Quantum Well(MMQWAl) structures have been grown by Mental-Organic chemical Vapor Deposition(MOCVD) method and stripe type MMQW laser diodes have been investigated. In the case of GaAs/AlGaAs superlattice and quantum well growth by MOCVD, the periodicity, interface abruptess, Al compositional uniformity and layer thickness have been confirmed though the shallow angle lapping technique, double crystal x-ray diffractometry (DCXD) and photoluminescence (PL) measurement. stripe-type MMQW laser diodes have been fabricated using the process technology of photolithography, chemical etching, ohmic contact, back side removing and cleaving. As the result of the electrical and opticalmeasurement of these laser diodes, we have achieved the series resistance of $1[\Omega}~2{\Omega}$ by current-voltage measurements, the threshold current of 200-300mA by currnt-light measurements and the lasing wavelength of 8000-8400$\AA$ by lasing spectrum measurements.