• Title/Summary/Keyword: InGaAs/GaAs

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The Effect of Metal Back-reflective Layers on the Performance of Transfer Printed GaAs Solar Cells (금속 후면 반사막이 GaAs 태양전지의 효율에 미치는 영향)

  • Choi, Wonjung;Kim, Chang Zoo;Kang, Ho Kwan;Jo, Sungjin
    • Current Photovoltaic Research
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    • v.2 no.2
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    • pp.73-77
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    • 2014
  • To investigate the effect of metal back-reflective layers (MBLs) on the performance of GaAs solar cells, we fabricated GaAs solar cells on Al and Ag metal layers using the transfer printing technique. We also investigated the effect of MBL texturing on the performance of transfer printed GaAs solar cells. Transfer printed solar cells with MBLs exhibited improved photovoltaic performance compared to solar cells without MBLs due to light trapping. We demonstrated GaAs solar cells with MBLs on a flexible substrate and performed systematic bending tests. All the measured characteristics of solar cells showed little change in performance.

Characteristics of Carbon and Aluminum Incorporation in AlGaAs by UHVCVD using Trimethylgallium, Trimethylalumnium, and Arsine (Trimethylgallium, Trimethylauminum과 Arsine을 사용하여 UHVCVD방법으로 성장된 AlGaAs의 탄소 및 알미늄의 유입 특성)

  • 노정래;심재기;하정숙;박성주;이일항
    • Journal of the Korean Vacuum Society
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    • v.2 no.1
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    • pp.34-40
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    • 1993
  • 새로운 단결정 박막 성장방법으로 최근에 많은 관심을 끌고 있는 초고진공 화학기상증착법(Ultra-High Vacuum Chemical Vapor Deposition)을 이용하여 AlGaAs에 에피탁시 박막을 성장시켰다. AlGaAs 에피탁시층의 성장은 2。 경사진 GaAs(100) 기판을 사용하였다. 반응 기체로는 Trimethylgallium(TMGa), Trimethylaluminum(TMAl)과 arsine을 사용하였고, 성장온도는 $580~700^{\circ}C$, 기체 압력은 10-5~10-4Torr를 유지하였다. 특히 본 연구에서는 arsine을 사전에 열분해 하는 통상의 Chemical Beam Epitaxy(CBE) 성장법과는 달리, arsine이 표면에서 분해되는 화학 반응만을 사용하여도 AlGaAs 에피탁시를 성장할 수 있음은 물론 박막내의 탄소 불순물의 농도가 크게 낮아짐을 관찰하였다. 또한 성장 온도의 변화에 따른 AlGaAs 에피탁시층의 Al 함유 과정에 대하여도 고찰하였다.

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$2^{\circ}$-off GaAs 기판위에 성장된 GaAs buffer 층의 두께에 따른 InAs 양자점의 변화

  • 김효진;민병돈;현찬경;박세기;박용주;김은규;김태환
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.85-85
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    • 2000
  • Stranski-Krastanow 자발형성 방법에 의한 양자점의 성장은 다른 공정에 비해 결함이 적은 반면에 크기와 위치를 조절하기 어렵다. 최근 20-off GaAs 기판을 이용한 양자점의 성장은 다른 공정과는 달리 성장조건만으로 선택적인 성장을 얻을 수 있으며 양자점의 크기가 terrace width를 벗어나지 않으므로 uniformity를 향상시킬 수 있다. 20-off GaAs 기판의 trrrace 넓이는 약 99 이지만 성장조건하에 Ga의 diffusion에 의한 step bunching 효과에 의하여 그 넓이는 변화하며 특히, 성장 두께에 따라 넓이는 증가한다. 이러한 현상을 바탕으로 20-off 기판위에 GaAs buffer 층을 1000 , 22 을 갖게 되었다. 이로써 20-off 기판을 이용할 경우,GaAs buffer 층의 두께만으로 양자점의 크기를 조절할 수 있다.

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Magnetotransport of Be-doped GaMnAs (GaMnAs의 Be 병행 도핑에 의한 자기 수송 특성 연구)

  • Im W. S.;Yoon T. S.;Yu F. C.;Gao C. X.;Kim D. J.;Ibm Y. E.;Kim H. J.;Kim C. S.;Kim C. O.
    • Korean Journal of Materials Research
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    • v.15 no.1
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    • pp.73-77
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    • 2005
  • Motivated by the enhanced magnetic properties of Mg-codoped GaMnN ferromagnetic semiconductors, Be-codoped GaMnAs films were grown via molecular beam epitaxy with varying Mn flux at a fixed Be flux. The structural, electrical, and magnetic properties were investigated. GaAs:(Mn,Be) films showed metallic behavior while GaAs:Mn films showed semiconducting behavior as determined by the temperature dependent resistivity measurements. The Hall-effect measurements with varying magnetic field showed clear anomalous Hall effect up to room temperature proving ferromagnetism and magnetotransport in the GaAs:(Mn,Be) films. Planar Hall resistance measurement also confirmed the properties. The dramatic enhancement of the Curie temperature in GaMnAs system was attributed to Be codoping in the GaMnAs films as well as MnAs precipitation.

Reduction of Operating Voltage of GaN-based Blue-violet Laser Diode by using Highly Mg Doped GaN Layer (고농도의 Mg가 도핑된 GaN층을 이용한 GaN계 청자색 레이저다이오드의 동작 전압 감소)

  • 곽준섭
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.7
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    • pp.764-769
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    • 2004
  • In order to reduce operating voltage of the GaN based blue-violet laser diodes, the effect of highly Mg doped GaN layer, which was grown below ohmic contact metals, on contact resistivity as well as operating voltage has been investigated. The addition of the highly Mg doped GaN layer greatly reduced contact resistivity of Pd/Pt/Au ohmic contacts from $5.2 \times {10}^-2 \Omegaㆍ$\textrm{cm}^2$ to 7.5 \times {10}^-4 \Omegaㆍ$\textrm{cm}^2$$. In addition, it also decreased device voltage at 20 mA by more than 3 V. Temperature- dependent sheet resistivity of the highly Mg doped GaN layer suggested that the reduction of the contact resistivity could be attributed to predominant current flow at the interface between the Pd/Pt/Au contacts and p-GaN through a deep level defect band, rather than the valence band.

Design and Fabrication of 10Gbps Optical Communication ICs Using AIGaAs/GaAs Heterojunction Bipolar Transistors (AIGaAs/GaAs 이종접합 바이폴라 트랜지스터를 이용한 10Gbps 고속 전송 회로의 설계 및 제작에 관한 연구)

  • 이태우;박문평;김일호;박성호;편광의
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.11a
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    • pp.353-356
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    • 1996
  • Ultra-high-speed analog and digital ICs (integrated circuits) fur 10Gbit/sec optical communication systems have been designed, fabricated and analyzed in this research. These circuits, which are laser diode (LD) driver, pre-amplifier, automatic gain controlled (AGC) amplifier, limiting amplifier and decision circuit, have been implemented with AIGaAs/GaAs heterojunction bipolar transistors (HBTs). The optimized AIGaAs/GaAs HBTs for the 10Gbps circuits in this work showed the cutoff and maximum oscillation frequencies of 65㎓ and 53㎓, respectively. It is demonstrated in this paper that the 10Gbps optical communication system can be realized with the ICs designed and fabricated using AlGaAs/GaAs HBTs.

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Symmetry of GaAsN Conduction-band Minimum: Resonant Raman Scattering Study (GaAsN 전도띠 바닥의 대칭성: 공명라만산란연구)

  • Seong M.J.
    • Journal of the Korean Vacuum Society
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    • v.15 no.2
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    • pp.162-167
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    • 2006
  • The symmetry of the conduction-band minimum of $GaAs_{1-x}N_{x}$ is probed by performing resonant Raman scattering (RRS) on thin layers of $GaAs_{1-x}N_{x}(x{\leq}0.7)$ epitaxially grown on Ge substrates. Strong resonance enhancement of the LO(longitudinal optical)-phonon Raman intensity is observed with excitation energies near the $E_0$ as well as $E_+$ transitions, However, in contrast to the distinct LO-phonon line-width resonance enhancement and activation of various X and L zone-boundary phonons brought about slightly below and near the $E_+$ transition, respectively, we have not observed any resonant LO-phonon line-width broadening or activation of sharp zone-boundary phonons near the $E_0$ transition. The observed RRS results reveal that the conduction-band minimum of GaAsN predominantly consists of the delocalized GaAs bulk-like states of ${\Gamma}$ symmetry.

Optical characteristics of GaN-based quantum structures

  • 조용훈
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.22-22
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    • 2003
  • Studies on the optical properties related to the built-in internal field and the carrier localization present in various GaN-based structures are essential not only for the physical interest but in designing practical visible and ultraviolet light emitting device applications with better performance and quantum efficiency. We report on the optical characteristics of various dimensional GaN-based structures such as (i) GaN self-assembled quantum dots grown in Stranski-Krastanov mode (OD), vertically-aligned GaN nanorods (1D), graded-In-content InGaN quantum wells (2D), laterally-overgrown GaN pyramids (3D), and GaN epilayers grown on various substrates. We used a wide variety of optical techniques, such as photoluminescence (PL), PL excitation, micro-PL, cathodoluminescence, optically-pumped stimulated emission, and time-resolved PL spectroscopy. An overview and comparison of the optical characteristics of the above GaN-based structures will be given.

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Pd/Ge-based Emitter Ohmic Contacts for AlGaAs/GaAs HBTs (AlGaAs/GaAs HBT 에미터 전극용 Pd/Ge계 오믹 접촉)

  • Kim, Il-Ho
    • Korean Journal of Materials Research
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    • v.13 no.7
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    • pp.465-472
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    • 2003
  • Pd/Ge/Ti/Pt and Pd/Ge/Pd/Ti/Au ohmic contacts to n-type InGaAs were investigated for applications to AlGaAs/GaAs HBT emitter ohmic contacts. In the Pd/Ge/Ti/Pt ohmic contact minimum specific contact resistivity of $3.7${\times}$10^{-6}$ $\Omega$$\textrm{cm}^2$ was achieved by rapid thermal annealing at $^400{\circ}C$/10 sec. In the Pd/Ge/Ti/Au ohmic contact, minimum specific contact resistivity of $1.1${\times}$10^{-6}$ $\Omega$$\textrm{cm}^2$ was achieved by annealing at 40$0^{\circ}C$/10 sec but the ohmic performance was degraded with increasing annealing temperature due to the reaction between the ohmic contact materials and the InGaAs substrate. However, non-spiking planar interface and relatively good ohmic contact (high-$10^{-6}$ /$\Omega$$\textrm{cm}^2$) were maintained after annealing at $450^{\circ}C$/10 sec. Therefore, these thermally stable ohmic contact systems are promising candidates for compound semiconductor devices. RF performance of the AlGaAs/GaAs HBT was also examined by employing the Pd/Ge/Ti/Pt and Pd/Ge/Pd/Ti/Au systems as emitter ohmic contacts. Cutoff frequencies were 63.5 ㎓ and 65.0 ㎓, respectively, and maximum oscillation frequencies were 50.5 ㎓ and 51.3 ㎓, respectively, indicating very successful high frequency operations.