• 제목/요약/키워드: In-situ particle monitoring

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진공 환경내 실시간 입자 모니터링 시스템의 개발 및 성능평가 (Development and Performance Test of In-situ Particle Monitoring System using Ion-counter in Vacuum Environments)

  • 안강호;김용민;권용택
    • 반도체디스플레이기술학회지
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    • 제5권1호
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    • pp.45-49
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    • 2006
  • In this paper, a new method that monitors the quantity of particles using ion-counter in vacuum environment is introduced. In-situ particle monitoring (ISPM) system is composed by Gerdien type ion-counter (house-made), DC power supply and electrometer. The ion-counter applied by positive voltage detects only positive charged particles. Therefore the particles to be detected should be in known charge state for further data analysis. ion-counter is installed at the exhaust line of process equipment where the pressure loss is structurally low. ISPM system performance has been verified with SMPS (Scanning Mobility Particle Sizer) system. The correlation coefficient is above 0.98 at the particle size range of $20{\sim}300nm$ in diameter with identified charge distribution under $0.1{\sim}10.0$ Torr.

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저압상태에서 공기역학적 렌즈를 이용한 In-Situ Particle Monitor의 성능특성 분석 (Investigation of the Performance Characteristics of an In-Situ Particle Monitor at Low Pressures Using Aerodynamic Lenses)

  • 배귀남
    • 대한기계학회논문집B
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    • 제24권10호
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    • pp.1359-1367
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    • 2000
  • In-situ particle monitors(ISPMs) are widely used for monitoring contaminant particles in vacuum-based semiconductor manufacturing equipment. In the present research, the performance of a Particle Measuring Systems(PMS) Vaculaz-2 ISPM at low pressures has been studied. We generated the uniform sized methylene blue particle beams using three identical aerodynamic lenses in the center of the vacuum line, and measured the detection efficiency of the ISPM. The effects of particle size, particle concentration, mass flow rate, system pressure, and arrangement of aerodynamic lenses on the detection efficiency of the ISPM were examined. Results show that the detection efficiency of the ISPM greatly depends on the mass flow rate, and the particle Stokes number. We also found that the optimum Stokes number ranges from 0.4 to 1.9 for the experimental conditions.

감압상태에서의 In-Situ Particle Monitor의 성능특성 (Performance Characteristics of In-Situ Particle Monitors at Sub-Atmospheric Pressure)

  • 배귀남
    • 대한기계학회논문집B
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    • 제22권11호
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    • pp.1564-1570
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    • 1998
  • In-situ particle monitors(ISPMs) are widely used for monitoring contaminant particles in vacuum-based semiconductor manufacturing equipment. In the present research, the performance of a Particle Measuring Systems(PMS) Vaculaz-2 ISPM at subatmospheric pressures has been studied. We created uniform upstream conditions of particle concentration and measured the detection efficiency, the lower detection limit, and the size response of the ISPM using uniform sized methylene blue aerosol particles. The effect of particle size, particle velocity, particle concentration, and system pressure on the detection efficiency was examined. Results show that the detection efficiency of the ISPM decreases with decreasing chamber pressure, and with increasing mass flow rate. The lower detection limit of the ISPM, determined at 50 % of the measured maximum detection efficiency, was found to be about $0.15{\sim}0.2{\mu}m$, which is similar to the minimum detectable size of $0.17{\mu}$ given by the manufacturer.

개선형 ISPM에서 공기역학적 렌즈의 최적조건에 대한 실험적 연구 (An Experimental Study on Optimal Condition of Aerodynamic Lens in the Modified ISPM)

  • 임효재;차옥환;설용태
    • 반도체디스플레이기술학회지
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    • 제3권2호
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    • pp.1-4
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    • 2004
  • An experimental study was conducted on the optimal configuration and size of ADFL(Aerodynamic Focusing Lens) which used in modified ISPM(In-Situ Particle Monitoring). The particle counting efficiency has been known as a function of distance and size of ADFL, thus we varied these parameters to find out the optimum values. From a result of experiment, it was found that two lenses and 6mm space between them showed a maximum particle measuring efficiency. To apply this modified ISPM to semiconductor manufacturing field, we need more experiment about the pressure change, flow rate, and input particle size.

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공기중 미세입자 측정 데이터 분석 및 통계 유의차 분석 (Airborne Fine Particle Measurement Data Analysis and Statistical Significance Analysis)

  • 안성준;문석환
    • 반도체디스플레이기술학회지
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    • 제22권1호
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    • pp.1-5
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    • 2023
  • Most of the production process is performed in a cleanroom in the case of facilities that produce semiconductor chips or display panels. Therefore, environmental management of cleanrooms is very important for product yield and quality control. Among them, airborne particles are a representative management item enough to be the standard for the actual cleanroom rating, and it is a part of the Fab or Facility monitoring system, and the sequential particle monitoring system is mainly used. However, this method has a problem in that measurement efficiency decreases as the length of the sampling tube increases. In addition, a statistically significant test of deterioration in efficiency has rarely been performed. Therefore, in this study, the statistically significant test between the number of particles measured by InSitu and the number of particles measured for each sampling tube ends(Remote). Through this, the efficiency degradation problem of the sequential particle monitoring system was confirmed by a statistical method.

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ISPM 및 PBMS를 이용한 BPSG 및 PSG CVD 공정 중 발생하는 오염입자의 실시간 측정 (Real-time Contaminant Particle Monitoring for Chemical Vapor Deposition of Borophosphosilicate and Phosphosilicate Glass Film by using In-situ Particle Monitor and Particle Beam Mass Spectrometer)

  • 나정길;최재붕;문지훈;임성규;박상현;이헌정;채승기;윤주영;강상우;김태성
    • 한국입자에어로졸학회지
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    • 제6권3호
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    • pp.139-145
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    • 2010
  • In this study, we investigated the particle formation during the deposition of borophosphosilicate glass (BPSG) and phosphosilicate glass (PSG) films in thermal chemical vapor deposition reactor using in-situ particle monitor (ISPM) and particle beam mass spectrometer (PBMS) which installed in the reactor exhaust line. The particle current and number count are monitored at set-up, stabilize, deposition, purge and pumping process step in real-time. The particle number distribution at stabilize step was measured using PBMS and compared with SEM image data. The PBMS and SEM analysis data shows the 110 nm and 80 nm of mode diameter for BPSG and PSG process, respectively.

화학기상증착 진공공정의 실시간 진단연구 (The Study on In-situ Diagnosis of Chemical Vapor Deposition Processes)

  • 전기문;신재수;임성규;박상현;강병구;윤진욱;윤주영;신용현;강상우
    • 한국진공학회지
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    • 제20권2호
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    • pp.86-92
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    • 2011
  • 본 연구에서는 새롭게 개발된 센서인 in-situ particle monitor (ISPM)와 기존센서의 기능을 업그레이드 한 센서인 self-plasma optical emission spectroscopy (SPOES)를 이용해 화학기상증착 진공공정을 진단하였다. 본 연구에서 사용된 증착공정 장비는 silane 가스를 이용한 silicon plasma enhanced chemical vapor deposition과 borophosphosilicate glass 증착장비이다. 두 장비의 증착 또는 클리닝 조건에서의 배출되는 오염입자와 배기가스를 개발된 센서를 이용해 공정상태를 실시간으로 진단하는 것과 개발된 센서의 센싱 능력을 검증하고자 하는 목적으로 연구가 진행되었다. 개발된 센서는 장비 배기구 설치되었으며, 공정압력, 유량, 플라즈마 파워 등의 공정변수 변화에 따른 오염입자 크기 및 분포와 배기 부산물의 변화를 측정하고, 측정 결과의 상호 연관성을 분석하였다.

Synthesis of Pd/Cu-Fe polymetallic nanoparticles for in situ reductive degradation of p-nitrophenol

  • Wenbin, Zhang;Lanyu, Liu;Jin, Zhao;Fei, Gao;Jian, Wang;Liping, Fang
    • Membrane and Water Treatment
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    • 제13권2호
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    • pp.97-104
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    • 2022
  • With a small particle size, specific surface area and chemical nature, Pd/Cu-Fe nanocomposites can efficiently remove the organic compounds. In order to understand the applicability for in situ remediation of contaminated groundwater, the degradation of p-nitrophenol by Pd/Cu-Fe nanoparticles was investigated. The degradation results demonstrated that these nanoparticles could effectively degrade p-nitrophenol and near 90% of degradation efficiency was achieved by Pd/Cu-Fe nanocomposites for 120 min treatment. The efficiency of degradation increased significantly when the Pd content increased from 0.05 wt.% and 0.10 wt.% to 0.20 wt.%. Meanwhile, the removal percentage of p-nitrophenol increased from 75.4% and 81.7% to 89.2% within 120 min. Studies on the kinetics of p-nitrophenol that reacts with Pd/Cu-Fe nanocomposites implied that their behaviors followed the pseudo-first-order kinetics. Furthermore, the batch experiment data suggested that some factors, including Pd/Cu-Fe availability, temperature, pH, different ions (SO42-, PO43-, NO3-) and humic acid content in water, also have significant impacts on p-nitrophenol degradation efficiency. The recyclability of the material was evaluated. The results showed that the Pd/Cu-Fe nanoparticles have good recycle performance, and after three cycles, the removal rate of p-nitrophenol is still more than 83%.

다양한 조건의 저압 공정 모니터링을 위한 입자 집속 장치 개발 (Development of particle focusing device to monitor various low pressure processes)

  • 김명준;김동빈;강상우;김태성
    • 한국입자에어로졸학회지
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    • 제13권2호
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    • pp.53-63
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    • 2017
  • As semiconductor process was highly integrated, particle contamination became a major issue. Because particle contamination is related with process yields directly, particles with a diameter larger than half pitch of gate should be controlled. PBMS (Particle beam mass spectrometry) is one of powerful nano particle measurement device. It can measure 5~500 nm particles at ~ 100 mtorr condition in real time by in-situ method. However its usage is restricted to research filed only, due to its big device volume and high price. Therefore aperture changeable aerodynamic lenses (ACALs) which can control particle focusing characteristics by changing its aperture diameter was proposed in this study. Unlike conventional aerodynamic lenses which changes particle focusing efficiency when operating condition is changed, ACALs can maintain particle focusing efficiency. Therefore, it can be used for a multi-monitoring system that connects one PBMS and several process chambers, which greatly improves the commercialization possibility of the PBMS. ACALs was designed based on Stokes number and evaluated by numerical method. Numerical analysis results showed aperture diameter changeable aerodynamic lenses can focus 5 to 100 nm standard particles at 0.1 to 10 torr upstream pressure.

ISPM을 이용한 PECVD 공정 내 발생입자 측정 연구 (Measurement of Particles Generated from PECVD Process using ISPM)

  • 김동빈;문지훈;김형우;강병수;윤주영;강상우;김태성
    • 한국입자에어로졸학회지
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    • 제11권4호
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    • pp.93-98
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    • 2015
  • Particles which generated from plasma enhanced chemical vapor deposition (PECVD) during thin film deposition process can affect to the process yield. By using light extinction method, ISPM can measure particles in the large-diameter pipe (${\leq}300mm$). In our research, in-situ particle monitor (ISPM) sensor was installed at the 300 mm diameter exhaust-line to count the particles in each size. In-house flange for mounting the transmitting and receiving parts of ISPM was carefully designed and installed at a certain point of exhaust line where no plasma light affect to the light extinction measurement. Measurement results of trend changes on particle count in each size can confirm that ISPM is suitable for real-time monitoring of vacuum process.