• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2006.10a
• /
• pp.161-162
• /
• 2006

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2004.05a
• /
• pp.12-12
• /
• 2004

나노임프린트 관련되어 전 세계적으로 지금까지 4개회사가 장비 및 공정기술 개발을 하고 있으나 대부분 수년 전에 창업한 회사이며, 4개의 나노임프린트 장비 관련 회사는 미국의 Nanonex, 오스트리아의 EVG사, 미국의 Molecular Imprint Inc. (MII),스웨덴이 Obducat이다. 개발된 장비의 대부분은 수작업이 필요한 연구용 장비로 현재 공정 기술개발을 위해 활용되고 있으며, MI사 장비가 최초로 양산 적용을 목표로 개발하여 국내에도 도입 되어있다. 일본에서는 아직 장비 개발이 시도된 바 없으며 현재 관련 공정 기술개발을 하고 있다.(중략)

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2008.11a
• /
• pp.128-128
• /
• 2008

본 연구에서는 나노 임프린트 리소그래피 래피 공정과 PVA(Poly-Vinyl-Alcohol), PDMS(Poly-Dimethyl-Siloxane) template 등의 flexible template를 사용하여 평면 기판 뿐만 아니라 곡면 렌즈 위에 moth-eye 구조를 성공적으로 형성시켰으며 처리 되지 않은 렌즈에 비해 투과율이 향상되는 것을 확인하였다.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2008.11a
• /
• pp.139-139
• /
• 2008

나노 임프린트 리소그래피 방법을 이용하여 매미 날개의 표면구조를 열가소성 고분자 시트 위에 역상으로 전사하였다. 그 후 표면구조가 형성된 시트의 UV-가시광선 투과도와 증류수의 접촉각을 측정함으로써 표면구조 형성을 통해 난반사 효과와 자가 세정 효과를 부여하였음을 확인하였다.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2010.11a
• /
• pp.431-432
• /
• 2010

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2012.05a
• /
• pp.164-164
• /
• 2012

청색 발광 다이오드의 광추출 효율 향상 및 전기적 특성 향상을 위하여 기판이 되는 사파이어에 마이크로급 패턴을 형성하는 공정이 일반적으로 사용되고 있다. 기존의 공정과는 달리, 저가의 간단한 공정을 통해 쉽게 유사한 성능 향상을 얻기 위하여, 나노임프린트 리소그래피 공정을 도입하여 사파이어 기판 상에 일정한 주기와 형태를 갖는 나노 패턴을 형성하였으며, 이를 이용하여 제작한 발광 다이오드의 성능이 전기적, 광학적 측면에서 크게 향상되었음을 확인할 수 있었다.

• Journal of the Korean Society for Precision Engineering
• /
• v.29 no.1
• /
• pp.114-120
• /
• 2012

We present a simple and low-cost method to fabricate poly(methyl-methacrylate) (PMMA) nanochannels with various shapes by combining the standard optical lithography with a PMMA layer transfer and collapse technique. We utilized PMMA membrane reflowing/collapsing phenomena into microchannels to fabricate nanochannels at both corners of arbitrarily-shaped microchannels. This allows nanochannels with various shapes such as curved nanochannels as well as straight nanochannels to be easily fabricated since the shape of the microchannel determines the shape of the nanochannels. This nanochannel fabrication method is simple, flexible, and low-cost since the standard optical lithography with low-resolution optical masks can be used to fabricate nanoscale channels as small as 100 nm wide with various shapes. Also, the sealing of nanochannels can be naturally achieved while the nanochannels are formed through the polymer layer transfer and collapse.

• Journal of the Microelectronics and Packaging Society
• /
• v.14 no.4
• /
• pp.1-7
• /
• 2007

Nanoimprint lithography (NIL) is an emerging technology enabling cost-effective and high-throughput nanofabrication. To successfully imprint a nano-sized pattern, the process conditions such as temperature, pressure, and time should be appropriately selected. This starts with a clear understanding of polymer material behavior during the NIL process. In this work, the squeezing of thin polymer films into nanocavities during the thermal NIL has been investigated based upon a two-dimensional viscoelastic finite element analysis in order to understand how the process conditions affect a pattern quality. The simulations have been performed within the viscoelastic plateau region and the stress relaxation effect has been taken into account.

• Proceedings of the Korean Society for Technology of Plasticity Conference
• /
• 2005.10a
• /
• pp.63-66
• /
• 2005

Nanoimprint lithography (NIL) process at room temperature has been newly proposed in recent years to overcome the shape accuracy and sticking problem induced in a conventional NIL process. Success of the room temperature NIL relies on the accurate understand of the mechanical behavior of the polymer. Since a conventional NIL process has to heat a polymer above the glass transition temperature to deform the physical shape of the polymer with a mold pattern, viscoelastic property of polymer have major effect on the NIL process. However, rate dependent behavior of polymer is important in the room temperature NIL process because a mold with engraved patterns is rapidly pressed onto a substrate coated with the polymer by the hydraulic equipment. In this paper, finite element analysis of the room temperature NIL process is performed with considering the strain rate dependent behavior of the polymer. The analyses with the variation of imprinting speed and imprinting pattern are carried out in order to investigate the effect of such process parameters on the room temperature NIL process. The analyses results show that the deformed shape and imprint force is quite different with the variation of punch speed because the dynamic behavior of the polymer is considered with the rate dependent plasticity model. The results provide a guideline for the determination of process conditions in the room temperature NIL process.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.34 no.4
• /
• pp.262-268
• /
• 2021

For the past several decades, various next-generation patterning methods have been developed to obtain well-designed nano-to-micro structures, such as imprint lithography, nanotransfer printing (nTP), directed self-assembly (DSA), E-beam lithography, and so on. Especially, nTP process has much attention due to its low processing cost, short processing time, and good compatibility with other patterning techniques in achieving the formation of high-resolution functional patterns. To transfer functional patterns onto desirable substrates, the use of soft materials is required for precise replication of master mold. Here, we introduce a simple and practical nTP method to create highly ordered structures using various polymeric replica materials. We found that polymethyl methacrylate (PMMA), polystyrene (PS), and polyvinylpyridine (PVP) are possible candidates for replica materials for reliable duplication of Si master mold based on systematic analysis of pattern visualization. Furthermore, we successfully obtained well-defined metal and oxide nanostructures with functionality on target substrates by using replica patterns, through deposition and transfer process. We expect that the several candidates of replica materials can be exploited for effective nanofabrication of complex electronic devices.