• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.156.2-156.2
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• 2015

반도체 소자의 크기가 나노사이즈로 줄어들기 때문에, 건식식각의 중요성이 강조되고 있다. dual plasma source를 사용함으로써 plasma 밀도, 이온충돌에너지, 이온플럭스를 조절 가능하다. Low frequency로 이온에너지를 조절하고, high frequency로 이온플럭스를 일반적으로 조절한다. 본 연구는 inductively coupled plasma (ICP)와 capacitively coupled plasma (CCP)를 사용하는 dual plasma source이다. ICP는 AE RPS로 2.4 MHz를 사용하고, CCP는 AE RFX-600으로 13.56 MHz이다. single L-probe는 Hiden ESPion이고, quadrupole mass spectrometer (QMS)는 INFICON CPM-300이다. chuck에 CCP가 인가되고, ICP는 SUS mesh를 거쳐서 영향을 미친다. Gas는 Ar, Ar+CF4 두 조건에서 비료를 하였다. Single L-probe를 이용하여 플라즈마를 측정한 결과 CCP만 인가하였을 때, Te 2.05 eV, Ne 4.07E+10 #/cm3, Ni 5.82E+10 #/cm3의 결과를 얻을 수 있었다. ICP를 방전하고 mesh를 통해서 chuck으로 입사하는 이온을 측정한 결과 mesh에 의해 이온이 중성화되어 거의 입사하지 않음을 확인할 수 있었다. 최종적으로 이온의 영향이 상쇄되고, 라디칼의 영향이 증가하여 높은 etch rate와 선택비를 가지며, 등방성 식각의 영향이 커질 것으로 사료된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.59.2-59.2
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• 2015

Modification of film structure and properties in inductively-coupled plasma (ICP) assisted dc and pulsed dc sputtering has been reported by Oya and Kusano [1] and by Sakamoto, Kusano, and Matsuda [2], showing drastic changes in films structure and properties by the ICP assistance in particular to the pulsed dc discharge. Although mechanisms involved in the modification has been reported to be the increase in energy transferred to the substrate, details of effects of low-energy ion bombardment on the modification and origin of an anomalous increase in the ion quantity by the ICP assistance to the pulsed dc discharge have not been discussed. In this presentation, mechanisms involved in film structure and property modification in ICP assisted dc and pulsed dc sputtering, in which a number of low-energy ions are formed, will be discussed based on ion energy distribution as well as effectiveness of energy transfer to the substrate by low energy particles [3]. The results discussed in this presentation will emphasize the fact that the energetic particles playing an important role in the film structure modification are those to be deposited, but not those of inert gas, when their energies range in less than 100 eV in the pressure range of magnetron sputtering.

• Analytical Science and Technology
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• v.24 no.6
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• pp.443-450
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• 2011

Quantitative analytical condition for nickel in ceramic, metal and plastic materials using complexation and solvent extraction followed by inductively coupled plasma-atomic emission spectrometry (ICP-AES) and atomic absorption spectrophotometry (AAS) was studied. Ceramic, metal and plastic samples were dissolved by acid digestion. Nickel was determined by ICP-AES and AAS after extraction of Ni $(DMG)_2$ in $CHCl_3$. Recovery efficiency of nickel was satisfactory, and most of matrix elements causing interference could be effectively eliminated by the separation. Nickel in the certified reference materials (BAM-376 and PACS-2) were quantitatively determined without influence of sample matrix.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.5 no.3
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• pp.269-277
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• 1995

Ultrafine TEX>$Al_2O_3$ powders were prepared from $AlCl_3$ and $Al_2(SO_4)_3$3 by using inductively coupled plasma (lCP) of ultrahigh temperature (above 5000 K) in heat source. The prepared $Al_2O_3$ powders had ${\alpha} - group ({\alpha}, {wdelta} ;and; {\theta})$ phase, a narrow size distribution and around 20 nm in meansize. It could be suggested that gas - solid reaction growth and interparticle sintering occured at the center of ICP tail flame (X = 500 mm) through the results of deposited aggregates - flock, whisker and platy on MgO polycrystal plate. And the formation mechanism of $Al_2O_3$ powders In spray - ICP reactor were described from upper results.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.50 no.10
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• pp.494-499
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• 2001

The effects of accelerated Ultraviolet (UV) radiation on High temperature vulcanized (HTV), Room temperature vulcanized (RTV) silicone rubber and two types of ethylene propylene diene terpolymer (EPDM) used for composite insulator were investigated by hydrophobicity class (HC), surface voltage decay after corona charging, SEM-ES, FTIR and XPS. The contact angle in two kinds of silicone rubber was scarcely change, but EPDM occurred to the loss of hydrophobicity followed by surface cracking and chalking. The surface voltage decay on UV-treated silicone rubber and EPDM showed a different decay trend with UV treatment. EDS and XPS analysis indicated that the oxygen content increased with UV treatment time in all samples. For silicone rubber, the oxidized groups of inorganic silica-like structure increased with UV treatment time. The oxidized carbon of C=O, O=C-O in EPDM increased. These oxidized surface for each material had different electrostatic characteristics, so deposited charges were expected to have different impacts on their surface hydrophobicity. The degradation mechanism based on our results was discussed.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.203-203
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• 2010

Nano-crystalline Si thin films were deposited on polymer and glass by inductively coupled plasma (ICP) - assisted RF magnetron sputtering at low temperature in an argon and hydrogen atmosphere. Internal ICP coil was installed to increase hydrogen atoms dissociated by the induced magnetic field near the inlet of the working gases. The microstructure of deposited films was investigated with XRD, Raman spectroscopy and TEM. The crystalline volume fraction of the deposited films on polymer was about 70% at magnetron RF power of 600W and ICP RF power of 500W. Crystalline volume fraction was decreased slightly with increasing magnetron RF power due to thermal damage by ion bombardment. The diffraction peak consists of two peaks at $28.18^{\circ}$ and $47.10^{\circ}\;2{\theta}$ at magnetron RF power of 600W and ICP RF power of 500W, which correspond to the (111), (220) planes of crystalline Si, respectively. As magnetron power increase, (220) peak disappeared and a dominant diffraction plane was (111). In case of deposited films on glass, the diffraction peak consists of three peaks, which correspond to the (111), (220) and (311). As the substrate temperature increase, dominant diffraction plane was (220) and the thickness of incubation (amorphous) layer was decreased.

• Analytical Science and Technology
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• v.15 no.5
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• pp.439-444
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• 2002

DE-O-V ICP-AES has been studied for the analytical characteristics of As, Se, and Ge with PN, USN and HG. Effect of $NaBH_4$ and HCl on the signal intensity of As, Se and Ge with HG and E-O-V ICP-AES were closely investigated. The sensitivities of As, Se and Ge with HG were much greater than those with PN and USN. Accordingly, the detection limits of the elements with HG were lower by a factor of 100 and 10 than PN and USN, respectively.

• Journal of the Korean Society of Surveying, Geodesy, Photogrammetry and Cartography
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• v.30 no.3
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• pp.323-332
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• 2012

An airborne LiDAR system performs several observations on flight routes to collect data of targeted regions accompanying with discrepancies between the collected data strips of adjacent routes. This paper aims to present an automatic error correction technique using modified ICP as a way to remove relative errors from the observed data of strip data between flight routes and to make absolute correction to the control data. A control point data from the existing digital topographic map were created and the modified ICP algorithm was applied to perform the absolute automated correction on the relatively adjusted airborne LiDAR data. Through such process we were able to improve the absolute accuracy between strips within the average point distance of airborne LiDAR data and verified the possibility of automation in the geometric corrections using a large scale digital map.

• Journal of Information Display
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• v.3 no.2
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• pp.26-30
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• 2002

Large area plasma source has been built for LCD etcher by an array of $2{\times}2$ ICP sources. Since only one RF power supply and one impedance matching network is used in this configuration, any difference in impedances of unit RF antennas causes unbalanced power delivery to the unit ICP. In order to solve this unavoidable unbalance, unit antenna is designed to have a movable tap, with which the inductance of each unit can be adjusted individually. The plasma density becomes symmetric and etch rate becomes more uniform with the impedance adjustment. The concept of adding axial time-varying magnetic field to the single ICP source is applied to the array ICP source, and is found to be effective in terms of etch rate and uniformity.

• Bulletin of the Korean Chemical Society
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• v.32 no.10
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• pp.3561-3565
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• 2011

A rapid and inexpensive method was developed for the determination of trace silver in geological samples by using sulfhydryl cotton coupled with ICP-MS. The interferences such as $^{90}Zr$, $^{92}Mo$ and $^{93}Nb$ on silver were investigated in detail. Sulfhydryl cotton was found to be an effective adsorbent for separation of interferences for Ag in the solutions. Excellent agreements with the certified values were obtained for all the certified reference materials. The memory effects of Ag by ICP-MS were examined by using different agents, including water, nitric acid, and HCl-thiourea to all standards/samples. The agents also acted as cleansing solutions. A combination of HCl with thiourea gave the minimum memory effect. For comparison of results, a proposed Chinese Geology Survey procedure DC-ARC-AES and a direct determination pretreatment method of ICP-MS (water bath- auqa regia digestion) were studied. Under optimal conditions, the detection limits of our method for $^{107}Ag$ and $^{109}Ag$ were 1.2 ng/g and 1.3 ng/g, which offered much better accuracy for some difficult analysis geological samples such as GBW07604, GBW07605.