• 전기학회논문지
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• 제61권2호
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• pp.237-242
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• 2012

In this paper, we investigated effects of ITO electrode geometry and dielectric layer thickness on the discharge Characteristic of AC PDP. As the dielectric thickness is decreased ($30{\sim}12{\mu}m$), firing and sustain voltage is decreased. Luminance and discharge power increase with decreasing dielectric layer thickness because of increasing capacitance between plasma and electrodes. Reactive power decreases with dielectric thickness due to reduced capacitance between sustain electrodes. For the high Xe test panel with small ITO electrode, luminous efficacy as well as luminance increase with decreasing dielectric layer thickness. This result suggest that high power density and small plasma volume is beneficial for high efficacy discharge.

• KIEE International Transactions on Electrophysics and Applications
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• 제4C권3호
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• pp.106-110
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• 2004

The operating condition of the OLED (organic light-emitting diode) is very sensitive to electrode thickness properties. The electrode thickness is a significant issue in the construction of OLEDs because of its transparency, high conductivity and high efficiency as an injector into organic materials. We carried out a systematic study to optimize the electrode thickness conditions in Indiumtin oxide (ITO), Molybdenum (Mo) and Aluminum (Al). Further, we measured electrode thickness under standard conditions [ITO 1500$\AA$, Mo 2600$\AA$, Al 1500$\AA$]. We also evaluated power consumption. In addition, we analyzed substrate uniformity with IVL measurement results. From these results, it is known that the electrode thickness should be optimized in order to accomplish optimal power efficiency.

• 한국진공학회지
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• 제20권3호
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• pp.195-199
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• 2011

RF 마그네트론 스퍼터와 DC 마그네트론 스퍼터를 병행하여 ITO/Au/ITO, ITO/Cu/ITO, 그리고 ITO/Ni/ITO 박막을 유리기판 위에 증착하였다. 증착 후 진공열처리를 통하여 층간 금속 층이 ITO박막의 메탄올 검출 민감도에 미치는 영향을 분석하였다. 모든 박막센서의 두께는 100 nm로 동일하게 ITO 50 nm/metal 10 nm/ITO 40 nm로 제작되었고 메탄올 농도는 100에서 1,000 ppm까지 달리하였다. ITO/Au/ITO 박막센서가 가장 높은 민감도를 보임으로써 ITO/Au/ITO 다층박막이 기존의 ITO메탄올 센서를 대체할 수 있는 센서임을 확인하였다.

• 센서학회지
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• 제16권3호
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• pp.229-233
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• 2007

The indium tin oxide (ITO) films were deposited on CR39 substrate using DC magnetron sputtering. The ITO thin films deposited at room temperature because CR39 substrate its glass-transition temperature is $130^{\circ}C$. The ITO thin films used bottom and top electrode and for organic thin film transparent transistors (OTFTs). The ITO thin film electrodes electrical properties and optical transparency properties in the visible wavelength range (300-800 nm) strongly dependent on volume of oxygen percent. For the optimum resistivity and transparency of the ITO thin film electrode achieved with a 75 W plasma power, 10 % volume of oxygen and a 27 nm/min deposition rate. Above 85 % transparency in the visible wavelength range (300-800 nm) measured without post annealing process and a low resistivity value $9.83{\times}10^{-4}{\Omega}cm$ was measured thickness of 300 nm. All fabrication process of ITO thin films did not exceed $80^{\circ}C$.

• 한국전기전자재료학회논문지
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• 제20권2호
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• pp.162-166
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• 2007

The ITO thin films were prepared by facing targets sputtering (FTS) system on polycarbonate (PC) substrate. The ITO thin films were deposited with a film thickness of 100 nm at room temperature. As a function of sputtering conditions, electrical and optical properties of prepared ITO thin films were measure. The electrical and optical characteristics of the ITO thin films were evaluted by Hall Effect Measurement (EGK) and UV/VIS spectrometer (HP), respectively. From the results, the ITO thin films was deposited with a resistivity $8{\times}10^{4}\;{\Omega}-cm$ and transmittance over 80 %.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.420-421
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• 2006

The ITO thin films were prepared by FTS (Facing Targets Sputtering) system on polycarbonate(PC) substrate. The ITO thin films were deposited with a film thickness of 100nm at room temperature. As a function of sputtering conditions, electrical and optical properties of prepared ITO thin films were measured. The electrical and optical characteristics of the ITO thin films were evaluated by Hall Effect Measurement(EGK) and UV-VIS spectrometer(HP), respectively. From the results, the ITO thin film was deposited with a resistivity $8{\times}10^{-4}[{\Omega}-cm]$ and transmittance over 80%.

• 한국산학기술학회논문지
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• 제11권10호
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• pp.3853-3858
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• 2010

본 논문에서는 메디치 프로그램을 사용하여 반사방지막(ARC : anti reflectance coating) 두께에 따라 실리콘 솔라셀의 전기적 특성분석을 보여준다. ITO 투명전극으로 이루어지는 ARC를 이용한 실리콘 솔라셀의 메쉬구조를 구축하고 ARC 두께에 따른 특성해석 모델링을 실시하였다. ARC 산화층의 두께가 30 nm, 60 nm. 90 nm일 때 입사광의 파장에 따른 외부 수집 효율성, 투과율, Isc, Voc, I-V 특성 변화 등을 구하였다. 시뮬레이션 결과 60 nm의 반사방지막 두께에서 최대전력 22 mW/$cm^2$, 0.83의 곡선 인자를 보였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.505-506
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• 2007

Organic photovoltaic effects were studied in a device structure of ITO/CuPc/Al and ITO/CuPc/$C_{60}$/BCP/Al. A thickness of CuPc layer was varied from 10 nm to 50 nm, we have obtained that the optimum CuPc layer thickness is around 40 nm from the analysis of the current density-voltage characteristics in CuPc single layer photovoltaic cell. From the thickness-dependent photovoltaic effects in CuPc/$C_{60}$ heterojunction devices, higher power conversion efficiency was obtained in ITO/20nm CuPc/40nm $C_{60}$/Al, which has a thickness ratio (CuPc/$C_{60}$) of 1:2 rather than 1:1 or 1:3. Light intensity on the device was measured by calibrated Si-photodiode and radiometer/photometer of International Light Inc(IL 14004).

• 반도체디스플레이기술학회지
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• 제19권3호
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• pp.88-92
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• 2020

As a highly conductive and transparent electrode, the optical transmittances of ITO/Ag/ITO were simulated and compared with the experimental results. The simulations are based on the finite-difference time-domain (FDTD) method in solving linear Maxwell equations. In our simulations, the computation domain is set in the XZ-plane with 3D dimension, and a plane wave with variable wavelengths ranging from 250 nm to 850 nm is incident in the z-direction at normal incidence to the ITO/Ag/ITO film surrounded by free-air space. As the results through both simulations and experiments, it was shown that the thickness combinations by the ITO layers of about 40 nm and the Ag layer of about 10 nm could be most suitable conditions as a high conductive transparent electrode having the transmittance similar to that of a single ITO layer.

• 반도체디스플레이기술학회지
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• 제14권3호
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• pp.33-36
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• 2015

It has increased several decades in the field of Indium Tin Oxide (ITO) transparent thin film, However, a major problem with this ITO thin film application is high cost compared with other transparent thin film materials[1]. So far, in order to overcome this disadvantage, we show that a transparent ITO/Ag/i-ZnO multilayer thin film electrode would be more cost-effective and it has not only highly transparent but also conductive properties. The aim of this research has therefore been to try and establish how ITO/Ag/i-ZnO multilayer thin film would be more effective than ITO thin film. Herein, we report the properties of ITO/Ag/i-ZnO multilayer thin film by using optical spectroscopic method and measuring sheet resistance. At a certain total thickness of thin film, sheet resistance of ITO/Ag/i-ZnO multilayer was drastically decreased than ITO layer approximately $40{\Omega}/{\Box}$ at same visible light transmittance. (minimal point $5.2{\Omega}/{\Box}$). Tendency, which shows lowly sheet resistive in a certain transmittance, has been observed, hence, it should be suitable for transparent electrode device.