• Title/Summary/Keyword: ITO heater

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Temperature Maintenance of an ITO Nanoparticle Film Heater (ITO 나노입자 면상발열체의 온도유지에 대한 연구)

  • Yang, Kyungwhan;Cho, Kyoungah;Im, Kiju;Kim, Sangsig
    • Journal of IKEEE
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    • v.20 no.2
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    • pp.171-173
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    • 2016
  • In this study, we fabricate a high efficiency heater consisting of the indium tin oxide (ITO) nanoparticle (NP)-paste and polydimethylsiloxane (PDMS) and investigate the effect of PDMS on temperature maintenance of the heater through the comparison with the PDMS-free ITO film heater. Compared to the ITO film heater, the temperature of the PDMS/ITO film heater lasts 1.5 times longer. And the power consumption of the PDMS/ITO film heater is reduced by 35%, owing to the low thermal conductivity of the PDMS layer.

Fabrication and Characteristics of Thermopneumatic-Actuated Polydimethylsiloxane Microvalve (열공압 방식의 Polydimethylsiloxane 마이크로 밸브의 제작 및 특성)

  • 김진호;조주현;한경희;김영호;김한수;김용상
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.53 no.4
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    • pp.231-236
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    • 2004
  • A normally open thermopneumaticc-actuated microvalve has been fabricated and their properties are investigated. The advantages of the proposed microvalve are of the low cost fabrication process and the transparent optical property using polydimethylsiloxane (PDMS) and indium tin oxide (ITO) glass. The fabricated microvalves with in-channel configuration are easily integrated with other microfluidic devices on the same substrate. The fabrication process of thermopneumatic-actuated microvalvesusing PDMS is very simple and its performance is very suitable for a disposable lab-on-a-chip. The PDMS membrane deflection increases and the flow rates of the microchannel with microvalvels decrease as the applied power to the ITO heater increases. The powers at flow-off are dependent on the membrane thickness and the applied inlet pressure but are independent of the channel width of microvalves. The flow rate is well controlled by the switching function of ITO heater and the closing/opening times are around 20 sec and 25 sec, respectively.

A Study on the Exothermic Properties of ITO/Ag/ITO Multilayer Transparent Electrode Depending on Metal Layer Thickness (금속층 두께에 따른 ITO/Ag/ITO 다층 투명 전극의 발열 특성 연구)

  • Min, Hye-Jin;Kang, Ye-Jina;Son, Hye-Won;Sin, So-Hyun;Hwang, Min-Ho;Lee, Hyun-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.35 no.1
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    • pp.37-43
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    • 2022
  • In this study, we investigated the optical, electrical and exothermic characteristics of ITO/Ag/ITO multilayer structures prepared with various Ag thicknesses on quartz and PI substrates. The transparent conducting properties of the ITO/Ag/ITO multilayer films depended on the thickness of the mid-layer metal film. The ITO/Ag (14 nm)/ITO showed the highest Haccke's figure of merit (FOM) of approximately 19.3×10-3 Ω-1. In addition, the exothermic property depended on the substrate. For an applied voltage of 3.7 V, the ITO/Ag (14 nm)/ITO multilayers on quartz and PI substrates were heated up to 110℃ and 200℃, respectively. The bending tests demonstrated a comparable flexibility of the ITO/Ag/IT multilayer to other transparent electrodes, indicating the potential of ITO/Ag/ITO multilayer as a flexible transparent conducting heater.

Characteristics of Indium-Tin-Oxide electrode for continuous-flow PCR chip (연속흐름 중합효소연쇄반응칩 제작을 위한 인듐 산화막 전극의 특성분석)

  • Joung, Seung-Ryong;Yi, In-Je;Kim, Jun-Hyuk;Kim, Han-Soo;Kim, Jae-Wan;Choi, Y.J.;Kang, C.J.;Kim, Yong-Sang
    • Proceedings of the KIEE Conference
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    • 2006.07c
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    • pp.1386-1387
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    • 2006
  • PDMS와 ITO 유리를 이용하여 continuous-flow PCR chip을 제작하였다. PDMS를 이용하여 microchannel을 형성하여 주었고, ITO electrode를 heater와 sensor로 사용하기 위하여 반도체 공정을 통해 패턴을 형성하였다. microchannel내에 흐르는 시료의 온도를 제어하기 위하여 heater와 sensor를 calibration을 하였다. ITO heater는 인가된 전압에 대해 매우 선형적인 발열을 하였으며, ITO sensor는 온도에 대해 선형적인 저항 변화를 나타낸 바, 그 결과 continuous-flow PCR chip의 정확한 온도 제어가 가능하였다.

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Pre-processing for the Design of Micro-fluid Flow Sensing Elements

  • Kim Jin-Taek;Pak Bock-Choon;Lee Cheul-Ro;Baek B.J.
    • KSTLE International Journal
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    • v.7 no.1
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    • pp.22-26
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    • 2006
  • A simple finite element analysis is performed to simulate the thermal characteristics of a micro sensor package with thin film heater embedded in the glass wall of a micro-channel. In this paper, Electric characteristics of ITO sputtered heater were presented in this study, which can be used as a map of heater design in the range of available system temperature. The effects of thermo-physical properties of materials, geometrical structure and boundary condition on the thermal performance are also investigated. Finally, the design of micro-flow induced thermal sensor that is capable of measuring fluid flow with a lower flow detection limit of approximately 24pL/s is presented.

Fabrication and Characteristics of Thermopneumatic-Actuated Polydimethylsiloxane Micropump (열공압 방식의 polydimethylsiloxane 마이크로 펌프의 제작 및 특성)

  • 김진호;문민철;김주호;김영호;김한수;한경희;김용상
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.53 no.6
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    • pp.342-346
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    • 2004
  • A thermopneumatic-actuated polydimethylsiloxane (PDMS) micropump has been fabricated and their properties are characterized. The diffusers are used as a flow-rectifying element instead of passive check valves. The advantages of the proposed microvalve are of the low cost fabrication process and the transparent optical property using PDMS and indium tin oxide (ITO) glass. We presented the PDMS micropump that is easily integrated with the in-channel PDMS microvalves on the same substrate. The flowrate of the micropump increases linearly as the applied pulse voltage to the ITO heater increases. The fabricated ITO heater resistance is 6.54k$\Omega$. The peak of the flow rate is observed at the duty ratio of 10% for the applied pulse voltage of 55V at 6Hz and the maximum flow rate of 78nl/min is measured.

Characteristics of ITO Films Deposited by dc Magnetron Sputter Using Powder Target (분말타겟의 dc 마그네트론 스퍼터에 의한 ITO박막의 특성)

  • 김현후;신성호;신재혁;박광자
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.427-431
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    • 2000
  • ITO (indium tin oxide) thin films on PET (polyethylene terephthalate) and glass substrates have been deposited by a dc magnetron sputtering without heat treatments such as substrate heater and post heat treatment. Each sputtering parameter during the sputtering deposition is an important factor for the high quality of ITO thin films deposited on polymeric substrate. Particularly, the material, electrical and optical properties of as-deposited ITO oxide films are dominated by sputtering power, oxygen partial pressure and films thickness. As the experimental results, the XRD patters of ITO films are influenced by sputtering power and pressure. As the power and pressure are increased, (411) peak is grown suddenly. the electrical resistivity is also increased, as the sputteing power and pressure are increased. Transmittance of ITO thin films in visible light ranges is lowered with increasing the sputtering power and film thickness. Reflectance of ITO films in infia-red region is decreased, as the power and pressure is increased.

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ITO Films Deposited by Sputter Method of Powder Target at Room Temperature. (상온에서 분말타겟의 스퍼터에 의해 증착된 ITO박막)

  • 김현후;이재형;신성호;신재혁;박광자
    • Journal of the Korean institute of surface engineering
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    • v.33 no.5
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    • pp.349-355
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    • 2000
  • Indium tin oxide (ITO) thin films have been deposited on PET (polyethylene terephthalate) and glass substrates by a do magnetron sputter method of powder target without heat treatments such as substrate heater and post heat treatment. During the sputtering deposition, sputtering parameters such as sputtering power, working pressure, oxygen gas mixture, film thickness and substrate-target distance are important factors for the high quality of ITO thin films. The structural, electrical and optical properties of as-deposited ITO oxide films are investigated by sputtering power, oxygen partial pressure and films thickness among the several sputtering conditions. XRD patterns of ITO films are affected by sputtering power and pressure. As the power and pressure are increased, (411) and (422) peaks of ITO films are grown strongly. Electrical resistivity is also increased, as the sputtering power and pressure are increased. Transmittance of ITO thin films in the visible light ranges is lowered with an increase of sputtering power and film thickness. Reflectance of ITO films in infra-red region is decreased, as the power and pressure is increased.

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The Effect of Dielectric Firing Process in PDP on the Properties of ITO Prepared by Reactive RF Sputtering (반응성 스퍼트링에 의한 ITO의 형성과 유전체 소성공정중의 특성변화에 관한 연구)

  • 남상옥;지성원;손제봉;조정수;박정후
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.11a
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    • pp.510-514
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    • 1997
  • The thin film that is electrically conductive and optically transparent is called conductive transparent thin film. ITO(Indium-Tin Oxide) which is a kind of conductive transparent thin film has been widely used in solar cell, transparent electrical heater, selective optical filter, FDP(Flat Display Panel) such as LCD(Liquid Crystal Display), PDP(Plasma Display Panel) and so on. Especially in PDP, ITO films is used as a transparent electrode in order to maintain discharge and decrease consumption power through the improvement of cell structure. In this study, we prepared ITO by reactive r.f. sputtering with indium-tin(Sn 10wt%) alloy target instead of indium-tin oxide target. The ITO films deposited at low temperature 15$0^{\circ}C$ and 8% $O_2$. Partial pressure showed about 3.6 Ω/$\square$. At the end of firing, the resistance of ITO was decreased, the optical transparence was improved above 90%.

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Electrical and Optical Properties of ITO Films Sputtered by RF -bias Voltage and In-Sn Alloy Target

  • Kim, Hyun-Hoo;Shin, Sung-Ho
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.4
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    • pp.153-157
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    • 2004
  • ITO thin films were deposited on PET and soda-lime glass substrates by a dc reactive magnetron sputtering of In-Sn alloy metal target without substrate heater and post-deposition thermal treatment. The dependency of rf-bias voltage and substrate power during deposition processing was investigated to control the electrical and optical properties of ITO films. The range of rf bias voltage is from 0 to -80 V and the substrate power is applied from 10 to 50 W. The minimum resistivity of ITO film is 5.4${\times}$10$^{-4}$ $\Omega$cm at 50 W power and rf-bias voltage of -20 V. The best transmittance of ITO films at 550 nm wavelength is 91 % in the substrate power of 30 W and rf-bias voltage of -80 V.