• Proceedings of the KAIS Fall Conference
• /
• 2006.11a
• /
• pp.133-134
• /
• 2006

본 논문에서는 ITO/Glass 기판에 스핀 코팅법(Spin Coating)과 열 증착법(Thermal Evaporation)을 이용하여 ITO/PEDOT:PSS/PVK/PFO-poss/Li/Al 구조를 갖는 청색 고분자 유기전계발광소자를 제작하였다. 청색 고분자 유기발광다이오드 제작시 ITO 전극을 $O_2$ gas를 이용한 Plasma Treatment와 Heat Treatment를 실시하여 기판처리가 제작된 소자의 전기, 광학적 특성에 미치는 영향에 대하여 조사하였다. Plasma와 Heat Treatment를 동시에 처리한 소자에서 가장 우수한 전기, 광학적 특성을 나타냈으며, 기판처리를 하지 않은 경우는 전기, 광학적 특성은 크게 감소하였다.

• Proceedings of the Korean Vacuum Society Conference
• /
• 1994.06a
• /
• pp.47-47
• /
• 1994

• Proceedings of the Korean Ceranic Society Conference
• /
• 2003.04a
• /
• pp.117.1-117
• /
• 2003

• Journal of Sensor Science and Technology
• /
• v.10 no.1
• /
• pp.80-85
• /
• 2001

$Hg_{1-x}Cd_xTe$(MCT) thin films were grown onto ITO glass and titanium plate by stationary cathodic electrodeposition in aqueous solution contained $CdSO_4$, $TeO_2$, and $HgCl_2$. During deposition two main fabrication parameters were taken into account deposition potential and growth temperature. MCT films deposited by varying two parameters were studied by X-ray diffraction, electron probe micro analyser(EPMA) and scanning electron microscope measurements. It was shown by XRD and EPMA measurements that the structure of MCT films was zinc blonde and the composition of MCT films can be controlled with the deposition potential.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.11a
• /
• pp.292-292
• /
• 2007

To apply PDP panel, Soda lime glass(SLG) is cheeper than Non-alkali glass and PD-200 glass but has problems such as low strain temperature and ion diffusion by alkali metal oxide. In this paper suggest the methode that prohibits ion diffusion by deposing barrier layer on SLG. Indium thin oxide(ITO) thin films and barrier layers were prepared on SLG substrate by Rf-magnetron sputtering. These films show a high electrical resistivity and rough uniformity as compared with PD-200 glass due to the alkali ion from the SLG on diffuse to the ITO film by the heat treatment. However these properties can be improved by introducing a barrier layer of $SiO_2\;or\;Al_2O_3$ between ITO film and SLG substrate. The characteristics of films were examined by the 4-point probe, SEM, UV-VIS spectrometer, and X-ray diffraction. GDS analysis confirmed that barrier layer inhibited Na and Ka ion diffusion from SLG. Especially ITO films deposited on the $Al_2O_3$ barrier layer had higher properties than those deposited on the $SiO_2$ barrier layer.

• Journal of the Korean Ceramic Society
• /
• v.31 no.11
• /
• pp.1315-1322
• /
• 1994

In this study, stable PbTiO3 coating solution was prepared using diethanolamine(DEA) complexing agent and deposited on indium-tin oxide(ITO) coated glass substrate. Prepared thin films were dense and crack-free. Perovskite-type PbTiO3 thin films could be obtained above 50$0^{\circ}C$, while the films heat-treated above $650^{\circ}C$ showed undesired properties due to interface reactions between films and substrates and warpage phenomena of substrates. Measured maximum dielectric constant and loss tangent were found to be 144 and 0.0163 at 1 kHz, 55$0^{\circ}C$ heat-treatment, respectively.

• Applied Chemistry for Engineering
• /
• v.16 no.6
• /
• pp.742-748
• /
• 2005

Transparent conductive indium-tin oxide (ITO) films are widely used as transparent electrodes for flat panel displays. Many of the ITO films for practical use have been prepared by magnetron sputtering, chemical vapor deposition, electron beam evaporation, etc. An oxide target composed of 10 wt% $SnO_2$ and 90 wt% $In_2O_3$ has been deposited onto polycyclic olefin polymer (POP) substrate by electron beam evaporation. POP has a higher glass transition temperature ($Tg=330^{\circ}C$) than other conventional polymers. In this study, the effects of substrate temperature and the $O_2$ introduction flow rate were investigated in terms of physical, electrical and optical properties of deposited ITO films. We investigated the effects of processing variables such as substrate temperature and the oxygen introduction flow rate. The best electrical and optical properties of deposited ITO films obtained from this study were electrical resistivity value of ${\rho}=1.78{\times}10^{-3}{\Omega}{\cdot}cm$ and optical transmittance of about 85% at 8 sccm (Standard Cubic Centimeter per Minute) $O_2$ introduction flow rate, $5{\AA}/sec$ deposition rate, $1000{\AA}$ deposited ITO thickness and $200^{\circ}C$ substrate temperature.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.293-293
• /
• 2013

최근 디스플레이산업이 발달하면서 투명전도성 물질에 대한 산업의 요구도가 높아지고 있다. ITO투명전도성 박막은 낮은 비저항과 우수한 식각특성을 가지고 있어 평면표시소자, 광소자, 터치패널 그리고 가스 센서 등 다양한 분야에 응용되고 있으며 디스플레이 소자가 소형화 되어감에 따라 박막의 다기능화가 요구되고 있다. 본 실험에서는 전기적 특성과 친, 발수특성을 동시에 가지는 다기능성 ITO 박막을 연구하였다. RIE방식으로 식각을 통하여 Poly Si-wafer 표면에 미세구조를 만든 기판과 Slide Glass기판에 RF-magnetron sputtering 방법을 이용해 ITO박막을 증착하여 비교분석 하였다. ITO박막 증착시 $100{\sim}400^{\circ}C$ 열처리와 산소를 사용하지 않고 Ar 가스만을 사용하여 실험한 후 열처리온도에 따른 전기적 특성 및 접촉각에 대하여 조사하였다. 3 uL의 Di-water를 사용하여 접촉각을 측정한 결과 $400^{\circ}C$ 열처리가 된 Poly si-wafer 위에 증착된 ITO 박막에서 초-친수 특성을 나타냈으며, 그 위에 PTFE을 증착하였을 경우 12 uL의 Di-water를 사용하여 약 $150^{\circ}$ 이상의 초-발수 특성을 나타내었다. 전기적 특성은 $5.8{\times}10^{-4}$의 비 저항을 나타내었다. 이러한 전기적 특성과 친 발수 특성을 동시에 가지는 ITO 박막은 Anti-Fogging, self-Cleaning, Solar cell 및 디스플레이소자 등 다양한 산업에 이용 가능할 것으로 생각된다.

• The Journal of the Institute of Internet, Broadcasting and Communication
• /
• v.15 no.6
• /
• pp.231-238
• /
• 2015

In this paper, we have studied a sheet resistance property of N- and P-type thin films deposited on ITO glass by use of RF magnetron sputtering. The N-type samples which has the deposition condition of 150W RF power, shows the highest current value, and the samples deposited for 15 minutes shows a better Ohmic contact property. As the substrate temperature, RF power and deposition time are increased, the sheet resistance of the samples is increased, and the low sheet resistance sample shows a better I-V property. The P-type samples shows the highest current value by 150W RF power condition as similar as N-type samples. and the samples deposited for 20 minutes shows a better ohmic contact property. The sheet resistance of the both types samples is increased as increasing RF power and deposition time.

• Journal of the Semiconductor & Display Technology
• /
• v.9 no.4
• /
• pp.1-5
• /
• 2010

The PVA (poly-vinyl alcohol) insulators were spun coated onto ITO coated glass substrates with the capacitors of Glass/ITO/PVA/Al structure. The effects of PVA concentrations (3.0, 4.0 and 5.0 wt%) on the morphology and electrical properties of the films were investigated. As the concentration of PVA increased from 3.0 to 5.0 wt%, the leakage current of device decreased from 17.1 to 0.23 pA. From the AFM measurement, the RMS value decreased with increasing PVA concentration, showing the improvement of insulator film roughness. The capacitances of the films with PVA concentrations of 4.0 and 5.0 wt% were about 28.1 and 24.2 nF, respectively. The lowest leakage current of 1.77 PA was obtained at the film thickness of 117.5 nm for the device with fixed PVA concentration of 5.0 wt%.