• Journal of the Korean Vacuum Society
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• v.7 no.s1
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• pp.134-139
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• 1998

Amorphous fluorocarbon (a-C:F) is of interest for low dielectric interlayer material, but in this work we applied this material to FED field emitter. N-doped a-C:F films were deposited by inductively coupled plasma chemical vapor deposition (ICPCVD). The Raman spectra were measured to study the film structure and inter-band optical absorption coefficients were measured using Perkin-Elmer UV-VIS-IR spectrophotometer and optical band gap was obtained using Tauc's plot. XPS spectrum and AFM image were investigated to study bond structure and surface morphology. Current-electric field(I-E) characteristic of the film was measured for the characterization of electron emission properties. The optimum doping concentration was found to be [N2]/[CF4]=9% in the gas phase. The turn-on field and the emission current density at $[N_2]/[CF_4]$=9% were found to be 7.34V/$\mu\textrm{m}$ and 16 $\mu\textrm{A}/\textrm{cm}^2$ at 12.8V/$\mu\textrm{m}$, respectively.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.663-666
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• 2007

High-efficiency red phosphorescent OLEDs employing a novel red emitter and a multifunctional oligofluorene host are reported. With qazIr(acac) as the red phosphorescent dopant, a maximum external quantum efficiency of 19% and maximum power efficiency of 11 lm/W are achieved. In addition, single layer devices using such host and dopant materials have efficiencies up to 13%.

• Journal of the Korean Applied Science and Technology
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• v.29 no.3
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• pp.459-465
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• 2012

We had synthesized a green dopant material based on the binaphthyl group, 7,7'-(2,2'dimethoxy-1,1'-binaphthyl-3,3'-diyl) bis(4-(thiophen -2-yl) benzo[e][1,2,5] thiadiazole (TBT). We also fabricated the white organic light emitting diode (OLED) with a phosphorescent blue emitter : iridium(III)bis[(4,6-di-fluoropheny)-pyridinato -N,C2]picolinate (FIrpic) doped in N,N'-dicarbazolyl-3,5-benzene (mCP) of hole transport type host material and both TBT and bis(2-phenylquinolinato)- acetylacetonate iridium(III) (Ir(pq)2acac) doped in 1,3,5-tris(N-phenylbenzimidazole -2-yl)benzene (TPBi) of electron transport type host material. As a result, the property of white OLED using TBT, which demonstrated a maximum luminous efficiency and external quantum efficiency of 5.94 cd/A and 3.23 %, respectively. It also showed the pure white emission with Commission Internationale de I'Eclairage (CIE) coordinates of (0.34, 0.36) at 1000 nit.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.265-265
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• 2014

일반적으로 태양전지 및 반도체 공정에서 불순물 주입 과정인 도핑(Doping)공정은 크게 몇 가지 방법으로 구분해 볼 수 있다. 소성로(Furnace)를 이용하여 열을 통해 불순물을 웨이퍼 내부로 확산시키는 열확산 방법과 진공 챔버 내부에서 전자기장을 걸어 이온을 극도로 가속시켜 진행하는 이온 주입(Ion implantation)이나 이온 샤워(Ion shower)를 이용한 도핑 방법이 있다. 또한 최근 자외영역 파장의 레이저광을 조사하여 광화학 반응에 의해 도펀트 물질를 분해하는 동시에 조사 부분을 용해하여 불순물을 도포하는 기법인 레이져 도핑(Laser doping) 방법이 개발중이다. 그러나 레이져나 이온 도핑 공정기술은 고가의 복잡한 장비가 필요하여 매출 수익성 및 대량생산에 비효율적이며 이온 주입에 의한 박막의 손상을 치료하기 위한 후속 어닐링(Post-annealing) 과정이 요구되는 단점을 가지고 있고 열확산 도핑 방법은 정량적인 불순물 주입 제어가 어렵고 시간 대비 생산량의 한계가 있다. 반면 대기압 플라즈마로 도핑을 할 경우 기존에 진공개념을 벗어나 공정상에서 보다 저가의 생산을 가능케 할 뿐아니라 멀티 플라즈마 소스 개발로 이어진다면 시간적인 측면에서도 단연 단축시킬 수가 있어 보다 대량 생산 공정에 효과적이다. 따라서 본 연구에서는 새로운 도핑 방법인 대기압 플라즈마를 이용한 도핑 공정기술의 가능성을 제안하고자 도핑 공정 시 웨이퍼 내 전류 패스(Current path)에 대한 메카니즘을 연구하였다. 대기압 플라즈마 방전 시 전류가 웨이퍼 내부에 흐를 때 발생되는 열을 이용하여 도핑이 되는 형식이란 점을 가정하고 이 점에 대한 원리를 증명하고자 실험을 진행하였다. 실험 방식은 그라운드(Ground) 내 웨이퍼의 위치와 웨이퍼 내 방전 위치에 따라 적외선 화상(IR image: Infrared image) 화상을 서로 비교하였다. 적외선 화상은 실험 조건에 따라 화상 내 고온의 표식이 상이하게 변하는 경향성을 나타내었다. 이 고온의 표식이 전류 패스라는 점을 증명하고자 시뮬레이션을 통해 자기장의 전산모사를 한 결과 전류 패스의 수직 방향으로 자기장이 형성이 됨을 확인하였으며 이는 즉 웨이퍼 내부 전류 패스에 따라 도핑이 된다는 사실을 명백히 말해주는 것이며 전류 패스 제어의 가능성과 이에 따라 SE(Selective Emitter) 공정 분야 응용 가능성을 보여준다.

• Journal of the Korean institute of surface engineering
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• v.47 no.5
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• pp.227-232
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• 2014

In this study, we propose the application of doping process technology for atmospheric pressure plasma. The plasma treatment means the wafer is warmed via resistance heating from current paths. These paths are induced by the surface charge density in the presence of illuminating Argon atmospheric plasmas. Furthermore, it is investigated on the high-concentration doping to a selective partial region in P type solar cell wafer. It is identified that diffusion of impurities is related to the wafer temperature. For the fixed plasma treatment time, plasma currents were set with 40, 70, 120 mA. For the processing time, IR(Infra-Red) images are analyzed via a camera dependent on the temperature of the P type wafer. Phosphorus concentrations are also analyzed through SIMS profiles from doped wafer. According to the analysis for doping process, as applied plasma currents increase, so the doping depth becomes deeper. As the junction depth is deeper, so the surface resistance is to be lowered. In addition, the surface charge density has a tendency inversely proportional to the initial phosphorus concentration. Overall, when the plasma current increases, then it becomes higher temperatures in wafer. It is shown that the diffusion of the impurity is critically dependent on the temperature of wafers.

• Proceedings of the KIEE Conference
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• 1995.07c
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• pp.1137-1139
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• 1995

$SiN_x$ films deposited on bare Si and wet-etched Si by RPCVD were fabricated to investigated the effect of wet-etched surface of Si on the characteristics of the interface between $SiN_x$ and Si. FT-IR spectra on each film showed similar characteristics. However, it was confirmed that the electric characteristics(I-V, C-V) of the interface between $SiN_x$ and Si have been degraded by the wet etching process of Si, which is applied for the formation of Si field emitter array. Therefore, we suggest that the stacked structure of insulating layer with good interface characteristics is desirable for FED application.

• Bulletin of the Korean Chemical Society
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• v.32 no.9
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• pp.3290-3294
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• 2011

The properties of monomeric and dimeric salen-aluminum complexes, [salen(3,5-$^tBu)_2$Al(OR)], R = $OC_6H_4-p-C_6H_6$ (H1) and R = [salen(3,5-$^tBu$)AlOPh]C$(CH_3)_2$ (H2) (salen = N,N'-bis-(salicylidene)-ethylenediamine) as host layer materials in red phosphorescent organic light-emitting diodes (PhOLEDs) were investigated. H1 and H2 exhibit high thermal stability with decomposition temperature of 330 and $370^{\circ}C$. DSC analyses showed that the complexes form amorphous glasses upon cooling of melt samples with glass transition temperatures of 112 and $172^{\circ}C$. The HOMO (ca. -5.2~-5.3 eV) and LUMO (ca. -2.3~-2.4 eV) levels with a triplet energy of ca. 1.92 eV suggest that H1 and H2 are suitable for a host material for red emitters. The PhOLED devices based on H1 and H2 doped with a red emitter, $Ir(btp)_2$(acac) (btp = bis(2-(2'-benzothienyl)-pyridinato-N,$C^3$; acac = acetylacetonate) were fabricated by vacuum-deposition and solution process, respectively. The device based on vacuum-deposited H1 host displays high device performances in terms of brightness, luminous and quantum efficiencies comparable to those of the device based on a CBP (4,4'-bis(Ncarbazolyl) biphenyl) host while the solution-processed device with H2 host shows poor performance.