• Title/Summary/Keyword: Hysteresis band

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Variable Speed Drives of Induction Motor for Traction Application with Modified Sliding Mode Control

  • Ryoo, Hong-Je;Kim, Jong-Soo;Rim, Geun-Hie;Dragos Ovidiu Kisck;Won, Chung-Yuen
    • Journal of KIEE
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    • v.11 no.1
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    • pp.62-68
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    • 2001
  • In this paper it is proposed an advanced modified sliding mode control of a rotor field oriented control of induction motor. The application of this unconventional control has very good results, such as disturbance rejection and nice dynamic properties. Stability can be guaranteed even in the worst situation. A conventional "sliding mode" controller is characterised by fast switching control signal, which causes the chattering of the drive system. To overcome this problem, a modified law is used, by introducing a hysteresis band and a continuous control, which modifies the conventional law. The control is accomplished with dual TMS320C44 floating-point digital signal processor. The validity of the proposed method was verified by experiment on the propulsion system simulator, used for the development of Korean High-Speed Railway Train(KHSRT).in(KHSRT).

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Low-temperature CVD PN-InP MISFETs (저온 CVD PN-InP MISFETs)

  • Jeong, Yoon-Ha
    • Proceedings of the KIEE Conference
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    • 1987.07a
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    • pp.473-476
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    • 1987
  • Low temperature phosphorus-nitride CVD was newly developed for a high quality gate insulator on InP substrate. This film showed the Poole-Frenkel type conduction in high electric field with resistivity higher than $1{\times}10^{14}$ ohm-cm near the electric field of $1{\times}10^7\;volt/cm$. The C-V hysteresis width was very small as 0.17 volt. The density of interface trap states was $2{\times}10^{11}cm^{-2}ev^{-1}$ below the conduction band edge of InP substrate. Effective electron mobility was about $1200-1500\;cm^2/Vsec$ and showed the instability of PN-InP MISFETs drain current reduced less than 10 percent for the period $0.5-10^3sec$.

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Direct Torque Control of Induction Motor Using Flux & Torque Slop (자속 및 토오크 기울기를 이용한 유도전동기의 직접토오크 제어)

  • Choi, Youn-Ok;Choi, Mon-Han;Jeong, Sam-Young;Cho, Geum-Bae;Baek, Hyung-Lae
    • Proceedings of the KIEE Conference
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    • 2003.07b
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    • pp.1135-1137
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    • 2003
  • The conventional DTC strategy provides a fast torque response even though it has very simple scheme consisted with only two hysteresis band comparators and a switching table for torque and flux control. Drawbacks of the conventional BTC are relatively high torque ripple at low speed and variation of the switching frequency according to motor speed. In this paper, the new direct torque control(BTC) schemes are proposed. Those schemes are based on the torque slope and and flux to reduce the torque ripple.

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A Sensorless Position Control System of SPMSM with Direct Torque Control (직접 토크제어에 의한 센서리스 SPMSM의 위치 제어 시스템)

  • Kim Min-Ho;Kim Nam-Hun;Kim Dong-Hee;Kim Min-Huei;Hwang Don-Ha
    • Proceedings of the KIPE Conference
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    • 2001.07a
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    • pp.397-400
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    • 2001
  • This paper presents a implementation of digital sensorless position control system of surface permanent-magnet synchronous motor (SPMSM) drive with a direct torque control (DTC). The system are stator flux and torque observer of stator flux feedback control model that inputs are current and voltage sensing of motor terminal with estimated rotor angle for a low speed operating area, two hysteresis band controllers, an optimal switching look-up table, rotor speed estimator, and IGBT voltage source inverter by using fully integrated control software. The developed sensorless control system are shown a good motion control response characteristic results and high performance features using 1.0 (kW) purposed servo drive SPMSM.

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Fabrication and Properties of Aluminum oxide/6H-SiC Structures using Sputtering Method (스퍼터링법을 이용한 산화알루미늄/6H-SiC 구조의 제작 및 특성)

  • Jung, Soon-Won;Choi, Haeng-Chul;Kim, Jae-Hyun;Jeong, Sang-Hyun;Kim, Kwang-Ho;Koo, Kyung-Wan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.194-195
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    • 2006
  • Aluminum oxide films directly grown on n-type 6H-SiC(0001) substrates were fabricated by RF magnetron sputtering system. Metal-insulator-semiconductor(MIS) C-V properties with aluminum oxide thin films showed hysteresis and f1at band voltage shift. The dielectric constant of the film calculated from the capacitance at the accumulation region was about 5. Typical gate leakage current density of film at room temperature was the order of $10^{-9}\;A/cm^2$ at the range of within 2MV/cm. The breakdown did not occur at the film within the measurement range.

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Electrical Characteristics of SiO2/4H-SiC Metal-oxide-semiconductor Capacitors with Low-temperature Atomic Layer Deposited SiO2

  • Jo, Yoo Jin;Moon, Jeong Hyun;Seok, Ogyun;Bahng, Wook;Park, Tae Joo;Ha, Min-Woo
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.17 no.2
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    • pp.265-270
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    • 2017
  • 4H-SiC has attracted attention for high-power and high-temperature metal-oxide-semiconductor field-effect transistors (MOSFETs) for industrial and automotive applications. The gate oxide in the 4H-SiC MOS system is important for switching operations. Above $1000^{\circ}C$, thermal oxidation initiates $SiO_2$ layer formation on SiC; this is one advantage of 4H-SiC compared with other wide band-gap materials. However, if post-deposition annealing is not applied, thermally grown $SiO_2$ on 4H-SiC is limited by high oxide charges due to carbon clusters at the $SiC/SiO_2$ interface and near-interface states in $SiO_2$; this can be resolved via low-temperature deposition. In this study, low-temperature $SiO_2$ deposition on a Si substrate was optimized for $SiO_2/4H-SiC$ MOS capacitor fabrication; oxide formation proceeded without the need for post-deposition annealing. The $SiO_2/4H-SiC$ MOS capacitor samples demonstrated stable capacitance-voltage (C-V) characteristics, low voltage hysteresis, and a high breakdown field. Optimization of the treatment process is expected to further decrease the effective oxide charge density.

Effect of Hydrogen Treatment on Electrical Properties of Hafnium Oxide for Gate Dielectric Application

  • Park, Kyu-Jeong;Shin, Woong-Chul;Yoon, Soon-Gil
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.1 no.2
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    • pp.95-102
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    • 2001
  • Hafnium oxide thin films for gate dielectric were deposited at $300^{\circ}C$ on p-type Si (100) substrates by plasma enhanced chemical vapor deposition (PECVD) and annealed in $O_2$ and $N_2$ ambient at various temperatures. The effect of hydrogen treatment in 4% $H_2$ at $350^{\circ}C$ for 30 min on the electrical properties of $HfO_2$for gate dielectric was investigated. The flat-band voltage shifts of $HfO_2$capacitors annealed in $O_2$ambient are larger than those in $N_2$ambient because samples annealed in high oxygen partial pressure produces the effective negative charges in films. The oxygen loss in $HfO_2$films was expected in forming gas annealed samples and decreased the excessive oxygen contents in films as-deposited and annealed in $O_2$ or $N_2$ambient. The CET of films after hydrogen forming gas anneal almost did not vary compared with that before hydrogen gas anneal. Hysteresis of $HfO_2$films abruptly decreased by hydrogen forming gas anneal because hysteresis in C-V characteristics depends on the bulk effect rather than $HfO_2$/Si interface. The lower trap densities of films annealed in $O_2$ambient than those in $N_2$were due to the composition of interfacial layer becoming closer to $SiO_2$with increasing oxygen partial pressure. Hydrogen forming gas anneal at $350^{\circ}C$ for samples annealed at various temperatures in $O_2$and $N_2$ambient plays critical role in decreasing interface trap densities at the Si/$SiO_2$ interface. However, effect of forming gas anneal was almost disappeared for samples annealed at high temperature (about $800^{\circ}C$) in $O_2$ or $N_2$ambient.

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Electrical Properties of Laser CVD Silicon Nitride Film (Laser CVD SiN막의 전기적 특성)

  • Kim, Yong-Woo;Kim, Sang-Wook;Park, Jong-Wook;Kim, Chun-Sub;Sung, Yung-Kwon
    • Proceedings of the KIEE Conference
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    • 1990.11a
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    • pp.85-87
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    • 1990
  • Silicon nitride film was deposited on a silicon wafer using a laser CVD(LCVD) technique, which is based on direct photolysis of $SiH_4/NH_3$ gas mixture by ArF laser beam(${\lambda}=193\;nm$). The refractive index of deposited SiN film is 1.9 at the temperature of $300^{\circ}C$, pressure of 5 torr. The breakdown field strength of LCVD SiN film was 10MV/cm. In IR spectrum, the absorption peak of Si-H, N-H, and Si-N is detected and it is shown that hydrogen is included in SiN film. From analysis of absorption band. it is calculated that density of Si-H, N-H bond is higher than $5{\times}10^{22}cm^{-3}$. LCVD MIS capacitor and PECVD MIS capacitor have injection-type hysteresis but it is known that hysteresis loss of LCVD MIS capacitor is smaller than that of PECVD MIS capacitor. It means that Interface state density of LCVD capacitor is smaller than that of PECVD capacitor. In addition, the flatband voltage($V_{FB}$) of LCVD is smaller than that of PECVD capacitor. And it means that fixed charged density($Q_{FIX}$) of LCVD capacitor is smaller than that of PECVD MIS capacitor.

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Dead Time Compensation and Polarity Check of Phase Currents Based on Programmable Low-pass Filter for Automotive Electric Drive Systems (자동차 전동 시스템을 위한 Programmable 저역 통과 필터 기반의 상전류 극성 판단 및 데드타임 보상)

  • Choi, Chinchul;Lee, Kangseok;Lee, Wootaik
    • Transactions of the Korean Society of Automotive Engineers
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    • v.22 no.6
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    • pp.23-30
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    • 2014
  • This paper proposes a dead time compensation method for an AC motor drive using phase current polarity information which is detected based on a digital programmable low-pass filter (PLPF). The polarity detection using the PLPF is an alternative solution of a conventional method which uses a general low-pass filter (LPF) and hysteresis bands in order to avoid jittering due to noises. The PLPF not only adjusts its cutoff frequency according to the synchronous frequency of AC motors but also eliminates a gain attenuation and phase delay which are main problems of the general LPF. Through the PLPF, a fundamental component signal without gain and phase distortions is extracted from the measured raw current signal with noise. By use of the fundamental component, the polarity of current is effectively detected by reducing the hysteresis band. Finally, the proposed method compensates the dead time effects by adding or subtracting average voltage value to voltage references of the controller according to the detected current polarity information. The proposed compensation method is experimentally verified by compared with the conventional method.

Capacitance-Voltage Characterization of Ge-Nanocrystal-Embedded MOS Capacitors (Ge 나노입자가 형성된 MOS 캐패시터의 캐패시턴스와 전압 특성)

  • Park, Byoung-Jun;Choi, Sam-Jong;Cho, Kyoung-Ah;Kim, Sang-Sig
    • Journal of IKEEE
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    • v.10 no.2 s.19
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    • pp.156-160
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    • 2006
  • Capacitance versus voltage (C-V) curves of Ge-nanocrystal (NC)-embedded MOS capacitors with and without a single capping Al2O3 layer are characterized in this work. C-V curves of the Ge-NC-embedded MOS capacitor with the A12O3 layer are counterclockwise in the voltage sweeps, which indicates tile presence of charge storages in the Ge NCs by the tunnelling of charge carriers between the Si substrate and the Ge NCs. In the Ge-NC-embedded MOS capacitor without Al2O3 layer, clockwise hysteresis of the C-V curves and leftward shifts of the flat band voltages are observed for the embedded MOS capacitor without the Al2O3 layer. It is suggested that the characteristics of the C-V curves are due to the charge trapping at oxygen vacancies within a SiO2 layer. In addition, the illumination of the white light enhances the lower capacitance part of the C-V hysteresis. The origin for the enhancement is discussed in this paper.

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