• Clean Technology
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• v.10 no.4
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• pp.221-228
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• 2004

Ethoxylated Nonyl Phenol Series (NP-series), nonionic surfactants, were applied for forming microemulsions in supercritical $CO_2$. Measurement results of the solubility in supercritical $CO_2$ are in the following; NP-series were high soluble in carbon dioxide in spite of the fact that those were not $CO_2$-philic surfactants traditionally well known. Water in $CO_2$ microemulsions were also formed stably. A complexation of hydrophilic lengths for $CO_2$-philic parts of NP-Series surfactants was optimized by NP-4 surfactant(N=4) for forming the microemulsions through the experiments. Formation of microemulsions was confirmed by measuring the UV-Visible spectrum through a spectroscopic method and existence of water in the microemulsions was confirmed as well. In order to apply it for a metal surface treatment or electroplating, an experiment for forming acid(organic, inorganic) solution in $CO_2$ microemulsions was carried out. Ionic surfactant in the reaction to an acid solution became unstable to form microemulsions, however, nonionic surfactant was formed stably in the reaction. Results of the study will be utilized for expanding the application scope of supercritical $CO_2$ which is an environmental-friendly solvent.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.34 no.11
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• pp.1721-1725
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• 2010

This paper reports the fabrication of geometry-controlled carbon microneedles by a backside exposure method and pyrolysis. The SU-8 microneedles are a polymer precursor in a carbonization process, which geometries such as base diameter, spacing, and aspect ratio can be controlled in a photolithography step. Using this fabrication method, highly reproducible carbon microneedles, which have high aspect ratios of more than 10 and very sharp nanotips, can be realized. The quartz surface with carbon microneedles becomes very hydrophilic and its wettability is adjusted by carrying out the silane treatment. In the carbon microneedle array ($3\;{\mu}m{\times}3\;{\mu}m$), the contact angle is extremly enhanced (${\sim}180^{\circ}$); this will be advantageous in developing low-drag microfluidics and labs-on-a-chip as well as in other bio-applications.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.4
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• pp.301-307
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• 2002

Direct bonded SOI wafer pairs with $Si ll SiO_2/Si_3N_4 ll Si$ the heterogeneous insulating layers of SiO$_2$-Si$_3$N$_4$are able to apply to the micropumps and MEMS applications. Direct bonding should be executed at low temperature to avoid the warpage of the wafer pairs and inter-diffusion of materials at the interface. 10 cm diameter 2000 ${\AA}-SiO_2/Si(100}$ and 560 $\AA$- ${\AA}-Si_3N_4/Si(100}$ wafers were prepared, and wet cleaned to activate the surface as hydrophilic and hydrophobic states, respectively. Cleaned wafers were pre- mated with facing the mirror planes by a specially designed aligner in class-100 clean room immediately. We employed a heat treatment equipment so called fast linear annealing(FLA) with a halogen lamp to enhance the bonding of pre mated wafers We kept the scan velocity of 0.08 mm/sec, which implied bonding process time of 125 sec/wafer pairs, by varying the heat input at the range of 320~550 W. We measured the bonding area by using the infrared camera and the bonding strength by the razor blade clack opening method, respective1y. It was confirmed that the bonding area was between 80% and to 95% as FLA heat input increased. The bonding strength became the equal of $1000^{\circ}C$ heat treated $Si ll SiO_2/Si_3N_4 ll Si$ pair by an electric furnace. Bonding strength increased to 2500 mJ/$\textrm{m}^2$as heat input increased, which is identical value of annealing at $1000^{\circ}C$-2 hr with an electric furnace. Our results implies that we obtained the enough bonding strength using the FLA, in less process time of 125 seconds and at lowed annealing temperature of $400^{\circ}C$, comparing with the conventional electric furnace annealing.

• KSBB Journal
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• v.20 no.4
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• pp.253-259
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• 2005

This study was accomplished using attached $A^2/O$ process that contains nonsurface-modified and surface-modified polyethylene media inside the Anaerobic/Anoxic, Oxic tank, respectively. We could make the hydrophobic polyethylene media have hydrophilic characteristics by radiating ion beam on the surface of the media. The objectives of this study is to investigate the removal efficiencies of the organics and nitrogen when the step feed ratio of raw wastewater into anaerobic and anoxic tank is changed. In this case, we assumed that the denitrification rate can be improved because the nitrifiers in anoxic tank can perform denitrification using RBDCOD instead of artificial carbon sources (for example, methanol, etc.). The wastewater injection rate into anaerobic/anoxic tank was set up by the ratio of 10 : 0, 9 : 1, 8 : 2, 6 : 4, and the results of BOD removal efficiency showed similar trends with $93.3\%,\;92.6\%,\;92.4\%\;and\;91.6\%$, respectively. But the BOD removal efficiency (utilization of the organics) in the anoxic tank was in the order of 9 : 1 $(84.8\%)$, 10 : 0 $(77.0\%)$, 8 : 2 $(75.3\%)$, and 6 : 4 $(61.1\%)$. The T-N removal efficiency was most high when the ratio is 9 : 1 $(67.4\%)$, and other conditions, 10 : 0, 8 : 2, 6 : 4, showed $61.3(\%),\;60.7\%,\;55.5\%$, respectively; the ratio 6 : 4 was found to be lowest T-N removal efficiency, lower than the ratio 9 : 1 by $12\%$. Though the nitrification rate of the ratio 10 : 0, 9 : 1, and 8 : 2 showed similar levels, the ratio 6 : 4 showed considerable inhibition of nitrification, ammonia was the great portion of the effluent T-N. The advantages of this process is that this process is cost-saving, and non-toxic methods than injecting the artificial carbon source.