• 한국전기전자재료학회논문지
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• 제16권11호
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• pp.961-968
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• 2003

In order to reach the high electrical quality of organic thin film transistors (OTFTs) such as high mobility and on-off current ratio, it is strongly desirable to study the enhancement of electrical properties in OTFTs. Here, we report the novel method of hydrogen plasma treatment to improve electrical properties in inverted staggered OTFTs based on pentacene as active layer. To certify the effect of this method, we compared the electrical properties of normal device as a reference with those of device using the novel method. In result, the normal device as a reference making no use of this method exhibited a field effect mobility of 0.055 $\textrm{cm}^2$/Vs, on/off current ratio of 10$^3$, threshold voltage of -4.5 V, and subthreshold slope of 7.6 V/dec. While the device using the novel method exhibited a field effect mobility of 0.174 $\textrm{cm}^2$/Vs, on/off current ratio of 10$\^$6/, threshold voltage of -0.5 V, and subthreshold slope of 1.49 V/dec. According to these results, we have found the electrical performances in inverted staggered pentacene TFT owing to this method are remarkably enhanced. So, this method plays a key role in highly improving the electric performance of OTFTs. Moreover, this method is the first time yet reported for any OTFTs.

• 한국염색가공학회지
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• 제4권2호
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• pp.76-83
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• 1992

Wool tropical and nylon taffeta were treated with low temperature plasma of $O_2$, $N_2$, NH$_3$, CF$_4$ and CH$_4$ for the intervals of 10 to 300 sec, and then dyed with leveling and milling type acid dyes in presence or absence of buffer solution. From the color depth of dyed fabrics, effect of plasma gases, treated time, dyeing time and temperature on dyeing property was studied. The results of the experiment can be summarized as follows: 1) The plasma treatments except methane gas increased the color depth of dyed wool fabrics, but not that of dyed nylon fabrics regardless of the plasma gases used. 2) The color depth of wool fabrics dyed in the dye bath without buffer solution was increased by the low temperature plasma, especially increased much more by CF$_4$ plasma treatment. It is found that with the identification of F- ion in the residual dye bath the hydrogen fluoride gas was adsorbed on wool fabrics in the plasma treatment. 3) The color depth of wool fabrics was increased with the time of $O_2$ and CF$_4$ plasma treatments. 4) In both cases of the leveling and milling type acid dyes, the rate of dyeing was increased in the low temperature plasma treatments, and it is found that the leveling type acid dye increased the color depth at relatively low temperature below 4$0^{\circ}C$, compared with the milling type acid dye.

• 한국진공학회지
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• 제15권2호
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• pp.223-230
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• 2006

분자선 에피택시 (MBE)법으로 성장된 양자점 원적외선 수광소자(Quantum Dot Infrared Photodetector: QDIP)구조의 $In_{0.5}Ga_{0.5}As/GaAs$ 자발형성 양자점에 대하여, 수소화 처리(Hydrogen Plasma treatment) 전후의 각각의 특성을 광학적인 방법으로 분석하였다. 광학적 특성은 광루미네센스(photoluminescence: PL) 그리고 광전류(Photocurrent: PC)방법으로 각각 15K 300K 10K 130k 범위에서 측정되었으며, 수소화 처리 전후의 $In_{0.5}Ga_{0.5}As$ 자발형성 양자점의 광학적 특성을 비교 분석해보면, 원시료(as-grown)의 하나의 봉우리가 수소화 처리를 통하여 두개의 봉우리로 나뉘지만 PL의 전체 세기(intensity)에는 큰 변화가 없었으며, 광전류는 수소화 처리 후에 감소함을 알 수 있다. 수소화 처리 전후의 샘플에 대해 PL의 결과로부터 활성화 에너지를 계산하여 비교해보면, 수소화 처리 전후의 활성화 에너지가 다름을 알 수 있고, 이 변화된 활성화 에너지 값은 측정된 광전류의 봉우리에 해당하는 에너지 값과 거의 일치함을 알 수 있다. 수소화 처리된 샘플은 역 수소화 처리를 통하여 PL 그래프의 모양이 원시료의 모양으로 되돌아가야 함에도 불구하고, 수소화 처리된 시료의 PL의 그래프와 동일한 모습을 보였다. 이러한 현상은 자발형성 양자점의 수소화 처리에 따른 양자점 내부의 양자점 조성의 변동에 그 원인이 있는 것으로 보인다.

• 상하수도학회지
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• 제24권1호
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• pp.85-92
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• 2010

본 연구에서는, 하폐수 처리시설에서 발생하는 기체상 무기악취물질을 저온 플라즈마 공정으로 제거하고, 악취물질과 반응 후 배출되는 오존 함유 배가스로 유기성 슬러지의 감량과 가용화 효과를 얻고자 복합반응기를 구성하였으며 일련의 실험을 진행하였다. 플라즈마를 통과한 대상 무기악취물질인 황화수소는 플라즈마를 단독으로 거쳤을 시 약 70%의 처리효율을 보였으며, 최종적으로 슬러지 반응조까지 통과했을 경우는 99% 이상의 처리효율을 보였다. 이 때 플라즈마 공정에서 배출되는 가스에 포함된 오존은 슬러지 반응조를 통과하여 90~100%의 제거효율을 보였다. 배가스가 슬러지 반응기에 산기되면, 유기물 산화가 단계적으로 진행되며 4시간 반응 시 슬러지의 TCOD는 약 50~60% 감소하고 SCOD는 4~5배 증가하였다. 따라서 가용화율은 운전 시간이 지날수록 증가하여 4시간 이후 약 10%까지 증가하였다. 결과적으로 저온 플라즈마와 슬러지 산기반응조 복합공정을 적용하면, 하폐수 처리시설 운영상에 나타나는 악취배출과 잉여슬러지 처분 문제에 동시 적용할 수 있을 것으로 판단된다.

• 조명전기설비학회논문지
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• 제22권8호
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• pp.75-81
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• 2008

본 논문은 플라즈마를 이용한 수처리 연구를 수행하였다. 이 연구에 사용한 수중플라즈마 토치는 상당한 전력의 절감을 가져올 수 있기 때문에 경제적인측면과 에너지효율면에서 뛰어난 결과를 나타내었다. 수중에서 일어나는 스트리머방전과 아크방전 현상을 면밀히 조사하여 비교하였고, 또한 염색페수를 플라즈마로 처리하였을 시의 색도제거율과 용존오존, 과산화수소와의 상관관계를 알기위해 표본화하고 분석하였다. 이에 플라즈마토치에는 선택적인 산화반응이 다소 있긴 하지만, 플라즈마화학반응에 의한 $H_2O_2$와 $O_3$의 성장이 아크방전 보다 스트리머방전시 더 효과적으로 촉진된다는 것을 알 수 있었다. 따라서 스트리머방전이 아크플라즈마 토치에 비해 더 효율적인 플라즈마 화학반응을 일으킬 수 있는 환경을 만들어주므로, 수처리에 있어서 스트리머플라즈마토치가 더 적합하였다.

• Journal of Microbiology and Biotechnology
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• 제29권9호
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• pp.1401-1411
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• 2019

Mycobacterial cell walls comprise thick and diverse lipids and glycolipids that act as a permeability barrier to antibiotics or other chemical agents. The use of OH radicals from a non-thermal plasma jet (NTPJ) for the inactivation of mycobacteria in aqueous solution was adopted as a novel approach. Addition of water vapor in a nitrogen plasma jet generated OH radicals, which converted to hydrogen peroxide ($H_2O_2$) that inactivated non-pathogenic Mycobacterium smegmatis and pathogenic Mycobacterium tuberculosis H37Rv. A stable plasma plume was obtained from a nitrogen plasma jet with 1.91 W of power, killing Escherichia coli and mycobacteria effectively, whereas addition of catalase decreased the effects of the former. Mycobacteria were more resistant than E. coli to NTPJ treatment. Plasma treatment enhanced intracellular ROS production and upregulation of genes related to ROS stress responses (thiolrelated oxidoreductases, such as SseA and DoxX, and ferric uptake regulator furA). Morphological changes of M. smegmatis and M. tuberculosis H37Rv were observed after 5 min treatment with $N_2+H_2O$ plasma, but not of pre-incubated sample with catalase. This finding indicates that the bactericidal efficacy of NTPJ is related to the toxicity of OH and $H_2O_2$ radicals in cells. Therefore, our study suggests that NTPJ treatment may effectively control pulmonary infections caused by M. tuberculosis and nontuberculous mycobacteria (NTM) such as M. avium or M. abscessus in water.

• 한국연소학회:학술대회논문집
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• 한국연소학회 2006년도 제33회 KOSCO SYMPOSIUM 논문집
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• pp.104-109
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• 2006

Improvements in internal combustion engine and aftertreatment technologies are needed to meet future environmental quality goals. Plasmatron fuel converters provide a rapid response, compact means to transform a wide range of hydrocarbon fuels (including gasoline, natural gas and diesel fuel) into hydrogen-rich gas. Hydrogen-rich gas can be used as an additive to provide NOx reductions of more than 80% in diesel engine vehicles by enabling very lean operation or heavy exhaust engine recirculation. For diesel engines, use of compact plasmatron reformers to produce hydrogen-rich gas for the regeneration of NOx absorber/absorbers and particulate traps for diesel engine exhaust after-treatment could provide significant advantages. Recent tests of conversion of diesel fuel to hydrogen-rich gas using a low current plasmatron fuel converter with non-equilibrium plasma features are described.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.1189-1192
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• 2009

Short channel a-Si:H TFT devices with Cu electrodes have been investigated. Short channel TFTs are defined by new plasma etch process. When the channel length becomes shorter, the TFT characteristics (threshold voltage, off current, sub threshold voltage, etc.,) are degraded. These degraded characteristics can be improved through the hydrogen plasma treatment and new gate insulator structure. Using these processes, 15.0 inch XGA LCD panel was fabricated successfully where the channel length of the TFT devices was about 2.5 micrometers.

• 열처리공학회지
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• 제13권3호
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• pp.143-150
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• 2000

Ferritic plasma nitrocarburising was performed on pure iron using a modified DC plasma unit. This investigation was carried out with various gas compositions which consisted of nitrogen, hydrogen and carbon monoxide gases, and various gas pressures for 3 hours at $570^{\circ}C$. After treatment, the different cooling rates(slow cooling and fast cooling) were used to investigate its effect on the structure of the compound layer. The ${\varepsilon}$ phase occupied the outer part of the compound layer and ${\gamma}^{\prime}$ phase existed between the ${\varepsilon}$ phase and the diffusion zone. The gas composition of the atmosphere influenced the constitution of the compound layer produced, i.e. high nitrogen contents were essential for the production of ${\varepsilon}$ phase compound layer. It was found that with increasing carbon content in the gas mixture the compound layer thickness increased up to 10%. In the gas pressure around 3 mbar, the compound layer characteristics were slightly effected by gas pressure. However, in the low gas pressure and high gas pressure, the compound layer characteristics were significantly changed. The constitution of the compound layer was altered by varying the cooling rate. A large amount of ${\gamma}^{\prime}$ phase was transformed from the ${\varepsilon}$ phase during slow cooling.

• 한국전기전자재료학회논문지
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• 제16권12S호
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• pp.1175-1180
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• 2003

Transformer Coupled Plasma Chemical Vapor Deposited (TCP-CVD) silicon nitride (SiNx) is widely used as a gate dielectric material for thin film transistors (TFT). This paper reports the SiNx films, grown by TCP-CVD at the low temperature (30$0^{\circ}C$). Experimental investigations were carried out for the optimization o(SiNx film as a function of $N_2$/SiH$_4$ flow ratio varying ,3 to 50 keeping rf power of 200 W, This paper presents the dielectric studies of SiNx gate in terms of deposition rate, hydrogen content, etch rate and leakage current density characteristics lot the thin film transistor applications. And also, this work investigated means to decrease the leakage current of SiNx film by employing $N_2$ plasma treatment. The insulator layers were prepared by two step process; the $N_2$ plasma treatment and then PECVD SiNx deposition with SiH$_4$, $N_2$gases.