• 제목/요약/키워드: Hydrofluoric acid-Nitric acid compound

검색결과 3건 처리시간 0.016초

Al-Si 합금의 양극산화거동 및 규소화합물 제어 (Anodizing Behavior and Silicides Control in Al-Si Alloy System)

  • 박종문;김주석;김재권;김수림;박노진;오명훈
    • 열처리공학회지
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    • 제31권1호
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    • pp.6-11
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    • 2018
  • The anodic oxidation behavior of Si-containing aluminum alloy for diecasting was investigated. Especially, the property changes during anodization both on aluminum 1050 and 9 weight percentage silicon containing aluminum (Al-9Si) alloys were analyzed by the static current test. In order to fabricate a uniform anodic oxidation film by effect of Al-Si compound, nitric acid containing hydrofluoric acid had been used as a desmutter for aluminum alloy after alkaline etching. It was found that the level of voltage of Al-9Si alloy during the static current test was almost as double as higher than aluminum 1050 through anodization. By adding hydrofluoric acid in the nitric acid electrolyte, the silicon compound on the surface was removed, and the optimum amount of added hydrofluoric acid could be derived. It was also observed that the size of silicon compound formed on the surface could be refined by heat treatment at $500^{\circ}C$ and followed water quenching.

Effect of zirconia surface treatment using nitric acid-hydrofluoric acid on the shear bond strengths of resin cements

  • Cho, Jin Hyung;Kim, Sun Jai;Shim, June Sung;Lee, Keun-Woo
    • The Journal of Advanced Prosthodontics
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    • 제9권2호
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    • pp.77-84
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    • 2017
  • PURPOSE. The aim of this study was to compare the surface roughness of zirconia when using Zircos E etching system (ZSAT), applying a nitric acid-hydrofluoric acid compound as a pretreatment agent, and also to compare the shear bonding strength according to different resin cements. MATERIALS AND METHODS. ZSAT, air abrasion, and tribochemical silicacoating were applied on prepared 120 zirconia specimens (10 mm in diameter, 7 mm in height) using CAD/CAM. Each 12 specimens with 4 different resin cements (Panavia F 2.0, Rely X Unicem, Superbond C&B, and Hot bond) were applied to test interfacial bond strength. The statistical analysis was performed using SAS 9.1 (SAS Institute Inc., Cary, NC, USA). The results are as follows: after application of the ZSAT on the zirconia specimens, surface roughness value after 2-hour etching was higher than those after 1- and 3-hour etching on SEM images. RESULTS. For Superbond C&B and Rely X Unicem, the specimens treated with ZSAT showed higher shear bond strength values than those treated with air abrasion and tribochemical silicacoating system. Regarding the failure mode of interface over cement and zirconia surface, Rely X Unicem and Hot bond showed cohesive failures and Panavia F 2.0 and Superbond C&B showed mixed failures. CONCLUSION. Zircos E etching system in zirconia restoration could increase its shear bond strength. However, its long term success rate and clinical application should be further evaluated.

반도체 웨이퍼 제조공정(製造工程) 중 발생혼합폐산(發生混合廢酸)으로부터 불산, 질산 및 초산의 각 산 회수(回收)에 관한 연구(硏究) (Study on Recovery of Separated Hydrofluoric Acid, Nitric Acid and Acetic Acid Respectively from Mixed Waste Acid Produced during Semiconductor Wafer Process)

  • 김주엽;김현상;배우근
    • 자원리싸이클링
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    • 제18권4호
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    • pp.62-69
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    • 2009
  • 반도체 웨이퍼 제조 공정 중 발생하는 질산, 불산, 초산으로 구성된 혼합폐산을 재활용하기 위한 연구를 수행하였다. 초기에 $NaNO_3$와 Si powder를 사용하여 불산을 $Na_2SiF_6$로 침전시켜 불소화합물을 제조하였고, 이 때 혼산 중 불산의 농도는 초기 127g/L에서 0.5g/L로 낮아져 불산 회수율은 99.5%였다. $Na_2SiF_6$ 제조 후 남은 혼산의 질산과 초산의 농도는 각각 502g/L, 117g/L였고, 이 혼산에 NaOH를 투입하여 pH=4로 맞춘 후 -440 mmHg, $95^{\circ}C에서 증발농축을 하여 초산 분리 회수하였다. 회수된 초산의 농도는 약 15%였고, 회수율은 85.3% 이상이었다. 또한, 농축여액을 $20^{\circ}C$까지 냉각하여 $NaNO_3$ 결정을 석출시킴으로 질산나트륨을 제조하였고, 그 회수율은 약 93%이상이었다. 제조된 $Na_2SiF_6$$NaNO_3$$90^{\circ}C$에서 건조시킨 후, XRD 분석한 결과, 순수 $Na_2SiF_6$$NaNO_3$만 합성된 것을 확인하였고, 그 순도는 각각 약 97%, 98%로 시판용과 유사하였다.