• Title/Summary/Keyword: Hole-Only Device

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Extreme baking effect of interlayer on PLED's performance

  • Kim, Mu-Gyeom;Kim, Sang-Yeol;Lee, Tae-Woo;Park, Sang-Hun;Park, Jong-Jin;Pu, Lyong-Sun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.1775-1778
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    • 2006
  • Through baking process on an interlayer, known as hole transporting layer, varying baking temperature up to 300 degree, which is considered as extremely high for polymer light emitting device (PLED) system, we found interesting relationship between packing density and morphology affecting device performance. Granular morphology shows that as temperature increases, grain size is getting smaller to pack closely and make interlayer harden. Such denser interlayer has temperature dependency of its own mobility, even without clear evidence of degradation of material itself. Its fact proven in a single film also reflects on multilayered PLED's performance like IVL, efficiency, lifetime. It's found that, especially, to enhance lifetime is related with thermal stability of interlayer and its mobility dependency to meet better charge balance. Therefore, it gives us understanding not only baking effect of interlayer, but also material & device designing guide to enhance lifetime.

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A structural study on the passive compliance system for assembly robot (조립용 로보트를 위한 수동형 컴플라이언스 시스템에 관한 구조적 연구)

  • 민정동;안태영;권구빈
    • 제어로봇시스템학회:학술대회논문집
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    • 1986.10a
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    • pp.31-35
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    • 1986
  • Up to now, the most studies on the passive compliance system for assembly robot were only concerned about the device itself without through analysis of its concept. In this paper, we have tried to analyze a structural characteristics, in the case that the passive compliance system was used in simple assembly process like inserting a round shaft or peg into a round hole.

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Study on Ohmic resistance of Zn-doping InP using RTA method (RTA 방법에 의해 Zn 도핑된 InP의 오믹저항 특성연구)

  • Kim, H.J.;Kim, I.S.;Kim, T.U.;Kim, S.T.;Kim, S.H;Ki, H.C.;Lee, K.M.;Yang, M.H.;Ko, H.J.;Kim, H.J.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.237-238
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    • 2008
  • Electrical properties of Pd/Zn/Pd/Au contacts to p-InP were investigated as function of the V/III ratio of p-InP. P-type InP was made by the Zn diffusion into InP and activation process with rapid thermal annealing (RTA) measurement. After activation, the hole concentration was two orders of magnitude higher than that of the sample having only diffusion process. According to transmission line method (TLM) results, the specific contact resistance of p-InP was lower as used InP having the lower V/III ratio. The experimental results represent that the diffusion of Zn in undoped InP deeply related to the equilibrium between interstitials and substitutional Zn is established via indium interstitials.

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Reconstruction of extensive jaw defects induced by keratocystic odontogenic tumor via patient-customized devices

  • Park, Seok-Yong;Shin, Young-Jo;Kim, Chul-Hoon;Kim, Bok-Joo
    • Maxillofacial Plastic and Reconstructive Surgery
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    • v.37
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    • pp.37.1-37.4
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    • 2015
  • Keratocystic odontogenic tumors can occur in any area of the maxilla or mandible. According to their size, location, and relations with surrounding structures, they are treated by cyst enucleation or enucleation after either marsupialization or decompression. Enucleation is performed when cysts are not large and when only minor damage to adjacent anatomical structures is expected. Although marsupialization and decompression follow the same basic bone-regeneration principle, which is to say, by reducing the pressure within the cyst, the former leaves a large defect after healing due to the large fistula necessary to induce the conversion of the cyst-lining epithelia to oral epithelia; the latter leaves only a relatively small defect, because of the continuous washing carried out by means of a tube inserted into a small hole in the cyst. In the latter case too, a decompressor appropriate for the focal position is required, owing to the importance of maintaining the device and controlling for oral hygiene. We report herein decompression treatment with a patient-customized device for an extensive cyst in the anterior region of the mandible.

Performance enhancement of Organic Thin Film Transistor using $C_{60}$ hole injection layer ($C_{60}$(buckminsterfullurene) 홀주입층을 적용한 유기박막트랜지스터의 성능향상)

  • Yi, Moon-Suk
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.5
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    • pp.19-25
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    • 2008
  • In this study, we fabricated Organic Thin Film Transistors(OTFTs) with $C_{60}$ hole injection layer between organic semiconductor(pentacene) and metal electrode, and we compared the electrical characteristics of OTFTs with/without $C_{60}$. When the $C_{60}$ hole injection layer was introduced, the mobility and the threshold voltage were improved from 0.298 $cm^2/V{\cdot}s$ and -13.3V to 0.452 $cm^2/V{\cdot}s$ and -10.8V, and the contact resistance was also reduced. When the $C_{60}$ is inserted, the hole injection was enhanced because the $C_{60}$ prevent the unwanted chemical reaction between pentacene and Au. Furthermore, we fabricated the OTFTs using Al as their electrodes. When the OTFTs were made by only aluminum electrode, the channel were not mostly made because of the high hole injection barrier between pentacene and aluminum, but when the $C_{60}$ layer with an optimal thickness was applied between aluminum and pentacene, the device performances were obviously enhanced because of the vacuum energy level shift of Al and the consequent decrease of the hole injection barrier which was induced by the interface dipole formation between $C_{60}$ and Al. The mobility and $I_{ON}/I_{OFF}$ current ratio of OTFT with $C_{60}/Al$ electrode were 0.165 $cm^2/V{\cdot}s$ and $1.4{\times}10^4$ which were comparable with the normal Au electrode OTFT.

Residual Stress Measurement of Sand Casting by ESPI Device and Thermal Stress Analysis (ESPI 장비를 활용한 사형 주조품의 잔류응력 측정 및 주조 열응력 해석)

  • Kwak, Si-Young;Nam, Jeong-Ho
    • Journal of Korea Foundry Society
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    • v.40 no.1
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    • pp.1-6
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    • 2020
  • Many studies involving a thermal stress analysis using computational methods have been conducted, though there have been relatively few experimental attempts to investigate thermal stress phenomena. Casting products undergo thermal stress variations during the casting process as the temperature drops from the melting temperature to room temperature, with gradient cooling also occurring from the surface to the core. It is difficult to examine thermal stress states continuously during the casting process. Therefore, only the final states of thermal stress and deformations can be detemined. In this study, specimens sensitive to thermal stress, were made by a casting process. After which the residual stress levels in the specimens were measured by a hole drilling method with Electron Speckle-Interferometry technique. Subsequently, we examined the thermal stresses in terms of deformation during the casting process by means of a numerical analysis. Finally, we compared the experimental and numerical analysis results. It was found that the numerical thermal stress analysis is an effective means of understanding the stress generation mechanism in casting products during the casting process.

Characteristics of OLEDs Using $Alq_2-Ncd\;and\;Alq_2-Nq$ as Emitting Layer ($Alq_2-Ncd$$Alq_2-Nq$를 이용한 유기전기발광 소자의 특성)

  • Yang, Ki-Sung;Shin, Hoon-Kyu;Kim, Chung-Kyun;Kwon, Young-Soo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.447-450
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    • 2003
  • In this paper, new luminescent material, 6,11-dihydoxy-5,12-naphtacene-dione Alq3 complex (Alq2-Ncd), 1,4-dihydoxy-5,8-naphtaquinone Alq3 complex(Alq2-Nq) was synthesized. And extended efforts had been made to obtain high-performance electroluminescent(EL) devices, since the first report of organic light-emitting diodes(OLEDS) based on tris-(8-hydroxyquinoline) aluminum(Alq3). We have performed investigate characterization of the materials. Current-voltage characteristics, luminance-voltage characteristics and luminous efficiency were measured by Flat Panel Display Analysis System(Model 200-AT) at room temperature. An intensive research is going on to improve the device efficiency using the hole injection layer, different electrodes, and etc. By using the hole injection layer, the charge-injection can be controlled and the stability could be improved. This study indicates not only the sterical effect but also some other effects would be responsible for the change of the emission wavelength.

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촉매제에 의한 연탄깨스 제거에 관한 연구

  • Heo, Jin
    • Journal of the Korean Professional Engineers Association
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    • v.5 no.19
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    • pp.3-16
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    • 1972
  • 1. Purposes and importances of the study. In gaining heating resources by combustion of briquette, which is the necessaries of every day's life, victims occur from poisonous affection of combustion gas (carbon mono-oxide) in every year and this gas attributable to increase death rate proportion to the high demand of briquette usage. It arise great problem ill point of national sanitation. Therefore, the study has a big aim to accomplish depressing CO gas or stimulating comlete combustion by both the methods of physical improvement of present combustion devices and chemical improvement by using V$_2$O$\sub$5/ catalyst to depress CO gas or fasten complete combustion Progress. Sucessful result of this study will not only to decrease the death rate but also to contribute fearless handling of briquette combustion so as to perform improving public Welfare. 2. Contents and scope of study. A. comparison of present and improved fuel hole device. B. Examination of effectness of improved elements. C. Effectness of miffed usage of catalyst. D. Comparison of Catalyst effectness. E. Examination of effectness of black slate containing V$_2$O$\sub$5/. 3. Results and recommendations of the study A. Absolute necessity of supplying secondary air by improved combustion device. B. Oxide Vanadium (V$_2$O$\sub$5/) has the greatest effectness to eliminate CO gas. C. Most effective catalyst of V$_2$O$\sub$5/ containing slate comes from "Samgoe" coal mine. D. By plastering catalyst on the cover plate of fire hole, it stimulate chemical reaction of re-combustion and preserving heat. E. Recommend to continute further precise study to practice with low-cost and handy devices to be applied the study results.

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Change of Piping-System Dynamics with Installation of Pogo Suppression Device (포고억제장치 설치에 따른 배관계 동특성 변화)

  • Lee Jun Kyoung;Lee Sang Yong;Lee Han Ju;Oh Seung Hyub
    • Journal of the Korean Society of Propulsion Engineers
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    • v.9 no.2
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    • pp.32-39
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    • 2005
  • The effectiveness of the pogo suppression device (PSD) on the response of the piping system simulating the fuel (or oxidizer) supply lines of the rocket engines was investigated. The system response defined as the ratio of the flow rate to the pressure in the main tube was obtained for various PSD gas volumes $((0\~2)\times10^{-3}m^3)$ and three different baffle hole diameters (5, 50, 115mm). Existence of a gas volume in the PSD reduced the system resonance frequency. With a larger gas volume, the resonance frequency became lower, but only slightly, while the fluctuations of the main tube pressure and the flow rate damped down considerably. The resonance frequency decreased with the increase of the PSD inlet restriction (or the decrease of the baffle hole diameter), though slightly. However, with a larger inlet restriction, the PSD pressure wave showed a delayed response with the smaller amplitude compared to the pressure variation in the main tube.

Etch Characteristics of $SiO_2$ by using Pulse-Time Modulation in the Dual-Frequency Capacitive Coupled Plasma

  • Jeon, Min-Hwan;Gang, Se-Gu;Park, Jong-Yun;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.472-472
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    • 2011
  • The capacitive coupled plasma (CCP) has been extensively used in the semiconductor industry because it has not only good uniformity, but also low electron temperature. But CCP source has some problems, such as difficulty in varying the ion bombardment energy separately, low plasma density, and high processing pressure, etc. In this reason, dual frequency CCP has been investigated with a separate substrate biasing to control the plasma parameters and to obtain high etch rate with high etch selectivity. Especially, in this study, we studied on the etching of $SiO_2$ by using the pulse-time modulation in the dual-frequency CCP source composed of 60 MHz/ 2 MHz rf power. By using the combination of high /low rf powers, the differences in the gas dissociation, plasma density, and etch characteristics were investigated. Also, as the size of the semiconductor device is decreased to nano-scale, the etching of contact hole which has nano-scale higher aspect ratio is required. For the nano-scale contact hole etching by using continuous plasma, several etch problems such as bowing, sidewall taper, twist, mask faceting, erosion, distortions etc. occurs. To resolve these problems, etching in low process pressure, more sidewall passivation by using fluorocarbon-based plasma with high carbon ratio, low temperature processing, charge effect breaking, power modulation are needed. Therefore, in this study, to resolve these problems, we used the pulse-time modulated dual-frequency CCP system. Pulse plasma is generated by periodical turning the RF power On and Off state. We measured the etch rate, etch selectivity and etch profile by using a step profilometer and SEM. Also the X-ray photoelectron spectroscopic analysis on the surfaces etched by different duty ratio conditions correlate with the results above.

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