• 제목/요약/키워드: High-spin

검색결과 748건 처리시간 0.023초

Spin orbit torque detected by spin torque FMR in W/CoFeB bilayer

  • Kim, Changsoo;Moon, Kyoung-Woong;Chun, Byong Sun;Kim, Dongseok;Hwang, Chanyong
    • 한국자기공명학회논문지
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    • 제23권2호
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    • pp.46-50
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    • 2019
  • Spin orbit torque would be applied as the next generation of MRAM, so many researchers are interested in related field. To make a more efficient device, electric current should convert into spin current with high efficiency. Moreover, it becomes important to measure efficiency of spin orbit torque accurately. We measured spin torque FMR of W/CoFeB hetero structure system with direct current. The efficiencies of the damping like torque and field like torque were measured by using the linewidth and on-resonance field proportional to direct current. In addition, we analyzed that a quadratic shift of the on-response field was caused by the Joule heating.

쌍안정성을 가지는 단분자 기억소자 디자인

  • 박태용
    • EDISON SW 활용 경진대회 논문집
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    • 제2회(2013년)
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    • pp.37-52
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    • 2013
  • 무어의 법칙에 따르면, 반도체의 집적도 2년마다 2배씩 증가한다고 한다. 무어의 법칙은 지금까지는 집적회로 기술의 발전을 잘 예측했다. 하지만 트랜지스터의 사이즈를 줄일수록 누수전류와 회로의 저항을 조절하기 어렵기 때문에 트랜지스터의 소형화에는 한계가 있다. 우리는 곧 무어의 법칙의 한계를 맞이할 것이다. 그래서 트랜지스터를 더욱 소형화시키기 위해서는 bottom-up analysis가 필요한 시점이다. Top-down analysis가 초기의 커다란 트랜지스터에서 점점 소형화를 시켜 작은 트랜지스터를 만든다는 개념인 반면, Bottom-up analysis는 처음부터 작은 분자를 조작하여 트랜지스터와 같은 성질을 띄도록 만드는 개념이다. 분자가 기억소자로서 이용되려면 저항이 다른 2가지 안정한 상태가 필요하다. 이번 연구에서 나는 기억소자를 디자인 하기 위하여 high spin state와 low spin state 두 가지 안정한 상태를 가지는 spin crossover complex를 이용하기로 했다. 이전의 연구에서 spin crossover 는 전기장을 이용해서도 유도될 수 있다고 확신하였고, 이를 이용해서 기억소자를 디자인하기로 하였다. 이번 연구를 위해서 symmetry를 가지는 octahedral spin crossover complex를 디자인하였고 이를 '기억 분자'라고 명명했다. 그리고 이 분자의 high spin state와 low spin state가 전기장을 이용하여 서로 바뀔 수 있는지 가능성을 DFT with B3LYP functional을 이용해서 비교했다. 그 결과로 전기장을 이용하여 기억분자의 spin crossover을 일으킬 수는 있지만 abnormally strong electric field를 써야 한다는 사실을 알아냈다. 이번 연구를 토대로 추후의 연구를 위해, 기억소자가 되기 위하여 분자가 어떤 특징을 만족시켜야 하는지를 분석했다.

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SOD(Spin On Doping)법을 이용한 저가 고효율 태양전지에 관한 연구 (A Study of low cost and high efficiency Solar Cell using SOD(spin on doping))

  • 박성현;김경해;문상일;김대원;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.1054-1056
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    • 2002
  • High temperature Kermal diffusion from $POCl_3$ source usually used for conventional process through put of a cell manufacturing line and potentially reduce cell efficiency through bulk like time degradation. To fabricate high efficiency solar cells with minimal thermal processing, spin-on-doping(SOD) technique can be employed to emitter diffusion of a silicon solar cell. A technique is presented to emitter doping of a mono-crystalline solar cell using spin-on doping (SOD). Moreover it is shown that the sheet resistance variation with RTA temperature and time fer mono-crystalline and multi-crystalline silicon samples. This novel SOD technique was successfully used to produces 11.3% efficiency l04mm by 104mm size mono-crystalline silicon solar cells.

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Interface Engineering in Quasi-Magnetic Tunnel Junctions with an Organic Barrier

  • Choi, Deung-Jang;Lee, Nyun-Jong;Kim, Tae-Hee
    • Journal of Magnetics
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    • 제15권4호
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    • pp.185-189
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    • 2010
  • Spin polarized tunneling through a hybrid tunnel barrier of a Spin filter (SF) based on a EuO ferro-magnetic semiconductor and an organic semiconductor (OSC) (rubrene in this case) was investigated. For quasi-magnetic tunnel junction (MTJ) structures, such as Co/rubrene/EuO/Al, we observed a strong spin filtering effect of the EuO layer exhibiting I-V curves with high spin polarization (P) of up to 99% measured at 4 K. However, a magnetoresistance (MR) value of 9% was obtained at 4.2 K. The low MR compared to the high P could be attributed to spin scattering caused by structural defects at the interface between the EuO and rubrene, due to nonstoichiometry in the EuO.

Electronic Spin Filter via Spin Superlattice

  • Han, Jae-Ho;Lee, H.W.;You, Chun-Yeol
    • Journal of Magnetics
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    • 제12권2호
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    • pp.77-80
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    • 2007
  • Recently there was a proposal for a spin filter by using the spin superlattice structure. In a certain energy range, the proposed structure exhibits a high spin filtering efficiency close to 100%. Unfortunately such energy range turns out to be narrow. In this paper, we report a method to widen the energy range by using an analogy to optical anti-reflection coating. In optics, it is well known that a stack of alternating layers of two dielectric materials can function as a highly transmissive or reflective filter for wide range of wavelength. Since electrons also have wave character as light, it would be possible to make an electronic analog of an optical filter. We demonstrate that alternating layers of two materials with different g-factors can function as a spin filter that allows electrons to be transmitted only when their spins point towards a certain particular direction. This spin-superlattice-based spin filter operates in wide energy ranges, curing the problem in the previous proposal.

Electron spin relaxation control in single electron QDs

  • Mashayekhi, M.Z.;Abbasian, K.;Shoar-Ghaffari, S.
    • Advances in nano research
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    • 제1권4호
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    • pp.203-210
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    • 2013
  • So far, all reviews and control approaches of spin relaxation have been done on lateral single electron quantum dots. In such structures, many efforts have been done, in order to eliminate spin-lattice relaxation, to obtain equal Rashba and linear Dresselhaus parameters. But, ratio of these parameters can be adjustable up to 0.7 in a material like GaAs under high-electric field magnitudes. In this article we have proposed a single electron QD structure, where confinements in all of three directions are considered to be almost identical. In this case the effect of cubic Dresselhaus interaction will have a significant amount, which undermines the linear effect of Dresselhaus while it was destructive in lateral QDs. Then it enhances the ratio of the Rashba and Dresselhaus parameters in the proposed structure as much as required and decreases the spin states up and down mixing and the deviation angle from the net spin-down As a result to the least possible value.

Magnetic and Electrical Properties of the Spin Valve Structures with Amorphous CoNbZr

  • Cho, Hae-Seok
    • Journal of Magnetics
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    • 제2권3호
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    • pp.96-100
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    • 1997
  • A spin valve structure of NiO(40 nm)/Co(2 nm)/Cu(2.6 nm)/Co(x nm)/Ta(5 nm) has been investigated for the application of magnetic random access memory (MRAM). The spin valve structure exhibited very large difference in the coercivities between pinned and free layers, a relatively high GMR ratio, and a low free layer coercivity. The spin valves were prepared by sputtering and were characterized by dc 4-point probe, and VSM. The spin valves with combined free layer exhibited a maximun GMR ratio of 10.4% with a free layer coercivity of about 82 Oe. The spin valves with a single 10 nm thick a-CoNbZr free layer exhibited a GMR ratio of about 4.3% with a free layer coercivity of about 12 Oe. The GMR ratio of the spin valves increased by addition of Co between Cu and a-CoNbZr. It has been confirmed that the coercivity of free layer can be decreased by increasing the thickness of a-CoNbZr. It has been confirmed that the coercivity of free layer can be decreased by increasing the thickness of a-CoNbZr layer without losing the GMR ratio substantially, which was mainly due to high resistivity of the amorphous "layers".

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CMP와 Spin Etching에 의한 Blanket Wafer(TEOS) 가공 특성 비교에 관한 연구 (A Study on Machining Characteristic Comparison of Blanket Wafer(TEOS) by CMP and Spin Etching)

  • 김도윤;정해도;이은상
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2001년도 춘계학술대회 논문집
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    • pp.1068-1071
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    • 2001
  • Recently, the minimum line width shows a tendancy to decrease and the multi-level to increase in semiconductor. Therefore, a planarization technique is needed, which chemical polishing(CMP) is considered as one of the most important process. CMP accomplishes a high polishing performance and a global planarization of high quality. But there are several defects in CMP such as microscratches, abrasive contaminations, and non-uniformity of polished wafer edges. Spin Etching can improve the defects of CMP. It uses abrasive-free chemical solution instead of slurry. Wafer rotates and chemical solution is simultaneously dispensed on a whole surface of the wafer. Thereby chemical reaction is occurred on the surface of wafer, material is removed. On this study, TEOS film is removed by CMP and Spin Etching, the results are estimated at a viewpoint of material removal rate(MRR) and within wafer non-uniformity(WIWNU).

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