• Title/Summary/Keyword: High reflectivity

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Polymer Waveguide Apodized Grating for Narrow-Bandwidth High-Reflectivity Wavelength Filters (협대역 고반사 파장 필터 구현을 위한 폴리머 광도파로 에포다이즈드 격자)

  • Lee, Won-Jun;Huang, Guanghao;Shin, Jin-Soo;Oh, Min-Cheol
    • Korean Journal of Optics and Photonics
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    • v.26 no.4
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    • pp.203-208
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    • 2015
  • Wavelength filters are essential components for selecting a certain wavelength channel of a WDM optical communication system. To realize wavelength filters with narrow bandwidth and high reflectivity, an apodized grating structure with length of 15 mm and index modulation of $5{\times}10^{-4}$ was designed. The device exhibited a reflectivity of 95%, 3-dB bandwidth of 0.28 nm, and 20-dB bandwidth of 0.70 nm on an 18 mm grating length.

A Study of Treatment Efficiency of Reflectors for CSOs Disinfection by Pulsed UV (Pulsed UV를 이용한 CSOs 소독시 반사체에 따른 처리효율 연구)

  • Han, Jonghun;Hur, Jiyong;Kim, Kangwook;Lee, Junyoung;Park, Wonseok;Lee, Jongyeol;Her, Namguk
    • Journal of Soil and Groundwater Environment
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    • v.20 no.1
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    • pp.36-40
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    • 2015
  • This study examined the disinfection in combined sewer overflows (CSOs) by pulsed ultraviolet (PUV). The reflectors (stainless steel. mirror, aluminium foil, aluminium (1050), aluminium (6061), aluminium (5052), and aluminium mirror) of PUV irradiation was performed in a 90 L stainless reactor at a constant temperature of $20^{\circ}C$ and an applied power of 4000 W. The reflection efficiency of reflectors were showed 1.00 (aluminium mirror) ~ 1.48 (aluminium foil) does. The case of a rough surface analysis using SEM showed high reflectance, was the case of a smooth surface and a low reflectivity. Pseudo first-order rate constant calculated results, has a higher reflectivity values were more than twice as high compared to the low reflectivity. Affected Total coliforms disinfection time, depending on the type of reflector is considered.

Effects of Sputtering Conditions on the Growth of Ag/CoFeB Layer on MgO(100) Substrate (MgO(100) 기판 위에 증착된 Ag/CoFeB 박막의 스퍼터링 조건에 따른 미세성장구조 변화 연구)

  • Jeon, Bo-Geon;Jeong, Jong-Ryul;Takahashi, Hirokazu;Tsunoda, Masakiyo;Takahashi, Migaku
    • Journal of the Korean Magnetics Society
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    • v.21 no.6
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    • pp.214-218
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    • 2011
  • In this study, we have systematically investigated the effect of sputtering conditions on the microstructural properties of Ag/CoFeB thin film on MgO substrate. It was found that the crystallinity and surface roughness of the Ag film strongly depends on the Ar sputtering pressure and sputtering power. Epitaxial growth of Ag(100) film on MgO(100) substrate was achieved under the sputtering conditions of high sputtering power and elevated temperature. XRR (X-ray reflectivity) and high-resolution TEM (transmission electron microscopy) measurements also revealed the interfacial roughening in the Ag/CoFeB interface due to the island structure formation and intermixing between Ag and CoFeB.

A Comparative Study of the Rainfall Intensity Between Ground Rain Gauge and Weather Radar (지상우량계와 기상레이더 강우강도의 비교연구)

  • Ryu, Chan-Su;Kang, In-Sook;Lim, Jae-Hwan
    • Journal of Integrative Natural Science
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    • v.4 no.3
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    • pp.229-237
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    • 2011
  • Today they use a weather radar with spatially high resolution in predicting rainfall intensity and utilizing the information for super short-range forecast in order to make predictions of such severe meteorological phenomena as heavy rainfall and snow. For a weather radar, they use the Z-R relation between the reflectivity factor(Z) and rainfall intensity(R) by rainfall particles in the atmosphere in order to estimate intensity. Most used among the various Z-R relation is $Z=200R^{1.6}$ applied to stratiform rain. It's also used to estimate basic rainfall intensity of a weather radar run by the weather center. This study set out to compare rainfall intensity between the reflectivity of a weather radar and the ground rainfall of ASOS(Automatic Surface Observation System) by analyzing many different cases of heavy rain, analyze the errors of different weather radars and identify their problems, and investigate their applicability to nowcasting in case of severe weather.

Goniometric Image Analysis of Observed Color Change in Dyed Trilobal Cross-section Polyester Monofilament Fabrics

  • Lee, Jung-Min;Kim, Jong-Jun;Jeon, Dong-Won;Ahn, Byung-Tae;Choi, Jung-Im
    • Journal of Fashion Business
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    • v.11 no.6
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    • pp.115-124
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    • 2007
  • The cross-section of the polyester filament yarn has been modified to have a variety of shape for aesthetic, added functions and sensitivities, and other purposes. Transparent polyester filament of trilobal cross-section has unique optical properties with high anisotropic reflectivity and transmissivity. The monofilament yarns may be utilized to impart to the fabrics lustrous appearance along with unique color change in case differently dyed yarns are woven together. The color changes of the fabric specimens according to the changes in observation and lighting conditions were analyzed using a CCD camera and an image analysis software. The changes of color/luster of the fabric specimens were measured and analyzed based on RGB, $L^*a^*b^*,\;L^*C^*h,$ and the color distribution within a three-dimensional color space.

Intercorrelation between Photonic Band and Etch Current on Rugate Photonic Crystals (Rugate 광결정에서 광학띠와 식각전류의 상관관계)

  • Park, Jongsun;Kim, Yongmin
    • Journal of Integrative Natural Science
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    • v.2 no.3
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    • pp.207-210
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    • 2009
  • Multiple rugate structures can be etched on a silicon wafer and placed in the same physical location, showing that many sharp spectral lines can be obtained in the optical reflectivity spectrum. Porous silicon samples were prepared by electrochemical etch of heavily doped p-type silicon wafers. The etching solution consisted of a 3:1 volume mixture of aqueous 48% hydrofluoric acid and absolute ethanol. Galvanostatic etch was carried out in a Teflon cell by using a two-electrode configuration with a Pt mesh counterelectrode. A sinusoidal current density waveform varying between 51.5 and $74.6mA/cm^2$ is applied. The anodization current was supplied by a Keithley 2420 high-precision constant current source which is controlled by a computer to allow the formation of PSi multilayer.

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FDTD Analysis of the Absorption Characteristics for Grid Ferrite Electromagnetic Wave Absorber (FDTD를 이용한 격자형 페라이트 전파흡수체 특성 해석)

  • 이재용;정연춘;명노훈
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.9 no.4
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    • pp.483-490
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    • 1998
  • The reflectivity of a grid ferrite electromagnetic wave absorber is analyzed using finite difference time domain (FDTD) method, which is usually used in anechoic chambers for EMI / EMS test. The frequency dispersive characteristics of ferrite medium and its boundary condition are modeled using magnetic flux in addition to E- and H-fields. By applying Floquets theorem, FDTD analysis of the grid ferrite absorber with periodic infinite array is simplified as a unit cell problem. The method of homogenization which is mainly utilized in the calculation of absorber reflectivity as a low frequency technique takes only into account volume fraction of the unit cell of the absorber except for the structure of medium geometry. However, the presented method in this paper can analyze the geometry effect of the unit cell with its medium characteristics up to high frequency region.

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THE EFFECT OF AN APPLIED BIAS UPON THE REFLECTANCE AND ADHESION OF SILVER FILMS BEING SPUTTER-DEPOSITED ON POLYESTER SUBSTRATE

  • Ri, Eui-Jae;Hoang, Tae-Su
    • Journal of the Korean institute of surface engineering
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    • v.32 no.3
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    • pp.257-264
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    • 1999
  • Thin reflective films are synthesized by using PVD methods with a bright metal of Al or Ag. For purposes of improving the reflectance and adhesion of such films particularly, substrate bias was applied during sputtering (namely, ion-plating) to enhance the deposition process with higher energy. And we succeeded in fabricating a quality silver film which possesses an adhesion of $85{\;}Kg/\textrm{cm}^2$ and a high reflectivity of more than 96%. Both of reflectivity and adhesion are better in case of bias sputtering as controlled than nonbias sputtering, particularly the bias of 50-100 V showed most effective. The microstructures of sample films were examined by using various equipments and the XRD spectrum in particular showed that <111> direction is the preferred growth orientation.

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Development of Rolling Type Light-Shelf with Adjustable Reflectivity (반사율 변경이 가능한 롤링타입형 광선반 개발)

  • Kim, Kyungsoo;Shim, Hyungjun;Lee, Heangwoo;Seo, Janghoo;Kim, Yongseong
    • KIEAE Journal
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    • v.16 no.5
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    • pp.57-64
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    • 2016
  • Purpose: Recently, lighting energy consumption in buildings has been gradually increasing and more studies are being carried out in order to solve this problem. Especially, the efficiency of the light-shelf system, which is a natural lighting system, has been recognized as a potential solution in addressing this problem and so various studies regarding the light-shelf system are being conducted. However, if high luminance material is used for the light-shelf system, glaring may occur in certain circumstances even though such material increases efficiency, and there are also difficulties related to maintenance and management in the case of an external light-shelf system. Therefore, the purpose of this study is to suggest modifications in relation to the reflectivity of the light-shelf system and introduce a rolling type light-shelf system with built-in cleaning equipment. In addition, a performance evaluation technique was established to verify its effectiveness. Method: In this study, we reviewed previous studies related to the light-shelf system and its performance. Then a testbed was established to assess the performance of the rolling-type light-shelf system suggested in this study. Also, the performance of the rolling-type light-shelf system suggested in this study was compared and analyzed with that of existent light-shelf systems in order to better verify the performance, and the uniformity ratio of illumination and lighting energy consumption were calculated for this purpose. Result: The results of the performance evaluation are as follows. 1) The performance evaluation result of the light-shelf system on the day of the summer solstice shows that $30^{\circ}$ is appropriate for the angle of light-shelf system, and the depth of the incoming natural light also increases as the angle of the light shelf increases. 2) It is possible to improve the uniformity ratio of illumination by increasing the reflectivity of the light shelf, and the reason for this is the increase in the amount of incoming light entering indoors due to the increased reflectivity of the light shelf. 3) The rolling type light-shelf system suggested in this study enables energy saving in comparison with existent light-shelf systems, and when the external illuminance decreases to 60,000 lx and 40,000 lx during the summer solstice due to factors such as the weather, the suggested light-shelf system can save energy by 12.1% and 5.1% respectively. Thus the light-shelf system proposed in this study is deemed to be effective in reducing energy costs.

Multi-crystalline Silicon Solar Cell with Reactive Ion Etching Texturization

  • Park, Seok Gi;Kang, Min Gu;Lee, Jeong In;Song, Hee-eun;Chang, Hyo Sik
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.419-419
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    • 2016
  • High efficiency silicon solar cell requires the textured front surface to reduce reflectance and to improve the light trapping. In case of mono-crystalline silicon solar cell, wet etching with alkaline solution is widespread. However, the alkali texturing methods are ineffective in case of multi-crystalline silicon wafer due to grain boundary of random crystallographic orientation. The acid texturing method is generally used in multi-crystalline silicon wafer to reduce the surface reflectance. However the acid textured solar cell gives low short-circuit current due to high reflectivity while it improves the open-circuit voltage. To reduce the reflectivity of multi-crystalline silicon wafer, double texturing method with combination of acid and reactive ion etching is an attractive technical solution. In this paper, we have studied to optimize RIE experimental condition with change of RF power (100W, 150W, 200W, 250W, 300W). During experiment, the gas ratio of SF6 and O2 was fixed as 30:10.

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