• Title/Summary/Keyword: High density plasma

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Grid를 이용한 고밀도 플라즈마 소스의 이온 특성 연구

  • Byeon, Tae-Jun;Gwon, A-Ram;Kim, Seung-Jin;Kim, Jeong-Hyo;Park, Min-Seok;Jeong, U-Chang
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.497-497
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    • 2012
  • 산업의 발전함에 따라 고기능성 박막의 수요가 증가하고 있으며, magnetron sputtering, e-beam evaporation, ion beam 등을 이용한 박막 증착에 대한 연구가 많이 진행되고 있다. 그러나 기존 방법만으로는 박막 접착계면의 불균일로 인해 고기능성 박막 성장이 어렵다는 단점을 가지고 있다. 이러한 문제를 해결하기 위하여 박막 공정 중 고밀도 플라즈마 소스(high density plasma source)를 통해 추가적인 에너지를 인가하여 박막의 밀도를 bulk 수준으로 증가시키고 내부 응력을 조절하는 연구에 대한 관심이 커지고 있다. 특히 grid를 이용하여 플라즈마 내 이온의 입사에너지를 증가시킴으로써, 기존 공정보다 고기능성 박막을 구현할 수 있다. 본 연구에서는 RF power를 이용한 inductively coupled plasma를 통해 플라즈마를 생성시킨 후 grid에 DC power를 인가하는 플라즈마 소스를 개발하였으며, 시뮬레이션을 통해 plasma density와 ion current density, ion energy 분석 및 grid 디자인을 하였다. 개발된 플라즈마 소스는 ion energy analyzer를 통해 RF power 및 grid에 인가하는 power의 세기에 따라 이온화 정도 및 이온의 입사에너지를 측정하였다.

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Electrical Characteristics of Helicon Wave plasmas (헬리콘 플라즈마의 전기적 특성)

  • 윤석민;김정형;서상훈;장흥영
    • Journal of the Korean Vacuum Society
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    • v.5 no.1
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    • pp.85-92
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    • 1996
  • The external electricla characteristics of helicon wave plasmas were measured over a wide range of RF power and magnetic filed. External parameters. such as antenna voltage , current, phase shift, and interanl parameter, electron density were measured at 7MHz, 1mTorr Ar discharge . The equivalent discharge resistance and reactance, and the power transfer efficiency were calculated through these measurements. There are a helicon mode which produces high density plasma by helicon wave and a lowmode which produces low density plasma by capaictive electric field. In case of the helicon mode, the anternna voltage and current were lower than those of the low-mode. The phase difference between voltage and current decreased suddenly at the transition point from the low-mode to the helicon mode. Equivalent resistance and power efficiency increased and reactance decreased suddenly at the transition point. These results mean that the power transperred to plasma and the nutual coupling between the antenna and plasma increase as the mode changes from the low-mode to the helicon mode.

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Design and Characterization of a Microwave Plasma Source Using a Rectangular Resonant Cavity (마이크로웨이브 공진 공동을 이용한 플라즈마 원의 설계 및 특성)

  • Kim, H.T.;Park, Y.S.;Sung, C.K.;Yi, J.R.;Hwang, Y.S.
    • Journal of the Korean Vacuum Society
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    • v.17 no.5
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    • pp.408-418
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    • 2008
  • The rectangular resonant cavity was designed and characterized as a microwave plasma source for focused ion beam. The optimum cavity was calculated analytically and analyzed in detail by using HFSS(High Frequency Structure Simulator). Since the resonant cavity can be affected by the permittivity of quartz chamber and plasma, the cavity is designed to be changeable in one direction. By observing the microwave input power at which the breakdown begins, the optimum cavity length for breakdown is measured and compared with the calculated one, showing in good agreement with the optimum length reduced by 10cm according to the permittivity change in the presence of quartz chamber. The shape of breakdown power curve as a function of pressure appears to be similar to Paschen-curve. After breakdown, plasma densities increase with microwave power and the reduced effective permittivity in the cavity with plasma results in larger optimum length. However, it is not possible to optimize the cavity condition for high density plasmas with increased input power, because too high input power causes expansion of density cutoff region where microwave cannot penetrate. For more accurate microwave cavity design to generate high density plasma, plasma column inside and outside the density cutoff region needs to be treated as a conductor or dielectric.

Changes of Plasma Cardiovascular Disease Risk Factors according to the Health Practice and Dietary Habits in Healthy Male University Studnets

  • Kyeong Sook Yim
    • Korean Journal of Community Nutrition
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    • v.3 no.5
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    • pp.685-694
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    • 1998
  • This cross-sectional study was conducted to describe the changes of plasma cardiovascular disease(CVD) risk factors in Korea. Overnight fasting plasma levels of total cholesterol, high density lipoprotein(HDL)-cholesterol, triacylglycerol and glucose were analyzed. Blood pressure and anthropometric data were also measured. Health practice factors such as smoking status, alcohol consumption and frequency fo exercise were evaluated by a self-administered questionnaire. Questions regarding dietary habits and food preferences were also asked. Seventy eight percent of the subjects had more than one CVD risk factor. Plasma total cholesterol, triacylglycerol, and fasting blood glucose were significantly increased according to the subjects body mass index$(kg/m^2$, BMI), whereas HDL-cholesterol, low density lipoprotein(LDL)-cholesterol and blood pressure showed no significant differences with BMI. Current smokers had significantly high plasma total cholesterol, LDL-cholesterol and triacylglycerol levels. Alcohol consumption significantly increased plasma total cholesterol and fasting blood sugar, but regular exercise had no effects on the plasma CVD risk factors. Overeating and frequency of fast food consumption were positively correlated with the CVD risk score, whereas intake of grains, meats and vegetables were negatively correlated with that score. A stepwise multiple regression analysis was performed to examine the effects of specific dietary factors on plasma lipid levels. For plasma total cholesterol level, the frequency of fast food intake explained 8% of the variance, followed by habitual overeating, frequency of grain intake and high cholesterol food intake(Model $R^2$=22.4%). For plasma triacylglycerol level, preference of oily foods accounted for 7.5% of the variance, followed by eating breakfast, preference of fruit and frequency of grain intake(Model $R^2$=22.0%). The findings suggest that intervention programs to reduce the risk of CVD should focus on health practice through reducing BMI, smoking cessation and moderate or no alcohol drinking. Moreover, desirable dietary habits such as eating breakfast, not overeating and reduced intake of fast food may improve CVD risk.

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Numerical Analysis of Discharge in Wire ion Plasma Source (입자법을 이용한 와이어.이온.플라즈마원의 해석)

  • 송태헌;고광철;강형부
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.11a
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    • pp.369-372
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    • 1997
  • Wire Ion Plasma Source (WIPS) is a plasma device which has a thin wire anode, a coaxially-set cylindrical cathode and electrodes located in both ends of the cylinder. The potential between the anode and cathode changes logarithmically by this electrode configuration. This electrode configuration enables high-density plasma to produce even at a low anode voltage. Since the electrode configuration is axially symmetric and long. plasma with axially uniform number density can be produced. Using particle-in-cell(PIC) and Monte Carlo collision(MCC), we investigate the traiectory of electrons and the characteristics of D.C. discharge in Wire ton Plasma Source.

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RECENT PROGRESS ON LASER DRIVEN ACCELERATORS AND APPLICATIONS

  • LEEMANS W. P.;ESAREY E.;GEDDES C.G.R.;SCHROEDER C. B.;TOTH CS.
    • Nuclear Engineering and Technology
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    • v.37 no.5
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    • pp.447-456
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    • 2005
  • Laser driven accelerators promise to provide an alternative to conventional accelerator technology. They rely on the excitation of large amplitude density waves in a plasma by the photon pressure of an intense laser. The density oscillations in which electrons and ions are separated, result in extremely large longitudinal electric fields that can be several orders of magnitude larger than those that are used in today's radio-frequency accelerators. Whereas this principle had been demonstrated experimentally for nearly two decades, it was not until 2004 that the production of high quality electron beams around 100 MeV was demonstrated. Analysis, aided by particle-in-cell simulations, as well as experiments with various plasma lengths and densities, indicate that tailoring the length of the accelerator, together with loading of the accelerating structure with beam, are the keys to production of mono-energetic electron beams. Increasing the energy towards a GeV and beyond will require reducing the plasma density and design criteria are discussed for an optimized accelerator module. The current progress and future directions are summarized through comparison with conventional accelerators, highlighting the unique short and long term prospects for intense radiation sources and high energy accelerators based on laser-drivenplasma accelerators.

Reductive effect of body weight in rats fed a high-fat diet by Sense-line

  • An, Hyo-Jin;Chung, Hwan-Suck;Jeong, Hyun-Ja;Lee, Soon-Ah;Kim, Hyung-Min;Baek, Seung-Hwa
    • Advances in Traditional Medicine
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    • v.3 no.1
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    • pp.29-33
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    • 2003
  • Sense-line (SL), a dietary functional food, is our invention for weight loss. To evaluate such an effect of SL, we analyzed the plasma levels of total cholesterol, low-density lipoprotein (LDL) cholesterol, high-density lipoprotein (HDL) cholesterol, and weight changes after rats were fed on high fat diet with SL for 20 days. Plasma total cholesterol level and LDL-cholesterol level was decreased by 52% and 91.89% in 5% SL treated group and by 13% and 51.45% in 10% SL treated group, respectively. But HDL-cholesterol was not changed. In addition, the weight was significantly lower in SL group than in high-fat diet group (P<0.05). Our findings indicate that SL may contain compounds with actions, which can treat blood circulatory trouble as well as overweight.

Analysis of Process Parameter dependency on the characteristics of high density fluoro carbon plasma using global model (글로벌 모델에 의한 저온 고밀도 플루오로카본 플라즈마 특성의 공정변수 의존성 해석)

  • Lee, Ho-Jun;Tae, Heung-Sik
    • Proceedings of the KIEE Conference
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    • 1999.11d
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    • pp.879-881
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    • 1999
  • Radical and ion densities in a CF4 plasma have been calculated as a function of input power density. 9as pressure and feed gas flow rate using simple 0 dimensional global model. Fluorine atom is found to be the most abundant neutral particle. Highly fragmented species such as CF and CF+ become dominant neutral and ionic radical at the high power condition. As the pressure increases. ion density increases but ionization rate decreases due to the decrease in electron temperature. The fractional dissociation of CF4 feed gas decreases with pressure after increasing at the low pressure range. Electron density and temperature are almost independent of flow rate within calculation conditions studied. The fractional dissociation of CF4 monotonically decreases with flow rate. which results in increase in CF3 and decrease in CF density. The calculation results show that the SiO2 etch selectivity improvement correlates to the increase in the relative density of fluorocarbon ion and neutral radicals which has high C/F ratio.

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Etching Mechanism of $YMnO_3$ Thin Films in High Density $CF_{4}/Ar$ Plasma (고밀도 $CF_{4}/Ar$ 플라즈마에서 $YMnO_3$ 박막의 식각 매카니즘)

  • Lee, Cheol-ln;Kim, Dong-Pyo;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.05b
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    • pp.12-16
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    • 2001
  • We investigated the etching characteristics of $YMnO_3$ thin films in high-density plasma etching system. In this study. $YMnO_3$ thin films were etched with $CF_{4}/Ar$ gas chemistries in inductively coupled plasma (ICP). Etch rates of $YMnO_3$ were measured according to gas mixing ratios. The maximum etch rate of $YMnO_3$ is 18 nm/min at $CF_{4}/(CF_{4}+Ar)$ of 20%. In optical emission spectroscopy (OES) analysis, F radical and Ar* ions in plasma at various gas chemistries decreased with increasing $CF_4$ content. Chemical states of $YMnO_3$ films exposed in plasma were investigated with x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). There is a chemical reaction between metal (Y, Mn) and F and metal-fluorides were removed effectively by Ar ion sputtering. $YF_x$, $MnF_x$ such as YF, $YF_2$, $YF_3$ and $MnF_3$ Were detected using SIMS analysis. The etch slope is about $65^{\circ}C$ and free of residues.

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Research on parallelization mechanism of inductively coupled plasma for large area plasma source

  • Lee, Jang-Jae;Kim, Si-Jun;Kim, Gwang-Gi;Lee, Ba-Da;Lee, Yeong-Seok;Yeom, Hui-Jung;Kim, Dae-Ung;Yu, Sin-Jae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.183-183
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    • 2016
  • Inductively coupled plasma having the high-density is often used for high productivity in the plasma processing. In large area processing, the plasma can be generated by using the multi-pole connected in parallel. However, in case of this, the power cannot transfer to plasma uniformly. To address the problem, we studied the mechanism of inductively coupled plasma connected in parallel by using transformer model. We also studied about the change of the plasma parameters over the time through the power balance equation and particle balance equation.

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