• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2000년도 춘계학술발표회 초록집
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• pp.5-5
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• 2000

In the severe accident case like LOCA, Zircaloy(Zry) claddings are oxidized not only in high temperature but also in high pressures. It is a concem whether the safety of high bum up fuels can be maintained during severe accident. The effects of steam pressure on Zry-4 oxidation, and the effect of prc-existing oxide layer on the cladding in the high temperature-high pressure oxidation of Ziy-4 were investigated. The experimental temperature range was $700-900^{\circ}C$, and the pressures were between 0.1 and l5.0MPa. Partial pressure of steam tumed out to be the important one rather than total gas pressure. The higher the steam pressure was applied, the thicker the oxide became. nle effect of st,earn pressure on the oxidation of claddings with preexisting oxide was about 40-60% less effective than that of pickled cladding. Aocelerated oxidation in highpressure slean1 seems to be originated from the formation of microcracks produced during the transformation of tetragonal zirconia to monoclinic phase. Steam pressure seems to affect the stability of tetragonal phase.

• 한국분말재료학회지
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• 제18권2호
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• pp.122-128
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• 2011

This study investigated the high temperature oxidation behavior of Ni-22.4%Fe-22%Cr-6%Al (wt.%) porous metal. Two types of open porous metals with different pore sizes of 30 PPI and 40 PPI (pore per inch) were used. A 24-hour TGA test was conducted at three different temperatures of $900^{\circ}C$, $1000^{\circ}C$ and $1100^{\circ}C$. The results of the BET analysis revealed that the specific surface area increased as the pore size decreased from 30 PPI to 40 PPI. The oxidation resistance of porous metal decreased with decreasing pore size. As the temperature increased, the oxidation weight gain of the porous metal also increased. Porous metals mainly created oxides such as $Al_2O_3$, $Cr_2O_3$, $NiAl_2O_4$, and $NiCr_2O_4$. In the 40 PPI porous metal with small pore size and larger specific surface area, the depletion of stabilizing elements such as Al and Cr occurred more quickly during oxidation compared to the 30 PPI porous metal. Ni-Fe-Cr-Al porous metal's high-temperature oxidation micro-mechanism was also discussed.

• 대한금속재료학회지
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• 제46권10호
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• pp.652-661
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• 2008

Reduction of NOx in emission gas, improvement of engine efficiency, and extension of warranty period has made demands for developing materials more corrosively resistant to the inner-muffler environments or predicting the lifetime of materials used in muffler more precisely. The corrosion inside muffler has been explained with condensate corrosion mainly though thermal oxidation experiences prior to condensate corrosion. Hence, the aim of this study is to describe how the thermal oxidation affects the corrosion of stainless steel exposed to the inner-muffler environments. Auger electron spectroscopy and electrochemical tests were employed to analyze oxide scale and to evaluate corrosion resistance, respectively. Thermal oxidation has different role of condensate corrosion depending on the temperature: inhibiting condensate corrosion below $380^{\circ}C$ and enhancing condensate corrosion above $380^{\circ}C$. The low temperature oxidation causes to form compact oxide layer functioning a barrier for penetrating condensate into a matrix. Although though thermal oxidation caused chromium-depleted layer between oxide layer and matrix, the enhancement of the condensate corrosion in high temperature oxidation resulted from corrosion-induced crevice formed by oxide scale rather than corrosion in chromium-depleted layer. It was proved by aids of anodic polarization tests and measurements of pitting corrosion potentials. By the study, the role of high temperature oxidation layer affecting the condensate corrosion of stainless steels used as muffler materials was well understood.

• 한국세라믹학회지
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• 제31권7호
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• pp.777-783
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• 1994

Oxidation behavior of hot-pressed silicon nitride ceramics with various sintering additives has been investigated. The weight gain of each specimens has shown in the range of 0.11 mg/$\textrm{cm}^2$ ~3.4 mg/$\textrm{cm}^2$ at 140$0^{\circ}C$ for 192 h and eleven compositions have shown good oxidation resistance with the weight gain below 0.5 mg/$\textrm{cm}^2$. The oxidation rate has been shown to obey the parabolic rate law and the oxidized surface has consisted of $\alpha$-cristobalite and M2Si2O7 or MSiO3 (M=rare earth or transition metals) phase. The oxidation rate of each specimens has related to the eutectic temperature between additive oxide and SiO2, and ionic radius of additive oxides, respectively. From the above results, it could be concluded that the oxidation behavior of hot pressed silicon nitride is dominated by the high temperature properties of grain boundary glassy phase and the high temperature properties of grain boundary glassy phase are affected by the ionic radius of additive oxides.

• 한국분말재료학회지
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• 제21권1호
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• pp.55-61
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• 2014

Fe-Cr-Al powder porous metal was manufactured by using new electro-spray process. First, ultra-fine fecralloy powders were produced by using the submerged electric wire explosion process. Evenly distributed colloid (0.05~0.5% powders) was dispersed on Polyurethane foam through the electro-spray process. And then degreasing and sintering processes were conduced. In order to examine the effect of cell size ($200{\mu}m$, $450{\mu}m$, $500{\mu}m$) in process, pre-samples were sintered for two hours at temperature of $1450^{\circ}C$, in $H_2$ atmospheres. A 24-hour thermo gravimetric analysis test was conducted at $1000^{\circ}C$ in a 79% $N_2$ + 21% $O_2$ to investigate the high temperature oxidation behavior of powder porous metal. The results of the high temperature oxidation tests showed that oxidation resistance increased with increasing cell size. In the $200{\mu}m$ porous metal with a thinner strut and larger specific surface area, the depletion of the stabilizing elements such as Al and Cr occurred more quickly during the high-temperature oxidation compared with the 450, $500{\mu}m$ porous metals.

• Nuclear Engineering and Technology
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• 제52권9호
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• pp.2054-2063
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• 2020

The high-temperature oxidation behavior of ZrSi₂ used as a coating material for nuclear fuel cladding was investigated for developing accident-tolerant fuel cladding of light water reactors. Bulk ZrSi₂ samples were prepared by spark plasma sintering. In situ X-ray diffraction was conducted in air at 900, 1000, and 1100 ℃ for 20 h. The microstructures of the samples before and after oxidation were examined by scanning electron microscopy and transmission electron microscopy. The results showed that the oxide layer of zirconium silicide exhibited a layer-by-layer structure of crystalline ZrO₂ and amorphous SiO₂, and the high-temperature oxidation resistance was superior to that of Zircaloy-4 owing to the SiO₂ layer formed. ZrSi₂ was coated on the Zircaloy-4 tube surface using laser 3D printing, and the coated tube was oxidized for 2000 s at 1200 ℃ under a vapor/argon mixture atmosphere. The outer surface of the coated tube was hardly oxidized (10-30 ㎛), while the inner surface of the uncoated tube was significantly oxidized to approximately 300 ㎛.

• 열처리공학회지
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• 제35권5호
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• pp.246-254
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• 2022

The high-temperature oxidation behavior of Cr-Mo steel AISI 4115 in air at different temperatures (600, 850, 950℃) for 120 min was studied by mass gain analysis, phase analysis (optical microscopy, electron probe micro-analysis, x-ray diffraction) and hardness measurement of each iron oxide-phase. The oxidation scales that formed on oxidation process consisted outer layer (Hematite), middle layer (Magnetite) and the inner layer (Chromite). In the case of 850 and 950℃, the oxidation mass gain per unit area of AISI 4115 steel increased according to the logarithmic rate as atmospheric pressure increased. Especially, It has been observed that with an increase in the atmospheric pressure at 600℃, the oxidation mass gain per unit area changed from a linear to logarithmic relationship.

• 한국세라믹학회지
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• 제34권5호
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• pp.512-518
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• 1997

The high temperature oxidation behaviors of titanium nitride films prepared by PACVD technique were studied in the temperature range of from 50$0^{\circ}C$ to 80$0^{\circ}C$ under air atmosphere. Ti0.88Al0.12N film, which showed the excellent microhardness from the previous work, was investigated on its oxidation resistance compared with pure TiN film. Ti-Al-N film showed superior oxidation resistance up to $700^{\circ}C$, whereas TiN film was fast oxidized into rutile TiO2 crystallites from at 50$0^{\circ}C$. It was found that an amorphous layer having AlxTiyOz formula was formed on the surface region due to outward diffusion of Al ions at the initial stage of oxidation. The amorphous oxide layer played a role as a barrier against oxygen diffusion, protected the remained nitride layer from further oxidation, and thus, resulted in the high oxidation resistive characteristics of Ti-Al-N film.

• 한국세라믹학회지
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• 제43권10호
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• pp.613-618
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• 2006

Graphite is suitable materials as a moderator, reflector, and supporter of a nuclear reactor because of high tolerance to the high temperature and neutron irradiations. Because graphite is so weak to the oxidation, its oxidation study is essentially demanded for the operation and design of the nuclear reactor. This work focuses on the effect of the surface oxidation of graphite according to the surface treatment. With thermogravimeter (TG), oxidation characteristics of the isotropic graphite are measured at the three temperature areas, and oxidation ratio and amounts are estimated as changing the surface roughness. Furthermore, the polished graphite surface produced fom the surface treatment is investigated with the Raman spectroscopic study. Oxidation behaviors of the surface are also evaluated as elimination the polished layer by washing with strong sonication.

• 한국전기전자재료학회논문지
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• 제16권9호
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• pp.765-770
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• 2003

We have developed a low-temperature, and low-pressure radical induced oxidation (RIO) technology, so that high-quality ultrathin silicon dioxide layers have been effectively produced with a high reproducibility, and successfully employed to realize high performace SiGe heterostructure complementary MOSFETs (HCMOS) lot the first time. The obtained oxide layer showed comparable leakage and breakdown properties to conventional furnace gate oxides, and no hysteresis was observed during high-frequency capacitance-voltage characterization. Strained SiGe HCMOS transistors with a 2.5 nm-thick gate oxide layer grown by this method exhibited excellent device properties. These suggest that the present technique is particularly suitable for HCMOS devices requiring a fast and high-precision gate oxidation process with a low thermal budget.