• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.35.2-35.2
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• 2011

나노와이어를 제작하는 많은 방법들 중에서 실리콘 기판을 무전해식각하여 실리콘 나노와이어를 제작하는 방법은 쉽고 간단하기 때문에 최근 많은 연구가 진행되고 있다. 무전해식각법을 이용한 실리콘 나노와이어 합성은 단결정 실리콘 나노와이어를 합성할 수 있고, p 또는 n형의 도핑 정도에 따라 원하는 전기적 특성의 기판을 선택하여 제작할 수 있다는 장점을 가지고 있다. 하지만 n형으로 도핑된 기판으로 나노와이어를 제작하였을 경우 식각으로 인한 나노와이어 표면의 거칠기로 인하여, 실제로는 n형 반도체 특성을 나타내지 않는 문제점을 가지고 있다. 따라서 본 연구에서는 무전해식각법으로 합성한 n형 나노와이어의 거칠기를 조절하고 filed-effect transistor (FET) 소자를 제작하여 나노와이어의 전기적 특성변화를 확인하였다. n형 나노와이어의 거칠기를 조절하기 위하여 열처리를 통해 표면을 산화시켰고, 열처리 시간에 따른 나노와이어 FET 소자를 제작하여 I-V 특성을 관찰하였다. 이때 절연막과 나노와이어 계면 사이의 결함을 최소화 하기 위하여 나노와이어를 poly-4-vinylphenol (PVP) 고분자 절연막에 부분 삽입시켰다. 나노와이어 표면의 거칠기는 high-resolution transmission electron microscopy (HRTEM)을 통하여 확인하였으며, 전기적 특성은 Ion/Ioff ratio, 이동도, subthreshold swing, threshold voltage 값 등을 평가하였다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.226-231
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• 2002

The present study discusses the results of the controlled precipitation of HgTe nanocrystals in a PbTe semiconductor matrix and demonstrates its effectiveness in producing well-organized and crystallographically aligned semiconductor nanocrystals. Following the similar procedure used in metallic alloys, the semiconductor alloys are treated at 600$^{\circ}C$ for 48 hours, quenched and aged up to 500 hours at 300$^{\circ}C$ and 450$^{\circ}C$ to induce homogeneous nucleation and growth of HgTe nanocrystalline precipitates. Examination of the resulting precipitates using transmission electron microscopy (TEM) and high resolution TEM (HRTEM) reveals that the coherent HgTe precipitates form as thin discs along the {100} habit planes making a crystallographic relation of {100}$\sub$HgTe///{100}$\sub$PbTe/ and [100]$\sub$HgTe///[100]$\sub$PbTe/. It is also found that the nato-disc undergoes a gradual thickening and a faceting under isothermal aging up to 500 hours without any noticeable coarsening. These results, combined with the extreme dimension of the precipitates (4 nm in length and sub-nanometer in thickness) and the simplicity of the formation process, leads to the conclusion that controlled precipitation is an effective method for the preparation of the desirable quantum-dot nanostructures.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07b
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• pp.738-743
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• 2004

The microwave dielectric properties and their related structural characteristics in solid solutions of (1-x) $Ba(Mg_{1/3}Nb_{2/3})O_3$ -x $La(Mg_{2/3}Nb_{1/3})O_3$ (BLMN) have been investigated by measuring the dielectric constant${\varepsilon}r)$, Q value and temperature coefficient of resonant frequency$({\tau}f)$ and by observing the crystal structure using high resolution transmission electron microscopy (HRTEM). Microwave dielectric properties showed characteristic features for specific composition. Dielectric constant$({\varepsilon}r)$ showed maximum value at the composition which corresponds to the phase boundary between 1:2 ordered and 1:1 ordered structure. The increase in ${\varepsilon}_r$ may be caused by the rattling of ions by incorporating smaller ions and the disordered structure. The variation of temperature coefficient of resonant frequency${{\tau}_f)$ was investigated in terms of oxygen octahedra tilting.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07b
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• pp.1033-1036
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• 2004

Si nanocrystallites thin films on p-type (100) Si substrate have been fabricated by pulsed laser deposition using a Nd:YAG laser. After deposition, samples were annealed at the temperatures of 400 to $800^{\circ}C$. Hydrogen passivation was then performed in the forming gas (95% $N_2$ + 5% $H_2$) for 1 hr. Strong violet-indigo photoluminescence has been observed at room temperature from nitrogen ambient-annealed Si nanocrystallites. The variation of photoluminescence (PL) Properties of Si nanocrystallites thin films has been investigated depending on annealing temperatures with hydrogen passivation. From the results of PL, Fourier transform infrared (FTIR), and high-resolution transmission electron microscopy (HRTEM) measurements, it is observed that the origin of violet-indigo PL from the nanocrystalline silicon in the silicon oxide film is related to the quantum size effect of Si nanocrystallites and oxygen vacancies in the SiOx(x : 1.6-1.8) matrix affects the emission intensity.

• ETRI Journal
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• v.28 no.6
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• pp.787-789
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• 2006

In this letter, we report that vertically well-aligned ZnO nanowires were grown on GaN epilayers and c-plane sapphire via a vapor-liquid-solid process by introducing a 3 nm Au thin film as a catalyst. In our experiments, epitaxially grown ZnO nanowires on Au-coated GaN were vertically well-aligned, while nanowires normally tilted from the surface when grown on Au-coated c-$Al_2O_3$ substrates. However, pre-growth annealing of the Au thin layer on c-$Al_2O_3$ resulted in the growth of well-aligned nanowires in a normal surface direction. High-resolution transmission electron microscopy measurements showed that the grown nanowires have a hexagonal c-axis orientation with a single-crystalline structure.

• 한국신재생에너지학회:학술대회논문집
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• 2009.11a
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• pp.398-398
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• 2009

텐덤 구조의 양자점 태양전지에서 양자점의 크기에 따라 에너지 밴드갭이 달라 넓은 대역의 태양광을 이용할 수 있다. 이러한 양자점의 크기는 증착 두께의 제어로 조절이 가능하다. Si과 C target을 이용한 RF Co-sputtering 법으로 각각 증착시간을 다르게 하여, SiC/$Si_{1-x}C_x$(x~0.20)인 실리콘 양자점 초격자 박막을 제조하고, $1000^{\circ}C$에서 20분간 질소 분위기에서 열처리를 하였다. Grazing incident X-ray diffraction(GIXRD)를 통해서 Si(111)과 $\beta$-SiC (111)이 생성되었음을 확인하였고, High resolution transmission electron microscopy(HRTEM) 사진으로 양자점의 크기와 분포 밀도를 확인할 수 있었다. Photoluminescence(PL)에서 1.4, 1.5, 1.7, 1.9eV의 Peak이 확인되었다.

• Korean Journal of Materials Research
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• v.25 no.11
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• pp.598-601
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• 2015

Using reverse micelle processing, $ZnAl_2O_4$ nanopowders were synthesized from a mixed precursor(consisting of $Zn(NO_3)_2$ and $Al(NO_3)_3$). The $ZnAl_2O_4$ was prepared by mixing the aqueous solution at a molar ratio of Zn : Al = 1 : 2. The average size and distribution of the synthesized powders with heat treatment at $600^{\circ}C$ for 2 h were in the range of 10-20 nm and narrow, respectively. The average size of the synthesized powders increased with increasing water to surfactant molar ratio. The XRD diffraction patterns show that the phase of $ZnAl_2O_4$ was spinel(JCPDS No. 05-0669). The synthesized and calcined powders were characterized using a thermogravimetric - differential scanning calorimeter(TG-DSC), X-ray diffraction analysis (XRD), and high resolution transmission electron microscopy(HRTEM). The effects of the synthesis parameter, such as the molar ratio of water to surfactant, are discussed.

• Bulletin of the Korean Chemical Society
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• v.30 no.12
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• pp.3045-3048
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• 2009

Graphene sheets formed by the reaction of carbon monoxide (CO) with aluminum sulfide ($Al_2S_3$) at reaction temperatures ${\leq}$ 800 $^{\circ}$ were characterized by X-ray diffraction (XRD), Raman spectroscopy, and high-resolution transmission electron microscopy (HRTEM). The graphene sheets, formed as CO was reduced to gaseous carbon by the reaction with $Al_2S_3$, in the temperature range 800 - 1100 $^{circ}C$, did not exhibit their characteristic XRD peaks because of the small number of graphene layers and/or low crystallinity of graphene sheets. Raman spectra of graphene sheets showed that the intensity ratio of the D band to the G band decreased and the 2D band was shifted to higher frequencies with increasing reaction temperature, indicating that the number of graphene layers increased with increasing reaction temperature.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.05a
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• pp.20.2-20.2
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• 2009

최근 무전해 식각법을 이용한 실리콘 나노와이어 합성이 다양한 각도에서 이루어지고 있다. 무전해 식각법을 통한 나노와이어 합성은, 단결정 실리콘 기판에 촉매를 올려 기판을 식각할 수 있는데, 이 방법을 이용하여 넓은 면적의 수직방향으로 배열된 10 ~ 300nm 지름의 단결정 실리콘 나노와이어를 합성할 수 있다. 본 연구에서는 무전해 식각법으로 boron이 도핑된 p-type실리콘 기판을 식각하여 실리콘 나노와이어를 합성하였고, 단일 나노와이어의 field-effect transistor(FET) 소자가 가지는 전기적 특성에 대하여 분석하였다. 특히 무전해 식각법을 이용하여 나노와이어를 합성할 때, 촉매로 사용되는 Ag particle이 나노와이어에 미치는 영향에 대해서 분석해 보았다. FET 소자의 게이트 절연막은 가장 일반적으로 사용되는 SiO2 (300nm)와 고유전체로 잘 알려진HfO2(80nm)를 사용하여 전기적 특성을 비교하여 보았다. 한편, HfO2 박막은 atomiclayer deposition(ALD)장비를 이용하여 증착하였다. 합성된 실리콘 나노와이어의 경우 X-ray diffraction(XRD)로 결정성을 확인하였으며, high-resolution transmission electron microscopy(HRTEM)으로 결정성 및 나노와이어의 표면 형태를 확인하였다. 전기적 특성은 I-V 측정을 통하여 Ion/Ioff ratio, 이동도, subthreshold swing, subthreshold voltage값을 평가하였다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.7
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• pp.747-753
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• 2004

In this paper, nanocrystalline indium tin oxide (ITO) particles were fabricated by using synthesis without harmful elements. The synthetic method is to eliminate the chloridic and nitridic elements which are included in the current wet type synthetic method. Therefore, it is possible to lower synthetic temperature below 600 $^{\circ}C$ to eliminate the harmful elements. Accordingly, fine particle can be achieved by applying the process. Particle size, surface area, crystal structure, and composition ratio of the synthesized nanocrystalline ITO particle by using the method were analyzed with high resolution transmission electron microscopy (HRTEM), BET surface area analyzer, X-ray diffraction (XRD), and energy dispersion spectroscopy (EDS). As a result, its particle size is less than 10 nm, and the surface area exceeds 100 m$^2$/g. The XRD analysis indicates that the cystal structure of the powder is cubic one with orientation of <222>, <400>, <440>. Also, the analysis of the composition demonstrates that the around 8 wt% tin is uniformly included in In$_2$O$_3$ lattice of the nanoparticle.