• Title/Summary/Keyword: HEMT Characterization

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A New Small-Signal Modeling Method of HEMT Using Weakly Pinched-Off Cold-HEMT (약하게 핀치오프된 Cold-HEMT를 이용한 새로운 HEMT 소신호 모델링 기법)

  • 전만영
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.7 no.4
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    • pp.743-749
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    • 2003
  • By biasing the gate of cold-HEMT with a voltage slightly lower than the pinch-off point, a new small-signal modeling method that is free from gate degradation problem and requires no additional DC measurement is proposed in this paper. The method has shown excellent agreement between modeled and measured S-parameters up to 62 GHz at 49 different normal operating bias points.

Extraction of Extrinsic Circuit Parameters of HEMT by Minimizing Residual Errors (잔차 오차 최소에 의한 HEMT의 외인성 파라미터 추출)

  • Jeon, Man-Young
    • The Journal of the Korea institute of electronic communication sciences
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    • v.9 no.8
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    • pp.853-859
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    • 2014
  • This study presents a technique for extracting all the extrinsic parameters of HEMTs by minimizing the residual errors between a pinch-off cold-FET's gate and drain pad de-embedded Z-parameters and its modeled Z-parameters calculated by the cold-FET's remaining parameters. The presented technique allows us to successfully extract the remaining extrinsic parameter values as well as the gate and drain pad capacitance value without the additional fabrications of the gate and drain dummy pad.

Fabrication and Characterization of $0.2\mu\textrm{m}$ InAlAs/InGaAs Metamorphic HEMT's with Inverse Step-Graded InAlAs Buffer on GaAs Substrate

  • Kim, Dae-Hyun;Kim, Sung-Won;Hong, Seong-Chul;Paek, Seung-Won;Lee, Jae-Hak;Chung, Ki-Woong;Seo, Kwang-Seok
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.1 no.2
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    • pp.111-115
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    • 2001
  • Metamorphic InAlAs/InGaAs HEMT are successfully demonstrated, exhibiting several advantages over conventional P-HEMT on GaAs and LM-HEMT on InP substrate. The strain-relaxed metamorphic structure is grown by MBE on the GaAs substrate with the inverse-step graded InAlAs metamorphic buffer. The device with 40% indium content shows the better characteristics than the device with 53% indium content. The fabricated metamorphic HEMT with $0.2\mu\textrm{m}$T-gate and 40% indium content shows the excellent DC and microwave characteristics of $V_{th}-0.65V,{\;}g_{m,max}=620{\;}mS/mm,{\;}f_T120GHZ{\;}and{\;}f_{max}=210GHZ$.

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Application of GaAs Discrete p-HEMTs in Low Cost Phase Shifters and QPSK Modulators

  • Kamenopolsky, Stanimir D.
    • ETRI Journal
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    • v.26 no.4
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    • pp.307-314
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    • 2004
  • The application of a discrete pseudomorphic high electron mobility transistor (p-HEMT) as a grounded switch allows for the development of low cost phase shifters and phase modulators operating in a Ku band. This fills the gap in the development of phase control devices comprising p-i-n diodes and microwave monolithic integrated circuits (MMICs). This paper describes a discrete p-HEMT characterization and modeling in switching mode as well as the development of a low-cost four-bit phase shifter and direct quadrature phase shift keying (QPSK) modulator. The developed devices operate in a Ku band with parameters comparable to commercially available MMIC counterparts. Both of them are CMOS compatible and have no power consumption. The parameters of the QPSK modulator are very close to the requirements of available standards for satellite earth stations.

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Fabrication and Characterization of GaAs/AlGaAs HEMT Device (GaAs/AlGaAs HEMT소자의 제작 및 특성)

  • 이진희;윤형섭;강석봉;오응기;이해권;이재진;최상수;박철순;박형무
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.31A no.9
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    • pp.114-120
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    • 1994
  • We have been successfully fabricated the low nois HEMT device with AlGaAs and GaAs structure. The epitazial layer with n-type AlgaAs and undoped GaAs was grown by molecular beam epitaxy(MBE) system. Ohmic resistivity of the ource and drain contact is below 5${\times}10^{6}{\Omega}{\cdot}cm^{2}$ by the rapid thermal annealing (RTA) process. The ideality factor of the Schottky gate is below 1.6 and the gate material was Ti/Pt/Au. The HEMTs with 0.25$\mu$m-long and 200$\mu$m-wide gates have exhibited a noise figure of 0.65dB with associated gain of 9dB at 12GHz, and a transconductance of 208mS/mm.

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Monolithic Integrated Amplifier for Millimeter Wave Band (밀리미터파 대역 단일 집적 증폭기)

  • Ji, Hong-Gu;Oh, Seung-Hyeub
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.11 no.10
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    • pp.3917-3922
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    • 2010
  • In this paper, 3 stage amplifier MMIC was designed and fabricated with U-band optimized epitaxal pHEMT that produced by large signal characterization and modeling for 60 GHz band. The pHEMT used in this paper, the gate $0.12\;{\mu}m$ length and total gate width of $100\;{\mu}m$, $200\;{\mu}m$ has been modeled using the large signal designed with negative feedback and MCLF instead of MIM capacitor for improving stability. Fabricated MMIC $2.5{\times}1.5mm^2$ size, current about 40 mA, operating frequency 59.5~60.5 GHz, gain 19.9~18.6 dB, input matching characteristics -14.6~-14.7 dB, output matching characteristics -11.9~-16.3 dB and output -5 dBm characteristics were obtained.

High performance X-band power amplifier MMIC using a 0.25 ㎛ GaN HEMT technology (0.25 ㎛ GaN HEMT 기술을 이용한 우수한 성능의 X-대역 전력 증폭기)

  • Lee, Bok-Hyung;Park, Byung-Jun;Choi, Sun-Youl;Lim, Byeong-Ok;Go, Joo-Seoc;Kim, Sung-Chan
    • Journal of IKEEE
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    • v.23 no.2
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    • pp.425-430
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    • 2019
  • This work describes the design and characterization of a X-band power amplifier (PA) monolithic microwave integrated circuit (MMIC) using a $0.25{\mu}m$ gate length gallium nitride (GaN) high electron mobility transistor (HEMT) technology. The developed X-band power amplifier MMIC has small signal gain of over 22.7 dB and saturated output power of 43.02 dBm (20.04 W) over the entire band of 9 to 10 GHz. Maximum saturated output power is a 43.84 dBm (24.21 W) at 9.5 GHz. Its power added efficiency (PAE) is 41.0~51.24% and the chip dimensions are $3.7mm{\times}2.3mm$, generating the output power density of $2.84W/mm^2$. The developed GaN power amplifier MMIC is expected to be applied in a variety of X-band radar applications.

Growth and Characterization of InGaP/InGaAs p-HEMI Using Compound Source MBE (Compound Source MBE를 이용한 InGaP/InGaAs p-HEMT 구조의 성장 및 특성 분석)

  • Kim, J.H.;S.J. Kang;S.J. Jo;J.D. Song;Lee, Y.T.;J.I. Song
    • Proceedings of the IEEK Conference
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    • 2000.06b
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    • pp.16-19
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    • 2000
  • DC and low frequency noise characteristics of InGaP/InGaAs pseudomorphic HEMTs (p-HEMTs) grown by compound source MBE are investigated for temperature range of 150K to 370K. Equivalent input noise spectra( $S_{iv}$ ) were measured as a function of frequency and temperature. $S_{iv}$ was measured to be 3.4 $\times$ 10$^{-12}$ $V^2$/ Hz at 1kHz for 1.3 X 50${\mu}{\textrm}{m}$$^2$InGaP/InGaAs p-HEMT at room temperature. Measurements of the low-frequency noise spectra of the p-HEMT as a function of temperature show that the trap with an activation energy level around 0.589 eV is a dominant trap that accounts for the low-frequency noise behavior of the device. The normalized extrinsic gm frequency dispersion of the p-HEMT. was as low as 2.5% at room temperature, indicating that the device has well-behaved low-frequency noise characteristics. Sub-micron (0.25 $\times$ 50${\mu}{\textrm}{m}$$^2$) gate p-HEMT showed $f_{T}$ and $f_{max}$ of 40GHz and 108GHz, respectively.y.y.

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Fabrication and characterization of the 0.25 ${\mu}m$ T-shaped gate P-HEMT and its application for MMIC low noise amplifier (0.25 ${\mu}m$ T형 게이트 P-HEMT 제작 및 특성 평가와 MMIC 저잡음 증폭기에 응용)

  • Kim, Byung-Gyu;Kim, Young-Jin;Jeong, Yoon-Ha
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.1
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    • pp.38-46
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    • 1999
  • o.25${\mu}m$ T-shaped gate P-HEMT is fabricated and used for design of X0band three stage monolithic microwave integrated circuit(MMIC) low noise amplifier(LNA). The fabricated P-HEMT exhibits an extrinsis transconductance of 400mS/mm and a drain current of 400mA/mm. The RF and noise characteristics show that the current gain cut off frequency is 65GHz and minimum noise figure(NFmin) of 0.7dB with an associated gain of 14.8dB at 9GHz. In the design of the three stage LNA, we have used the inductive series feedback circuit topology with the short stub. The effects of series feedback to the noise figure, the gain, and the stability have been investigated to find the optimal short stub length. The designed three staage LNA showed a gain of above 33dB, a noise figure of under 1.2dB, and ainput/output return loss of under 15dB and 14dB, respectively. The results show that the fabricated P-HEMT is very suitable for a X-band LNA with high gain.

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Fabrication and Characterization of 70 nm T-gate AlGaAs/InGaAs/GaAs metamorphic HEMT Device (70 nm T-게이트를 갖는 InGaAs/InAlAs/GaAs metamorphic HEMT 소자의 제작 및 특성)

  • 김성찬;임병옥;백태종;고백석;신동훈;이진구
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.9
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    • pp.19-24
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    • 2004
  • In this paper, we have demonstrated the fabrication of a 70 nm foot print of the T-gate by using a positive resist ZEP520/P(MMA-MAA)/PMMA trilayer by double exposure method without a thin dielectric supporting layer on the substrate. The device performance was characterized by DC and RF measurement. The fabricated 70 nm InGaAs/InAlAs MHEMTS with 70 ${\mu}{\textrm}{m}$ unit gate width and 2 fingers showed good DC and RF characteristics of Idss, max =228.6 mA/mm, gm =645 mS/mm, and fT =255 GHz, respectively.