• Proceedings of the KIPE Conference
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• 2003.07b
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• pp.611-615
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• 2003

In this paper, a operation characteristics and analysis of the HB(half bridge) inverter for remote plasma system are studied. the remote plasma system is cleaning system for the chemical vapor deposition (CVD) chamber in semiconductor processing. The remote plasma system is powered by the RF generator The main power stage of the RF generator is used for the HB PWM inverter with an low pass filter in the secondary circuit of the transformer. The detailed mode analysis of HB invertor was described. The operation characteristics of Remote Plasma Source are verified by simulation and experimental results.

• Proceedings of the KIPE Conference
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• 2002.07a
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• pp.245-248
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• 2002

In this paper, the development of the RF power supply for Remote Plasma System is discussed. 7kW, 400kHz Remote Plasma Generator is designed and tested. The main power stage is used for the HB PWM inverter with an LC filter in the secondary circuit. The operation characteristics of Remote Plasma Generator are verified by simulation and experimental results.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.41 no.9
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• pp.1031-1041
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• 1992

Existing current-controlled inverters with hysteresis controller (HC) result in the dependence of the inverter on its load characteristics, poor inverter utilization due to too much or too little supply voltage, and the current error in the hysteresis band(HB) which causes deterioration of operation of the supplied motor. In this paper, techniques and results of modeling the operation of current-controlled three phase power inverter with HC are presented. Four symmetrical control schemes are considered: the so called three independent control, three semi-dependent control(a), three semi-dependent control(b) and three dependent control each using three current controller. The dependence of the inverter on its load has been studied. To overcome this difficulty, an inner feedback control has been introduced and optimum parameter has been determined. With the addition of an inner feedback control, adjustment of the switching frequency to a desired value is possible. Also, this modification improves operating characteristics of inverter by enforcing a switching pattern of low dependence on the load, resulting in significantly improved quality of the output current.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.20 no.8
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• pp.6-14
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• 2006

This paper is a study about a proper method of plasma generation to cleaning method and a high frequency power equipment circuit to generation of plasma that used cleaning of chamber for TFT-LCD PECVD. The high density plasma required for cleaning causes a possibility of high density plasma more than $1{\times}10^{11}[EA/cm^3]$. It apply a ferrite core of ferromagnetic body to a existing ICP form. In case of power transfer equipment on 400[kHz] high frequency to generation of plasma it makes certain a stable switching operation in condition of plasma through using a inverter form for general purpose HB. And it demonstrates the performance of power transfer equipment using methods of measurement which use a transformer of series combination the density of plasma and the rate of dissolution of $NF_3$ in condition of $A_r\;and\;NF_3$.