• 전력전자학회:학술대회논문집
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• 전력전자학회 2003년도 춘계전력전자학술대회 논문집(2)
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• pp.611-615
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• 2003

In this paper, a operation characteristics and analysis of the HB(half bridge) inverter for remote plasma system are studied. the remote plasma system is cleaning system for the chemical vapor deposition (CVD) chamber in semiconductor processing. The remote plasma system is powered by the RF generator The main power stage of the RF generator is used for the HB PWM inverter with an low pass filter in the secondary circuit of the transformer. The detailed mode analysis of HB invertor was described. The operation characteristics of Remote Plasma Source are verified by simulation and experimental results.

• 전력전자학회:학술대회논문집
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• 전력전자학회 2002년도 전력전자학술대회 논문집
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• pp.245-248
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• 2002

In this paper, the development of the RF power supply for Remote Plasma System is discussed. 7kW, 400kHz Remote Plasma Generator is designed and tested. The main power stage is used for the HB PWM inverter with an LC filter in the secondary circuit. The operation characteristics of Remote Plasma Generator are verified by simulation and experimental results.

• 대한전기학회논문지
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• 제41권9호
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• pp.1031-1041
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• 1992

Existing current-controlled inverters with hysteresis controller (HC) result in the dependence of the inverter on its load characteristics, poor inverter utilization due to too much or too little supply voltage, and the current error in the hysteresis band(HB) which causes deterioration of operation of the supplied motor. In this paper, techniques and results of modeling the operation of current-controlled three phase power inverter with HC are presented. Four symmetrical control schemes are considered: the so called three independent control, three semi-dependent control(a), three semi-dependent control(b) and three dependent control each using three current controller. The dependence of the inverter on its load has been studied. To overcome this difficulty, an inner feedback control has been introduced and optimum parameter has been determined. With the addition of an inner feedback control, adjustment of the switching frequency to a desired value is possible. Also, this modification improves operating characteristics of inverter by enforcing a switching pattern of low dependence on the load, resulting in significantly improved quality of the output current.

• 조명전기설비학회논문지
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• 제20권8호
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• pp.6-14
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• 2006

본 논문은 TFT-LCD(Thin Film Transistor Liquid Crystal Display) PECVD(Plasma Enhanced Chemical Vapor Deposition) 장비 공정용 챔버(Chamber) 세정을 위한 새로운 플라즈마 세정방법에 적합한 플라즈마 발생방법과 플라즈마 발생을 위한 고주파 전원장치의 전력회로에 관한 연구이다. 세정에 요구되는 고밀도 플라즈마는 안테나 형태의 기존 ICP(Inductively Coupled Plasma) 방식에 강자성체인 페라이트 코어를 적용하므로 써 $1{\times}10^{11}[EA/cm^3]$이상의 고밀도 플라즈마 발생을 가능하게 하였다. 플라즈마 발생을 위한 400[kHz] 고주파 전력 변환장치의 경우 범용 HB(Half Bridge) 인버터 방식을 적용하여 플라즈마 부하에서도 안정적인 영전압 스위칭 동작을 확인 하였다. 변압기 직렬결합 방식을 사용한 10[kW] 고출력을 통해 $A_r$과 $NF_3$가스 분위기하에서 플라즈마의 밀도와 $NF_3$가스 분해율을 측정하므로서 고주파 전력 변환 장치의 성능을 입증하였다.