• 제목/요약/키워드: H5N6

검색결과 4,470건 처리시간 0.036초

One-pot Four Component Reaction of Unsymmetrical 1-Methylbarbituric Acid with BrCN and Various Aldehydes in the Presence of Et3N and/or Pyridine

  • Jalilzadeh, Mohammad;Pesyan, Nader Noroozi
    • 대한화학회지
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    • 제55권6호
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    • pp.940-951
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    • 2011
  • Reaction of 1-methylpyrimidine-(1H,3H,5H)-2,4,6-trione (1-MBA 1) as an unsymmetrical barbituric acid with cyanogen bromide and various aldehydes in the presence of triethylamine and/or pyridine afforded diastereomeric mixtures of new class of heterocyclic stable 5-aryl-1,1'-dimethyl- and 5-aryl-3,1'-dimethyl-1H,1'H-spiro[furo[2,3-d]pyrimidine-6,5'-pyrimidine]2,2',4,4',6'(3H,3'H,5H)-pentaones which are dimeric forms of 1-methyl barbiturate at the range of $0^{\circ}C$ to room temperature. In the reaction of some aldehydes with 1-MBA and BrCN were afforded a mixture of diastereomers. Another two aldehydes such as 4-cyano- and 2-hydroxybenzaldehydes gave exclusively two diastereomers in which binded to the salt of triethylammonium hydrobromide by intermolecular H-bond in ratio of 1:1. 4-Hydroxybenzaldehyde and 2-pyridinecarbaldehyde gave exclusively one diastereomer under the same condition. Aldehydes possessing strong electron-donor were produced exclusively two geometric isomers of Knoevenagel adduct (E- and Z-isomers). The structures of compounds were deduced by $^1H$ NMR, $^{13}C$ NMR and FT-IR spectroscopy. Mechanism of the formation is discussed.

차세대 sub-0.1$\mu\textrm{m}$급 MOSFET소자용 고유전율 게이트 박막 (High-k Gate Dielectric for sub-0.1$\mu\textrm{m}$ MOSFET)

  • 황현상
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2000년도 하계종합학술대회 논문집(2)
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    • pp.20-23
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    • 2000
  • We have investigated a process for the preparation of high-quality tantalum oxynitride ( $T_{a}$ $O_{x}$ $N_{y}$) via the N $H_3$ annealing of 7$_{a2}$ $O_{5}$, for use in gate dielectric applications. Compared with tantalum oxide (7$_{a2}$ $O_{5}$), a significant improvement in the dielectric constant was obtained by the N $H_3$ treatment. In addition, light reoxidation in a wet ambient at 45$0^{\circ}C$ resulted in a significantly reduced leakage current. We confirmed nitrogen incorporation in the tantalum oxynitride ( $T_{a}$ $O_{x}$ $N_{y}$ by Auger Electron Spectroscopy. By optimizing the nitridation and reoxidation process, we obtained an equivalent oxide thickness as thin as 1.6nm and a leakage current of less than 10mA/$\textrm{cm}^2$ at 1.5V..5V..5V..5V..5V..5V.

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규회석 분말, 염화칼륨 및 황산칼륨이 요소질소의 유효화에 미친 영향 (Effect of Wallastonite, Potssium chloride and Potassium sulphate on the mineraligation of Urea)

  • 오왕근;김재영
    • 한국토양비료학회지
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    • 제23권4호
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    • pp.293-296
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    • 1990
  • 규회석분말, 염화칼륨, 황산칼륨이 요소의 암모니아화 및 질산화에 주는 영향을 밝히고자 흙 500g씩을 플라스틱 포트에 담아 비닐하우스내($30{\sim}35^{\circ}C$)에서 17일간 밭상태로 보존하며 얻은 시험 결과는 다음과 같다. 1. 황산칼리는 염화칼리보다 규회석분말의 토양산성중화를 용이하게 하였으며 이 효과가 요소질소의 암모니아화 및 질산화를 촉진하였다. 2. pH 6.0이하에서는 $(NH_4+NO_3)-N$에 대한 $NO_3-N$의 비율이 20%이다. 3. 토양의 pH 5.2~6.0은 암모니아의 질산화를 억제하는 임계범위가 되거나, 질산화를 억제하는 농도까지 암모니아를 집적시키기 쉬운 범위인 것 같다. 4. 암모니아의 질산화는 저수분의 풍건토양에서도 일어나는 것 같다.

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有機 Halides 와 Amines 間의 光反應에 關한 硏究 (A Study on the Photoreaction between Organic Halides and Amines)

  • 김유선;박용자
    • 대한화학회지
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    • 제6권2호
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    • pp.148-154
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    • 1962
  • The reactions between organic halides$(CCl_4,\;C_6H_5Br,\;C_6H_5Cl,\;C_6H_5I)$ and amines $(C_6H_5NH_2,\;R_2NH,\;R_3N,\;(CH_2)_5NH,\;pyridine)$ were studied under mixed u.v. irradiation. The modes of reactions were examined by means of gas chromatography and product-reactant ratio determination. The reaction of $CCl_4$ with amines give chloroform and hexachloroethanes, and the reaction of aromatic halides with amines gave biphenyl and benzene. In each series of reaction there obtained mainly corresponding amine hydrohalides, but no amination products. The reactivity was in the order of the basicity of amines and of the reactivity of organic hahides, except in the case of cyclic tertiary amine. The result was interpreted as a non-chain photodecomposition process. A competitive proton abstraction reaction path via the formation of a change transfer complex was proposed as the reaction mechanism.

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Hydrogen Storage Properties of Pure MgH2

  • Kwak, Young Jun;Lee, Seong Ho;Park, Hye Ryoung;Song, Myoung Youp
    • 한국재료학회지
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    • 제23권5호
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    • pp.266-270
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    • 2013
  • The hydrogen storage properties of pure $MgH_2$ were studied and compared with those of pure Mg. At the first cycle, pure $MgH_2$ absorbed hydrogen very slowly at 573 K under 12 bar $H_2$. The activation of pure $MgH_2$ was completed after three hydriding-dehydriding cycles. At the $4^{th}$ cycle, the pure $MgH_2$ absorbed 1.55 wt% H for 5 min, 2.04 wt% H for 10 min, and 3.59 wt% H for 60 min, showing that the activated $MgH_2$ had a much higher initial hydriding rate and much larger $H_a$ (60 min), quantity of hydrogen absorbed for 60 min, than did activated pure Mg. The activated pure Mg, whose activation was completed after four hydriding-dehydriding cycles, absorbed 0.80 wt% H for 5 min, 1.25 wt% H for 10 min, and 2.34 wt% H for 60 min. The particle sizes of the $MgH_2$ were much smaller than those of the pure Mg before and after hydriding-dehydriding cycling. The pure Mg had larger hydrogen quantities absorbed at 573K under 12 bar $H_2$ for 60 min, $H_a$ (60 min), than did the pure $MgH_2$ from the number of cycles n = 1 to n = 3; however, the pure $MgH_2$ had larger $H_a$ (60 min) than did the pure Mg from n = 4 to n = 6.

플라즈마 침탄 및 CrN 코팅된 Ti-6Al-4V 합금의 구조 및 Creep특성 (Creep Properties of Plasma Carburized and CrN Coated Ti-6Al-4V Alloy)

  • 위명용;박용권
    • 한국재료학회지
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    • 제14권8호
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    • pp.558-564
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    • 2004
  • In order to improve the low hardness and low wear resistance of Ti-6Al-4V alloy, plasma carburization treatment and CrN film coating were carried out. Effects of the plasma carburization and CrN coating were analyzed and compared with the non-treated alloy by mechanical and creep tests. After plasma carburization and CrN coating treatments, the carburized layer was about 150 ${\mu}m$ in depth and CrN coated layer was about 7.5 ${\mu}m$ in thickness. Hardness value of about $H_{v}$ 402 of the non-treated alloy was improved to $H_{v}$ 1600 and 1390 by plasma carburization and CrN thin film coating, respectively. Stress exponent(n) was decreased from 9.10 in CrN coating specimen to 8.95 in carburized specimen. However, the activation energy(Q) was increased from 242 to 250 kJ/mol. It can be concluded that the static creep deformation for Ti-6Al-4V alloy is controlled by the dislocation climb over the ranges of the experimental conditions.

Cycloplatinated Complexes of Thiosemicarbazones. Synthesis and Crystal Structure of [$Ph_2PC_6H_4CHNNC(S)NHCH_3PtCl$]

  • 유동원;강상욱;고재정;최문근
    • Bulletin of the Korean Chemical Society
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    • 제18권3호
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    • pp.305-310
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    • 1997
  • The synthesis and characterization of the platinum heterocyclic carboxaldehyde thiosemicarbazone complexes [NC5H4CRNNC(S)NHR'PtCl] (R=H, R'=CH3(1); R=CH3, R'=CH3(2); R=CH3, R=H(3)) and diphenylphosphinophenyl carboxaldehyde thiosemicarbazone complexes [Ph2PC6H4CHNNC(S)NHRPtCl] (R=CH3(5); R=iC3H7(6); R=Ph(7)) are described. Compounds 1-3 were prepared by reaction of Pt(SEt2)2Cl2 with 2-acetylpyridine-4-alkylthiosemicarbazone in the presence of NEt3. Compounds 5-7 were prepared using Pt(SEt2)2Cl2 in toluene with diphenylphosphinophenyl carboxaldehyde alkylthiosemicarbazone. The compounds have been characterized by microanalysis, NMR (1H, 13C, 31P) spectroscopy, and single-crystal X-ray diffraction. X-ray single crystal diffraction analysis reveals that compound 5 is a mononuclear platinum compound with P,N,S-coordination mode.

4,5-Dihydro-6-(4-methoxy-3-methylphenyl)-3(2H)-pyridazinone계 화합물의 합성 연구 (Synthesis of Some New 4,5-dihydro-6-(4-methoxy-3-methylphenyl)-3(2H)-pyridazinone Derivatives)

  • Soliman, Mohamed H. A.;El-Sakka, Sahar S.
    • 대한화학회지
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    • 제55권2호
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    • pp.230-234
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    • 2011
  • 4,5-Dihydro-6-(4-methoxy-3-methylphenyl)-3(2H)-pyridazinone derivative계 화합물의 합성연구를 수행하였다. 첫 번째로, 4,5-dihydro-6-(4-methoxy-3-methylphenyl)-3(2H)-pyridazinone (1)은 o-cresyl methyl ether와 succinic anhydride를 Friedel-Crafts 아실화 반응을 통하여 얻은 다음에, 고리화 반응을 통하여 합성하였다. 얻어진 화합물 1을, NaOEt조건 하에서, 방향족 알데히드와 반응시켜서 4-substituted benzyl pyridazinones (3a-d)을 합성하였으며, 화합물 1을 탈수소화반응을 시켜서 화합물 4를 얻었다. 한편 pyridazine 5는 화합물 1과 1,3-diphenyl-2-propen-1-one을 Michael 첨가반응을 이용하여 합성하였다. N-Dialkylaminomethyl 화합물 6a-b는 pyridazinone 1과 formaldehyde 및 2차 amine을 바능시켜서 얻은 반면에, 화합물 7은 pyridazinone 1을 반응시켜서 얻었으며, 화합물 8은 pyridazinone 3b를 phosphorus oxychloride 와 반응시켜서 얻었다.

새로운 항혈전 약물인 아스팔라톤의 전처방화 연구 (Preformulation Study of Aspalatone, a New Antithrombotic Agent)

  • 곽혜선;전인구
    • Biomolecules & Therapeutics
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    • 제8권4호
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    • pp.332-337
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    • 2000
  • Physicochemical properties of aspalatone (acetylsalicylic acid maltol ester, AM), which has been recently found to have an antithrombotic effect, were studied in terms of solubility, dissolution, partition coefficient (Pc) and stability. The solubility of AM at 37$^{\circ}C$ was about 1.2 mg/ml and the P$_{c}$ value for n-octanol/water and chloroform/water was 11.4 and 382.6, respectively. Dissolution rates of AM at pH 1.2 and 6.8 were more than 80% within 30 min. The degradation of AM followed apparent first-order kinetics, and was dependent on temperature, pH and ionic strength. From the pH-rate profile, the optimal pH was found to be at around 4.0. Half-lives at pH 1.2 and 6.8 were 33.5 and 44.4 hr, respectively. The degradation rate of AM at pH 1.2 was somewhat faster than that of aspirin, but at pH 7.0, the degradation rate of AM was slower than that of aspirin.n.

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반송률 변화에 따른 연속 유입식 SBR 공정의 질소 거동 (The Nitrogen Behavior in the Continuous Inflow SBR according to Variations of Internal Recycling Rate)

  • 김수연;최용범;조유나;한동준;권재혁
    • 청정기술
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    • 제25권3호
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    • pp.231-237
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    • 2019
  • 연속 유입식 SBR 공정의 BOD 제거효율은 체류 시간 9 ~ 15 h에서는 92.1 ~ 96.0%에서 체류 시간 6 h에서는 86.9 ~ 90.7%로 감소하였으나, 체류 시간 6 h까지 안정적인 제거효율을 보였다. T-N 제거효율은, 체류시간 12 ~ 15 h에서는 80.1 ~ 87.9%, 체류시간 9 h에서는 71.9 ~ 87.0%, 체류시간 6 h에서는 60.1 ~ 65.7%로 감소되었다. 유기물 및 질소 제거 결과 실험결과 연속 유입식 SBR 반응조의 최적 체류시간은 9 h로 판단된다. 체류시간 9 h에서 반송률(1 ~ 5Q) 변화에 따른 유기물 제거효율 검토 결과, TCODcr의 제거율은 88.4 ~ 96.0%, TBOD 제거효율은 92.1 ~ 98.1%로 조사되어 내부반송률 변화가 유기물 제거에 미치는 영향은 미미한 것으로 조사되었다. 내부반송률 변화에 따른 T-N은 1 ~ 2Q에서 70.3 ~ 80.4%, 3Q는 77.2 ~ 85.6%, 4 ~ 5Q는 61.5 ~ 80.8%로 조사되어, 내부반송률 3Q에서 질소 제거효율이 가장 높게 조사되었다. T-P는 1 ~ 4Q에서 제거효율은 75.0 ~ 84.6%, 5Q에서는 63.3 ~ 72.4%로 감소하였는데, 이러한 이유는 반송률 5Q 이상에서는 미생물에 의한 인(P)의 용출 및 섭취가 원활하게 이루어지지 않기 때문으로 판단된다. 따라서 유기물 및 영양염류 제거를 위한 최적 반송률은 3Q로 조사되었다.