• Bulletin of the Korean Chemical Society
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• 제25권11호
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• pp.1623-1624
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• 2004

• 한국자기공명학회논문지
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• 제11권2호
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• pp.64-72
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• 2007

[ $^1H$ ] nuclear magnetic resonance (NMR) experiments have been performed at 30 - 300 K and 7 T to investigate dynamics of hydrogen bond network in the single crystal $(NH_4)_3H(SO_4)_2$. The two proton sites, ammonium proton and hydrogen-bond proton, are identified from the $^1H$ NMR MAS spectrum at 340 K. As temperature decreases, the $^1H$ NMR spectrum shifts to the higher frequency side with a larger linewidth. The spectrum at 65 K shows a distinctive change in line shape toward the ferroelectric transition at 63 K. The measured values of $T_1$ for ammonium and hydrogen-bond protons are similar in the whole range of temperature. $T_1$ of $^1H$ NMR shows a gradual decrease down to 120 K and starts to steeply increase below 100 K. Then $T_1$ shows abrupt decrease below 70 K with a sharp minimum at 63 K, where the ferroelectric transition occurs. This temperature dependence of spectrum and $T_1$ clearly prove that the large change in the dynamics of hydrogen bond network is associated with the ferroelectric phase transition at 63 K.

• Advances in concrete construction
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• 제2권1호
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• pp.1-11
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• 2014

This paper demonstrates an experimental study to evaluate the effects of environmental exposures on the bond between ribbed Glass Fiber Reinforced Polymer (GFRP) reinforcing bars and concrete. The equation recommended by ACI 440-1R-06, for the bond stress,was evaluated in this study. A total of 16 pullout samples, 12with GFRP bars and 4with steel bars, were exposed to two different harsh environments for different periods of time. The exposed harsh environments included direct sun exposure and cyclic splash zone sea water. The variation in the shear (bond) strengths before and after exposure was considered as a measure of the durability of the bond between GFRP bars and concrete.Experimental results showed there is no significant difference of the bond strength between 60 and 90 days of exposures.It also showed that the empirical equation of the bond stress calculated by ACI 440-IR-06 is very conservative.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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• pp.170-171
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• 2006

The chemical shift of SiOC film was observed according to the flow rate ratio. SiOC film has the broad main band of $880{\sim}1190cm^{-1}$ and the sharp Si-$CH_3$ bond at $1252cm^{-1}$, and the infrared spectra in the Si-O-C bond moved to low frequency according to the increasing of an oxygen flow rate. The chemical shift affected the carbon content in the SiOC film, and the decreasing of carbon atoms elongated the C-H bonding length, relatively. The main bond without the sharp Si-$CH_3$ bond at $1252cm^{-1}$ consisted of Si-C, C-O and Si-O bonds, and became the bonding structure of the Si-O-C bond.

• 한국진공학회지
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• 제18권1호
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• pp.15-23
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• 2009

깨끗한 Si(100)-$2{\times}1$, D를 먼저 흡착시킨 Si(100)-$2{\times}1$, 그리고 이온 빔에 의해 원자 수준으로 거칠어진 Si(100) 등의 세 가지 표면에 각각 $Si_2H_6$의 흡착시켜 포화 실릴($-SiH_3(a)$) 흡착층을 형성시키고 실험적으로 비교 고찰하였다 전구체 흡착 거동(기작)과 함께 $Si_2H_6$의 표면 분해(화학)흡착 반응성은 개질을 시켜주지 않은 깨끗한 Si(100)-$2{\times}l$ 표면에서 가장 크게 나타났다. 이 결과는 화학흡착 반응 즉, $H_3Si-SiH_3$ 결합 분해와 두 개의 Si-$SiH_6(a)$ 표면결합 형성이 표면의 Dangling Bond Pair 상에서 동시적으로(Concertedly) 일어나는 $Si_2H_6$의 분해흡착 기작으로 설명될 수 있었다. 또한 Si(100)-$2{\times}l$ 표면에 흡착된 $-SiH_3(a)$의 매우 논은 열적 안정성은 ${\sim}0.9\;ML$나 되는 표면 덮힘도와 함께 실릴기로 조밀하게 흡착된 표면에 Dangling Bond가 존재하지 않는 것에 의한 것으로 밝혀졌다.

• Applied Biological Chemistry
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• 제37권6호
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• pp.447-450
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• 1994

RNA의 가수분해시에 생성되는 cyclic phosphate 중간체의 모델 화합물인 ethylene phosphate의 P-O결합 분해속도 상수는 $100^{\circ}C$ 에서 $k=3{\times}10^{-7}s^{-1}({\Delta}H{\neq}=24\;kcal,\;{\Delta}S{\neq}=25.5\;eu)$이었으며 DNA모델 화합물인 dimethylphosphate는 $150^{\circ}C$에서 $1{\times}10^{-11}s^{-1}({\Delta}H{\neq}=36\;kcal,\;{\Delta}S{\neq}=25.5\;eu)$이었다. RNA모델 화합물인 hydroxyethylmethylphosphate의 가수분해는 dimethylphosphate의 C-O결합이 가수분해되는 반응속도와 비교될 만한 정도의 반응속도가 관측되었다.

• Bulletin of the Korean Chemical Society
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• 제15권2호
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• pp.150-153
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• 1994

By treating mer, trans-Re(${\equiv}NC_6H_5)(PPh_3)_2Cl_3$, Ⅰ, with 5 atm of CO at room temperature for 52 h, fac-Re(${\equiv}NC_6H_5)(CO)(PPh_3)Cl_3$, Ⅱ, was obtained as dark green precipitates in 81% yield. The crystal structure of Ⅱ was determined through X-ray diffraction. Ⅱ crystallizes in the monoclinic system, space group $P2_1/n$ with cell parameters a=9.740 (2) ${\AA}$, b=16.210 (5) ${\AA}$, c=16.192 (6) ${\AA}$, ${\beta}$=97.50 $(2)^{\circ}$, and Z=4. Least-squares refinement of the structure led to a R$(R_w)$ factor of 0.030 (0.036) for 2878 unique reflections of I>3${\sigma}(I)$ and for 241 variables. In comparison to the starting material Ⅰ, the bond distance of Re-N became longer from 1.726 (6) to 1.736 (5) ${\AA}$ and the bond angle of Re-N-C(Ph) became smaller from 172.6 (6) to 167.0 $(2)^{\circ}$, indicating that the Re-N bond in Ⅱ is weakened and has a less triple-bond character than that in Ⅰ.

• Environmental Engineering Research
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• 제12권5호
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• pp.211-217
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• 2007

Polycyclic aromatic hydrocarbon growth from cyclopentadiene (CPD) pyrolysis was investigated using a laminar flow reactor operating in a temperature range of 600 to $950^{\circ}c$. Major products from CPD pyrolysis are benzene, indene and naphthalene. Formation of observed products from CPD is explained as follows. Addition of the cyclopentadienyl radical to a CPD $\pi$-bond produces a resonance-stabilized radical, which further reacts by one of three unimolecular channels: intramolecular addition, C-H bond $\beta$-scission, or C-C bond $\beta$-scission. The intramolecular addition pathway produces a 7-norbornenyl radical, which then decomposes to indene. Decomposition by C-H bond $\beta$-scission produces a biaryl intermediate, which then undergoes a ring fusion sequence that has been proposed for dihydrofulvalene-to-naphthalene conversion. In this study, we propose C-C bond $\beta$-scission pathway as an alternative reaction channel to naphthalene from CPD. As preliminary computational analysis, Parametric Method 3 (PM3) molecular calculation suggests that intramolecular addition to form indene is favored at low temperatures and C-C bond $\beta$-scission leading to naphthalene is predominant at high temperatures.

• Bulletin of the Korean Chemical Society
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• 제32권6호
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• pp.1851-1858
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• 2011

Details of the double-bond isomerization of 1-hexene over H-ZSM-5 were clarified using density functional theory. It is found that the reaction proceeds by a mechanism which involves the Br${\o}$nsted acid part of the zeolite solely. According to this mechanism, 1-hexene is first physically adsorbed on the acidic site, and then, the acidic proton transfers to one carbon atom of the double bond, while the other carbon atom of the double bond bonds with the Br${\o}$nsted host oxygen, yielding a stable alkoxy intermediate. Thereafter, the Br${\o}$nsted host oxygen abstracts a hydrogen atom from the $C_6H_{13}$ fragment and the C-O bond is broken, restoring the acidic site and yielding trans-2-hexene. The calculated activation barrier is 12.65 kcal/mol, which is in good agreement with the experimental value. These results well explain the energetic aspects during the course of double-bond isomerization and extend the understanding of the nature of the zeolite active sites.

• 한국재료학회지
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• 제14권11호
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• pp.821-827
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• 2004

Titanium oxide thin films were prepared on Si(100) substrates by R.F. magnetron reactive sputtering at $30\sim200watt$ R.F power range, and annealed at $600^{\circ}C\sim800^{\circ}C$ for 1 hour. The properties of $TiO_2$ thin films were analyzed using x-ray, ${\alpha}-step$, ellipsometer, scanning electron microscopy, and FT-IR spectrometer. Upon in-situ depositions, the initial phase of $TiO_2$ thin film showed non-crystalline phase at R.F. power $30\sim100$ watt. The crosssection of $TiO_2$ thin films were sbserved to be the columnar structure. With the increasing R.F power and annealing temperature, the grain size, crystallinity, refractive index, and void size of titanium oxides showed a tended to increase. The FT-IR transmittance spectra of titanium oxide thin films have the obsorption band of Ti-O bond, Si-O bond, Si-O-Ti bond and O-H bond. With the increase of R.F. power and annealing temperature, these films have the stronger bond structures. It is considered that such a phenomena is due to phase transition and good crystallinity