• Title/Summary/Keyword: H-Si(100)

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The treatment of coal fly ash for recycling as ceramic raw materials : II. The effects of sampling condition and pH treatment in elutriation (요업 원료로 재활용하기 위한 석탄회의 처리 : II. 채취조건 및 수비선별시 pH의 영향)

  • 허화범;정철원;박종현;신건철
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.6 no.4
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    • pp.627-639
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    • 1996
  • Charateristics of Ansan and Boryong coal fly ashes collected at different seasons were investigated for the recycling them as ceramic raw materials. The effect of pH treatment on the classification of Ansan coal fly ashes by elutriation was discussed. Charateristics of ansan and boryong coal fly ashes were not significantly changed with power plants and seasons. major crystalline phases were mullite and quartz. These results suggested that coal fly ashes cab be used as raw materials instead of clay minerals. However, particle size distribution was very broad from a few $\mu\textrm{m}$ to over $100\;\mu\textrm{m}$. Especially, ansan coal fly ashes have various morphologies. Therefore, coal fly ashes should be classified before using as raw materials. Because of higher dispersion by pH treatment, spherical cenospheres were mainly collected in the 4th step and particle size distribusion was also decreased by elutriation for the ansan coal fly ashes. The specific surface area of the sample collected in the 4th step was $1.24\;m^{2}/g$ which was smaller than that of not treated Ansan coal fly ashes.

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Plasma Etching Process based on Real-time Monitoring of Radical Density and Substrate Temperature

  • Takeda, K.;Fukunaga, Y.;Tsutsumi, T.;Ishikawa, K.;Kondo, H.;Sekine, M.;Hori, M.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.93-93
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    • 2016
  • Large scale integrated circuits (LSIs) has been improved by the shrinkage of the circuit dimensions. The smaller chip sizes and increase in circuit density require the miniaturization of the line-width and space between metal interconnections. Therefore, an extreme precise control of the critical dimension and pattern profile is necessary to fabricate next generation nano-electronics devices. The pattern profile control of plasma etching with an accuracy of sub-nanometer must be achieved. To realize the etching process which achieves the problem, understanding of the etching mechanism and precise control of the process based on the real-time monitoring of internal plasma parameters such as etching species density, surface temperature of substrate, etc. are very important. For instance, it is known that the etched profiles of organic low dielectric (low-k) films are sensitive to the substrate temperature and density ratio of H and N atoms in the H2/N2 plasma [1]. In this study, we introduced a feedback control of actual substrate temperature and radical density ratio monitored in real time. And then the dependence of etch rates and profiles of organic films have been evaluated based on the substrate temperatures. In this study, organic low-k films were etched by a dual frequency capacitively coupled plasma employing the mixture of H2/N2 gases. A 100-MHz power was supplied to an upper electrode for plasma generation. The Si substrate was electrostatically chucked to a lower electrode biased by supplying a 2-MHz power. To investigate the effects of H and N radical on the etching profile of organic low-k films, absolute H and N atom densities were measured by vacuum ultraviolet absorption spectroscopy [2]. Moreover, using the optical fiber-type low-coherence interferometer [3], substrate temperature has been measured in real time during etching process. From the measurement results, the temperature raised rapidly just after plasma ignition and was gradually saturated. The temporal change of substrate temperature is a crucial issue to control of surface reactions of reactive species. Therefore, by the intervals of on-off of the plasma discharge, the substrate temperature was maintained within ${\pm}1.5^{\circ}C$ from the set value. As a result, the temperatures were kept within $3^{\circ}C$ during the etching process. Then, we etched organic films with line-and-space pattern using this system. The cross-sections of the organic films etched for 50 s with the substrate temperatures at $20^{\circ}C$ and $100^{\circ}C$ were observed by SEM. From the results, they were different in the sidewall profile. It suggests that the reactions on the sidewalls changed according to the substrate temperature. The precise substrate temperature control method with real-time temperature monitoring and intermittent plasma generation was suggested to contribute on realization of fine pattern etching.

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플라즈마 표면 처리를 이용한 ZnO 습식성장 패터닝 기술 연구

  • Lee, Jeong-Hwan;Park, Jae-Seong;Park, Seong-Eun;Lee, Dong-Ik;Hwang, Do-Yeon;Kim, Seong-Jin;Sin, Han-Jae;Seo, Chang-Taek
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.330-332
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    • 2013
  • 소 분위기에서 플라즈마 표면 처리의 경우 기판 표면에 존재하는 수소와 탄소 유기물들이 산소와 반응하여 $H_2O$$CO_2$ 등으로 제거되며 표면에 오존 결합을 유도하여 표면 에너지를 증가시키는 것으로 알려져 있다. ZnO 나노구조물을 성장시키는 방법으로는 MOCVD (Metal-Organic Chemical Vapor Deposited), PLD (Pulsed Laser Deposition), VLS (Vapor-Liquid-Solid), Sputtering, 습식화학합성법(Wet Chemical Method) 방법 등이 있다. 그중에서도 습식화학합성법은 쉽게 구성요소를 제어할 수 있고, 저비용 공정과 낮은 온도에서 성장 가능하며 플렉서블 소자에도 적용이 가능하다. 그러므로 본 연구에서는 플라즈마 표면처리에 따라 표면에너지를 변화하여 습식화학합성법으로 성장시킨 ZnO nanorods의 밀도를 제어하고 photolithography 공정 없이 패터닝 가능성을 유 무를 판단하는 연구를 진행하였다. 기판은 Si wafer (100)를 사용하였으며 세척 후 표면에너지 증가를 위한 플라즈마 표면처리를 실시하였다. 분위기 가스는 Ar/$O_2$를 사용하였으며 입력전압 400 W에서 0, 5, 10, 15, 60초 동안 각각 실시하였다. ZnO nanorods의 seed layer를 도포하기 위하여 Zinc acetate dehydrate [Zn $(CH_3COO)_2{\cdot}2H_2O$, 0.03 M]를 ethanol 50 ml에 용해시킨 후 스핀코팅기를 이용하여 850 RPM, 15초로 5회 실시하였으며 $80^{\circ}C$에서 5분간 건조하였다. ZnO rods의 성장은 Zinc nitrate hexahydrate [$Zn(NO_3)_2{\cdot}6H_2O$, 0.025M], HMT [$C6H_{12}N_4$, 0.025M]를 deionized water 250 ml에 용해시켜 hotplate에 올리고 $300^{\circ}C$에서 녹인 후 $200^{\circ}C$에서 3시간 성장시켰다. ZnO nanorods의 성장 공정은(Fig. 1)과 같다. 먼저 플라즈마 처리한 시편의 표면에너지 측정을 위해 접촉각 측정 장치[KRUSS, DSA100]를 이용하였다. 그 결과 0, 5, 10, 15, 60 초로 플라즈마 표면 처리했던 시편이 각각 Fig. l, 2와 같이 $79^{\circ}$, $43^{\circ}$, $11^{\circ}$, $6^{\circ}$, $7.8^{\circ}$로 측정되었으며 이것을 각각 습식화학합성법으로 ZnO nanorods를 성장 시켰을 때 Fig. 3과 같이 밀도 차이를 확인할 수 있었다. 이러한 결과를 바탕으로 기판의 표면에너지를 제어하여 Fig. 4와 같이 나타나며 photolithography 공정없이 ZnO nanorods를 패터닝을 할 수 있었다. 본 연구에서는 플라즈마 표면 처리를 통하여 표면에너지의 변화를 제어함으로써 ZnO nanorods 성장의 밀도 차이를 나타냈었다. 이러한 저비용, 저온 공정으로 $O_2$, CO, $H_2$, $H_2O$와 같은 다양한 화학종에 반응하는 ZnO를 이용한 플렉시블 화학센서에 응용 및 사용될 수 있고, 플렉시블 디스플레이 및 3D 디스플레이 소자에 활용 가능하다.

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A Study on the Characteristics of Chrysotile and Amosite by Acid and Heat Treatment (산 및 열처리 과정에 따른 주요 석면의 특성변화에 관한 연구)

  • Lee, Jin Hyo;Lee, Su Hyun;Kang, Mi Hye;Bae, Il Sang;Kim, Ik Soo;Han, Kyu Mun;Eo, Soo Mi;Jung, Kweon;Koo, Ja Yong
    • Journal of Korean Society of Environmental Engineers
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    • v.37 no.6
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    • pp.371-379
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    • 2015
  • This study is purposed to seek the characteristics of both asbestos in accordance with acid and heat treatment for chrysotile and amosite used mainly as building materials. Results of acid treatment, the refractive index, the elongation sign, the extinction of acid-treated chrysotile were mostly similar to those of untreated chrysotile regardless of pH, elapsed time. But the characteristics of acid-treated chrysotile were different from those of untreated chrysotile after 8 weeks, at pH 1.2 acidic solution. When chrysotile treated with acid, weight ratio (%) of O and Mg fluctuated greatly in accordance with acid treatment unlike Si. But the change of constituents ratio (%) was small as time passed after acid treatment. The refractive index, the elongation sign and the extinction of acid-treated amosite were mostly similar to those of untreated amosite regardless of pH, elapsed time. When amosite was treated with acid, weight ratio (%) of Fe slightly increased. But in case of O, a contrary tendency was seen. Results of heat treatment, the higher the temperature, the more increased the refractive index of chrysotile. When chrysotile was heated for 10 minutes at $1,100^{\circ}C$, the elongation sign of chrysotile changed from positive(+) to negative(-). The extinction of chrysotile didn't change apparently in accordance with heat treatment. Also weight ratio (%) of O and Mg fluctuated greatly in accordance with heat treatment unlike Si. The higher the temperature, the more increased the refractive index of amosite. The elongation sign and the extinction of amosite didn't change apparently in accordance with heat treatment. Also weight ratio (%) of O and Fe fluctuated greatly in accordance with heat treatment. But weight ratio (%) of Si and Mg of heated amosite were mostly similar to those of untreated amosite regardless of temperature, heating time.

Effect of Silicate Fertilizer Application on Zoysiagrass (Zoysia japonica Steud.) Field (들잔디 재배지에서 규산질비료 살포 효과)

  • Bae, Eun-Ji;Kim, Chung-Yeol;Yoon, Jun Hyuck;Lee, Kwang-Soo;Park, Yong-Bae
    • Weed & Turfgrass Science
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    • v.7 no.3
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    • pp.247-257
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    • 2018
  • This study was conducted to find out the optimum silicate fertilization for improving the quality and density of zoysiagrass (Zoysia japonica Steud.), the growth of zoysiagrass and changes in chemical properties of soil in field experiments treated with different levels of silicate fertilizer during 3 years from 2012 to 2014. An increase in the silicate fertilizer from 100, 200, to $400kg\;10a^{-1}$ led to a significant increase in the fresh and dry weight of shoots and stolons, the number of shoots and length of stolon, but were not significantly different between 200 and $400kg\;10a^{-1}$. Moreover, soil pH, EC and the contents of available $SiO_2$ were increased as the rate of silicate fertilizer application increased. Thus, these results demonstrated that the silicate fertilizer rate for maximum growth of zoysiagrass was $200kg\;10a^{-1}$ in consideration of improving growth of zoysiagrass and the chemical property of the soil.

A study on the synthesis and crystal growth of the MFI type zeolite, silicalite under highgravity (고중력에서 MFI 형 Zeolite 인 Silicalite 결정의 합성 및 성장에 관한 연구)

  • Kim, Wha-Jung;Lee, Joon
    • Applied Chemistry for Engineering
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    • v.2 no.2
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    • pp.97-107
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    • 1991
  • Highly-siliceous dealuminated zeolite, silicalite(end member of ZSM-5) was synthesized from a batch composition of 2.55 $Na_2O-5.0$ TPABr-$100SiO_2-2800H_2O $ at $180^{\circ}C$ and at times ranging from one to seven days of reaction time. Autoclaves containing the synthesis mixture were centrifuged within the specially-equipped convection oven to provide an elevated gravitational force field like 30 and 50 G. Tests were also conducted at normal gravity. For synthesis performed under elevated gravities, average and maximum crystal sizes were substantially greater than those synthesized under normal gravity and product yields were also found to be affected by elevated gravity ; that is, product yields were substantially enhanced under elevated gravity from 4 % to 55 % with respect to normal gravity. The average crystal sizes of silicalite synthesized at normal gravity were 50 to $70{\mu}m$ over an entire range of reaction time, one to seven days while the average crystal sizes synthsized under elevated gravities, 30 and 50 G, were 160 to $190{\mu}m$ respectively. For the elevated gravity, in particular, two separate nucleations and growths were observed. For examples, at 50G, large crystals of $200{\mu}m$ were produced through the second growing stage after 5 days of reaction following the rapid first growing stage where fairly large crystals of $135{\mu}m$ were produced only in 2 days of reaction. The maximum crystal sizes obtained through the above two growing stages were 190 and $300{\mu}m$, respectively. A discussion of how elevated gravity affects nucleation, growth, yield and crystal size of silicalite is presented.

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Sulfate Resistance of Alkali-Activated Materials Mortar (알칼리 활성화 결합재 활용 모르타르의 황산염 침식 저항성)

  • Park, Kwang-Min;Cho, Young-Keun;Lee, Bong-Chun
    • Journal of the Korea institute for structural maintenance and inspection
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    • v.20 no.2
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    • pp.94-101
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    • 2016
  • This paper presents an investigation into the durability alkali-activated materials(AAM) mortar and paste samples manufactured using fly-ash(FA) and ground granulated blast furnace slag(GGBFS) exposed to a sulfate environment with different GGBFS replace ratios(0, 30, 50 and 100%), sodium silicate modules($Ms[SiO_2/Na_2O]$ 1.0, 1.5 and 2.0) and initial curing temperatures($23^{\circ}C$ and $70^{\circ}C$). The tests involved immersions for a period of 6 months into 10% solutions of sodium sulfate and magnesium sulfate. The evolution of compressive strength, weight, length expansion and microstructural observation such as x-ray diffraction were studied. As a results, as higher GGBFS replace ratio or Ms shown higher compressive strengths on 28 days. In case of immersed in 10% sodium sulfate solution, the samples shows increase in long-term strength. However, for samples immersed in magnesium sulfate solutions, the general observation was that the compressive strength decreased after immersion. The most drastic reduction of compressive strength and expansion of weight and length occurred when GGBFS or Ms ratios were higher. Also, the XRD analysis of samples immersed in magnesium sulfate indicated that expansion of AAM caused by gypsum($CaSO_4{\cdot}2H_2O$); the gypsum increased up to 6 months continuously.

Microstructure and Microdefects of Diamond Thin Films Deposited by MPECVD (마이크로웨이브 화학증착법에 의한 다이아몬드 박막의 미세구조오 미세결함)

  • Lee, Se-Hyeon;Lee, Yu-Gi;Park, Jong-Wan
    • Korean Journal of Materials Research
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    • v.6 no.8
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    • pp.833-840
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    • 1996
  • Diamond thin films were deposited on p-type (100) Si wafers using MPECVD. Prior to deposition, ultrasonic striking was done to improve density of nucleation sites with dimond powder of 40~$60\mu$m size. Then diamond thin films were deposited at $^900{\circ}C$, 40Torr and 1000W microwave power using ${CH}_{4}$ and ${H}_{2}$ gases. The purity, the morphology and the microstructur'e and microdefects of diamond thin films were characterized by Raman spectroscopy, SEM and TEM, repectively. In Raman spectroscopy the peaks of non-diamond phase increased as ${CH}_{4}$, concentration increased. In SEM, the morphology of diamond thin films varied from crystalline to cauliflower as ${CH}_{4}$, concentration increased. As ${CH}_{4}$ con centration increased, the density of defects increased, with most defects being {III} twin. ${MTP}_{5}$, were formed with five (II]) planes. As these (Ill) Planes were twinned, ${MTP}_{5}$, represented five-fold symmetry. ]n the interfaces, defects in diamond thin films fanned out from small regions implying nucleation sites.

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Formulation and Application of UV-Cured Hard Coating Compounds for PVC Tile (PVC 바닥상재용 광경화형 하드 코팅액의 제조 및 응용에 관한 연구)

  • Park, Bo-Ram;Yoon, Hyun-Jung;Zhao, Hong;Ha, Jin-Wook
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.10 no.9
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    • pp.2396-2401
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    • 2009
  • This study is on development of UV-cured hard coating compounds which have more improved abrasion resistance than existing UV-cured urethane-acrylic resin, to prevent a surface of a widely used PVC tile as a constructive material from being scratched. To make a high abrasion resistant hard coating solution compared to UV-cured urethane-acrylic resin which has no abrasion resistance and been used for PVC tiles, we added powder substances of different abrasion resistant level, $Al_2O_3$(Al-160SG-3), $Al(OH)_3$(SH-8W), $SiO_2$(KS-5000), etc., to the resin, changing their contents from 10% to 30% against quantities of resin, and compounded it using Ring-Mill. After coating PVC tiles with the hard coating solution using bar-coating method that can adjust a thickness, we estimated some surface properties-abrasion resistance, pencil hardness, adhesive power, thickness of coating, and so on. As a result, a hard coating solution added 30% $Al_2O_3$ powder to the resin had the finest surface properties-the first grade in abrasion resistance, H in pencil hardness, 100% in adhesive power, and a hard coating solution which showed excellent solidity and abrasion resistance has smaller particle size, higher powder content, and thicker coating thickness.

Fundamental Research on Reactivity of Silica Source in the Rapidly Cured Inorganic Micro-Defect-Free(MiDF) Concrete (촉진 양생한 무기계 MiDF 콘크리트에서 실리카질 원료의 반응성에 관한 기초 연구)

  • Choi, Hong-Beom;Kim, Jin-Man
    • Journal of the Korean Recycled Construction Resources Institute
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    • v.7 no.2
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    • pp.166-173
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    • 2019
  • In this paper, the reaction properties of silica source in the accelerated curing conditions using autoclave and the fundamental properties of inorganic Micro Defect Free(MiDF) concrete using silica source are studied. Studies show that Si ions elution rate from silica source in autoclave curing is higher in amorphous source. In tap water conditions, solids which is source after autoclaved curing show a higher mass reduction in amorphous materials, which is attributed to the higher elution rate of ion. In $Ca(OH)_2$ solution conditions, amorphous materials show higher mass increase, due to increase in C-S-H minerals. From experiment for influence on the properties of MiDF concrete by using nano silica materials, the specimen with silica fume shows an increase in compressive strength and a decrease in absorption depending on replacement rate up to 5.5%, while nano silica with amorphous phase and high-fineness shows a decrease in compressive strength and decrease in the water absorption. The specimen with nano silica increases the pore below 10,000nm, but reduces pore between 10,000 and 100,000nm. The above results show that the porosity and absorption rate of MiDF concrete can be reduced by using amorphous nano-size silica. However, to reduce the pore of 50 to 10,000nm, better dispersion of nano material in the cement matrix will be necessary. We will focus on the this item in the next research.