• Title/Summary/Keyword: H-Si(100)

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High Frequency Properties of Patterned Fe-Al-O Thin Films

  • N.D. Ha;Park, B.C.;B.K. Min;Kim, C.G.;Kim, C.O.
    • Proceedings of the Korean Magnestics Society Conference
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    • 2003.06a
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    • pp.194-194
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    • 2003
  • As a result of the recent miniaturization an enhancement in the performance of thin film inductors and thin film transformers, there are increased demands for the thin films with high magnetic permeability in the high frequency range, high saturation magnetization, in high electrical resistivity, and low coercive force. In order to improve high frequency properties, we will investigate anisotropy field by shape and size of pattern. The Fe-Al-O thin films of 16mm and 1 $\mu\textrm{m}$ thickness were deposited on Si wafer, using RF magnetron reactive sputtering technique with the mixture of argon and oxygen gases. The fabricating conditions are obtained in the working partial pressure of 2mTorr, O$_2$ partial pressure of 5%, input power of 400W, and Al pellets on an Fe disk with purity of 99,9%. Magnetic properties of the continuous films as followed: the 4$\pi$M$\_$s/ of 19.4kG, H$\_$c/ of 0.6Oe, H$\_$k/ of 6.0Oe and effective permeability of 2500 up to 100㎒ were obtained. In this work, we expect to enhance effect of magnetic anisotropy on patterned of Fe-Al-O thin films.

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Si and Mg doped Hydroxyapatite Film Formation by Plasma Electrolytic Oxidation

  • Park, Seon-Yeong;Choe, Han-Cheol
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.195-195
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    • 2016
  • Titanium and its alloys are widely used as implants in orthopedics, dentistry and cardiology due to their outstanding properties, such as high strength, high level of hemocompatibility and enhanced biocompatibility. Hence, recent works showed that the synthesis of new Ti-based alloys for implant application involves more biocompatible metallic alloying element, such as, Nb, Hf, Zr and Mo. In particular, Nb and Hf are one of the most effective Ti ${\beta}-stabilizer$ and reducing the elastic modulus. Plasma electrolyte oxidation (PEO) is known as excellent method in the biocompatibility of biomaterial due to quickly coating time and controlled coating condition. The anodized oxide layer and diameter modulation of Ti alloys can be obtained function of improvement of cell adhesion. Silicon (Si) and magnesium (Mg) has a beneficial effect on bone. Si in particular has been found to be essential for normal bone and cartilage growth and development. In vitro studies have shown that Mg plays very important roles in essential for normal growth and metabolism of skeletal tissue in vertebrates and can be detected as minor constituents in teeth and bone. The aim of this study is to research Si and Mg doped hydroxyapatite film formation by plasma electrolytic oxidation. Ti-29Nb-xHf (x= 0, 3, 7 and 15wt%, mass fraction) alloys were prepared Ti-29Nb-xHf alloys of containing Hf up from 0 wt% to 15 wt% were melted by using a vacuum furnace. Ti-29Nb-xHf alloys were homogenized for 2 hr at $1050^{\circ}C$. Each alloy was anodized in solution containing typically 0.15 M calcium acetate monohydrate + 0.02 M calcium glycerophosphate at room temperature. A direct current power source was used for the process of anodization. Anodized alloys was prepared using 270V~300V anodization voltage at room. A Si and Mg coating was produced by RF-magnetron sputtering system. RF power of 100W was applied to the target for 1h at room temperature. The microstructure, phase and composition of Si and Mg coated oxide surface of Ti-29Nb-xHf alloys were examined by FE-SEM, EDS, and XRD.

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Characteristics of Sputtered TiO2 Thin Films for Coating of Polymer Insulator (폴리머 애자 코팅을 위한 스퍼터링 되어진 TiO2 박막의 특성)

  • Park, Y.S.;Jung, H.S.;Park, C.M.;Park, Y.;Kim, H.C.
    • Journal of the Korean Vacuum Society
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    • v.21 no.3
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    • pp.158-163
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    • 2012
  • In this work, we have fabricated the $TiO_2$ thin films on Si and glass, polymer insulator substrates as the self-cleaning coating of polymer insulator. $TiO_2$ films were deposited by RF magnetron sputtering method with $TiO_2$ ceramic target and $TiO_2$ films of 100 nm thickness were fabricated with various RF powers. We have investigated the optical and surface, and structural properties of $TiO_2$ films prepared with various RF powers. As a result, the value of the contact angle of $TiO_2$ thin film is increased with increasing RF power and the value of the rms surface roughness is increased. The transmittance is decreased with increasing RF power. These results indicate that the variation of the surface and optical properties of $TiO_2$ thin films is related to the sputtering effects by increasing RF power.

UV 나노임프린트 리소그래피의 Quartz 기판상의 Resin mold 제거를 위한 Hybrid 세정공정에 관한 연구

  • Jo, Yun-Sik;Kim, Min-Su;Gang, Bong-Gyun;Kim, Jae-Gwan;Lee, Byeong-Gyu;Park, Jin-Gu
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.81.1-81.1
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    • 2012
  • 나노임프린트 리소그라피(Nano-Imprint Lithography, NIL) 기술은 기판위의 resin을 나노구조물이 각인된 스탬프로 눌러서 나노구조물을 형성하는 기술로, 경제적이고 효과적으로 나노구조물을 제작할 수 있는 기술이다. 그중에서도 UV 기반의 나노임프린트(UV-NIL) 기술은 resin을 투명한 스탬프로 누른뒤 UV로 경화시켜 나노구조물을 형성하는 기술로써 고온, 고압($140{\sim}180^{\circ}C$, 10~30bar)이 필요한 가열식 나노임프린트 기술에 비해 상온, 상압($20^{\circ}C$, 1bar)에서도 구조물 형성이 가능하여 다층구조 형성에 적합하다. 연속적인 임프린팅 공정에 의해 resin이 quarz 스탬프에 잔류하여 패터닝에 결함을 유발하게 되므로 오염물을 제거하기 위한 세정공정이 필요하다. 하지만 UV에 의해 경화된 resin은 cross-linking을 형성하여 화학적인 내성이 증가하게 되므로 제거하기가 어렵다. 현재는 resin 제거를 위한 세정공정으로 SPM($H_2SO_4/H_2O_2$) 세정이 사용되고 있는데 세정시간이 길고 세정 후에 입자 또는 황 잔유물이 남으며 많은 유해용액 사용의 문제점이 있어 효과적으로 resin을 제거할 세정공정이 필요한 상황이다. 본 연구에서는 친환경적인 UV 세정 및 오존수 세정공정을 적용하여 경화된 resin을 제거하는 연구를 진행하였다. 실험샘플은 약 100nm 두께의 resin을 증착한 $1.5cm{\times}1.5cm$ $SiO_2$ 쿠폰 wafer를 사용하였으며, UV 및 오존수의 처리시간을 달리하여 resin 제거효율을 평가하였다. ATR-FTIR 장비를 사용하여 시간에 따른 resin의 두께를 측정한 결과, UV 세정으로 100nm 높이의 resin중에 80nm의 bulk resin이 단시간에 제거가 되었고 나머지 20nm의 resin thin film은 오존수 세정으로 쉽게 제거되는 것을 확인 하였다. 또한 표면에 남은 resin residue와 particle을 제거하기 위해서 SC-1 세정을 진행하였고 contact angle과 optical microscope 장비를 사용하여 resin이 모두 제거된 것을 확인하였다.

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Microstructure and Surface Hardening of Pressure-assisted Sintered FeAl-base Intermetallic Compound by Plasma Nitriding (가압소결에 의해 제조된 FeAl계 금속간 화합물의 플라즈마 질화에 의한 미세조직 및 표면경화)

  • Park, Ji-Hwan;Park, Yun-U
    • Korean Journal of Materials Research
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    • v.9 no.11
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    • pp.1102-1107
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    • 1999
  • FeAl matrix composite was fabricated successfully by hot-pressing. The mechanical properties of FeAl alloys have been widely studies, but their behaviors of surface hardening effect by plasma nitriding has not yet been studied. This study was to analysis the relationship between microstructure of the sintered composite by hot-pressing and surface hardening at plasma nitriding treatment. Surface hardening of FeAl base alloys was improved by plasma nitriding with increasing plasma treatment time. Excellent surface hardness in the FeAl alloys could be obtained by plasma nitriding($\textrm{H}_{\textrm{v}}$ 100gf, diffusion layer: 1100~1450kg/$\textrm{mm}^2$, matrix : 330~360kg/$\textrm{mm}^2$). Diffusion layer size increased with increasing plasma nitriding times and decreased with increasing Sic, content.

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Fabrication of the 7$\times$7 mm Planar Inductor for 1W DC-DC Converter (1W DC-DC 컨버터를 위한 7$\times$7 mm 평면 인덕터의 제조)

  • Bae, Seok;Ryu, Sung-Ryong;Kim, Choong-Sik;Nam, Seoung-Eui;Kim, Hyoung-June;Min, Bok-Ki;Song, Jae-Sung
    • Journal of the Korean Magnetics Society
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    • v.11 no.5
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    • pp.222-225
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    • 2001
  • The planar type inductors have a good potential for the application of miniaturized low power DC-DC converters. For those high quality application, the reduction of coil loss and also magnetic films which have good high frequency properties are required. Fabricated inductor was consisted of FeTaN/Ti magnetic film and electroplated Cu coil thickness of 100$\mu\textrm{m}$ and $SiO_2$ as a insulating layer. The inductor was designed double rectangular spiral shape for magnetic field highly confining within the device. The measured value of inductance and resistance were 980 nH and 1.7 $\Omega$ at 1 MHz as operating frequency of device. The Q factor is 3.55 at 1 MHz.

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A Response Time of the Nuclear Emergency Preparedness Robot based on the Gamma Ray Dose-Rate Constraints (감마선 선량율 제한조건에 따른 원자력 비상대응로봇의 대응시간)

  • Cho, JaiWan;Choi, Young Soo;Kim, TaeWon;Jeong, KyungMin
    • Annual Conference of KIPS
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    • 2014.04a
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    • pp.807-810
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    • 2014
  • 로봇 시스템의 제어 및 이를 이용한 환경 인식에는 많은 전자 광학 소자들이 사용되고 있다. 로봇 제어회로에 사용되고 있는 Si CMOS 공정의 CPU, ASIC, FPGA 소자는 고 선량의 감마선에 취약하다. 환경정보 수집용으로 로봇에 탑재되는 CMOS/CCD 카메라의 관측영상에는 고선량 감마선으로 인한 speckle (백색잡음, white noise) 들이 나타나며, 이들이 카메라의 관측성능을 저하시킨다. 후쿠시마 원자력발전소 사고와 같이 원자력시설에서 제어불능의 심각한 사고가 발생되면 고선량 감마선이 방출된다. 이러한 고선량 감마선방출은 사람에 의한 사고수습을 불가능하게 하며, 사고 수습을 위해서는 로봇의 활용이 불가피하다. 그러나, 방출되는 고선량 감마선의 세기(선량율)가 지나치게 높을 경우, 로봇 전자회로가 장애를 일으키기 때문에 로봇의 적절한 임무수행이 가능한 감마선 세기에 대한 고려가 필요하다. 본 논문에서는 고선량 감마선 환경하에서의 로봇 탑재 CCD/CMOS 카메라의 관측 성능을 고려하여 100 Gy/h 를 감마선 선량율 제한조건으로 설정한다. 그리고, 재 가동 승인심사를 받기 위해 일본의 원전 운영자들이 제시한 PWR (가압경수로) 원전의 중대사고 대책 적합성 평가문서에 나타난 노심용융개시 시점의 원자로 격납건물내 감마선 선량율 추이 계산결과를 활용하여 로봇의 대응시간을 계산하였다. 문서 (PDF) 에 표현된 감마선 선량율 추이 그래프를 영상 판독하여, 격납건물내 감마선 선량율이 100 Gy/h 제한조건에 도달하는 시간을 계산하였다. 이를 로봇의 대응시간으로 설정한다.

PLASMA POLYMERIZED THIN FILMS GROWN BY PECVD METHOD AND COMPARISON OF THEIR ELECTROCHEMICAL PROPERTIES

  • I.S. Bae;S.H. Cho;Park, Z. T.;Kim, J.G.;B. Y. Hong;J.H. Boo
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2003.10a
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    • pp.119-119
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    • 2003
  • Plasma polymerized organic thin films were deposited on Si(100) glass and Copper substrates at 25 ∼ 100 $^{\circ}C$ using cyclohexane and ethylcyclohexane precursors by PECVD method. In order to compare physical and electrochemical properties of the as-grown thin films, the effects of the RF plasma power in the range of 20∼50 W and deposition temperature on both corrosion protection efficiency and physical properties were studied. We found that the corrosion protection efficiency (P$\_$k/), which is one of the important factors for corrosion protection in the interlayer dielectrics of microelectronic devices application, was increased with increasing RF power. The highest P$\_$k/ value of plasma polymerized ethylcyclohexane film (92.1% at 50 W) was higher than that of the plasma polymerized cyclohexane film (85.26% at 50 W), indicating inhibition of oxygen reduction. Impedance analyzer was utilized for the determination of I-V curve for leakage current density and C-V for dielectric constants. To obtain C-V curve, we used a MIM structure of metal(Al)-insulator(plasma polymerized thin film)-metal(Pt) structure. Al as the electrode was evaporated on the ethylcyclohexane films that grew on Pt coated silicon substrates, and the dielectric constants of the as-grown films were then calculated from C-V data measured at 1㎒. From the electrical property measurements such as I-V ana C-V characteristics, the minimum dielectric constant and the best leakage current of ethylcyclohexane thin films were obtained to be about 3.11 and 5 ${\times}$ 10$\^$-12/ A/$\textrm{cm}^2$ and cyclohexane thin films were obtained to be about 2.3 and 8 ${\times}$ 10$\^$-12/ A/$\textrm{cm}^2$.

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Effect of a Li2O Additive on the Sintering Behavior of UO2 in the H2 and CO2 Atmospheres

  • Kim, Si-Hyung;Joung, Chang-Young;Kim, Yeon-Gu;Lee, Soo-Chul;Kim, Ban-Soo;Na, Sang-Ho;Lee, Young-Woo;Suhr, Dong-Soo
    • Journal of the Korean Ceramic Society
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    • v.41 no.8
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    • pp.567-572
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    • 2004
  • The variation of the sintered density and grain size of UO$_2$ as a function of the Li$_2$O amount and sintering atmosphere was observed. Li$_2$O enhanced the grain growth of the UO$_2$ pellet in H$_2$, but rather hindered it in $CO_2$ atmosphere. Grain size of the UO$_2$ and UO$_2$-0.1 wt%Li$_2$O pellets was, respectively, 8 $\mu$m and 100 $\mu$m at 168$0^{\circ}C$ in the H$_2$ atmosphere, and that of each pellet was, respectively, 24 $\mu$m and 17 $\mu$m at the same temperature in the $CO_2$ atmosphere. As-received Li$_2$O powder, which had been composed of Li$_2$O and LiOH, was converted to the Li$_2$CO$_3$ phase after heating to 80$0^{\circ}C$ in $CO_2$. On the other hand, the Li$_2$O and LiOH phases remained unchanged in H$_2$ atmosphere. In the H$_2$, the as-received Li$_2$O powder began to evaporate at about 105$0^{\circ}C$ and then about 20 wt% residue was left at 150$0^{\circ}C$. But, most of the Li elements evaporated at 150$0^{\circ}C$ in the $CO_2$ atmosphere.

Purification and Properties of Cyclodextrin glycosyltransferase from Bacillus stearothermophilus KY-126 (Bacillus stearothermophilus KY-126가 생산하는 Cyclodextrin glycosyltransferase의 정제 및 특성)

  • Kang, Sang-Mo;Yoo, Si-Hyung
    • Korean Journal of Food Science and Technology
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    • v.26 no.4
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    • pp.375-381
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    • 1994
  • A bacterial strain No. KY-126, which produced extracellular cyclodextrin glycosyltransferase(CGTase), was isolated from soil and identified as Bacillus stearothermophilus KY-126. The enzyme was purified by the treatments of ammonium sulfate precipitation, DEAF-Sephadex, Sephadex G-100 column chromatography. The optimal pH and temperature for the enzyme activity were pH 5.5 and $65^{\circ}C$, respectively. And the enzyme was stable at pH values from 6.0 to 11.0 at $55^{\circ}C$ for 30 min and stable up to $60^{\circ}C$ for 30 min.. The enzyme was inhibited by $HgCl_{2}$. The molecular weight of the enzyme was estimated to be 67,000 by using SDS-PAGE. The maximum conversion from starch to cyclodextrin (CD) by CGTase was 43% and obtained at 6 hr reaction and the ratio of ${\alpha}-,\;{\beta}-,\;{\gamma}-$, CD production at this time was 2.9 : 2.1 : 1.0.

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