• Journal of Korean Society of Forest Science
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• v.55 no.1
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• pp.1-21
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• 1982

The pollen morphology of 2 forms, 6 varieties, 50 species, 15 genera, 11 families of Korean Sapindales was studied. The keys were provided for general and families of Korean Sapindales. General pollen morphology was diversed and taxonomically significant differences were obtained in shape, aperture, type and size, sculpture pattern and exine thickness of pollen grains. Pollen grains of Korean Sapindales could be grouped into four types and five subtypes. One of five sub-types pollen grains of Acer could be ground into four under subtypes: ginnala type, barbinerve type, psseudo-sieboldianum type and negundo type. Pollen morphology of Empetraceae, Buxaceae and Balsaminaceae appeared to have very special features in the equatorial view and aperature type compare with pollen grain of the other families of Korean Sapindales.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2009.10a
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• pp.263-266
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• 2009

Transformation induced plasticity (TRIP) steel consisting of ferrite, austenite, and bainite phases was regarded as an excellent candidate for automotive applications due to the good combination of ductility and strength. The aim of the present study was to understand the microstructural characteristics of ultrafine grained (UFG) TRIP low-carbon steel fabricated via equal channel angular pressing accompanied with intercritical- and isothermal-annealing treatments. When compared to coarse grained counterpart, only the volume fraction of austenite phase in UFG TRIP steel remained unchanged, but all other microstructural variables such as size and morphology were different. It was found that UFG TRIP steel showed the homogeneous distribution of each constituent phase, which was discussed in terms of annealing treatments done in this study.

• Transactions on Electrical and Electronic Materials
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• v.7 no.5
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• pp.257-261
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• 2006

Nano-structured carbon nitride $(CN_x)$ films were prepared by reactive RF magnetron sputtering with a DC bias at various deposition conditions, and the physical and electrical properties were investigated. FTIR spectrum indicated an ${alpha}C_3N_4$ peak in the films. The carbon nitride film deposited on Si substrate had a nano-structured surface morphology. The grain size was about 20 nm and the deposition rate was $1.7{\mu}m/hr$. When the $N_2/Ar$ ratio was 3/7, the level of nitrogen incorporation was 34.3 at%. The film had a low dielectric constant. The metal-insulator-semiconductor (MIS) capacitors that the carbon nitride was deposited as insulators, exhibited a typical C-V characteristics.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05b
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• pp.107-110
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• 2002

The optical memory devices of BST thin films to composite $(Ba_{0.7}\;Sr_{0.3})TiO_{3}$ using sol-gel method were fabricated by changing of the depositing layer number on $Pt/Ti/SiO_{2}/Si$ substrate. The structural properties of optical memory devices to be ferroelectric was investigated by fractal analysis and 3-dimension image processing. The thickness of BST thin films at each coating numbers 3, 4 and 5 times was $2500[\AA]$, $3500[\AA]$ and $3800[\AA]$. BST thin films exhibited the most pronounced grain growth. The surface morphology image was roughness with coating numbers. The thin films increasing with coating numbers shows a more textured and complex configuration.

• Journal of the Korean Society for Heat Treatment
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• v.20 no.6
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• pp.306-310
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• 2007

Changes in microstructure and damping capacity with aging time for solutionized Mg-Al alloy have been investigated. Discontinuous ${\beta}\;(Mg_{17}Al_{12})$ precipitates form along the primary grain boundaries, the amount of which increases as the aging time increases. The hardness of the matrix with respect to aging time shows a typical "S" shape, indicating a generation of fine continuous precipitates in the matrix during the aging. The peak level of damping capacity is obtained after 1 hour of aging, over which the damping capacity becomes deteriorated continuously. The formation of optimum density of continuous ${\beta}$ precipitates with fine morphology which would act as pinning points for dislocation lines, might be responsible for the improvement of damping capacity.

• Journal of the Korean institute of surface engineering
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• v.43 no.6
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• pp.255-259
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• 2010

In this work, Ni-Co composites incorporated with nano-sized SiC particles in the range of 45-55 nm are prepared by electroplating. The effects of plating duration on the chemical composition, surface morphology, crystalline structures and hardness have been studied. The maximum hardness of Ni-Co-SiC composite coating is approximately 633 Hv at plating duration of 1 h. The hardness is gradually decreased with increasing plating duration, which can be attributed to the growth of crystalline size and the agglomerates of SiC nano-particles. It is therefore explained that the grain refinement of Ni-Co matrix and stable dispersion of SiC particles play an important role for strengthening, which indicate Hall-Petch relation and Orowan model were dominant for hardening of Ni-Co-SiC composite coatings.

• Korean Journal of Crystallography
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• v.3 no.1
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• pp.53-66
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• 1992

Extensive research has been perform성 on the property-microstructure-process condition relations of thin films. The various proposed models are mainly based on physical vapor deposition processes. Especially the study on the surface condition of substrates in Zone 1 with low surface mobility has not been sufficient. In this study, therefore, we discussed the mochological changes of TiN films deposited by plusma enhanced chemical vapor deposition process with substrates of different composition and micro-rorghness, and compared it with the Structure Zone Model. We could find out that the growth rate of films increased and micro-grain size decreased with the increase in micro-roughness, but it does not improve the mechanical properties because of many imperfections like voids, micro-cracks, stacking faults, etc. This means that, in these deposition conditions, the increase in shadowing diffect is more effective than the increase in nucleation sites on the growth of films due to the increase in substrate roughness.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.31 no.3
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• pp.177-181
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• 2018

We prepared ZnS thin films via chemical bath deposition (CBD) in an aqueous solution of ammonia ($NH_3$) and hydrazine ($N_2H_4$). The composition ratio of hydrazine used was 0%, 17%, 22%, 29%, or 50%. We investigated the effects of hydrazine and ammonia on the growth, and the structural and optical properties of ZnS in terms of surface uniformity, voids, and grain size. We found that during the growth of ZnS films, hydrazine was very effective for improving the surface morphology and layer uniformity with fast layer formation, while it had no effect on the bandgap energy, $E_g$.

• Proceedings of the KIEE Conference
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• 2009.07a
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• pp.1248_1249
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• 2009

The $Sr_{0.7}Bi_{2.3}Nb_2O_9$(SBN) thin films are deposited on Pt-coated electrode(Pt/Ti/$SiO_2$/Si) using RF sputtering method with RF power and Ar/$O_2$ ratio. The size of grain of SBN thin films were increased with the increase of Ar/$O_2$ ratio and RF power respectively. Also, the crystallinity of SBN thin films were increased remarkably at RF power and Ar/$O_2$ ratio were 80[W] and 80/20, respectively.

• Proceedings of the KIEE Conference
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• 2008.10a
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• pp.121-122
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• 2008

The films of the vanadium tungsten oxide, $V_{1.85}W_{0.15}O_5$, were grown on Pt/Ti/$SiO_2$/Si substrate by RF sputtering method. It was found that film crystallinity, dielectric properties, and TCR properties were strongly dependent upon the thin film thickness. As increasing of $V_{1.85}W_{0.15}O_5$ thickness, the grain size, morphology, and crystallinity increased. The dielectric constants of $V_{1.85}W_{0.15}O_5$ thin films deposited at 150nm were 71.11, with a dielectric loss of 0.015, respectively. Also, The $V_{1.85}W_{0.15}O_5$ thin films showed good TCR values of -3.45%/K.