• Title/Summary/Keyword: Glow plasma

Search Result 147, Processing Time 0.072 seconds

Improvement of Adhesion Strength of DLC Films on Nitrided Layer Prepared by Linear Ion Source

  • Shin, Chang-Seouk;Kim, Wang-Ryeol;Park, Min-Seok;Jung, Uoo-Chang;Chung, Won-Sub
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2011.08a
    • /
    • pp.177-179
    • /
    • 2011
  • The purpose of this study is to enhance an adhesion between substrate and Diamond-like Carbon (DLC) film. DLC has many outstanding properties such as low friction, high wear resistance and corrosion resistance. However, it is difficult to achieve enough adhesion because of weak bonding between DLC film and the substrate. For improvement adhesion, a layer between DLC film and the substrate was prepared by dual post plasma. DLC film was deposited on nitrided layer by linear ion source. The composed compound layer between substrate and DLC film was investigated by Glow Discharge Spectrometer (GDS) and Scanning Electron Microscope (SEM). The synthesized bonding structure of DLC film was analyzed using a micro raman spectrometer. Mechanical properties were measured by nano-indentation. In order to clarify the mechanism for improvement in adhesive strength, it was observed by scratch test.

  • PDF

Analysis and improvement on the Reliability of Plasma Display Panel

  • Lee, Ho-Jun;Jang, Jin-Ho;Kang, Kyoung-Il;Kim, Dong-Hyun;Park, Chung-Hoo;Kim, Jae-Sung;Jeon, Woo-Gon
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2009.10a
    • /
    • pp.95-96
    • /
    • 2009
  • It is analyzed how the Plasma - MgO surface interaction, driving waveform and their inter-relation can cause misfiring. Developing of glow discharge mode during the ramp reset due to lack of priming particles was suggested as one of the important misfiring sources. It is also shown that simple modification of reset waveform can considerably reduce misfiring probability.

  • PDF

Inductively Coupled Plasma discharge characteristic of Ne, Ar, Kr mixed gas (유도결합형 플라즈마에서의 Ne, Ar, Kr 혼합가스 방전특성)

  • Her, In-Sung;Choi, Yong-Sung;Lee, Chong-Chan;Park, Dae-Hee
    • Proceedings of the KIEE Conference
    • /
    • 2004.11a
    • /
    • pp.306-309
    • /
    • 2004
  • Recently, the environmental problem has received considerable attention. so, many lamps have been developing for environmental requirement and energy efficiency. also, at glow discharge lamp researchers try to reduce energy spending that is power saving lamp. this kind requirement agree with strong points of electrodeless fluorescent lamp has received to now lighting sauce. At low pressure as mTorr I.C.P make high density plasma easily, is good to maintain discharge, has high ionization and does not have failing lighting and losing ability of electron radiation by oxidation and volatilization of electrodes, because this tape does not have electrodes. This point of I.C.P can use at electrodeless fluorescent lamp in this study ICP display elements and Ar, Ne, Kr are researched for optical characteristic. each gas is looked into optical characteristic, also mixed gases is experiment for optical characteristic.

  • PDF

Solid State Sintering of Micrometric and Nanometric WC-Co Powders

  • Escobar, J.A.;Campo, F.A.;Serrano, C.H.
    • Proceedings of the Korean Powder Metallurgy Institute Conference
    • /
    • 2006.09a
    • /
    • pp.350-351
    • /
    • 2006
  • A solid stage sinterizacion model of the WC-Co is applied on this work. These results are compaired with the experimental data obtained for nanometric and micrometric sinter powder in an electric furnace and micrometric in a plasma reactor (using Abnormal Glow Discharge AGD). The correlations obtained allow the prediction of the sintering behavior in AGD for nanometric powder. The activation of the solid state sintering is shown with the decraease of the WC size and the use of AGD

  • PDF

Bidirectional Pulse Power Supply for Dielectric Barrier Discharge (유전체 장벽 방전을 위한 양방향 펄스 전원장치)

  • Shin, Wan-Ho;Hong, Won-Seok;Jeoung, Hwan-Myoung;Choi, Jae-Ho
    • Proceedings of the KIEE Conference
    • /
    • 2005.07b
    • /
    • pp.1521-1523
    • /
    • 2005
  • High voltage plasma power supply was adopted to control polluted gases and an ozone generation. Bidirectional pulse power supply consisted of power semiconductor switch devices, a high voltage transformer, and a control board adapted switching method. Plasma power supply with sinusoidal bidirectional pulse, which has output voltage range of 0-20kV and output frequency range of 1kHz-20kHz, is realized. Using proposed system, pulsed high voltage/high frequency discharges were tested in a DBD(dielectric barrier discharge) reactor, and the spatial distribution of a glow discharge was observed. The system showed stable operational characteristics, even though the voltage and the frequency increased. Above features were verified by experiments.

  • PDF

Preparation of MgO Protective Layer for AC PDP by Unbalanced Magnetron Sputtering (불평형 마그네트론 스파터링에 의한 AC PDP의 MgO 보호층 형성에 관한 연구)

  • Ko, Kwang-Sic;Kim, Young-Kee;Park, Jung-Tae;Kim, Eun-Chin;Cho, Jung-Soo;Park, Chung-Hoo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2000.05b
    • /
    • pp.142-145
    • /
    • 2000
  • The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the dc bias voltage of -10V showed lower discharge voltage and lower erosion rate by ion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardment during deposition process.

  • PDF

A Novel discharging MEMS device & glow discharge properties (미소간극을 갖는 MEMS 방전 소자 제작 및 특성 연구)

  • Kim, Joo-Hwan;Moon, Hyoung-Sik;Kim, Young-Min
    • Proceedings of the KIEE Conference
    • /
    • 2004.11a
    • /
    • pp.46-48
    • /
    • 2004
  • A micro-scale discharge device has been fabricated using MEMS technology and failure mechanisms during DC discharge are investigated for the microstructure. The failure of sustaining the plasma is mainly caused by either open or short of the micro-electrodes, both resulting from the sputtered metal atoms during the DC discharge. The glow discharge lifetime of the microstructures is found to depend on bias circuit scheme as well as the electrode structure. Based on the understanding of the failure mechanism, a novel microstructure is suggested to improve discharge lifetime and the longer lifetime is experimentally demonstrated. In addition to the failure mechanism, an electric breakdown between two electrodes with microns gap are studied using micromachined metal structures. The electrode gap is able to be accurately controlled by thickness of a sacrificial layer and the electric breakdown was measured while varying the gap from $2{\mu}m$ to $20{\mu}m$. The electric breakdown behavior was found to highly depend on the electrode material, which was not considered in Paschen's law.

  • PDF

Development of a Microplasma Source under Atmospheric Pressure using an External Ballast Capacitor (방전에너지 제어용 외부 커패시터를 이용한 대기압 마이크로 플라즈마 소스 개발)

  • Ha, Chang-Seung;Lee, Je-Hyun;Son, Eui-Jeong;Park, Cha-Soo;Lee, Ho-Jun
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
    • /
    • v.27 no.6
    • /
    • pp.31-38
    • /
    • 2013
  • A pulse driven atmospheric plasma jet controlled by external ballast capacitor is developed. Unlike the most commonly use DBD sources, the proposed device utilizes bare metal electrode. The discharge energy per pulse can precisely be determined by changing voltage and capacitance of the ballast capacitor. It is shown that the device can provide wide range of plasma, from stable glow mode to near arc state. Current-voltage waveforms, optical emission spectra and discharge images are investigated as a function of an injection energy. The OES shows that He and oxygen lines are increased as a function of the external ballast capacitor. Ozone and rotational temperature have similar tendency with a power consumption. The feeding gas is He and the applied DC voltage is from 400V to 800V when the gap distance is $500{\mu}m$.

Measurement of Ion Energy Distribution using QMS & Ionization Enhancement by usign Magnetic Field in Triod BARE (자장을 이용한 이온화율 증대형 삼극형 BARE에서 이온화율의 증대경향과 QMS를 이용한 이온의 에너지 분포 측정)

  • 김익현;주정훈;한봉희
    • Journal of the Korean institute of surface engineering
    • /
    • v.24 no.3
    • /
    • pp.119-124
    • /
    • 1991
  • Recently, the trend of research in hard coating is concentrate on developing the process of ionization rate under low operating pressure, to get the thin film with high adhesion and dense microstructures. In this study ionization rate enhancement type PVD process using permanent magnet is developed, which enhances the ionization rate by confining the plasma suppressing the wall loss of electron. By the result to investigate the characteristic of glow discharge, the ionization rate of this process is enhanced about twice as high as that of triod BARE process (about 26%), and more dense TiN microstructures are obtained in this process. Cylindrical ion energy analyzer is made and attached in front of a quadrupole mass filter for the analysis of the energy distribution of reactive gas and activated gas ions from the plasma zone. To analyze the operation mechanism of ion energy analyzer, computer simulation is performed by calculation the electric field environment using finite element method. By these analyses of ion energy distribution of outcoming ions from the plasma zone, it is found that magnetic field enhances ion kinetic energy as well as ionization rate. The other results of this study is that the foundation of feed-back system is constructed, which automatically control the partial pressure of reactive gas. In can be possible by recording the data of mass spectrum and ion energy analysis using A-D converter.

  • PDF

A Study on Adhesive Properties of Cellulose Triacetate Film by Argon Low Temperature Plasma Treatment (아르곤 저온 플라즈마 처리에 의한 CTA 필름의 접착성 연구)

  • Koo Kang;Park Young Mi
    • Textile Coloration and Finishing
    • /
    • v.16 no.5
    • /
    • pp.28-34
    • /
    • 2004
  • The polarizing film application exploits the unique physicochemical properties between PVA(Poly vinyl alcohol) film and CTA(Cellulose triacetate) film. However, hardly any research was aimed at improving the adhesion characteristics of the CTA film by radio frequency(RF) plasma treatment at argon(Ar) gaseous state. In this report, we deal with surface treatment technology for protective CTA film developed specifically for high adhesion applications. After Ar plasma, surface of the films is analyzed by atomic force microscopy(AFM), roughness parameter and peel strength. Furthermore, the wetting properties of the CTA film were studied by contact angle analysis. Results obtained for CTA films treated with a glow discharge showed that this technique is sensitive to newly created physical functions. The roughness and peel strength value increased with an increase in treatment time for initial treatment, but showed decreasing trend for continuous treatment time. The result of contact angle measurement refer that the hydrophilicity of surface was increased. AFM studies indicated that no considerable change of surface morphology occurred up to 3 minutes of treatment time, but a considerable uneven of surface structure resulted from treating time after 5 minutes.