• Title/Summary/Keyword: Gi-saeng

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A study on 'Keo-Bu-Saeng-Gi' (거부생기(去腐生肌)에 대한 고찰(考察))

  • Seong, Eun-Jin;Kim, Hwan-Yeong;Choi, Byeong-Seon;Lee, Ho-Seop;Yu, Hyeon-Ju;Park, Seon-Gyu;Choe, Jae-Hwan;Lee, Yun-Gyeong;Jo, Eun-Hee;Park, Min-Cheol
    • The Journal of Korean Medicine Ophthalmology and Otolaryngology and Dermatology
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    • v.22 no.3
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    • pp.122-131
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    • 2009
  • Background and Objective : Keo-Bu-Saeng-Gi(去腐生肌) is the word meaning wound healing process of the skin disease. This study introduces the theory of Keo-Bu-Saeng-Gi that can be used for not only skin disease but also for rejuvenation, beauty care. Methods : We searched oriental literatures and reports related with Keo-Bu-Saeng-Gi(去腐生肌). Result and Conclusions : Many oriental literatures refered to Keo-Bu-Saeng-Gi(去腐生肌) as a wound healing mechanism of the skin disease. Wound healing is very important for skin disease and rejuvenation. We can use this theory of Keo-Bu-Saeng-Gi(去腐生肌) for skin care.

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THE EFFECT OF PROCESS CONDITIONS ON THE PHYSICAL PROPERTIES OF SILVER FILMS PREPARED BY USING SPUTTERING ON POLYESTER SUBSTRATE

  • Hoang, Tae-Su;Ri, Eui-Jae
    • Journal of the Korean institute of surface engineering
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    • v.32 no.3
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    • pp.401-405
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    • 1999
  • Reflective silver films with high quality were prepared on polyester substrate by using sputter deposit on techniques. Best reflectivity thin films of silver were produced with process parameters of $10^{-6}$ Torr as base pressure, 50 W as R.F. power, 5 mTorr as working pressure, and 10 sccm as Ar flow rate. Being deposited with an R.F. power of 50 W, Ag films revealed the highest 96.3 % reflectance as illuminated with a light of 700 nm wavelength. The adhesion of sample films showed as high as 14 to $20{\;}kg/\textrm{cm}^2$, which is suitable for industrial purposes. Their film crystallinity and orientation resulted in the planes of (111) and (200) for the growth with a preferred orientation of <111>, in general. The cross-sections of thin film specimens showed columnar structures. It is noted that columns became coarsened and less dense as R.F. power increased, resulting in a low reflectivity for the product film.

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THE REFLECTANCE AND ADHESION OF SILVER FILMS PREPARED BY USING E-BEAM EVAPORATION ON POLYESTER SUBSTRATE

  • Ri, Eui-Jae;Hoang, Tae-Su
    • Journal of the Korean institute of surface engineering
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    • v.32 no.3
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    • pp.406-409
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    • 1999
  • Thin films of silver with high reflectance of 95% and above were fabricated successfully on polyester substrate by using e-beam evaporation processes. The optimum process condition was investigated by varying the current values applied while keeping the substrate temperature at room temperature by circulating the cooling water around it during deposition. Thin films of silver deposited with 30 mA as current revealed the highest reflectance of 96.4%, while being illuminated with a light of 700nm wave-length. But their adhesion showed unsatisfactory results. Though the films showed a condensation type in the cross-sectional views, they revealed crystallinity in the planes of (111) and (200) and growth orientation in <100> direction.

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THE EFFECT OF AN APPLIED BIAS UPON THE REFLECTANCE AND ADHESION OF SILVER FILMS BEING SPUTTER-DEPOSITED ON POLYESTER SUBSTRATE

  • Ri, Eui-Jae;Hoang, Tae-Su
    • Journal of the Korean institute of surface engineering
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    • v.32 no.3
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    • pp.257-264
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    • 1999
  • Thin reflective films are synthesized by using PVD methods with a bright metal of Al or Ag. For purposes of improving the reflectance and adhesion of such films particularly, substrate bias was applied during sputtering (namely, ion-plating) to enhance the deposition process with higher energy. And we succeeded in fabricating a quality silver film which possesses an adhesion of $85{\;}Kg/\textrm{cm}^2$ and a high reflectivity of more than 96%. Both of reflectivity and adhesion are better in case of bias sputtering as controlled than nonbias sputtering, particularly the bias of 50-100 V showed most effective. The microstructures of sample films were examined by using various equipments and the XRD spectrum in particular showed that <111> direction is the preferred growth orientation.

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