• 제목/요약/키워드: GaInP-AlGaInP

검색결과 269건 처리시간 0.034초

Ridge Formation by Dry-Etching of Pd and AlGaN/GaN Superlattice for the Fabrication of GaN Blue Laser Diodes

  • 김재관;이동민;박민주;황성주;이성남;곽준섭;이지면
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.391-392
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    • 2012
  • In these days, the desire for the precise and tiny displays in mobile application has been increased strongly. Currently, laser displays ranging from large-size laser TV to mobile projectors, are commercially available or due to appear on the market [1]. In order to achieve a mobile projectors, the semiconductor laser diodes should be used as a laser source due to their size and weight. In this presentation, the continuous etch characteristics of Pd and AlGaN/GaN superlattice for the fabrication of blue laser diodes were investigated by using inductively coupled $CHF_3$ and $Cl_2$ -based plasma. The GaN laser diode samples were grown on the sapphire (0001) substrate using a metal organic chemical vapor deposition system. A Si-doped GaN layer was grown on the substrate, followed by growth of LD structures, including the active layers of InGaN/GaN quantum well and barriers layer, as shown in other literature [2], and the palladium was used as a p-type ohmic contact metal. The etch rate of AlGaN/GaN superlattice (2.5/2.5 nm for 100 periods) and n-GaN by using $Cl_2$ (90%)/Ar (10%) and $Cl_2$ (50%)/$CHF_3$ (50%) plasma chemistry, respectively. While when the $Cl_2$/Ar plasma were used, the etch rate of AlGaN/GaN superlattice shows a similar etch rate as that of n-GaN, the $Cl_2/CHF_3$ plasma shows decreased etch rate, compared with that of $Cl_2$/Ar plasma, especially for AlGaN/GaN superlattice. Furthermore, it was also found that the Pd which is deposited on top of the superlattice couldn't be etched with $Cl_2$/Ar plasma. It was indicating that the etching step should be separated into 2 steps for the Pd etching and the superlattice etching, respectively. The etched surface of stacked Pd/superlattice as a result of 2-step etching process including Pd etching ($Cl_2/CHF_3$) and SLs ($Cl_2$/Ar) etching, respectively. EDX results shows that the etched surface is a GaN waveguide free from the Al, indicating the SLs were fully removed by etching. Furthermore, the optical and electrical properties will be also investigated in this presentation. In summary, Pd/AlGaN/GaN SLs were successfully etched exploiting noble 2-step etching processes.

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단일양자 우물구조로 된 InGaAs/InAlAs의 밴드간 공명 터널링 다이오드에 관한 연구 (InGaAs/InAIAs resonant interband tunneling diodes(RITDs) with single quantum well structure)

  • 김성진;박영석;이철진;성영권
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1456-1458
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    • 1996
  • In resonant tunneling diodes with the quantum well structure showing the negative differential resistance (NDR), it is essential to increase both the peak-to-valley current ratio (PVCR) and the peak current density ($J_p$) for the accurate switching operation and the high output of the device. In this work, a resonant interband tunneling diode (RITD) with single quantum well structure, which is composed of $In_{0.53}Ga_{0.47}As/ln_{0.52}Al_{0.48}As$ heterojunction on the InP substrate, is suggested to improve the PVCR and $J_p$ through the narrowed tunnel barriers. As the result, the measured I-V curves showed the PVCR over 60.

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GaAsAl 레이저 자극이 흰쥐의 압통역치에 미치는 영향 (Effects of GaAsAl Laser on the Pressure Pain Threshold in Rats)

  • 송영화;이영구;임종수
    • 대한물리치료과학회지
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    • 제7권2호
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    • pp.533-543
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    • 2000
  • This study was designed to evaluate the analgesic effect of low power GaAsAl laser on the pain threshold of mechanical stimulation using different treatment points, acupuncture point (zusanli) and non-acupuncture points(back). Furthermore, we investigated the analgesic effect of low power GaAsAl laser using the different duration and intensity of laser in mechanical stimulation induced pain behavior. The results were summarized as follows: 1. The threshold of mechanical stimulation was significantly increased by GaAsAl laser stimulation into zusanli point after 15 and 30 min after laser stimulation(P<05). However, the laser stimulation into non-acupoint did not affect the pain threshold of mechanical stimulation. with dose dependent manner. 2. In order to investigate the analgesic effects of BV depending upon different intensities of laser stimulation, the experimental animals were divided into three groups: 3 mW treated group, 6 mW treated group and 10 mW treated group. The low power GaAsAl laser stimulation was applied into zusanli acupoint for 30 min with different intensity of laser stimulation. Six and ten mW of laser stimulation significantly increased the pain threshold of mechanical stimulation at 15 min after laser stimulation as compared to that of control group(P<.05). Moreover, the analgesic effect of 10 mW laser stimulation was maintained for 30 min after laser stimulation (P<.05). 3. Finally, we tested the analgesic effect of 10 mW laser stimulation using different duration such as 10 min, 30 min or 1 hr after application of mechanical stimulation. In 30 min treatment group, the pain threshold of mechanical stimulation was increased at 15min and 30min after laser stimulation(P<.05). However, laser stimulation for 60 min dramatically increased the pain threshold of mechanical stimulation at 0 min after laser stimulation and the analgesic effect of laser stimulation was observed until 1 hr after laser stimulation. In conclusion, these data apparently demonstrate that low power GaAsAl laser has analgesic effect on mechanical induced pain model in rats. In addition, the treated point, intensity and duration of laser stimulation should be concerned before clinical application for pain management purpose.

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p형 InGaAs-InAlAs 결합양자우물을 이용한 흡수계수스펙트럼의 broadening (Broadening of absorption spectrum in a p-type InGaAs-InAlAs coupled Quantum well)

  • 김경환;김성준
    • 전자공학회논문지D
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    • 제34D권3호
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    • pp.34-40
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    • 1997
  • Intervalence subband absroption of normally incident infrared radiation in p-type InGaAs-InAlAs coupled quantum well (CQW) is theoretically investigated by the multiband effective mass formalism. By solving a 4*4 luttinger-kohn hamitonian, we calculate valence subband structures, intervalence subband transition matrix elements, and absorption coefficient spectrum in the CQW which consists of a wider well, a thinner well and a barreir between them. Using the flexible design parameters given to the valence band CQW structure, we show that the absorption coefficient profile can be tailored. For a carefully designed CQW, theabsorption coefficient cn be made to maintain a large value over a wider wavelength range of incident infrared radiation compared with that shown in intersubband absorption in usual single quantum well.

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GaAs 기반의 텐덤형 태양전지 연구

  • 전민현
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.2-2
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    • 2010
  • 텐덤형 태양전지는 다양한 에너지 대역을 동시에 흡수할 수 있도록 제작할 수 있어 단일접합 태양전지에 비해 높은 에너지변환효율을 기대할 수 있다. 본 연구에서는 GaAs를 기반으로 양자점 혹은 양자우물 구조를 이용한 고효율 텐덤형 태양전지를 설계하고, 완충층 및 활성층의 특성을 분석하였다. 분자선 단결정 성장 장비를 이용하여 GaAs 기판 위에 메타모픽 (metamorphic)성장법을 이용하여 convex, linear, concave 형태로 조성을 변화시켜 $In_xAl_1-_xAs$ 경사형 완충층을 성장한 후 그 특성을 비교하였다. 또한, 최적화된 경사형 완충층 위에 1.1 eV와 1.3 eV의 에너지 대역을 각각 흡수할 수 있는 적층 (5, 10, 15 층)된 InAs 양자점 구조 또는 InGaAs 양자우물구조를 삽입하여 p-n 접합을 성장하였다. 그리고 GaAs/AlGaAs층을 이용한 터널접합에서는 GaAs층의 두께 (20, 30, 50 nm)에 따른 터널링 효과를 평가하였다. 그 결과, 경사형 완충층을 통해 조성 변화로 인한 결함을 최소화하여 다양하게 조성 변화가 가능한 고품위의 구조를 선택적으로 성장할 수 있었으며, 적층의 양자점 구조 및 양자우물 구조를 이용해 고효율 텐덤형 태양전지의 구현 가능성을 확인하였다.

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다층 성장한 InAs/InAlGaAs 양자점의 광학적 특성 (Optical Characteristics of Multi-Stacked InAs/InAlGaAs Quantum Dots)

  • 오재원;권세라;류미이;조병구;김진수
    • 한국진공학회지
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    • 제20권6호
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    • pp.442-448
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    • 2011
  • 자발형성법으로 InP (001) 기판에 성장한 InAs/InAlGaAs 양자점(QDs, quantum dots)의 광학적 특성을 PL (photoluminescence)과 TRPL (time-resolved PL)을 이용하여 분석하였다. InAs 양자점 시료는 single layer InAs/InAlGaAs QDs (QD1)과 7-stacked InAs/InAlGaAs QDs (QD2)를 사용하였다. 저온(10 K)에서 QD1과 QD2 모두 1,320 nm에서 PL 피크가 나타났으며, 온도를 300 K까지 증가하였을 때 각각 178 nm와 264 nm의 적색편이(red-shift)를 보였다. QD1의 PL 소멸시간은 PL 피크인 1,320 nm에서 1.49 ns이고, PL 피크를 중심으로 장파장과 단파장으로 이동하면서 점차 짧아졌다. 그러나 QD2의 PL 소멸시간은 발광파장이 1,130 nm에서 1,600 nm까지 증가할 때 1.83 ns에서 1.22 ns로 점진적으로 짧아졌다. 이러한 QD2의 PL과 TRPL 결과는 평균 양자점의 크기가 InAs/InAlGaAs 층이 증가함에 따라 점차 증가하기 때문으로 single layer인 QD1에 비해 양자점 크기의 변화가 더 크기 때문으로 설명된다.

저압 유기금속 화학증착법을 이용한 InAIAs 에피층과 InGaAs/InAIAs 양자 우물 구조의 성장과 분석 (Growth and characterizations of INAlAs epilayers and InGaAs/INAlAs quantum well structures by low pressure metalorganic chemical vapor deposition)

  • 유경란;문영부;이태완;윤의준
    • 한국진공학회지
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    • 제7권4호
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    • pp.328-333
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    • 1998
  • 저압 유기금속 화학증착법을 이용하여 (001) InP 기판 위에 격자 일치된 InAlAs 에 피층 성장 결과 620~$700^{\circ}C$범위에서 성장 온도가 증가할수록 산소 유입량의 감소 때문으로 생각되는 광학적 성질의 향상이 관찰되었으나 $750^{\circ}C$이상의 고온에서는 InP완충층의 열화에 의한 결정성의 감소가 발견되었다. 또한, AsH3의 유량이 증가됨에 따라 성장된 InAlAs층의 Al함유량이 증가하는 현상이 관찰되었고, 이는 Al-As와 In-As의 bond strength 차이로 설 명하였다. InGaAs/InAlAs 단일 양자우물구조에서 측정된 우물두께에 따른 photoluminescence peak energy는 계산 값과 잘 일치하였고, high resolution x-ray diffraction 측정을 통하여 뚜렷한 satellite peak와 fine thickness fringe들이 관찰되는 우수 한 계면특성을 가지는 다중 양자우물구조가 성장됨을 확인하였다.

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Influence of Emitter Width on the Performance of 975-nm (In,Ga)(As,P)/(Al,Ga)As High-power Laser Diodes

  • Yang, Jung-Tack;Kim, Younghyun;Pournoury, Marzieh;Lee, Jae-Bong;Bang, Dong-Soo;Kim, Tae-Kyung;Choi, Woo-Young
    • Current Optics and Photonics
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    • 제3권5호
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    • pp.445-450
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    • 2019
  • The influence of high-power laser diode (HPLD) emitter width on the device performance is investigated for 975-nm (In,Ga)(As,P)/(Al,Ga)As broad-area HPLDs, using self-consistent electro-thermal-optical simulation. To guarantee the simulation's accuracy, simulated results are matched with the measured results for a sample HPLD with fitting parameters. The influences of HPLD emitter width on temperature distribution, output power, and the beam product parameter (BPP) are analyzed for three different emitter widths of 50, 70, and $90{\mu}m$. It is found that a device with smaller emitter width exhibits both thermal rollover and thermal blooming at lower output power, but smaller BPP.

집광에 의한 GaAs/AlGaAs태양전지의 출력 증대 연구 (A Study on the Output Power Enhancement of GaAs/AlGaAs Solar Cell using Concentration Method)

  • 이동호;김영환;송진동;김성일
    • 신재생에너지
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    • 제5권3호
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    • pp.26-31
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    • 2009
  • Using MBE growth method, GaAs/AlGaAs solar cell structure was grown. Deposited electrodes are Au/Ni/Ge for n-type and Au/Pt/Ti for p-type electrodes were deposited by E-beam evaporator. Indoor light concentrators were devised and fabricated in order to concentrate artificial solar rays. Also mirror and prism and Fresnel lens concentration system with solar simulator were devised and fabricated. Results of solar cell characteristics were measured with shutting system which can control the amount of light. Maximum power density was 2.13 W/$cm^2$ and maximum concentration was 124 sun, when mirror with Fresnel lens was used at $7854\;mm^2$ of shutter hole.

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MBE 성장온도에 따른 GaAs 및 AlGaAs의 전기광학적 특성 (Growth and characterization of GaAs and AlGaAs with MBE growth temperature)

  • Seung Woong Lee;Hoon Young Cho;Eun Kyu Kim;Suk-Ki Min;Jung Ho Park
    • 한국결정성장학회지
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    • 제4권1호
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    • pp.11-20
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    • 1994
  • 분자선에피택시(molecular beam epitaxy)법을 이용하여 GaAs 및 ALGaAs layer를 undoped 반절연(100) GaAs 기판위에 성장하였고, 최적의 성장온도와 성장된 시료에 대한 전기적 및 광학적 특성을 조사 하였다. Undoped GaAs층의 성장에 있어서는 측정결과로 부터 As/Ga의유속비가 약 20, 성장온도가 $570^{\circ}C$일때 12K에서의 Photoluminescence 반폭치(FWHM)가 1.14meV인 결정성이 좋은 시료가 얻어졌으며, p형으로서 carrier 농도가 $1.5{\times}10^{14}cm^{-3}$ 미만이고, Hall 이동도가 300K에서 $579cm^2/V-s$인 양질의 에피층이 얻어졌다. 또한 이들 시료에서는 ODLTS, DLTS측정으로 부터 2개의 hole형 깊은 주위만이 관측되었다. Undoped AlGaAs층의 성장에 있어서는 As/(Ga+Al)의 유속비가 20이고 $60^{\circ}C$의 성장온도에서 표면 morphology와 결정성이 좋은 시료를 성장할 수 있었으며, 0.17~0.85eV에서 8개의 깊은 준위가 관측되엇다. Si이 도핑된 AlGaAs 층의 경우, PL 스펙트럼으로 부터 Si의 도핑효과를 관측할 수 있었으며, Hall 측정으로부터 300K에서 $1.5{\times}10^{16}cm^{-3}$일 때 Hall 이동도가 $2547cm^2/V-s$인 시료를 얻을 수 있었다.

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