• Title/Summary/Keyword: Ga doped

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Controlled Ga-doped ZnO NWs Synthesized by PLD in Furnace (PLD in Furnace 장비에 의한 Ga-Doped ZnO 나노선 합성 제어)

  • Song, Yong-Won;Lee, Sang-Gyu;Chang, Seong-Pil;Son, Chang-Wan;Leem, Jae-Hyeon;Lee, Sang-Yeol
    • Proceedings of the KIEE Conference
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    • 2007.11a
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    • pp.112-113
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    • 2007
  • We synthesize ZnO nanowires (NWs) doped with 3 wt% Ga on sapphire substrate using a hot-walled pulsed laser deposition (PLD) system named PLD in Furnace. A proprietary target rotating system is employed in the furnace to ensure the homogeneity of the deposition. The kinetic energy of the laser-ablazed ZnO is controlled for the optimization of NW formation. The physical properties of the resultant NWs are presented.

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The Structural Investigation for the Enhancement of Electrical Conductivity in Ga-doped ZnO Targets

  • Yun, Sang-Won;Seo, Jong-Hyeon;Seong, Tae-Yeon;An, Jae-Pyeong;Gwon, -Hun;Lee, Geon-Bae
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.243.2-243.2
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    • 2011
  • ZnO materials with a wide band gap of approximately 3.3 eV has been used in transparent conducting oxides (TCO) due to exhibitinga high optical transmission, but its low conductivity acts as role of a limitation for conducting applications. Recently, Ga or Al-doped ZnO (GZO, AZO) becomes transparent conducting materials because of high optical transmission and excellent conductivity. However, the fundamental mechanism underlying the improvement of electrical conductivity of the GZO is still the subject of debate. In this study, we have fully investigated the reasons of high conductivity through the characterization of plane defects, crystal orientation, doping contents, crystal structure in Zn1-xGaxO (x=0, 3, 5.1, 5.6, 6.6 wt%). We manufactured Zn1-xGaxO by sintering ZnO and Ga2O3 powers, having a theoretical density of 99.9% and homogeneous Ga-dopant distribution in ZnO grains. The GZO containing 5.6 wt% Ga represents the highest electrical conductivity of $7.5{\times}10^{-4}{\Omega}{\cdot}m$. In particular, many twins and superlattices were induced by doping Ga in ZnO, revealed by X-ray diffraction measurements and TEM (transmission electron microscopy) observations. Twins developed in conventional ZnO crystal are generally formed at (110) and (112) planes, but we have observed the twins at (113) plane only, which is the first report in ZnO material. Interestingly, the superlattice structure was not observed at the grains in which twins are developed and the opposite case was true. This structural change in the GZO resulted in the difference of electrical conductivity. Enhancement of the conductivity was closely related to the extent of Ga ordering in the GZO lattice. Maximum conductivity was obtained at the GZO with a superlattice structure formed ideal ordering of Ga atoms.

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Cathode Luminescence Characteristics of $ZnGa_2O_4$ Phosphors with the doped molar ratio of Mn (Mn 첨가에 따른 $ZnGa_2O_4$ 형광체의 발광특성)

  • Hong, Beom-Joo;Lee, Seung-Kyu;Kwon, Sang-Jik;Kim, Kyung-Hwan;Park, Yong-Seo;Cho, Hyung-Wook
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.463-465
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    • 2005
  • The $ZnGa_2O_4$:Mn phosphor was synthesized through solid-state reactions at the various molar ratio of Mn from 0.002 % to 0.01 %. Structural and optical properties of the $ZnGa_2O_4$:Mn phosphor was investigated by using X-ray diffraction (XRD), and cathodoluminescence (CL) measurements. The XRD patterns show that the Mn-doped $ZnGa_2O_4$ has a (311) main peak and a spinel phase. Also the emission wavelength shifts from 420 to 510 nm in comparison with $ZnGa_2O_4$ when Mn is doped in $ZnGa_2O_4$. These results indicate that $ZnGa_2O_4$:Mn phosphors hold promise for potential applications in field-emission display devices with high brightness operating in green spectral regions.

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Preparation of Zn-Doped GaN Film by HVPE Method (HVPE법에 의한 Zn-Doped GaN 박막 제조)

  • Kim, Hyang Sook;Hwang, Jin Soo;Chong, Paul Joe
    • Journal of the Korean Chemical Society
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    • v.40 no.3
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    • pp.167-172
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    • 1996
  • For the preparation of single-crystalline GaN film, heteroepitaxial growth on a sapphire substrate was carried out by halide vapor phase epitaxy(HVPE) method. The resulting GaN films showed n-type conductivity. The insulator type GaN film was made by doping with Zn(acceptor dopant), which showed emission peaks around 2.64 and 2.43 eV. The result of this study indicates that GaN can be obtained in an epitaxial structure of MIS(metal-insulator-semiconductor) junction. The observed data are regarded as fundamental in developing GaN epitaxial films for light emitting devices of hetero-structure type.

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Characteristics of selective area growth of GaN/AlGaN double heterostructure grown by hydride vapor phase epitaxy on r-plane sapphire substrate (HVPE 방법에 의해 r-plane 사파이어 기판 위의 선택 성장된 GaN/AlGaN 이종 접합구조의 특성)

  • Hong, S.H.;Jeon, H.S.;Han, Y.H.;Kim, E.J.;Lee, A.R.;Kim, K.H.;Hwang, S.L.;Ha, H.;Ahn, H.S.;Yang, M.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.19 no.1
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    • pp.6-10
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    • 2009
  • In this paper, a selective area growth (SAG) of a GaN/AlGaN double heterostructure (DH) has been performed on r-plane sapphire substrate by using the mixed-source hydride vapor phase epitaxy (HVPE) with multi-sliding boat system. The SAG-GaN/AlGaN DH consists of GaN buffer layer, Te-doped AlGaN n-cladding layer, GaN active layer, Mg-doped AlGaN p-cladding layer, and Mg-doped GaN p-capping layer. The electroluminescence (EL) characteristics show an emission peak of wavelength, 439 nm with a full width at half maximum (FWHM) of approximately 0.64 eV at 20 mA. The I-V measurements show that the turn-on voltage of the SAG-GaN/AlGaN DH is 3.4 V at room temperature. We found that the mixed-source HVPE method with a multi-sliding boat system was one of promising growth methods for III-Nitride LEDs.

도핑 농도에 따른 GaN-doped ZnO 박막의 제조 및 특성 평가

  • Lee, Dong-Uk;Sim, Byeong-Cheol;Lee, Won-Jae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.142-142
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    • 2009
  • Zinc Oxide (ZnO)는 wurtzite 결정구조를 가지고 있으며, 밴드갭 에너지가 약 3.4eV인 산화물 반도체 이다. GaN가 도핑된 ZnO 박막을 Pulsed Laser Deposition (PLD) 법을 이용하여 사파이어 기판과 실리콘 기판에 각각 증착하였다. $500^{\circ}C$의 증착온도에서 1at%~10at%까지의 GaN 도핑농도에 따른 ZnO 박막의 결정성, 성분 분석을 비롯한 전기적 특성을 조사하였다. 첨가된 GaN의 농도에 따라 ZnO 박막의 결정성이 변화하였으며, 농도 변화에 상관없이 ZnO(002) 방향으로 성장함을 알 수 있었다. 또한 실리콘 기판에 증착한 GaN-doped ZnO 박막은 5at%에서 $9.3\;{\times}\;10-3{\Omega}cm$, 10at%에서 $9.2\;{\times}\;10-3{\Omega}cm$의 비저항 값을 가지며 각각 p-type 특성을 나타내었다.

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Doping and Annealing Effect on Luminescent Characteristics of $_2$ Phosphor Thin Films (ZnGa$_2$O$_4$형광박막의 발광특성에 미치는 도핑 및 어닐리의 효과)

  • 정영호;정승묵;김석범;김영진
    • Journal of the Korean Ceramic Society
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    • v.35 no.6
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    • pp.619-625
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    • 1998
  • Mn doped {{{{ {Zn {Ga }_{2 }O }_{4 } }} thin film phosphors were prepared on Si(100) wafers and ITO coated glass substrates by rf magnetron sputtering technique and the effects of the substrates dopant and the sputtering paramet-ers were analyzed, Changes of the oreintation were observed after annealine tratment. The grain size of {{{{ {Zn {Ga }_{2 }O }_{4 } }} : Mn thin film deposited on Si wafer was smaller than that on ITO/glass substrate which resulted in higher PL intensity. The PL spectra of Mn doped {{{{ {Zn {Ga }_{2 }O }_{4 } }} thin films showed sharp green luminescence spec-trum. According to CL spectrum it could be concluded that Mn ions acted as an actuator for green emission by substituting Zn atom sites.

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Effects on Optical Characteristics of GaN Polarity Controlled by Substrate

  • Kang, Sang-Won;Shim, Hyun-Wook;Lee, Dong-Yul;Han, Sang-Heon;Kim, Dong-Joon;Kim, Je-Won;Oh, Bang-Won;Kryliouk, Olga;Anderson, Timothy J.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.6 no.2
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    • pp.79-86
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    • 2006
  • N-polar, Ga-polar, and non-polar GaN was grown by MBE and MOVPE using various substrates and influence of polarity has been investigated. The GaN growth by MOVPE is along cplane (0001), c-plane (0001), and a-plane (11-20) direction on c-plane (0001), a-plane (11-20) and r-plane (1-102) sapphire substrate respectively. The polarity of the film has a strong influence on the morphology and the optical properties of PA-MBE grown As-doped GaN layers. Strong blue emission from As-doped GaN was observed only in the case of N-polarity (000-1) layers, which was attributed to the highest concentration of Ga dangling bonds for this polarity of a GaN surface.