• Title/Summary/Keyword: GDMS

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Analysis of dominant impurities in Cu and Ta films using SIMS and GDMS (SIMS와 GDMS를 이용한 구리와 탄탈 박막내의 주요불순물 분석)

  • ;Minoru Isshiki
    • Journal of the Korean Vacuum Society
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    • v.13 no.2
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    • pp.79-85
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    • 2004
  • Secondary ion mass spectrometry(SIMS) and glow discharge mass spectrometry(GDMS) were used to determine the impurity concentrations of hydrogen, carbon, and oxygen elements in the Cu and Ta films, and the results of SIMS and GDMS analysis were carefully considered. The Cu and Ta films were deposited on Si (100) substrates at zero substrate bias voltage and a substrate bias voltage of -50 V(Cu films) or -125 V(Ta films) using a non-mass separated ion beam deposition method. As a result of SIMS with Cs+ ion beam, in the case of the Cu and Ta films deposited without the substrate bias voltage, many strong peaks were observed, which is considered to be detected as a the cluster state such as CxHx, OxHx, CxOxHx. All the peaks of SIMS results could be interpreted by the combination of these dominant impurities. Moreover, it was confirmed that the quantitative results of GDMS analysis were accordant to the SIMS results.

Trace impurity analysis of Cu films using GDMS: concentration change of impurities by applying negative substrate bias voltage (글로우방전 질량분석법을 이용한 구리 박막내의 미량불순물 분석: 음의 기판 바이어스에 의한 불순물원소의 농도변화)

  • Lim Jae-Won;Isshiki Minoru
    • Journal of the Korean Vacuum Society
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    • v.14 no.1
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    • pp.17-23
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    • 2005
  • Glow discharge mass spectrometry(GDMS) was used to determine the impurity concentrations of the deposited Cu films and the 6N Cu target. Cu films were deposited on Si (100) substrates at zero substrate bias voltage and a substrate bias voltage of -50 V using a non-mass separated ion beam deposition method. Since do GDMS has a little difficulty to apply to thin films because of the accompanying non-conducting substrate, we have used an aluminum foil to cover the edge of the Cu film in order to make an electrical contact of the Cu film deposited on the non-conducting substrate. As a result, the Cu film deposited at the substrate bias voltage of -50 V showed lower impurity contents than the Cu film deposited without the substrate bias voltage although both the Cu films were contaminated during the deposition. It was found that the concentration change of each impurity in the Cu films by applying the negative substrate bias voltage is related to the difference in their ionization potentials. The purification effect by applying the negative substrate bias voltage might result from the following reasons: 1) Penning ionization and an ionization mechanism proposed in the present study, 2) difference in the kinetic energy of accelerated Cu+ ions toward the substrate with/without the negative substrate bias voltage.

Direct Anlysis of Impurities in Solides with Glow Discharge Mass Spectrometry

  • Ki Beom Lee;Dae Won Moon;Kwang Woo Lee
    • Bulletin of the Korean Chemical Society
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    • v.10 no.6
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    • pp.524-529
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    • 1989
  • A glow discharge mass spectrometric(GDMS) analytical method was developed for direct analysis of impurities in solids. Ions extracted from a glow discharge ion source with a sample as a cathode were analyzed by a quadrupole mass filter. Ion extractions were carried out through differentially-pumped orifices biased to positive and negative potentials. Operating parameters of the glow discharge source such as discharge current, orifice-to-cathode distance, energy analyzer setting and bias voltages have been optimized. The developed GDMS was applied to the analysis of KSS copper-base alloy standards certified by Korea Standards Research Institute(KSRI). In the analysis, the reproducibility and the detection limits were estimated to be about 2.5% RSD, and in the low ppm range, respectively.

Recyling and refining of molybdenum scraps by vacuum arc melting (진공(眞空) 아크 용해(溶解)에 의한 몰리브덴 스크랩의 재활용(再活用) 및 정련(精鍊))

  • Lee, Back-Kyu;Oh, Jung-Min;Lee, Seoung-Won;Kim, Sang-Bae;Lim, Jae-Won
    • Resources Recycling
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    • v.20 no.5
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    • pp.40-45
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    • 2011
  • We carried out to investigate the refining effect of molybdenum by Ar-H$_2$ vacuum arc melting(VAM) process for recycling Mo scrap. The purity of the Mo metals refined by VAM was evaluated using glow discharge mass spectromety(GDMS). From the result of GDMS, most impurities in the Mo metals except for W were removed by Ar-H$_2$ VAM down to a few mass ppm levels. The purity of the refined molybdenum scrap was improved up to 4N5(99.995%) from 3N(99.95%) of the initial Mo scrap. The amount of gaseous impurities such as C, N, and O in Mo scrap were decreased from 1290 ppm to 132 ppm. As a result, it is considered that a possibility of refining and cost-effective method for recycling Mo scrap by Ar-H$_2$ vacuum arc melting process was confirmed in this study.

Recycling and refining of tantalum scraps by electron beam melting (전자빔용해법(溶解法)에 의한 탄탈럼 스크랩의 재활용(再活用) 및 정련(精鍊))

  • Lee, Back-Kyu;Oh, Jung-Min;Choi, Good-Sun;Kim, Hyung-Seok;Lim, Jae-Won
    • Resources Recycling
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    • v.21 no.2
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    • pp.59-65
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    • 2012
  • The refining effect of tantalum by electron beam melting(EBM) process for recycling tantalum scraps was investigated in the study. The purity of the tantalum metals refined by EBM was evaluated using glow discharge mass spectrometry (GDMS). From the result of GDMS, most impurities in the tantalum metals were removed by EBM down to a few mass ppm levels. The purity of the refined tantalum scraps was improved up to 5N (99.9991%) from 4 N (99.996%) of the initial tantalum scraps. The amount of metallic impurities in the tantalum was decreased from 30 ppm to 8 ppm. In addition, the gaseous impurities in the tantalum were decreased from 470 ppm to 50 ppm. Therefore a possibility of refining method for recycling tantalum scraps by EBM process was confirmed in this study.

Analysis of multi-layered Surface with Glow Discharge-Mass Spectrometry (글로우방전 질량분석법을 이용한 다층박막의 표면 분석)

  • Pak, Yong-Nam;Lee, Gae-Ho;Kim, Hyo Jin
    • Analytical Science and Technology
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    • v.10 no.5
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    • pp.357-361
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    • 1997
  • A Griemm type Glow Discharge cell is attached to a commercial quadrapole based ICP-MS and used for the analysis of surface analysis. By employing 2.0mm diameter, mode and proper experimental conditions, several layers of few ${\mu}m$ thickness are analysed within 30 minutes. Multi-layers of Cu-Ni, Fe-Ni are analyzed with the resolution of 10nm by GDMS. Proper experimental conditions make a flat bottom crater shape and good resolution for multi-layer depth profile study.

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Preparation and Characterization of Pure Titanium Ingots Prepared by Electron Beam Melting (전자빔용해법에 의한 고순도 티타늄 잉고트의 제조 및 분석)

  • Kim, Won-Baek;Lee, Gang-In;Choe, Guk-Seon;Seo, Chang-Yeol;Yang, Dong-Hyo
    • Korean Journal of Materials Research
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    • v.7 no.7
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    • pp.608-617
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    • 1997
  • 전자빔 용해법에 의해 고순도 티타늄잉고트 및 버튼시편을 제조하였다. 이들 중 18개의 금속불순물을 GDMS(Glow Discharge Mass Spectrometry)로 그리고 탄소, 질소, 산소의 함량을 고온연소법으로 측정한 후 이들과 전기비저항, 경도와의 관계를 조사하였다. 99%와 99.6%스폰지를 용해한 경우 대부분의금속불순물들이 대폭 감소하는 큰 휘발 정련효과가 나타났으며 비금속불순물들의 경우는 장비의 진공상태에 따라 큰 영향을 받으며 정련효과를 기대할 수 없었다. 금속 불순물중 철은 가장 제거하기 어려운 원소로 밝혀졌으며 이는 원료 스폰기중에서 철이 주불순물이기 때문이며 추가적인 예비정련이 필요한 것으로 나타났다. 상온 및 액체질소온도에서의 전기비저항은 가스불순물의 량이 증가함에 따라 직선적으로 증가하였으며 이들의 저항비($\rho$$_{RT}$ /$\rho$$_{N2}$)는 가스불순물의 총량이 1,000ppm이하의 경우 불순물량이 감소함에 따라 급격하게 저하하였으며 이 이상인 경우 완만하게 감소하였다. 이들의 경도는 가스불순물의 량이 증가하였으며 산소당량의 평방근에 비례하는 것으로 나타났다.다.

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Preparation of Low-Oxygen Ingot by Repetitive Melting and Mo Metal Powder by Hydrogen Reduction from $MoO_3$ Powder (삼산화 몰리브덴 분말로부터 수소 환원에 의한 금속 분말 및 반복 용해에 의한 저산소 잉곳 제조)

  • Lee, Back-Kyu;Oh, Jung-Min;Kim, Hyung-Seok;Lim, Jae-Won
    • Particle and aerosol research
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    • v.9 no.1
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    • pp.31-36
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    • 2013
  • In this study, Mo metal powder was prepared by hydrogen reduction of Mo trioxides with different purity of 2N and 3N grades. We have obtained Mo metal powder with oxygen content of 1450 ppm by hydrogen reduction and subsequent heat treatment for degassing. Using the Mo metal powder, a low-oxygen Mo ingot was prepared by repetitive vacuum arc melting. The oxygen content of the obtained Mo ingot was less than 70 ppm after vacuum arc melting for 30 min. The purity of the Mo metal powder and the ingot was evaluated using glow discharge mass spectrometry. The purity of the respective Mo ingots was increased to 3N and 4N grades from the Mo powder of 2N and 3N grades after the repetitive vacuum arc melting. The low oxygen Mo ingot thus can be used as a raw material for sputtering targets.

An Exploratory Study on the Relationship between Decision Making Styles and Risk Attitudes : The Case of Korean Adults (의사결정스타일과 위험성향의 측정, 분포, 그리고 그 관계 : 한국인 표본을 대상으로)

  • Bae, Eunsung;Kim, Bumseok;Min, Jae H.
    • Journal of the Korean Operations Research and Management Science Society
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    • v.41 no.4
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    • pp.33-53
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    • 2016
  • We measure individuals' decision making styles and risk attitudes from a sample of Korean adults using the general decision making styles (GDMS) and the multiple price list design (MPLD), respectively. With the measurement results, we identify the distributions of the decision making styles and risk attitudes, and explore the relationship between them. Specifically, we conduct an exploratory experiment to find out some meaningful characteristics of the Korean adults in terms of their decision making styles and risk attitudes. The results of the experiment show that the distribution of the five decision making styles turns out to be different by the demographic characteristics of the sample. In addition, risk attitudes of the Korean people are quite distinct from those shown in the previous studies which were mostly conducted in the United States with the samples of college students. It is also shown that each of the five decision making styles has a different distribution of risk attitudes, which is statistically verified. The results of this study make a meaningful addition to the literature of this kind by providing the rationale for understanding the decision making styles and the risk attitudes of the Korean adults, which may serve as grounds for predicting the behaviors of the key individuals in various public and private sectors.

Effect of defects on lifetime of silicon electrodes and rings in plasma etcher (플라즈마 에쳐용 실리콘 전극과 링의 수명에 미치는 결함의 영향)

  • Eum, Jung-Hyun;Chae, Jung-Min;Pee, Jae-Hwan;Lee, Sung-Min;Choi, Kyoon;Kim, Sang-Jin;Hong, Tae-Sik;Hwang, Choong-Ho;Ahn, Hak-Joon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.20 no.2
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    • pp.101-105
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    • 2010
  • Silicon electrode and ring in a plasma etcher those are in contact with harsh plasma suffer from periodic heating and cooling during their lifetime. This causes the silicon components failure due to thermal stress remaining the persistent slip bands (PSBs) on their surfaces. The factors that determine the lifetime of silicon electrode and ring were discussed with respect to silicon ingot. The impurity level and the average defect concentration measured with glow discharge mass spectrometer (GDMS) and microwave photo-conductance decay (${\mu}$-PCD) were compared with the grade of silicon ingots those are divided to slip-free and slip-allowed ingot. Some silp-allowed samples showed planar defects along <110> direction on {001} surface. The role of these defects was suggested from the viewpoint of the lifetime of silicon components.