• Title/Summary/Keyword: GATE simulation

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A Self-Aligned Metal Gate MOSFET Structure Utilizing The Oxidation Rate Variation on The Impurity Concentration (불순물 농도에 따른 산화막 성장률의 차이를 이용한 자기 정렬된 금속게이트 MOSFET 구조)

  • 고요환;최진호;김충기
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.36 no.7
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    • pp.462-469
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    • 1987
  • A metal gate MOSFET with source/drain regions self-aligned to gate region is proposed. The proposed MOS transistor is fabricated by utilizing the higher oxidation rate of source/drain regions with high doping concentration when compared with channel region with moderate doping. The thick oxide on the source/drain regions reduces the gate and drain(source) overlap capacitance down to that of a self-aligned polysilicon gate device while allowing the use of a metal gate with much lower resistivity than the more commonly used polycrystalline silicon. A ring oscillator composed of 15 inverter stages has been computer simulated using SPICE. The results of the simulation show good agreement with experimental measurement confirming the fast switching speed of propesed MOSFET.

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Analysis of a Distributed Mixer Using Dual-gate MESFETSs (Dual-gate MESFET를 사용한 분포형 혼합기 해석에 관한 연구)

  • 김갑기;오양현;정성일;이종익
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.7 no.2
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    • pp.178-185
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    • 1996
  • In this paper, a theoretical analysis of a wide band distributed mixer using a dual-gate GaAs MESFET's(DGFET) is introduced. Based on low noise mixer mode(LNM) region modeling of DGFET, variation of g/sub m/ and conversion gain are presented versus bias. The distributed mixer is composed of drain and gate transmission line, m-derived image impedance matching circuits at each input and output port, and DGFET's. Through computer simulation, wide-band characteristics of designed distributed mixer are confirmed. And, it is certificated that LO/RF isolation between gate 1 and gate 2 is obtained more than 15dB.

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Fabrication and Characterization of Floating-Gate MOSFET with Multi-Gate and Channel Structures for CMOS Image Sensor Applications (다중 Gate 및 Channel 구조를 갖는 CMOS 영상 센서용 Floating-Gate MOSFET 소자의 제작 및 특성 평가)

  • Ju, Byeong-Gwon;Sin, Gyeong-Sik;Lee, Yeong-Seok;Baek, Gyeong-Gap;Lee, Yun-Hui;Park, Jeong-Ho
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.50 no.1
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    • pp.17-22
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    • 2001
  • The floating-gate MOSFETs were fabricated by employing 1.5 m n-well CMOS process and their optical-electrical properties were characterized for the application to CMOS image sensor system. Based on the simulation of energy band diagram and operating mechanism of parasitic BJT were proposed as solutions for the increase of photo-current value. In order to realize them, MOSFETs having multi-gate and channel structures were fabricated and 60% increase in photo-current was achieved through enlargement of depletion layer and parallel connection of parasitic BJTs by channel division.

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Computer Simulation Study of the Hydrostatic Transmission Applied to the Rack-Bar Type Sluice Gate (래크바형 수문권양기에 적용된 정유압장치의 컴퓨터 시뮬레이션에 의한 작동특성 연구)

  • Lee, S.R.
    • Transactions of The Korea Fluid Power Systems Society
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    • v.6 no.2
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    • pp.14-21
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    • 2009
  • The typical hydraulic hoisting system of the rack-bar type sluice gate is composed of a hydraulic supply unit using an uni-directional pump, a direction control valve, a hydraulic motor, a counter balance valve, and flow control valves. Here, the hydrostatic transmission is applied to the hoisting system of rack-bar type sluice gate to simplify the operation of gate such that the upward and downward direction of gate is simply controlled by the direction of pump rotation. The new hydraulic hoisting system is composed of a bi-directional pump, a hydraulic motor, two counter balance valves, two check valves, two pilot-operated check valves, two relief valves and a shuttle valve. The characteristics of a suggested system are analyzed by computer simulations.

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Design of Integrated a-Si:H Gate Driver Circuit with Low Noise for Mobile TFT-LCD

  • Lee, Yong-Hui;Park, Yong-Ju;Kwag, Jin-Oh;Kim, Hyung-Guel;Yi, Jun-Sin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.822-824
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    • 2007
  • This paper investigated a gate driver circuit with amorphous silicon for mobile TFT-LCD. In the conventional circuit, the fluctuation of the off-state voltage causes the fluctuation of gate line voltages in the panel and then image quality becomes worse. Newly designed gate driver circuit with dynamic switching inverter and carry out signal reduce the fluctuation of the off-state voltage because dynamic switching inverter is holding the off-state voltage and the delay of carry signal is reduced. The simulation results show that the proposed a-Si:H gate driver has low noise and high stability compared with the conventional one.

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Effects of Resistivity of Gate Line Material on TFT-LCD Pixel Operations (게이트 라인 물질의 저항률이 TFT-LCD 화소의 동작에 미치는 영향)

  • 이영삼;최종선
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.06a
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    • pp.321-324
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    • 1998
  • Pixel-Design Array Simulation Tool(PDAST) was used to profoundly the gate signal distortion and pixel changing capability, which are the most critical limiting factors for high-quality TFT-LCDs. Since PDAST can simulate the gate, data and pixel voltages of a certain pixel on TFT array at any time and at any location on an array, the effect of the resistivity of gate line material on the pixel operations can be effectively analyzed. The gate signal delay, pixel charging ratio, level-shift of the pixel voltage were simulated with varying the resis5tivity of the gate line material. The information obtained from this study could be utilized to design the larger area and finer image quality panel.

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A Study on the Structure of Polycrystalline Silicon Thin Film Transistor for Reducing Off-Current (OFF 전류의 감소를 위한 다결정 실리콘 박막 트랜지스터의 구조 연구)

  • Oh, Jeong-Min;Min, Byung-Hyuk;Han, Min-Koo
    • Proceedings of the KIEE Conference
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    • 1993.07b
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    • pp.1292-1294
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    • 1993
  • This paper proposes a new structure of polycrystalline silicon(poly-Si) thin film transistor(TFT) having a thick gate-oxide below the gate edge. The new structure is fabricated by the gate re-oxidation in wet ambient. It is shown that the thick gate-oxide below the gate edge is effective in reducing the leakage current and the gate-drain overlap capacitance. We have simulated this device by using the SSUPREM4 process simulator and the SPISCES-2B device simulator. As a simulation result it is found that the new structure provides a low tentage current less than 0.2 pA and achieves a on/off ratio as high as $5{\times}10^7$.

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Canal Operation Simulation of Middle Route Project

  • Fan, Jie
    • Proceedings of the Korea Water Resources Association Conference
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    • 2008.05a
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    • pp.26-32
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    • 2008
  • Middle Route Project, the largest water conveyance system in China delivers the water of Changjiang River to North China. In order to create canal operation simulation system, mathematical models are established based on the analysis of hydraulics about steady flow, unsteady flow, and check gate. By simulating the canal operation behavior, we improved the check gate control algorithm and predicted the change process of water surface and flow profile which is very valuable to actual canal operation.

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New Dynamic Logic Gate Design Method for Improved TFT Circuit Performance

  • Jeong, Ju-Young;Kim, Jae-Geun
    • Journal of Information Display
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    • v.6 no.1
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    • pp.17-21
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    • 2005
  • We explored a new way of designing dynamic logic gates with low temperature polysilicon thin film transistors to increase the speed. The proposed architecture of logic gates utilizes the structural advantage of smaller junction capacitance of thin film transistors. This method effectively blocks leakage of current through the thin film transistors. Furthermore, the number of transistors used in logic gates is reduced thereby reducing power consumption and chip area. Through HSPICE .simulation, it is confirmed that the circuit speed is also improved in all logic gates designed.

Size Scaling에 따른 Gate-All-Around Silicon Nanowire MOSFET의 특성 연구

  • Lee, Dae-Han;Jeong, U-Jin
    • Proceeding of EDISON Challenge
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    • 2014.03a
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    • pp.434-438
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    • 2014
  • CMOS의 최종형태로써 Gate-All-Around(GAA) Silicon Nanowire(NW)가 각광받고 있다. 이 논문에서 NW FET(Field Effect Transistor)의 채널 길이와 NW의 폭과 같은 size에 따른 특성변화를 실제 실험 data와 NW FET 특성분석 simulation을 이용해서 비교해보았다. MOSFET(Metal Oxide Semiconductor Field Effect Transistor)의 소형화에 따른 쇼트 채널 효과(short channel effect)에 의한 threshold voltage($V_{th}$), Drain Induced Barrier Lowering(DIBL), subthreshold swing(SS) 또한 비교하였다. 이에 더하여, 기존의 상용툴로 NW를 해석한 시뮬레이션 결과와도 비교해봄으로써 NW의 size scaling에 대한 EDISON NW 해석 simulation의 정확도를 파악해보았다.

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