• Title/Summary/Keyword: Free silicon

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A Numerical Study on Phonon Spectral Contributions to Thermal Conduction in Silicon-on-Insulator Transistor Using Electron-Phonon Interaction Model (전자-포논 상호작용 모델을 이용한 실리콘 박막 소자의 포논 평균자유행로 스펙트럼 열전도 기여도 수치적 연구)

  • Kang, Hyung-sun;Koh, Young Ha;Jin, Jae Sik
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.41 no.6
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    • pp.409-414
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    • 2017
  • The aim of this study is to understand the phonon transfer characteristics of a silicon thin film transistor. For this purpose, the Joule heating mechanism was considered through the electron-phonon interaction model whose validation has been done. The phonon transport characteristics were investigated in terms of phonon mean free path for the variations in the device power and silicon layer thickness from 41 nm to 177 nm. The results may be used for developing the thermal design strategy for achieving reliability and efficiency of the silicon-on-insulator (SOI) transistor, further, they will increase the understanding of heat conduction in SOI systems, which are very important in the semiconductor industry and the nano-fabrication technology.

Preparation and Optical Characterization of DBR/Host Dual Porous Silicon Containing DBR and Host Structures (DBR 다공성 실리콘과 Host 다공성 실리콘으로 이루어진 이중 다공성 실리콘의 제조와 광학적 특성)

  • Choi, Tae-Eun;Yang, Jinseok;Um, Sungyong;Jin, Sunghoon;Cho, Bomin;Cho, Sungdong;Sohn, Honglae
    • Journal of Integrative Natural Science
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    • v.3 no.2
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    • pp.78-83
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    • 2010
  • DBR/Host dual porous silicons containing DBR and host structure were prepared and their optical properties were characterized using Ocean Optics spectrometer. In this dual porous silicon, single porous silicon layer was used as host layer for possible biomolecule and drug materials and DBR porous silicon layer was used for signal transduction due to the recognition of molecules. Optical reflection spectrum of dual porous silicon displayed only DBR reflection but Fabry-Perot fringe pattern. DBR reflection band of dual porous silicon shifted to the shorter wavelength as the etching time of host layer increased. Cross-sectional FE-SEM image of dual porous silicon displayed a thickness of about 20 micrometer for DBR porous silicon layer. Developed etching technology could be useful to prepare DBR porous silicon which exhibited specific reflection resonance at the required wavelength and to provide an label-free biosensors and drug delivery materials.

Formation Mechanism of the Micro Precipitates Causing Oxidation Induced Stacking Faults in the Czochralski Silicon Crystal.

  • Kim, Young-K.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.1 no.1
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    • pp.66-73
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    • 1991
  • During the growth of macroscopically dislocation-free Czochralski silicon crystal, micro precipitates causing stacking faults in the silicon wafer during the oxidation are formed Thermal history the cryscausing acquire during the growth process is known to be a key factor determining the nucleation of this micro precipitates. In this article, various mechanisms suggested on the formation of microdefects in the silicon crystal are reviewed to secure the nucleation mechanism of the micro precipitates causing OSF whose pattern is normally ring or annular in CZ silicon crytal. B-defects which are known as vacancy clustering are considered to be the heterogeneous nucleation sites for the micro precipitates causing OSF in the CZ silicon crystals.

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Preparation and Characterization of Flexible Optical Composite Films Based on Bragg-Structured Interferometer

  • Um, Sungyong;Sohn, Honglae
    • Journal of Integrative Natural Science
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    • v.6 no.4
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    • pp.244-250
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    • 2013
  • Three types of functionalized flexible optical composite films based on Bragg structure porous silicon interferometer have been successfully fabricated by casting a toluene solution of polystyrene onto the free-standing porous silicon. The optical properties of composite films are measured. Surface functionalization of porous silicon is determined by FT-IR measurement. Reflectance and transparence properties of composite films are measured for the possible application of tunable optical filter and indicate that the transmission peak occurred at the identical location where the reflection peak appeared.

Simultaneous Detection Properties of Organic Vapor, Pressure Difference and Magnetic Field using a Rugate-structured Free-standing Porous Silicon Film (Rugate 구조를 갖는 자립형 다공성 실리콘 박막을 이용한 유기 증기, 압력차, 자기장의 동시 감응 특성)

  • Han, Seong-Beom;Lee, Ki Won
    • Journal of Sensor Science and Technology
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    • v.26 no.3
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    • pp.186-191
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    • 2017
  • In this study, we investigated the simultaneous detection properties of organic vapor, pressure difference, and magnetic field using a single rugate-structured free-standing porous silicon (RFPS) thin film. Both the wavelength and the intensity of the rugate peaks were changed in the reflectivity spectrum measured at the thin film surface while the organic vapor was exposed to the RFPS thin film. However, when the pressure difference and the magnetic field were exposed to the film, only the rugate peak intensity was changed. Therefore, it is possible to distinguish whether or not the organic vapor is detected by simultaneously changing the rugate peak wavelength and intensity. In addition, a method of distinguishing between the pressure difference and the magnetic field detection signal has been derived by rapidly modulating the direction of the magnetic field. This study shows that it is possible to simultaneously detect and distinguish various objects using a single RFPS thin film, and it is found that porous silicon can be utilized as a sensor sufficiently.

1-D photonic crystals of free-standing DBR PSi for sensing and drug delivery applications (비고정화 된 일차원 광결정의 DBR 다공성 실리콘을 이용한 센서와 Drug Delivery로의 응용)

  • Koh, Young-Dae;Kim, Ji-Hoon;Park, Jong-Sun;Kim, Sung-Gi;Kim, Dong-Su;Cho, Sung-Dong;Sohn, Hong-Lae
    • Journal of Sensor Science and Technology
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    • v.15 no.6
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    • pp.391-396
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    • 2006
  • Free-standing multilayer distributed Bragg reflectors (DBR) porous silicon dielectric mirrors, prepared by electrochemical etching of crystalline silicon using square wave currents are treated with polystyrene to produce flexible, stable composite materials in which the porous silicon matrix is covered with caffeine-impregnated polystyrene. Optically encoded DBR PSi/polystyrene composite films retain the optical reflectivity. Optical characteristics of DBR PSi/polystyrene composite films are stable and robust for 2 hrs in a pH=7 aqueous buffer solution. The appearance of caffeine and change of DBR peak were simultaneously measured by UV-vis spectrometer and Ocean optics 2000 spectrometer, respectively.

Classification of metals inducing filed aided lateral crystallization (FALC) of amorphous silicon

  • Jae-Bok Lee;Se-Youl Kwon;Duck-Kyun Choi
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.11 no.4
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    • pp.160-165
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    • 2001
  • The effects of various metals on Field Aided Lateral Crystallization (FALC) behaviors of amorphous silicon (a-Si) were investigated. Under an influence of electric field, metals such s Cu, Ni and Co were found to fasten the lateral crystallization toward a metal-free region, exhibiting a typical FALC behavior while the lateral crystallization of a-Si was not obvious for Pd. However, Au, Al and Cr did not induce the lateral crystallization of a-Si in metal-free region. Such phenomenological differences in various metals were studied in terms of dominant diffusing species (DDS) in the reaction between metal and Si. It was judged that the applied electric field enhanced the crystallization velocity by accelerating the diffusion of metal atoms since the occurrence of lateral crystallization would be strongly dependent on the diffusion of metal atoms than that of Si atoms. Therefore, it was concluded that he only metal-dominant diffusing species in the reaction between metal and Si results in the crystallization of a-Si in metal-free region.

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Free vibration analysis Silicon nanowires surrounded by elastic matrix by nonlocal finite element method

  • Uzun, Busra;Civalek, Omer
    • Advances in nano research
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    • v.7 no.2
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    • pp.99-108
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    • 2019
  • Higher-order theories are very important to investigate the mechanical properties and behaviors of nanoscale structures. In this study, a free vibration behavior of SiNW resting on elastic foundation is investigated via Eringen's nonlocal elasticity theory. Silicon Nanowire (SiNW) is modeled as simply supported both ends and clamped-free Euler-Bernoulli beam. Pasternak two-parameter elastic foundation model is used as foundation. Finite element formulation is obtained nonlocal Euler-Bernoulli beam theory. First, shape function of the Euler-Bernoulli beam is gained and then Galerkin weighted residual method is applied to the governing equations to obtain the stiffness and mass matrices including the foundation parameters and small scale parameter. Frequency values of SiNW is examined according to foundation and small scale parameters and the results are given by tables and graphs. The effects of small scale parameter, boundary conditions, foundation parameters on frequencies are investigated.

The Study on the Denuded Zone Formation of Czochralski-grown Single Crystal Silicon Wafer (I) (Czochralski 법으로 성장시킨 단결정 Silicon Wafer에서의 표면 무결함층(Denuded Zone) 형성에 관한 연구(I))

  • 김승현;양두영;김창은;이홍림
    • Journal of the Korean Ceramic Society
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    • v.28 no.6
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    • pp.495-501
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    • 1991
  • This study is intended to make defect-free region, denuded zone at the silicon wafer surface for semiconductor device substrates. In this experiment, initial oxygen concentration of starting material CZ-grown silicon wafer, various heat treatment combinations, denuding ambient and the amounts of oxygen reduction were measured, and then denuded zone (DZ) formation and depth were investigated. In Low/High anneal (DZ formation could be achieved), the optimum temperature for Low anneal was 700$^{\circ}C$∼750$^{\circ}C$. In case of High anneal, with the time increased, DZ depth was increased at 1000$^{\circ}C$, 1150$^{\circ}C$ respectively, but on the contrary, DZ depth was decreased at low temperature 900$^{\circ}C$. As well, out-diffusion time below 2 hours was unsuitable for effective Gettering technique even though the temperature was high, and DZ formation could be achieved when initial oxygen concentration was only above 14 ppm in silicon wafer.

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Fabrication of Macroporous Silicon Diaphragms (매크로기공을 갖는 다공질 실리콘 다이어프램의 제작)

  • Min, Nam-Ki;Ha, Dong-Sik;Jeong, Woo-Sik;Min, Suk-Ki
    • Proceedings of the KIEE Conference
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    • 1998.07d
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    • pp.1558-1560
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    • 1998
  • Macroporous silicon diaphragms 20 to $200{\mu}m$ thick have been formed on p-type silicon by anistropic etching in TMAH solution and then by electrochemical etching in HF-ethanol-water solution with an applied current. The pores have a pore diameter of $1.5{\sim}2{\mu}m$, with a depth of $20{\sim}30{\mu}m$ and are not interconnected, which are in sharp contrast to the porous silicon reported previouly for similarly doped p-Si. The fabrication of macroporous silicon and free-standing diaphragms is expected to offer new applications for microsensors, micro-machining, and separators.

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