• Title/Summary/Keyword: Focused Plasma

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Influences of degradation in MgO protective layer and phosphors on ion-induced secondary electron emission coefficient and static margins in alternating current plasma display panels

  • Jeong, H.S.;Lim, J.E.;Park, W.B.;Jung, K.B.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.518-521
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    • 2004
  • The degradation characteristics of MgO protective layer and phosphors have been investigated in terms of the ion-induced secondary electron emission coefficient ${\gamma}$ and static margin of discharge voltages, respectively, in this experiment. The ion-induced secondary electron emission coefficients ${\gamma}$ for the degraded MgO protective layer and phosphors have been studied by ${\gamma}$ -focused ion beam system. The energy of Ne+ ions used is from 80 eV to 200 eV in this experiment. The degraded MgO and phosphor layers are found to have higher ${\gamma}$ than that of normal ones without degradations or aged one. Also, the static margin of discharge voltages for test panels with degraded MgO protective layer and phosphors been found to be seriously decreased in comparison with those of normal ones without degradations.

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Effect of RF Bias on Electron Energy Distributions and Plasma Parameters in Inductively Coupled Plasma (유도 결합 플라즈마에서 플라즈마 변수와 전자 에너지 분포에 대한 극판 전력 인가의 영향)

  • Lee, Hyo-Chang;Chung, Chin-Wook
    • Journal of the Korean Vacuum Society
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    • v.21 no.3
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    • pp.121-129
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    • 2012
  • RF biased inductively coupled plasma (ICP) is widely used in semiconductor and display etch processes which are based on vacuum science. Up to now, researches on how rf-bias power affects have been focused on the controls of dc self-bias voltages. But, effect of RF bias on plasma parameters which give a crucial role in the processing result and device performance has been little studied. In this work, we studied the correlation between the RF bias and plasma parameters and the recent published results were included in this paper. Plasma density was changed with the RF bias power and this variation can be explained by simple global model. As the RF bias was applied to the ICP, increase in the electron temperature from the electron energy distribution was measured indicating electron heating. Plasma density uniformity was enhanced with the RF bias power. This study can be helpful for the control of the optimum discharge condition, as well as the basic understanding for correlation between the RF bias and plasma parameters.

Development of Multi Dielectric Barrier Discharge Plasma Reactor for Water Treatment (수처리용 다중 유전체 방벽 방전 플라즈마 반응기 개발)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Environmental Science International
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    • v.22 no.7
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    • pp.863-871
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    • 2013
  • Dielectric discharges are an emerging technique in environmental pollutant degradation, which that are characterized by the production of hydroxyl radicals as the primary degradation species. For practical application of the plasma reactor, reactor that can handle large amounts of water are needed. Plasma research to date has focused on small-scale water treatment. This study was carried out basic study for scale-up of a single DBD (dielectric barrier discharge) plasma reactor. The degradation of N, N-Dimethyl-4-nitrosoaniline (RNO, indicator of the generation of OH radical) was used as a performance indicator of multi-plasma reactor. The experiments is divided into two parts: design parameters [effect of distance of single plasma module (1~14 cm), arrangement of ground electrode (single and multi), rector number (1~5) and power number (1~5)]; operation parameter [effect of applied voltage (60~220 V), air flow rate (1~5 L/min), electric conductivity of solution ($1.4{\mu}S/cm$, deionized water)~18.8 mS/cm (addition of NaCl 10 g/L) and pH (5~9)]. Considering the electric stability of the plasma reactor, optimum spacing between the single plasma module was 2 cm. Multi discharge electrodes - single ground electrode array was selected. Combination of power 3-plasma module 5 was the optimal combination for maximum RNO degradation. The optimum 1st voltage and air flow rate for RNO degradation were 180 V and 4 L/min, respectively. The pH and conductivity of the solution was not influencing the RNO degradation.

The research of dependency between trigger condition and trigger geometry for triggered vacuum switch

  • Park, Ung-Hwa;Kim, Mu-Sang;Son, Yun-Gyu;Lee, Byeong-Jun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.228.2-228.2
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    • 2016
  • The triggered vacuum switch (TVS) discharges high current through two processes. In the first process, an igniting plasma is generated at a trigger system, and the next process that a main discharge is taken place sequentially at a six-gap rod electrode within a few microsecond. In general, a triggered voltage producing the igniting plasma is increased. However, after several hundred shots, it goes down and stable, in our experiment the trigger voltage is about 5 kV after 250 shots. This triggered characteristics comes from the ceramic insulator which is covered by an electrode material, therefore we have focused on the first igniting plasma process. The igniting plasma has been generated at the surface of a ceramic insulator under a strong electric field. The electric field can be increased through modifying geometries of trigger components which compose of a trigger pin, a ceramic insulator and an enclosed holder. We fabricated not only two types of trigger pin which are a plane head and an umbrella head type, but two different holders which are a concave and a convex type. In this paper the result that the dependency of geometries for these four combined types is included, but the study of the ceramic insulator is not. The research of the ceramic insulator will be announced in the other paper.

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Enhanced Hydrophilic Property of TiO2 Thin Film Deposited on Glass Etched with O2 Plasma

  • Kim, Hwa-Min;Seo, Sung Bo;Kim, Dong Young;Bae, Kang;Sohn, Sun Young
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.3
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    • pp.152-155
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    • 2013
  • $TiO_2$ films were deposited on glass substrates with and without $O_2$ plasma etching by using the RF-magnetron sputtering method. We focused on the effect of surface structure on the photoinduced hydrophilic properties of $TiO_2$ films, fabricated on different surface conditions according to the presence or absence of the $O_2$ plasma treatment on glass substrates. The wettability and photoinduced hydrophilic properties of the $TiO_2$ films were investigated according to the changes in water contact angles under UV light irradiations with a very low intensity of 0.1 $mW/cm^2$. The photoinduced hydrophilic properties on the $TiO_2$ formed above the plasma treated glass were also superior to those on the $TiO_2$ formed above the bare glass. This enhanced $TiO_2$ film has been used practically for self cleaning and anti-fogging glasses.

Measurement of Defect Energy Level in MgO Layer

  • Son, Chang-Gil;Song, K.B.;Jeoung, S.J.;Park, E.Y.;Kim, J.S.;Choi, E.H.;J, S.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1380-1383
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    • 2007
  • The secondary electron emission coefficient (${\gamma}$) of the cathode is an important factor for improving the discharge characteristics of AC-PDP, because of its close relationship to discharge voltage. In this experiment, we have investigated the electronic structure of the energy band in the MgO layer responsible for the high ${\gamma}$. We used three kinds of MgO pellet that have another component, and each MgO layers have been deposited by electron beam evaporation method. The work-functions of MgO layer have been investigated from their ion-induced secondary electron emission coefficient (${\gamma}$), respectively, using various ions with different ionization energies in a ${\gamma}-FIB$ (Focused Ion Beam) system. We have compared work-function with ${\gamma}-FIB$ system current signal for measurement defect energy level in MgO layer. MgO-A in the three types has lowest work-function value (4.12eV) and there are two defect energy levels.

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Homocysteine and Total Antioxidant Status in Acute Myocardial Infarction Patients Among Tamil Population

  • Angeline, T.;Aruna, Rita Mary;Devi, K. Rama;Jeyaraj, Nirmala
    • Animal cells and systems
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    • v.11 no.2
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    • pp.161-164
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    • 2007
  • Oxidative stress is prerequisite for the development of atherosclerosis. Apart from the traditional risk factors that contribute to this devastating condition, in the past few decades, much attention has been focused on plasma total homocysteine mainly because of its strong association with coronary artery disease. It has been suggested that homocysteine induces oxidative stress and hence the present work was undertaken to assess the total homocysteine status and plasma total antioxidant capacity in the acute myocardial infarction (AMI) patients among Tamil population. The study subjects included only the Tamil population. Blood samples were collected from 100 AMI patients and 100 controls. Plasma was separated and the total antioxidant status was assessed as a measure of ferric reducing power of antioxidants using spectrophotometric method. Plasma total homocysteine concentrations were assessed by automated chemiluminescence method. While Total antioxidant status was significantly decreased, the plasma homocysteine concentrations were elevated in AMI patients compared to the controls. However, there was no correlation between the homocysteine levels and total antioxidant status. The findings of this study may have therapeutic implications, including food sources rich in antioxidants for all AMI patients to minimize the effect of free radicals formed during oxidative stress among Tamil population.

A New Generation of Biocompatible Pulse-discharged Plasma by Marx Generator and Its Application on the Biomolecules

  • Park, Ji-Hun;Attri, Pankaj;Hong, Yeong-Jun;Kumar, Naresh;Kim, Sang-Yeop;Kim, Yeong-Jo;Lee, Gu-Hyeop;Lee, Seung-Mok;Park, Bong-Sang;Jeon, Su-Nam;Choe, Eun-Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.240.2-240.2
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    • 2014
  • Characteristics of pulse-discharged plasma in liquid and its biological applications to proteins are investigated by making use of high voltage Marx generator. The Marx generator has been consisted of 5 stages, where each charging capacitor is $0.5{\mu}F$ to generate a high voltage pulse with rising time of $1{\mu}s$. We have applied an input voltage of 6 kV to the each capacitor of $0.5{\mu}F$. The high voltage pulsed plasma has been generated inside a polycarbonate tube by a single-shot operation, where the breakdown voltage is measured to be 7 kV, current of 1.2 kA, and pulse width of ${\sim}1{\mu}s$ between the two electrodes of anode-cathode made of stainless steel, which are immersed into the liquids. For the investigation of the influence of pulsed plasma on biomolcules, we have focused on the amino acids, DNA, proteins, cell and cholesterol.

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Improvement of a UV/Ozone Duplex Sterilizer (UV/Ozone 복합 살균기의 살균력 개선 연구)

  • Jee, Jung-Eun;Yang, Won-Kyun;Park, Eun-Chul;Kim, Kang-Suk;Joo, Jung-Hoon
    • Journal of the Korean institute of surface engineering
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    • v.41 no.2
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    • pp.76-82
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    • 2008
  • We investigated sterilization characteristics of UV lights by counting the number of bacteria units with varying sterilization time and distance from the light source. We focused on an idea that UV light of 184.9 nm could generate ozone and developed a new sterilizer. The UV-ozone duplex system sterilized bacteria faster than UV-only sterilizers. To reduce shadowing effects by target objects, we used UV transparent quartz plate as a support and put a reflecting plate. Distribution of UV irradiation intensity and ozone supply were analyzed by a 3D model and measured by a semiconductor UV sensor. But even with an Al reflector, multi-layered pens could not be treated properly from UV irradiation only. Ozone generating lamp could treat more uniformly multi-layered pens with a stirring fan by supplying ozone to shadowed surfaces.

Study on the Surface Reaction of Pt Thin Film with SF$_6$/Ar and Cl$_2$/Ar Plasma Gases (Pt 박막의 SF$_6$/Ar과 C1$_2$/Ar 플라즈마 가스와의 표면반응에 관한 연구)

  • 김상훈;주섭열;안진호
    • Journal of the Microelectronics and Packaging Society
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    • v.8 no.3
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    • pp.63-67
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    • 2001
  • Up to now, most studies about Pt-etching have been focused on physical sputtering mechanism with Cl-based plasma, while only a limited results are available for etching characteristics with fluorine-based plasma. In this study, etch characteristics of Pt thin film with $Cl_2$/Ar and $SF_{6}$/Ar Ar gas chemistries have been studied with ECR plasma etching system. It is confirmed that $SF_{6}$/Ar Ar plasma chemistry could make volatile etch-products through the reaction with Pt thin film. Also the improvement in etch rate, etch profile and surface roughness is obtained due to the formation of volatile platinum fluoride compounds.

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