• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2002년도 춘계학술대회 논문집
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• pp.244-247
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• 2002

The performance of the precision micro-positioning 4-dof stage is presented. The compact design utilizes the monolithic mechanism to achieve the translation in the Z axis and rotation in the $\theta$ z, $\theta$ x and $\theta$ y axes with high stiffness and high damping. Hysteresis, nonlinearity, and drift of the piezoelectric effects are improved by incorporating the sensors in a feedback control. Experiments demonstrate that the micro-positioning stage is capable of 2nm resolution over the travel range of 25$\mu\textrm$ m in the Z axis, 0.0l7 $\mu\textrm$ rad resolution over the 170$\mu\textrm$ rad in the $\theta$ z and 0.011 $\mu\textrm$ rad resolution over the $\mu\textrm$ rad in the $\theta$ x and $\theta$ y axes. The cross-axis interferences among the axes are at a noise range. This stage is available for positioning error compensation of the XY stage with large stroke.