• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.5-5
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• 2009

Thin-film-transistors (TFTs) that can be prepared at low temperatures have attracted much attention because of the great potential for transparent and flexible electronics. One of the mainstreams in this field is the use of organic semiconductors such as pentacene. But device performance of the organic TFTs is still limited due to low field-effect mobility and rapid degradation after exposing to air. Alternative approach is the use of amorphous oxide semiconductors as a channel. Amorphous oxide semiconductors (AOSs) based TFTs showed the fast technological development, because AOS films can be fabricated at room temperature and exhibit the possibility in application like flexible display, electronic paper, and larges solar cells. Among the various AOSs, a-IGZO has lots of advantages because it has high channel mobility, uniform surface roughness and good transparency. [1] The high mobility is attributed to the overlap of spherical s-orbital of the heavy post-transition metal cations. This study demonstrated the effect of the variation in channel thickness from 30nm to 200nm on the TFT device performance. When the thickness was increased, turn-on voltage and subthreshold swing was decreased. The a-IGZO channels and source/drain metals were deposited with shadow mask. The a-IGZO channel layer was deposited on $SiO_2$/p-Si substrates by RF magnetron sputtering, where RF power is 150W. And working pressure is 3m Torr, at $O_2/Ar$ (2/28 sccm) atmosphere. The electrodes were formed with electron-beam evaporated Ti (30 nm) and Au (70 nm) bilayer. Finally, Al (150nm) as a gate metal was thermal-evaporated. TFT devices were heat-treated in a furnace at 250 $^{\circ}C$ and nitrogen atmosphere for 1hour. The electrical properties of the TFTs were measured using a probe-station. The TFT with channel thickness of 150nm exhibits a good subthreshold swing (SS) of 0.72 V/decade and on-off ratio of $1{\times}10^8$. The field effect mobility and threshold voltage were evaluated as 7.2 and 8 V, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.137-137
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• 2009

Thin-film transistors (TFTs) that can be prepared at low temperatures have attracted much attention due to the great potential for flexible electronics. One of the mainstreams in this field is the use of organic semiconductors such as pentacene. But device performance of the organic TFTs is still limited by low field effect mobility or rapidly degraded after exposing to air in many cases. Another approach is amorphous oxide semiconductors. Amorphous oxide semiconductors (AOSs) have exactly attracted considerable attention because AOSs were fabricated at room temperature and used lots of application such as flexible display, electronic paper, large solar cells. Among the various AOSs, a-IGZO was considerable material because it has high mobility and uniform surface and good transparent. The high mobility is attributed to the result of the overlap of spherical s-orbital of the heavy pest-transition metal cations. This study is demonstrated the effect of thickness channel layer from 30nm to 200nm. when the thickness was increased, turn on voltage and subthreshold swing were decreased. a-IGZO TFTs have used a shadow mask to deposit channel and source/drain(S/D). a-IGZO were deposited on SiO2 wafer by rf magnetron sputtering. using power is 150W, working pressure is 3m Torr, and an O2/Ar(2/28 SCCM) atmosphere at room temperature. The electrodes were formed with Electron-beam evaporated Ti(30nm) and Au(70nm) structure. Finally, Al(150nm) as a gate metal was evaporated. TFT devices were heat treated in a furnace at $250^{\circ}C$ in nitrogen atmosphere for an hour. The electrical properties of the TFTs were measured using a probe-station to measure I-V characteristic. TFT whose thickness was 150nm exhibits a good subthreshold swing(S) of 0.72 V/decade and high on-off ratio of 1E+08. Field effect mobility, saturation effect mobility, and threshold voltage were evaluated 7.2, 5.8, 8V respectively.

• 마이크로전자및패키징학회지
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• 제22권1호
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• pp.55-61
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• 2015

신축성 전극소재는 웨어러블 밴드나 전자피부와 같은 플렉서블 제품으로의 적용 때문에 주목 받고 있다. 플렉서블 소자로서 사용하기 위해선 구부리거나 비틀거나 늘리는 등 물리적 변형에도 전기저항의 증가가 최소화되어야 한다. 카본블랙은 저가의 간단한 공정, 특히 인장 시 비저항의 감소라는 장점 때문에 후보소재로 고려되고 있다. 하지만 카본블랙의 전도도는 전극으로 사용되기에 상대적으로 낮다. 이에 비해 그래핀은 뛰어난 전기전도도 및 유연성 때문에 촉망받고 있는 전자소재이다. 따라서 그래핀을 첨가한 카본블랙은 신축성 전극으로 적합한 소재로 예상된다. 본 논문을 통해 인장 시 그래핀을 첨가한 카본전극의 전기적 특성을 연구하였다. 기계적인 인장은 전극 내의 균열(crack)을 형성시켜 도전경로의 파괴를 일으켰다. 하지만 인장으로 정렬된 그래핀은 카본필러 간의 연결성을 강화하고 도전구조를 유지하였다. 무엇보다도 그래핀 첨가로 인하여 인장 시 카본전극의 전자구조가 변화하여 전자를 효과적으로 전도하게 하였다. 결론적으로 그래핀 첨가를 통해 카본블랙 복합체에 신축성 전극으로의 가능성을 부여하였다.

• 마이크로전자및패키징학회지
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• 제18권2호
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• pp.63-67
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• 2011

본 연구에서는 interlayer로 Sn을 사용하여 경성 인쇄 회로 기판(Rigid printed circuit board, RPCB)과 연성 인쇄 회로 기판(Flexible printed circuit board, FPCB) 간의 열압착 접합(Thermo-compression bonding) 조건을 최적화하는 연구를 진행하였다. 접합에 앞서 FPCB를 다양한 온도와 시간조건 하에서 Sn이 용융된 솔더 배스 안에서 침지(Dipping) 공정을 수행하였고, 열압착법을 이용하여 FPCB와 RPCB의 접합을 수행하였다. FPCB/RPCB 접합부의 접합 강도를 $90^{\circ}$ 필 테스트(Peel test)를 이용하여 측정하였다. 그 결과 $270^{\circ}C$, 1s의 침지 조건에서 FPCB의 polyimide(PI)와 Cu 전극 계면에서 파단되고, 이때, 최대 박리 강도를 얻었다. FPCB와 RPCB의 열압착 접합시 주요 변수로는 압력, 온도, 시간이 있으며, 특히 온도의 증가에 따라 접합 강도가 크게 증가하였다. 접합부 계면 관찰 결과, 접합 온도와 시간이 증가함에 따라 접합 면적이 증가하였으며, 이로 인해 접합 강도가 증가하는 것으로 사료된다. 필 테스트 과정에서 나타나는 F-x(Forcedisplacement) 곡선을 토대로 산출한 파괴 에너지와 접합 강도는 $280^{\circ}C$, 10s의 접합 조건에서 가장 높게 나타났으며, 이 조건이 최적 접합 조건으로 도출되었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.100-101
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• 2012

The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

• 한국전기전자재료학회논문지
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• 제33권1호
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• pp.25-30
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• 2020

Oxide (SiO₂)/Metal(Ag)/Oxide(SiO₂, ITO, ZnO) multilayer films were fabricated using a magnetron sputtering technique at room temperature on Si (p-type, 100) and a glass substrate. The electrical and optical properties of the asymmetric multilayer films depended on the thickness of the mid-layer film and the type of oxide in the bottom layer. As the metal layer becomes thicker, the sheet resistance decreases. However, the transmittance decreases when the metal layer exceeds a threshold thickness of approximately 10~12 nm. In addition, the sheet resistance and transmittance change according to the type of oxide in the bottom layer. If the oxide has a large resistivity, the overall sheet resistance increases. In addition, the anti-reflection effect changes according to the refractive index of the oxide material. The optical and electrical properties of multilayer films were investigated using an ultraviolet visible (UV-Vis) spectrophotometer and a 4-point probe, respectively. The optimum structure is SiO₂ (30 nm)/Ag (10 nm)/ZnO (30 nm) multilayer, with the highest FOM value of 7.7×10^-3 Ω^-1.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.111.2-111.2
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• 2015

Typical electrodes (metal or indium tin oxide (ITO)), which were used in conventional organic light emitting devices (OLEDs) structure, have transparency and conductivity, but, it is not suitable as the electrode of the flexible OLEDs (f-OLEDs) due to its brittle property. Although Graphene is the most well-known alternative material for conventional electrode because of present electrode properties as well as flexibility, its carrier injection barrier is comparatively high to use as electrode. In this work, we performed plasma treatment on the graphene surface and alkali metal doping in the organic materials to study for its possibility as anode and cathode, respectively. By using Ultraviolet Photoemission Spectroscopy (UPS), we investigated the interfaces of modified graphene. The plasma treatment is generated by various gas types such as O2 and Ar, to increase the work function of the graphene film. Also, for co-deposition of organic film to do alkali metal doping, we used three different organic materials which are BMPYPB (1,3-Bis(3,5-di-pyrid-3-yl-phenyl)benzene), TMPYPB (1,3,5-Tri[(3-pyridyl)-phen-3-yl]benzene), and 3TPYMB (Tris(2,4,6-trimethyl-3-(pyridin-3-yl)phenyl)borane)). They are well known for ETL materials in OLEDs. From these results, we found that graphene work function can be tuned to overcome the weakness of graphene induced carrier injection barrier, when the interface was treated with plasma (alkali metal) through the value of hole (electron) injection barrier is reduced about 1 eV.

• Smart Structures and Systems
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• 제8권1호
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• pp.139-155
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• 2011

Polymeric thin-film assemblies whose bulk electrical conductivity and mechanical performance have been enhanced by single-walled carbon nanotubes are proposed for measuring strain and corrosion activity in metallic structural systems. Similar to the dermatological system found in animals, the proposed self-sensing thin-film assembly supports spatial strain and pH sensing via localized changes in electrical conductivity. Specifically, electrical impedance tomography (EIT) is used to create detailed mappings of film conductivity over its complete surface area using electrical measurements taken at the film boundary. While EIT is a powerful means of mapping the sensing skin's spatial response, it requires a data acquisition system capable of taking electrical impedance measurements on a large number of electrodes. A low-cost wireless impedance analyzer is proposed to fully automate EIT data acquisition. The key attribute of the device is a flexible sinusoidal waveform generator capable of generating regulated current signals with frequencies from near-DC to 20 MHz. Furthermore, a multiplexed sensing interface offers 32 addressable channels from which voltage measurements can be made. A wireless interface is included to eliminate the cumbersome wiring often required for data acquisition in a structure. The functionality of the wireless impedance analyzer is illustrated on an experimental setup with the system used for automated acquisition of electrical impedance measurements taken on the boundary of a bio-inspired sensing skin recently proposed for structural health monitoring.

• 한국지반공학회:학술대회논문집
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• 한국지반공학회 2005년도 춘계 학술발표회 논문집
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• pp.401-408
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• 2005

Recently shield TBM tunnellings are being applied to subway construction in Korean cities. Generally these kinds of tunnellings have the problems in the stability of ground such as subsidence because urban subway is constructed in the shallow depth. A sinkhole occurred on the road just above the tunnel during tunneling in Kwangju, so a survey for upper layer of the tunnel was needed. But conventional Ground Probing Radar can't be applicable due to the presence of steel-mesh screen in the shield segment, so no existent geophysical method is applicable in this site. Because the outer surface of each shield segment is electrically insulated, dipole-dipole resistivity method which is popular in engineering site investigation, was tried to this survey for the first time. Specially manufactured flexible ring-type electrodes were installed into the grouting holes at an interval of 2.4 m on the ceiling. The K-Ohm II system which has been developed by KIGAM and tested successfully in many sites, was used in this site. The system consists of 1000Volt-1Ampere constant-current transmitter, optically isolated 24 bit sigma-delta A/D conversion receiver - maximum 12 channel simultaneous measurements, and graphical automatic acquisition software for easy data quality check in real time. Borehole camera logging with circular white LED lighting was also done to investigate the state of the layer. Measured resistivity data lack of some stations due to failing opening lids of holes, shows general high-low trend well. The dipole-dipole resistivity inversion results discriminate (1) one approximately 4 meter diameter cavity (grouted but incompletely hardened, so low resistivity - less than $30{\Omega}m$), (2) weak zone (100-200${\Omega}m$), and (3) hard zone (high resistivity - more than 1000${\Omega}m$) very well for the distance of 320 meters. The 2-D inversion neglects slight absolute 3-D effect, but we can get satisfactory and useful information. Acquired resistivity section and video tapes by borehole camera logging will be reserved and reused if some problem occurs in this site in the future.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2018년도 춘계학술대회 논문집
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• pp.82-82
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• 2018

광전소자용 투명전극으로 적용하기 위한 초박형 Al 박막에 대해서 기초연구를 수행하였다. 증착 전 챔버(chamber) 내 기저압력은 $3{\times}10^{-7}Torr$이하로 유지하였으며 Ar 불활성 기체의 유입을 통해 작업압력을 $1{\times}10^{-2}Torr$로 상승시켜 증착을 실시하였다. DC 마그네트론 스퍼터링법을 이용하여 유리기판상에 Al 박막의 증착을 실시하였으며, 박막의 두께가 3-12 nm인 Al 박막을 각각 형성하였다. 두께가 7 nm 일 때 면저항은 $135{\Omega}/{\square}$로 측정되었고 7 nm 이상인 두께의 박막은 두께가 증가할 때 면저항이 점진적으로 감소되는 경향을 확인할 수 있었다. 두께가 10 nm인 박막의 측정된 면저항은 $13.1{\Omega}/{\square}$로 두께 7 nm인 박막과 비교하였을 때 약 10배의 차이를 확인할 수 있었다. 두께 6 nm 이하인 박막은 면저항 측정이 불가능하였는데 이는 SEM 분석 결과, 연속박막을 이루지 못 하였기 때문이라고 결론을 내릴 수 있었으며, 두께 12 nm인 박막까지 완전한 연속박막이 형성되지 않았다. 각각의 박막에서 입자의 크기는 선 교차법(line intercept method)을 이용하여 시편당 평균 120개의 입자에 대한 평균값을 측정하였으며, 이론적으로 예상할 수 있는 바와 같이 두께가 증가할수록 입자크기도 비례하여 증가하게 되는 것을 확인할 수 있었다. 가시광선 파장영역 내 투과도의 경우, 3 nm 두께에서 평균 80% 이상의 투과도가 측정된 데 반하여, 4-5 nm 두께에서 평균 60%로 급격하게 감소되기 시작하며 그 이후, 두께 증가에 따라 투과도가 점진적으로 감소되는 경향을 확인할 수 있었다. 또한 Al 박막은 시간의 경과에 따른 표면의 산화가 진행되어 기존에 측정된 면저항보다 10-60%의 면저항이 증가하였는데 이는 두께가 얇을수록 더 산화의 영향을 많이 받기 때문에 나타난 결과로 보인다. 추후 산화방지막 및 빛반사방지막 층을 초박형 Al박막과 함께 Oxide/Metal/Oxide 구조로 형성하여 위와 같은 현상들을 해결하고 박막물성의 증진을 통해 투명전극에 적용을 목표로 한다.