• Title/Summary/Keyword: Filtered cathodic vacuum arc

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자장여과아크소스의 자장필터 꺾임 각도와 아크방전전류에 따라 증착된 ta-C 코팅의 마모 거동 연구 (A Study on the Wear Behavior of Tetrahedral Amorphous Carbon Coatings Based on Bending Angles of the Filtered Cathodic Vacuum Arc with Different Arc Discharge Currents)

  • 김원석;김송길;장영준;김종국
    • Tribology and Lubricants
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    • 제38권3호
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    • pp.101-108
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    • 2022
  • The structure and properties of tetrahedral amorphous carbon (ta-C) coatings depend on the main process parameters and bending angles of the magnetic field filter used in the filtered cathodic vacuum arc (FCVA). During the process, it is possible to effectively control the plasma flux of carbon ions incident on the substrate by controlling the arc discharge current, thereby influencing the mechanical properties of the coating film. Furthermore, we can control the size and amount of large particles mixed during carbon film formation while conforming with the bending angle of the mechanical filter mounted on the FCVA; therefore, it also influences the mechanical properties. In this study, we consider tribological characteristics for filtered bending angles of 45° and 90° as a function of arc discharge currents of 60 and 100 A, respectively. Experiment results indicate that the frictional behavior of the ta-C coating film is independent of the bending angle of the filter. However, its sliding wear behavior significantly changes according to the bending angle of the FCVA filter, unlike the effect of the discharge current. Further, upon changing the bending angle from 45° to 90°, abrasive wear gets accelerated, thereby changing the size and mixing amount of macro particles inside the coating film.

진공아크방전으로 제작된 다이아몬드상 탄소 박막이 코팅된 실리콘 전계 방출 소자의 전계 방출 특성 (Field emission properties of the silicon field emission arrays coated with diamond-like carbon film prepared by filtered cathodic vacuum arc technique)

  • 황한욱;김용상
    • 한국전기전자재료학회논문지
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    • 제13권4호
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    • pp.326-331
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    • 2000
  • We have fabricated the field emitter arrays coated with diamond-like carbon (DLC) films that improved the field emission characteristics. The nitrogen doped DLC films are prepared by the filtered cathodic vacuum are (FCVA) tehnique. The activation energy of the nitrogen doped DLC films are derived from electrical conductivity measurements. The silicon field emission arrays (FEAs) were prepared by the VLSI technique. The turn-on field was rapidly decreasing and the emission current was remarkably increasing the DLC-coated FEAs than the non-coated silicon FEAs. In the nitrogen doped FEAs, the turn-on field decreased and the emission current increased with increasing the nitrogen found out the field emission current and the work function of the DLC-coated FEAs was remarkably decreased than that of the non-coated silicon FEAs. As nitrogen doping concentrations are increased the work function of FEAs is decreased and the field emission properties are improved in nitrogen doped DLC-coated FEAs. This phenomenon in due the fact that the Fermi energy level moves to the conduction band by increasing nitrogen doping concentration.

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다구찌 강건 설계를 통한 자장 여과 아크 소스로 증착된 사면체 비정질 탄소막의 최적화 (Optimization of tetrahedral amorphous carbon (ta-C) film deposited with filtered cathodic vacuum arc through Taguchi robust design)

  • 곽승윤;장영준;류호준;김지수;김종국
    • 한국표면공학회지
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    • 제54권2호
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    • pp.53-61
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    • 2021
  • The properties of tetrahedral amorphous Carbon (ta-C) film can be determined by multiple parameters and comprehensive effects of those parameters during a deposition process with filtered cathodic vacuum arc (FCVA). In this study, Taguchi method was adopted to design the optimized FCVA deposition process of ta-C for improving deposition efficiency and mechanical properties of the deposited ta-C thin film. The influence and contribution of variables, such as arc current, substrate bias voltage, frequency, and duty cycle, on the properties of ta-C were investigated in terms of deposition efficiency and mechanical properties. It was revealed that the deposition rate was linearly increased following the increasing arc current (around 10 nm/min @ 60 A and 17 nm/min @ 100A). The hardness and ID/IG showed a correlation with substrate bias voltage (over 30 GPa @ 50 V and under 30 GPa @ 250 V). The scratch tests were conducted to specify the effect of each parameter on the resistance to plastic deformation of films. The analysis on variances showed that the arc current and substrate bias voltage were the most effective controlling parameters influencing properties of ta-C films. The optimized parameters were extracted for the target applications in various industrial fields.

진공아크방전으로 제작된 다이아몬드상 탄소 박막의 질소 도우핑에 따른 전계 방출 특성 (Field emission property of the nitrogen doped diamond-like carbon film prepared by filtered cathodic vacuum arc technique)

  • 최만섭;김용상;이해승;박진석;전동렬;김종국
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1997년도 추계학술대회 논문집 학회본부
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    • pp.273-275
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    • 1997
  • We fabricated the conventional silicon tips coated with a diamond-like carbon (DLC) film. The DLC films are prepared by the filtered cathodic vacuum arc (FCVA) technique. With increasing nitrogen content in DLC film, the work function($\phi$) and the turn-on voltage decrease and the emission current increases. This phenomenon is due to the fact that the Fermi-level moves to the conduction band by increasing nitrogen doping concentration. We have tested on the stability of the DLC film coated silicon tip during 2 hours at 500V.

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분자 동역학 전산모사에 의한 비정질 탄소 필름의 합성거동 연구 (Investigation of Amorphous Carbon Film Deposition by Molecular Dynamic Simulation)

  • 이승협;이승철;이규환;이광렬
    • 한국진공학회지
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    • 제12권1호
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    • pp.25-34
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    • 2003
  • 탄소 원자 간의 interaction potential로서 Tersoff에 의해 제안된 반 경험적인 potential을 이용하여 고경질 탄소박막의 합성 거동을 전산 모사하였다. 고에너지의 탄소익사를 diamond (100) 표면에 충돌시켜 고밀도의 비정질 탄소박막을 만들 수 있었으며, 전산모사에 의해 합성된 탄소 박막의 물성과 Shin 등이 발표한 filtered cathodic arc 공정에 의해 합성된 탄소의 물성을 비교하였다. ta-C 합성 실험에서 관찰된 바와 같이 최적의 에너지 영역에서 다이아몬드에 가장 유사한 물성의 필름이 합성되었으며, 이때의 입사원자 에너지인 50 eV 는 실험적으로 최적의 필름이 얻어지는 조건에서의 탄소이온 에너지와 유사하였다. 전산모사에 의해 합성된 박막은 비정질이었으며, 다이아몬드 lattice에 해당하는 short range order를 가지긴 있었다. 그러나, 최적의 에너지 조건에서는 2.1 $\AA$의 거리의 준안정 site에 탄소들이 많이 존재하는 것을 알 수 있었는데, 이는 필름 표면의 국부적 급냉효과가 최대가 되는 조건과 일치하였다. 이러한 결과는 다이아몬드상 카본필름의 합성에 있어서, 고 에너지의 탄소인자가 충돌하면서 발생하는 국소적인 열에너지의 증가가 가장 빨리 제거되는 조건에서 최적의 물성을 가지는 경질탄소 필름이 형성되는 것을 보여주고 있다.

Nb seeding이 Ag 박막 성장모드에 미치는 영향에 대한 열역학적인 고찰 (Thermodynamics Consideration of Growth Mode of Silver Islands by Transition Metal Seeding)

  • 변응선;김동호;전상조
    • 한국표면공학회지
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    • 제40권1호
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    • pp.6-10
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    • 2007
  • For low-emissivity application on window glass, coalescence of thin film silver islands is crucial for high transmittance in the visible and high reflectance in the infrared. It is well known that the underlayer affects the growth mode. In this work, the effect of the underlayer on the growth of silver films deposited by filtered cathodic vacuum arc is discussed. While a nominal 0.1 nm niobium underlayer has promoted the coalescence of silver islands, a 0.2 nm layer did not show these features. From a thermodynamic approach, Nb seeding less one monolayer is considered to reduce the surface energy between the silver atoms and $Nb/TiO_2$ surface, resulting the change of its growth from 3D islands to 2D-layer modes. If the seed layer exceeds one monolayer, however, a rougher surface is formed because the surface energy of Nb itself is superior to that of $Nb-TiO_2$. The onset of silver layer on the roughened Nb surface is required more silver.

FVA 증착법에 의해 합성된 ta-C 박막의 구조 및 물성 제어 (The control of the structure and properties of tetrahedral amorphous carbon films prepared by Filtered Vacuum Arc)

  • 이철승;신진국;김종국;이광렬;윤기현
    • 한국진공학회지
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    • 제11권1호
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    • pp.8-15
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    • 2002
  • 진공 여과 음극 아크(Filtered Vacuum cathodic Arc, FVA) 증착법을 이용하여 초경질 다이아몬드상 카본 박막(tetrahedral amorphous carbon, ta-C)을 합성하였다. FVA 증착법은 이온화율이 높고, 치밀한 다이아몬드상 카본 박막 증착에 적당한 이온 에너지를 갖는 등의 장점을 갖고 있다. 하지만, 이때의 카본 이온 에너지는 아크 소스의 조작만으로는 쉽게 조절되지 못한다는 단점을 갖고 있다. 다양한 물성 조절을 위해, 본 연구에서는 기판에 바이어스 전압을 인가하여 ta-C박막의 기계적 물성을 제어하였다. 기판의 바이어스 전압이 증가함에 따라, 기계적 물성 및 밀도는 바이어스 전압이 -100 V인 경우에 최대값을 보였다. 최대 경도값 및 밀도는 각각 55$\pm$3 GPa, 3.6$\pm$0.4 g/㎤로 이는 RF PACVD나 이온빔으로 증착되는 DLC의 3~5배에 이르는 값이다. 조성 및 구조 분석은 Raman spectroscopy와 NEXAFS spectroscopy를 이용하여 조사하였다. 각 바이어스 전압에 따른 박막의 물성 변화는 박막내의 $sp^2$$sp^3$ 혼성결합 분율의 변화의 관점으로 이해할 수 있었다.

FCVA 방법으로 증착된 다이아몬드상 탄소 박막의 XPS 및 XRR 특성 연구 (A Study on XPS and XRR Characteristics of DLC films Deposited by FCVA Method)

  • 박창균;장석모;엄현석;서수형;박진석
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제52권3호
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    • pp.109-115
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    • 2003
  • Diamond-like carbon (DLC) films are deposited at room temperature using a filtered cathodic vacuum arc (FCVA) technique. The influence of negative bias voltage (applied to the substrate from 0 to -250V) on the $sp^3$ hybridized carbon fraction is examined by Raman spectroscopy and x-ray photoelectron spectroscopy (XPS) for C 1s core peak. For the first time, depth profile of C 1s, Si 2p, and O 1s XPS peaks for the deposited DLC film are obtained. DLC film is modeled as a multilayered structure. composing of surface, bulk, and interface. In addition, the x-ray reflectivity (XRR) is proposed as a method for estimating the density, surface roughness, and thickness of each layer constituting the DLC film. The estimated thickness of DLC film is in good agreement with the result obtained from the transmission electron microscope (TEM) measurement.

다이어몬드상 탄소/실리콘 이종접합 태양전지의 특성 및 신뢰성 분석에 관한 연구 (A study on the characterization of properties and stabilities of a solar cell using diamond-like carbon/silicon heterojunctions)

  • 박진석
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1997년도 추계학술대회 논문집 학회본부
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    • pp.683-687
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    • 1997
  • The purpose of this work is to develop a highly reliable solar cell based on the diamond-like carbon(DLC)/silicon heterojunction. Thin films of DLC have been deposited by employing both filtered cathodic vacuum arc(FCVA) and magnetron plasma-enhanced chemical vapor deposition(m-PECVD) systems. Structural, electrical, and optical properties of DLC films deposited are systematically analyzed as a function of deposition conditions, such as magnetic field, substrate bias voltage, gas pressure, and nitrogen content. The I-V measurement has been used to elucidate the mechanism responsible for the conduction process in the DLC/Si junction. Photoresponse characteristics of the junction are measured and its reliability against temperature and light stresses is also analyzed.

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Diamond-like Carbon (DLC) 박막의 구조적, 전기적 물성분석 (Characterization of structural and electrical properties of diamond-like carbon thin films)

  • 이재엽;이진복;손민규;김성영;김응상;박진석
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1997년도 하계학술대회 논문집 C
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    • pp.1383-1386
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    • 1997
  • Dimond-like carbon(DLC) films have been deposited by using both rf plasma-enhanced chemical vapor deposition (PECVD) and filtered cathodic vacuum arc (FCVA) deposition systems. Effects of deposition conditions, such as dc self-bias, $CH_4$ gas pressure, substrate bias, and $N_2$ partial pressure, on the structural and electrical properties of DLC films are examined. The experimental results obtained have also been discussed by considering a theoretical model for film growth.

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