• Proceedings of the Korean Society of Dyers and Finishers Conference
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• 2011.03a
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• pp.58-58
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• 2011

CNT 나노기술을 응용한 IT산업용 적층간지용 ESD(정전방전, Electrostatic Dissipation)PU 발포필름의 제조 가공기술 및 상품화 개발은 전자제품 패키지에 요구되는 쿠션성과 정전방전 기능을 갖는 폴리우레탄 발포 필름의 제조기술을 확립함으로써 가능 할 수 있다. 특히 IT산업용 필름제품이 개발되면 ESD 성능을 발휘하게 됨으로서 정전기 쇼크에 의한 각종 전자제품의 오작동이나 파손 방지가 가능하게 되어 포장재, 자동차, 전자제품의 하우징 등으로 사용될 수 있게 된다. 현재까지 ESD 기능을 부여하기 위해서 사용되는 충전재로는 금속섬유, 금속플레이크, 탄소섬유, 카본블랙 등이 있으며, 최근 탄소나노튜브를 응용한 연구가 많이 진행되고 있는데 탄소나노튜브는 직경이 수십nm, 종횡비 1000이상의 나노섬유형태로 서 전기전도성이 구리수준으로 알려져 있고 소량을 충전할 시 기계적 특성도 오히려 증대하는 장점을 가지고 있으며 전기적 특성으로는 상대적으로 낮은 나노튜브 함량에서는 ESD를 들 수 있고 높은 함량에서는 전자파 차폐성까지 기대되고 있다. 본 연구에서는 우수한 인장강도, 기계적 강도, 열적 안정성, 내약품성을 가지면서 습식 또는 용융공정을 통해 용이하게 시트, 필름, 코팅제를 제조할 수 있는 방수, 투습방수성을 가지는 유연재료인 폴리우레탄(PU) 1액형 PU에 MWNT 함량이 3wt%인 IPA/MWNT 분산용액을 PU 함량 대비 20, 30, 40파트로 함유시켜 $120^{\circ}C$에서 2분 건조시켜 제조한 그라운드 필름에 2액형 PU와 IPA/MWNT 분산용액에 발포제를 첨가하여 발포온도 140, 150, $160^{\circ}C$에서 5분간 건조시켜 시료 필름을 제조하였다. 제조된 필름의 전기전도성 측정은 부피저항과, 표면저항을 각각 측정하여 확인하였으며, 필름의 마찰 대전압은 E.S.T-7 마찰 대전압 시험기를 이용하여 표면 마찰 대전압과 반감기를 측정하여 확인하고, 필름의 물리적 특성은 인장시험기를 이용하여 breaking stress, breaking strain을 구하였다. 필름의 표면 특성은 영상 현미경 시스템을 사용하여 ${\times}1000$ 배율로 측정하여 분산특성과의 연관성을 확인하였다.

• Journal of Pharmaceutical Investigation
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• v.27 no.4
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• pp.287-293
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• 1997

To make a stable o/w emulsion, the effects of egg lecithin as an emulsifier and polyvinylpyrrolidone (PVP) as an auxiliary emulsifier on the physical stability of emulsion were investigated. The oil-in-water emulsion system was manufactured by microfluidizer and evaluated the physical stability. Average particle size and size distribution of emulsion was measured by dynamic light scattering analyzer and interfacial tension was measured. From the interfacial tension tested, critical micelle concentration of the egg lecithin was 0.1 %w/v and optimal concentration for the preparation of emulsion was 1.0 %w/v. The mean particle size was about $0.2\;{\mu}m$ which was suitable for injections. The short-term accelerated stability studies were conducted by centrifugation, freeze-thaw method and shaking of the emulsion samples. The addition of PVP was caused the reduction in the particle size and improved the physical stability of emulsion. These results suggested that a mixed interfacial film comprising the egg lecithin and PVP was formed at the o/w interface and it was effective in preventing phase separation under thermic or mechanical stress. We used antineoplaston A10 (A10) as a model drug which is peptide and amino acid derivative having a action to the living organism against the development of neoplastic growth by a nonimmunological progress. It has a poor solubility in water and there may be a difficulty in formulation of A10. Emulsion formulation study about A10 was performed. Solubility of A10 in emulsion was about five times as high as that in water. From the results of solubility and partition coefficient, almost A10 molecules in o/w emulsion exist in the interface between oil and water.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.11 no.1
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• pp.20-26
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• 2001

Titanium boride ($\textrn{TiB}_{x}$) films were deposited on (100) silicon substrates at the substrate temperature of $500^{\circ}C$ by means of the co-evaporation of titanium and boron evaporants during deposition. The co-evaporation method makes it possible to deposit the non-stoichiometric films with different boron-to-titanium ratio($0{\le}B/Ti \le 2.5$). The resistivity increases linearly as the boron-to-titanium ratio in the as-deposited films is increased. The surface roughness of $\textrn{TiB}_{x}$ films is changed as a function of the boron-to-titanium ratio. The XRD spectrum for pure titanium film shows a highly (002) preferred orientation. For B/Ti=0.59 ratio only a single TiB phase that shows a (111) preferred orientation is observed. However, the $\textrn{TiB}_{x}$ phase with the hexagonal structure of the $AlB_2$(C32) type appears as the boron concentration increase, and only a single $\textrn{TiB}_{x}$ phase is observed for $B/Ti \ge 2.0$ ratio. The $\textrn{TiB}_{x}$/Si samples reveal a tensile stress (3~$20{\times}^9$dyn/$\textrm{cm}^2$) in the overall composition of the films, although the magnitude of the residual stresses is depended on the nominal B/Ti ratio.

• Journal of the Microelectronics and Packaging Society
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• v.13 no.1 s.38
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• pp.7-15
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• 2006

In-situ observation of electromigration in thin film pattern of 63Sn-37Pb solder was performed using a scanning electron microscope system. The 63Sn-37Pb solder had the incubation stage of electromigration for edge movement when the current density of $6.0{\times}10^{4}A/cm^2$ was applied the temperature between $90^{\circ}C\;and\;110^{\circ}C$. The major diffusion elements due to electromigration were Pb and Sn at temperatures of $90-110^{\circ}C\;and\;25-50^{\circ}C$, respectively, while no major diffusion of any element due to electromigration was detected when the test temperature was $70^{\circ}C$. The reason was that both the elements of Sn and Pb were migrated simultaneously under such a stress condition. The existence of the incubation stage was observed due to Pb migration before Sn migration at $90-110^{\circ}C$. Electromigration behavior of 63Sn-37Pb solder had an incubation time in common for edge drift and void nucleation, which seemed to be related the lifetime of flip chip solder bump. Diffusivity with $Z^*$(effective charges number) of Pb and Sn were strongly affect the electromigration-induced major diffusion element in SnPb solder by temperature, respectively.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.47 no.7
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• pp.8-16
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• 2010

In this paper, we investigated the effects of $O_2$ fraction on the properties of Al-doped ZnO (AZO) thin films prepared by radio frequency (RF) magnetron sputtering. Hall, photoluminescence (PL), and X-ray photoelectron spectroscopy (XPS) measurements revealed that the p-type conductivity was exhibited for AZO films with an $O_2$ fraction of 0.9 while the n-type conductivity was observed for films with $O_2$ fractions in range of 0 - 0.6. PL and XPS also showed that the acceptor-like defects, such as zinc vacancies and oxygen interstitials, increased in films prepared by an $O_2$ fraction of 0.9, resulting in the p-type conductivity in the films. Hall results indicated that AZO films prepared by $O_2$ fractions in range of 0 - 0.6 can be used for electrode layers in the applications of transparent thin film transistor. We concluded from the X-ray diffraction analysis that worse crystallinity with a smaller grain size as well as higher tensile stress was observed in the films prepared by a higher $O_2$ fraction, which is related to incorporation of more oxygen atoms into the films during deposition. The study of atomic force microscope suggested that the smoother surface morphology was observed in films prepared by using $O_2$ fraction, which causes the higher resistivity in those films, as evidenced by Hall measurements.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.327.1-327.1
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• 2014

Nitrides-on-silicon structures are considered to be an excellent candidate for unique design architectures and creating devices for high-power applications. Therefore, a lot of effort has been concentrating on growing high-quality III-nitrides on Si substrates, mostly Si(111) and Si(001) substrates. However, there are several fundamental problems in the growth of nitride compound semiconductors on silicon. First, the large difference in lattice constants and thermal expansion coefficients will lead to misfit dislocation and stress in the epitaxial films. Second, the growth of polar compounds on a non-polar substrate can lead to antiphase domains or other defective structures. Even though the lattice mismatches are reached to 16.9 % to GaN and 19 % to AlN and a number of dislocations are originated, Si(111) has been selected as the substrate for the epitaxial growth of nitrides because it is always favored due to its three-fold symmetry at the surface, which gives a good rotational matching for the six-fold symmetry of the wurtzite structure of nitrides. Also, Si(001) has been used for the growth of nitrides due to a possible integration of nitride devices with silicon technology despite a four-fold symmetry and a surface reconstruction. Moreover, Si(110), one of surface orientations used in the silicon technology, begins to attract attention as a substrate for the epitaxial growth of nitrides due to an interesting interface structure. In this system, the close lattice match along the [-1100]AlN/[001]Si direction promotes the faster growth along a particular crystal orientation. However, there are insufficient until now on the studies for the growth of nitride compound semiconductors on Si(110) substrate from a microstructural point of view. In this work, the microstructural properties of nitride thin layers grown on Si(110) have been characterized using various TEM techniques. The main purpose of this study was to understand the atomic structure and the strain behavior of III-nitrides grown on Si(110) substrate by molecular beam epitaxy (MBE). Insight gained at the microscopic level regarding how thin layer grows at the interface is essential for the growth of high quality thin films for various applications.

• Journal of the korean academy of Pediatric Dentistry
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• v.33 no.1
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• pp.91-98
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• 2006

Supernumerary teeth are teeth which result from the continued budding of the enamel organ of the preceding tooth or from excessive proliferation of cells. They are most often found in the maxillary anterior region. And they can be responsible for a variey of irregularities in the primary and transitional dentition. There are two morphological types of supernumerary teeth, supplemental and rudimentary. Supplemental teeth have normal shape and size. In contrast, rudimental teeth have abnormal shape and smaller size. Supplemental supernumerary teeth are most common in permanent lateral incisor area. Its extraction must be decided more carefully with differential diagnosis between normal teeth, because it has normal shape and size. We reports 3 cases of the normal incisor shaped teeth in the maxillary anterior region. In all cases, we used the 3D Dental-CT as well as the conventional plain film such as periapical, occlusal, and panoramic radiograph. Consequently, 3B Dental-CT was valualble to figure out the exact position and morphology of supernumerary teeth, to do more conservative surgery and to reduce surgery stress and time.

• Journal of the Korean Magnetics Society
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• v.9 no.2
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• pp.111-120
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• 1999

The effects of annealing in rotating magnetic field after deposition on electromagnetic properties of $Co_{82}Zr_6Mo_{12}$ thin (200~1200 $\AA$) films prepared by RF-magnetron sputtering were investigated in terms of microstructure and surface morphology. The coercivity decreases, but $4{\pi}M_5$ does not change with increasing the film thickness. The coercivity of the films was decreased below 300 $^{\circ}C$ due to stress relief and decreasing the surface roughness, while increased at 400 $^{\circ}C$ due to partial grain growth. And then, $4{\rho}M_5$ was almost independent of annealing temperatures below 200 $^{\circ}C$, but increased from 7.4 kG to 8.0 kG at 300 $^{\circ}C$ and at 400 $^{\circ}C$, which was caused by precipitation and growth of fine Co particles in the films. The electrical resistivity of films was decreased with increasing annealing temperatures and the magnetoresistance was a negative value of nearly 0 $\mu$$\Omega$cm. After annealing at 300 $^{\circ}C$, maximum effective permeability was 1200 to the hard axis of the thin films according to high frequency change. Considering the practical application of biasing layers of the films for magnetoresistive heads, optimal annealing conditions was obtained after one hour annealing at 300 $^{\circ}C$ in 400 Oe rotating magnetic field.

• The Journal of the Korea Contents Association
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• v.8 no.2
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• pp.91-99
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• 2008

When making a comic film, the comic presentation that uses stress and exaggeration is the important subject among other things. In this study we tried to investigate the comic effect using the movement of three-dimensional shot. To conduct this study, we extracted the shot manufactured through the Flow Motion of a 3D Production Program Virtual Camera and a High Speed Motion Picture Camera. The shot manufactured applying this manufacturing skill and using three-dimensional production method for the video contents efficiently made was classified into several scenes. The focus of this study is to search for the factor that makes the atmosphere of a story comic through three-dimensional production shot. According to the shot analysis, three-dimensional production method plays a role in developing more stories on space and time by visualizing stories in three dimensions, which makes the most use of the movement of camera, lens and the utilization of focus. In addition, in the presentation where many comic and exaggerated factors are provided, we used the technology that stresses a scene using the size of a shot and the lasting time and presented the method that exaggerates space using a 3D Production Program Virtual Camera and a High Speed Motion Picture Camera. By reviewing the qualitative improvement and the efficient method on making comic films through the possibility that the atmosphere of this three-dimensional shot can apply to the effect for comic presentation, we tried to approach the comic presentation.

• Journal of Conservation Science
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• v.34 no.6
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• pp.459-470
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• 2018

Cellulose nitrates were used for folklore artifacts(ornamental beads and pipes in hatstrings, frames of eyeglasses, ornamental eyeglass cases, headband ornaments, and jeogori buttons) between the 19th and 20th centuries; however, they are susceptible to cracking, crazing, embrittlement, and crumbling due to deterioration. To consolidate and adhere deteriorated cellulose nitrate folklore artifacts, water-soluble acrylic emulsion adhesives were investigated. For consolidation, Plextol D 498, which has the lowest viscosity in low concentrations, was used. In adhesive films whose glass transition temperature(Tg) is lower than room temperature, the tensile stress and modulus decreased and the strain increased; therefore, the flexibility was high. The Plextol D 498 and Plextol D 498 and Dispersion K 52 films maintained their adhesiveness and flexibility after artificial-sunlight-accelerated ageing, and Plextol D 498 and Dispersion K 52 films hardly caused yellowing. Plextol D 498 was the most stable for accelerating ageing. A low concentration of Plextol D 498 emulsion resulted in the best permeability on the surface of cellulose nitrate, compared with other acrylic emulsions. To prevent ornamental hatstrings from cracking, crazing, embrittlement, and crumbling, a Plextol D 498 emulsion was used. After applying low concentrations(1%, 3%) of the emulsion to consolidate the fragments and high concentration to adhere the fragments, the ornamental hatstrings were protected from crumbling by deterioration, and their fragments were well-adhered. To preserve it from deterioration by oxygen and humidity, the treated ornament was sealed with an oxygen-barrier film using a low-humidity oxygen scavenger.