• Title/Summary/Keyword: Film grating

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Holographic grating formation in AsGeSeS(10,20,40,80nm) thin films (AsGeSeS(10,20,40,80nm) 박막에서의 홀로그래픽 격자 형성)

  • Lee, Ki-Nam;Yoo, Chul-Ho;Kim, Jong-Bin;Lee, Yeong-Jong;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.05a
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    • pp.119-122
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    • 2004
  • This paper discovers that we form holographic grating in AsGeSeS thin film. Holographic grating is not developed in the length of 10,20,40nm, while it is formed in the thin film of 80nm though it shows very low diffraction efficiency. On the contrary, holographic grating is established in every thin film of Ag(10nm)/AsGeSeS(10,20,40,80nm). Lattice in 10,20 nm thin film builds up, and immediately disappears. In the case of 40nm thin film, even if holographic grating is made up, it seems to have a low diffraction efficiency. Apart from 10,20,40nm, it shows the highest diffraction efficiency in the thin film of 80nm.

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A Study on the Small Disturbance Measurement of Liquid Film Thickness by $Moir\acute{e}$ Fringe ($Moir\acute{e}$ Fringe에 의한 액막 두께 미소 변위 측정 연구)

  • Jeon, H.S.;Kim, K.H.
    • Journal of ILASS-Korea
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    • v.2 no.4
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    • pp.29-35
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    • 1997
  • Liquid film thickness is measured by $moir\acute{e}$ topography which monitored liquid surface. $Moir\acute{e}$ fringe measurement techniques share the inherent simplicity found in optical interferometric techniques have the advantage of use over a greater range of displacement. $Moir\acute{e}$ fringe are the geometric interference patterns observed when two dense line grating are superposed. Light transmitted through a fixed line grating is deviated by the liquid film surface, producing a distored image of the grating. The $moir\acute{e}$ fringe produced by projection of this optically distored grating onto a second stationary grating permit visualization of the liquid surface and measurement of the liquid film thickness. This study measured the small amplitude of liquid film thickness to the $moir\acute{e}$ fringe pattern produced when spherical metal was dropped glycerin put)1 And the measurement of liquid film thickness flowing down an inclined plate are required to calculate the liquid slope in a position.

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Humidity Sensor Using Polyimide Film Coated Fiber Bragg Grating (폴리이미드가 코팅된 광섬유 브래그 격자를 이용한 습도센서)

  • Jae Chang Yang;Gun Pyo Kim;Kwang Taek Kim
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.36 no.6
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    • pp.594-597
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    • 2023
  • We have proposed and demonstrated a fiber optic RH (relative humidity) sensor based on fiber Bragg grating covered with a polyimide film. As the polyimide film absolves the moisture in the air, its volume expands. As a result, the grating period of the FBG (fiber Bragg grating) covered with a polyimide film becomes wide and the Bragg wavelength is shifted. The sensor is implemented by fixing a 30 ㎛ thickness polyimide film on the surface of an optical fiber grating using an adhesive, and the characteristics of the device according to humidity are analyzed. The fabricated FBG RH sensor showed a high sensitivity of 0.0186 nm/RH% and a wide measurement range from 30% to 90%. The influence of environmental temperature on the characteristics of the RH sensor was also measured and analyzed. The feasibility of commercialization is presented.

2-dimensional hologram formation by selective etching on amorphous As-Ge-Se-S thin film (비정질 As-Ge-Se-S 박막에서 선택적 에칭을 통한 2차원 홀로그램 제작)

  • Kim, Jin-Hong;Kang, Jin-Won;Chung, Hong-Bay
    • Proceedings of the KIEE Conference
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    • 2006.07c
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    • pp.1430-1431
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    • 2006
  • We investigated the formation of 2-dimension hologram grating by means of selective etching characteristic and photo-expansion effect according to photo irradiation on amorphous As-Ge-Se-S thin film. By method of phase holography, we made the 2-dimensional hologram grating by each (S:P) and ($+45^{\circ}:-45^{\circ}$) polarized beam with DPSS laser(532nm) and He-Ne laser(632nm). A recording property was observed at each polarized beam through 2-dimensional hologram surface relief grating. Chalcogenide thin film was etched selectively by NaOH solution after the formation of 1-dimensional diffraction grating. And then etched sample was rotated 90 degree to fabricate 2 dimensional hologram grating. We found that it was observed the formation of 2-dimensional hologram grating by AFM(Atomic Force Microscopy).

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Holographic Grating Formation of Chalcogenid Thin Films By the DPSS laser (DPSS laser에 의한 비정질 칼코게나이드 박막의 홀로그래픽 격자형성)

  • Koo, Yong-Woon;Nam, Ki-Hyun;Chung, Hong-Bay
    • Proceedings of the KIEE Conference
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    • 2008.07a
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    • pp.1440-1441
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    • 2008
  • In this paper, we investigated the diffraction grating efficiency on AsSeS and Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The Chalcogenide film thickness was 0.5um and Ag thin film was varied from 10nm and 20nm. Diffraction efficiency was obtained from (P:P) polarized Diode Pumped Solid State laser(DPSS, 532.0nm: 200mW) beam on AsSeS and Ag/AsSeS thin films. As a results, diffraction grating was not formed at AsSeS thin film but at Ag-doped AsSeS thin film, diffraction grating was formed well compare with the former.

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Holographic Grating Formation of Amorphous AsSeS Thin Film (비정질 AsSeS 박막의 홀로그래픽 데이터 격자형성)

  • Ju, Long-Yun;Lee, Song-Hee;Nam, Ki-Hyun;Koo, Sang-Mo;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.447-448
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    • 2008
  • In this paper, we investigated the diffraction grating efficiency on AsSeS and Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The film thickness was 0.5um and diffraction efficiency was obtained from (P:P) polarized He-Ne (632.8nm)laser beam on AsSeS and Ag/AsSeS thin films. As a results, diffraction grating was not formed at AsSeS thin film but at Ag-doped AsSeS thin film, diffraction grating was formed well compare with the former.

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Holographic Data Grating Formation of AsGeSeS Single & Ag/AsGeSeS Double Layer Thin Films with the Incident Beam Wavelength (입사빔의 파장에 따른 AsGeSes & Ag/AsGeSes 박막의 홀로그래픽 데이터 소거특성)

  • Koo, Yong-Woon;Chung, Hong-Bay
    • Proceedings of the KIEE Conference
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    • 2006.07c
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    • pp.1428-1429
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    • 2006
  • We investigated the diffraction efficiency, erasing property and rewriting property of diffraction grating with each wavelength of recording beam. A (P:P) polarized light was exposed on AsGeSeS and Ag/AsGeSeS thin film to form a diffraction grating by HeNe(635nm) laser and DPSS(532nm) laser. At the maximum efficiency condition, unpolarized HeNe laser beam was irradiated to erase 1ha generated diffraction grating. The HeNe laser showed more higher diffraction efficiency and the DPSS laser showed more faster diffraction grating time. At erasing and rewriting process, AsGeSeS(61%-85%)thin film showed better property than Ag doped Ag/AsGeSeS(53%-63%) double layer structured thin film.

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Multiple Order Diffractions by Laser-Induced Transient Grating in Nematic MBBA Film

  • 김성규;김학진
    • Bulletin of the Korean Chemical Society
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    • v.20 no.6
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    • pp.705-711
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    • 1999
  • The laser-induced transient grating method is applied to study the dynamics of the nematic MBBA film. The nanosecond laser pulses of 355 nm are used to make the transient grating and the cw He-Ne laser of 633 nm is used to probe the dynamics. Strong multiple order diffractions are observed at high nematic temperatures. The reordering process induced by the phototransformed state, which is the locally melted state from the nematic sample, is attributed to the main origin of the multiple order diffractions from the nematic MBBA. The characteristics of the multiple order gratings are discussed with the grating profiles simulated from the multiple diffraction signals.

The Elimination Characteristics by Impressed Voltage of Holography Grating in Chacogenide Thin Film

  • Lee Ki-Nam;Yeo Cheol-Ho;Yang Sung-Jun;Chung Hong-Bay
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.6
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    • pp.219-222
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    • 2004
  • This paper discovers that there are some peculiar properties that can remove holography grating, which was made in chacogenide thin film by impressed voltage. The thin films were used are $As_{40}Ge_{10}Se_{15}S_{35}$, and we use He-Ne laser in order to form thin films. I-V curved line in a thin film before a lattice was made has the critical point, about 3.7 V. Moreover, the I-V curved line increased current intensity at over 4 V after it made thin film. In addition, while holography grating is being made, and when it has the highest diffraction efficiency, a lattice can be deleted if put more voltage into it.

Annealing Effect of the Chalcogenide Thin Film for Holographic Grating Formation (홀로그래픽 격자 형성에 대한 칼코게나이드 박막의 열처리 효과)

  • Park, Jung-Il;Shin, Kyung;Lee, Jung-Tae;Lee, Young-Jong;Chung, Hong-Bay
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.8
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    • pp.736-739
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    • 2003
  • We prepared the chalcogenide As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35/, Se$\_$75/Ge$\_$25/ thin film. Holographic grating was formed by the He-Ne laser( λ =633 nm). Annealing at 100$^{\circ}C$ and 200$^{\circ}C$ has been used to change the optical property of chalcogenide thin films for holographic grating formation. As the results, large variation of the optical property was generated at the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35/ chalcogenide film. Diffraction efficiency of the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35/ film has been enhanced about three times