• 한국수산과학회지
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• 제32권4호
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• pp.395-398
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• 1999

Chitosan을 이용하여 필름을 제조하여 chitosan의 탈아세틸화도와 분자량, chitosan의 농도, pH등에 따른 chitosan 필름의 인장강도, 인장율 및 수분 투과도 등을 조사한 결과는 다음과 같다. Chitosan 조제조건으로는 $47\%$ NaOH로 $130^{\circ}C$에서 3시간이상 처리시켰을 때 탈아세틸화도의 변화는 적은데 비해 분자량의 감소는 크게 나타나 상업적으로 이용시 3시간 이하로 처리하는 것이 바람직하였다. Chitosan의 탈아세틸화도, 분자량, pH, 농도에 따른 필름의 인장강도, 인장율 및 수분 투과도의 결과는 탈아세틸화도가 높아짐에 따라 인장강도, 인장율, 수분 투과도 등은 감소하였으며, 분자량이 적어짐에 따라 인장강도, 인장율, 수분 투과도등은 감소하는 것으로 조사되었다. pH가 높아짐에 따라 인장강도와 수분 투과도는 감소하였으나 인장율에 있어서는 증가하는 것으로 나타났다. 그리고 chitosan 농도가 높아짐에 따라 인장율과 수분 투과도는 감소하였으나 인장강도는 증가하는 것으로 조사되었다.

• Journal of Korean Vacuum Science & Technology
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• 제2권1호
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• pp.25-31
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• 1998

The reliability of fluorine doped silicon oxide (SiOF) films for intermetal dielectrics in multilevel interconnections of ultra-large scale integrated circuits (ULSIs) is investigated. SiOF films were deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECRPECVD) using H-free source gases, i.e., SiF4 and O2. The effect of post plasma treatment on the moisture absorption and dielectric properties of SiOF films was carried out I terms of air exposure time, The reliability test of Cu/TiN/SiOF/Fi specimen was carried out in terms of temperature by rapid thermal annealing (RTA) in N2 ambient. After O2 plasma treatment,, no appreciable peak directly related to moisture absorption was detected. The capacitance-voltage (C-V) characteristics of the O2 plasma treated SiOF film showed that the film remained to hold the sound dielectric properties even after boiling treatment. The Cu/TiN/SiOF/Si system was found to be reliable up to $600^{\circ}C$.

• 폴리머
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• 제32권5호
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• pp.478-482
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• 2008

용액 가공에 의한 광학용 폴리카보네이트 필름의 제조시 사용되는 1,3-dioxolane 용매가 폴리카보네이트 필름의 구조 형성에 미치는 영향에 대하여 살펴보았다. 기존 용액 가공에 용매로 사용하는 methylene chloride 대신 1,3-dioxolane을 필름 제조 용매로 사용하는 경우, 환경 친화성을 갖는 반면 1,3-dioxolane의 높은 휘발 온도로 인하여 필름 건조 공정에서 용매 제거 속도가 감소되며 이는 폴리카보네이트 필름의 결정화를 초래함을 확인하였다. 그 결과, 필름의 결정화도가 증가하여 표면이 거칠어지며 이에 따라 광 투과도가 감소함을 확인할 수 있었다. 또한 용매 제거 속도 변화에 따른 이러한 형태학적 변화는 폴리카보네이트 필름의 기계적 특성에 영향을 미침을 알 수 있었다.

• 한국수소및신에너지학회논문집
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• 제33권6호
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• pp.808-818
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• 2022

In this research paper, we investigated the cryogenic line chill down characteristics of liquefied natural gas (LNG). A numerical analysis model was established and verified so that it can calculate the precise cooling characteristics of cryogenic fluid for the stable and safe utilization especially such as LNG and liquid hydrogen. The numerical modeling was programmed by C++ as an one-dimensional homogeneous model. The thermohydraulic cooling process was simulated using mass, momentum, energy conservation equations and appropriate heat transfer correlations. In this process, the relevant heat transfer correlations for nuclear boiling, transition boiling, film boiling, and single-phase heat transfer that can predict the experimental results were implemented. To verify the numerical modeling, several cryogenic line chill down experiments using LNG were conducted at the Korea Institute of Machinery & Materials (KIMM) LNG and Cryogenic Technology Center.

• Journal of Mechanical Science and Technology
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• 제17권6호
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• pp.935-944
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• 2003

Forced convective boiling heat transfer coefficients were predicted for an annular flow inside a horizontal tube for pure refrigerants and nonazeotropic binary refrigerant mixtures. The heat transfer coefficients were calculated based on the turbulent temperature profile in liquid film and vapor core considering the composition difference in vapor and liquid phases, and the nonlinearity in mixing rules for the calculation of mixture properties. The heat transfer coefficients of pure refrigerants were estimated within a standard deviation of 14% compared with available experimental data. For nonazeotropic binary refrigerant mixtures, prediction of the heat transfer coefficients was made with a standard deviation of 18%. The heat transfer coefficients of refrigerant mixtures were lower than linearly interpolated values calculated from the heat transfer coefficients of pure refrigerants. This degradation was represented by several factors such as the difference between the liquid and the overall compositions, the conductivity ratio and the viscosity ratio of both components in refrigerant mixtures. The temperature change due to the concentration gradient was a major factor for the heat transfer degradation and the mass flux itself at the interface had a minor effect.

• 한국전기전자재료학회논문지
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• 제22권11호
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• pp.992-998
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• 2009

We investigated the influence of organic solvents on the droplet properties of 6,13-bis (triisopropylsilylethynyl) pentacene (TIPS-pentacene), which was used for semiconductor of organic thin film transistors (OTFTs) and deposited by ink jet printing. From the result of the investigation, the conditions of a suitable solvent is that boiling point should be above $200^{\circ}C$ to reduce coffee stain and the surface tension above 32 dyn/cm to decrease the droplet size. Consequently, we selected tetralin which have a high boiling point ($207^{\circ}C$) and high surface tension (34.3 dyn/cm) as the solvent for TIPS-pentacene, and applied it to OTFTs. In fabrication process the conventional bank process employing photolithography and etching process was replaced by ink jet printed bank process, resulting in simplifying the process. Especially, polyvinylphenol was used for the bank, and the high hydrophobicity could improve the confinement of TIPS molecules inside the bank, enhancing the performance over the conventional hydrophilic polyvinylalcohol bank. The mobility was $0.18\;cm^2/Vs$, current on/off ratio $2.09{\times}10^5$, subthreshold slope 0.42 V/dec, and off state current $0.049\;pA/{\mu}m$.

• 열처리공학회지
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• 제25권4호
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• pp.181-189
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• 2012

The demand on quantitative measurement of the heat flux is motivated in making higher-quality steel product through a water quenching process of plate mill. To improve a spatial degree of heat flux measurement, the multi-point heat flux measurement was carried out by a unique experimental technique that has a combination of the existing single-point heat flux gauge. The corresponding heat flux can be easily determined by Fourier's law in a conventional way. The multi-point heat flux gauge developed in this study can be applicable to measure the surface heat flux, the surface heat transfer coefficient during a water quenching applications of steelmaking process. The results exhibit different heat transfer regimes; such as single-phase forced convection, nucleate boiling, and film boiling, that are occurred in close proximity on the multi-point heat flux gauge quenched by water impinging jet.

• 대한기계학회논문집
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• 제13권3호
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• pp.411-418
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• 1989

본 연구에서는 물 및 물을 주성분으로 하는 NaCl, $Na_{2}$CO$_{3}$, NaOH 등의 비휘발성 수용액을 담금제로 하고 KS M 2172의 열처리유 냉각성능 실험 방법에서 채택하고 있는 은시편(순도 99.9%)을 이용한 표준냉각곡선으로부터 냉각 속도 열전달계수 및 담금강열도 등 담금제의 냉각성능 파라미터를 구하였으며, 각종 담금제의 온도 및 수용액의 농도 변화에 따른 냉각성능을 평가하였다. 그리고 실험에서 채택한 시편 및 담금제를 모델로 하여 축대칭 비정상 열전도방정식을 유한 요소법에 의하여 해석하고 냉각시간에 따른 시편의 온도분포를 계산하여 실험결과와 비교하였다.

• 한국항해항만학회:학술대회논문집
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• 한국항해항만학회 2000년도 추계학술대회논문집
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• pp.45-48
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• 2000

High dielectric (Ba,Sr)TiO$_3$thin films were etched in an inductively coupled plasma (ICP) as a function of C1$_2$/Ar gas mixing ratio. Under Cl$_2$(20)/Ar(80), the maximum etch rate of the BST films was 400$\AA$/min and selectivities of BST to Pt and PR were obtained 0.4 and 0.2, respectively. We investigated the etched surface of BST by x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and x-ray diffraction (XRD). From the result of XPS analysis, we found that residues of Ba-Cl and Ti-Cl bonds remained on the surface of the etched BST for high boiling point. The surface roughness decreased as Cl$_2$increases in C1$_2$/Ar plasma because of non-volatile etching products. This changed the nature of the crystallinity of BST. From the result of XRD analysis, the crystallinity of etched BST film maintained as similar to as-deposited BST under Ar only and Cl$_2$(20)/Ar(80). However, (100) orientation intensity of etched BST film abruptly decreased at Cl$_2$only plasma. It was caused that Cl compounds were redeposited on the etched BST surface and damaged to crystallinity of BST film during the etch process.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 추계학술대회 논문집
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• pp.45-48
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• 2000

High dielectric (Ba,Sr)TiO$_3$ thin films were etched in an inductively coupled plasma (ICP) as a function of C1$_2$/Ar gas mixing ratio. Under Cl$_2$(20)/Ar(80), the maximum etch rate of the BST films was 400$\AA$/min and selectivities of BST to Pt and PR were obtained 0.4 and 0.2, respectively. We investigated the etched surface of BST by x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and x-ray diffraction (XRD). From the result of XPS analysis, we found that residues of Ba-Cl and Ti-Cl bonds remained on the surface of the etched BST for high boiling point. The surface roughness decreased as Cl$_2$ increases in Cl$_2$/Ar plasma because of non-volatile etching products. This changed the nature of the crystallinity of BST. From the result of XRD analysis, the crystalliility of etched BST film maintained as similar to as-deposited BST under Ar only and Cl$_2$(20)/Ar(80). However, (100) orientation intensity of etched BST film abruptly decreased at Cl$_2$ only plasma. It was caused that Cl compounds were redeposited on the etched BST surface and damaged to crystallinity of BST film during the etch process.