• Title/Summary/Keyword: Film Antenna

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Hydrophobic and Mechanical Characteristics of Hydrogenated Amorphous Carbon Films Synthesized by Linear Ar/CH4 Microwave Plasma

  • Han, Moon-Ki;Kim, Taehwan;Cha, Ju-Hong;Kim, Dong-Hyun;Lee, Hae June;Lee, Ho-Jun
    • Applied Science and Convergence Technology
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    • v.26 no.2
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    • pp.34-41
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    • 2017
  • A 2.45 GHz microwave plasma with linear antenna has been prepared for hydrophobic and wear-resistible surface coating of carbon steel. Wear-resistible properties are required for the surface protection of cutting tools and achieved by depositing a hydrogenated amorphous carbon film on steel surface through linear microwave plasma source that has $TE_{10}-TEM$ waveguide. Compared to the existing RF plasma source driven by 13.56 MHz, linear microwave plasma source can easily generate high density plasma and provide faster deposition rate and wider process windows. In this study, $Ar/CH_4$ gas mixtures are used for hydrogenated amorphous carbon film deposition. When microwave power of 1000 W is applied, 40 cm long uniform $Ar/CH_4$ plasma could be obtained in gas pressure of 200~400 mTorr. The Vickers hardness measurement of hydrogenated amorphous carbon film on steel surface was evaluated. It was found the optimized deposition condition at $Ar:CH_4=25:25$ sccm, 300 mTorr with microwave power of 1000W and RF bias power of 100W. By deposition of hydrogenated amorphous carbon film, contact angle on steel surfaces increases from $43.9^{\circ}$ to $93.2^{\circ}$.

Study of plasma induced charging damage and febrication of$0.18\mu\textrm{m}$dual polysilicon gate using dry etch (건식각을 이용한 $0.18\mu\textrm{m}$ dual polysilicon gate 형성 및 plasma damage 특성 평가)

  • 채수두;유경진;김동석;한석빈;하재희;박진원
    • Journal of the Korean Vacuum Society
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    • v.8 no.4A
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    • pp.490-495
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    • 1999
  • In 0.18 $\mu \textrm m$ LOGIC device, the etch rate of NMOS polysilicons is different from that of PMOS polysilicons due to the state of polysilicon to manufacture gate line. To control the etch profile, we tested the ratio of $Cl_2$/HBr gas and the total chamber pressure, and also we reduced Back He pressure to get the vertical profile. In the case of manufacturing the gate photoresist line, we used Bottom Anti-Reflective Coating (BARC) to protect refrection of light. As a result we found that $CF_4O_2$ gas is good to etch BARC, because of high selectivity and good photoresist line profile after etching BARC. in the results of the characterization of plasma damage to the antenna effect of gate oxide, NO type thin film(growing gate oxide in 0, ambient followed by an NO anneal) is better than wet type thin film(growing gate oxide in $0_2+H_2$ ambient).

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Inductively Coupled Plasma Chemical Vapor Deposition System for Thin Film Ppassivation of Top Emitting Organic Light Emitting Diodes (전면발광 유기광소자용 박막 봉지를 위한 유도결합형 화학 기상 증착 장치)

  • Kim Han-Ki
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.6
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    • pp.538-546
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    • 2006
  • We report on characteristics of specially designed inductively-coupled-plasma chemical vapor deposition (ICP-CVD) system for top-emitting organic light emitting diodes (TOLEDs). Using high-density plasma on the order of $10^{11}$ electrons/$cm^3$ generated by linear-type antennas connected in parallel and specially designed substrate cooling system, a 100 nm-thick transparent $SiN_{x}$ passivation layer was deposited on thin Mg-Ag cathode layer at substrate temperature below $50\;^{\circ}C$ without a noticeable plasma damage. In addition, substrate-mask chucking system equipped with a mechanical mask aligner enabled us to pattern the $SiN_x$ passivation layer without conventional lithography processes. Even at low substrate temperature, a $SiN_x$ passivation layer prepared by ICP-CVD shows a good moisture resistance and transparency of $5{\times}10^{-3}g/m^2/day$ and 92 %, respectively. This indicates that the ICP-CVD system is a promising methode to substitute conventional plasma enhanced CVD (PECVD) in thin film passivation process.

A Study on the Characteristics of Conductive Paste for Roll-to-Roll Printing (Roll to Roll Printing용 전도성 Paste 물성 연구)

  • Cho, Mi-Jeong;Nam, Su-Yong
    • Proceedings of the Korean Printing Society Conference
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    • 2007.11a
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    • pp.59-64
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    • 2007
  • We have manufactured low-curable silver pastes for gravure printing out of roll to roll printing process. When printing, the pastes be used different silver powder shape because of the printing characteristics. The pastes were prepared with silver powder by silver powder shape, polyester resin, solvent and homogenized on a standard three-roller mill. And the pastes exhibited a shear-thinning flow at viscosity profile. Moreover the adhesive strength and resistivity of silver film had good characteristics. With the manufactured paste in this study, RFID antenna circuit had flexible is manufactured and it had $10^{-4}{\sim}10^{-5}{\Omega}{\cdot}cm$.

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Microwave Properties of Tunable Phase Shifter Using High Temperature Superconducting Thin Film (고온초전도 박막을 이용한 튜너블 이상기의 마이크로파 특성)

  • Kwak Min Hwan;Kim Young Tae;Moon Seong Eon;Ryu Han Cheol;Lee Su Jae;Kang Kwang Yong
    • Progress in Superconductivity and Cryogenics
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    • v.7 no.1
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    • pp.13-16
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    • 2005
  • High temperature superconductor, $\YBa_2Cu_3O_{7-x}$ (YBCO) and ferroelectric, $\Ba_{0.1}Sr_{0.9}TiO_{3}$ (BST) multilayer thin films were deposited using on MgO(100) substrates pulsed laser deposition. The thin films exhibited only (001) peaks of YBCO and 1357 The HTS thin films demonstrated excellent zero resistance temperature of 92.5 K. We designed and fabricated HTS ferroelectric phase shifter using high frequency system simulator and standard photolithography method, respectively The HTS phase shifter shows a low insertion loss (2.97 dB) and large phase change ($\162^{circ}$) with 40 V do bias at 10 GHz. The HTS phase shifter shows 54 of figure of merit. These results can be applicable to phased anay antenna system for satellite communication services.

Bipolar Pulse Bias Effects on the Properties of MgO Reactively Deposited by Inductively Coupled Plasma-Assisted Magnetron Sputtering

  • Joo, Junghoon
    • Applied Science and Convergence Technology
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    • v.23 no.3
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    • pp.145-150
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    • 2014
  • MgO thin films were deposited by internal ICP-assisted reactive-magnetron sputtering with bipolar pulse bias on a substrate to suppress random arcs. Mg is reactively sputtered by a bipolar pulsed DC power of 100 kHz into ICP generated by a dielectrically shielded internal antenna. At a mass flow ratio of $Ar/O_2$ = 10 : 2 and an ICP/sputter power ratio of 1 : 1, optimal film properties were obtained (a powder-like crystal orientation distribution and a RMS surface roughness of approximately 0.42 nm). A bipolar pulse substrate bias at a proper frequency (~a few kHz) prevented random arc events. The crystalline preferred orientations varied between the (111), (200) and (220) orientations. By optimizing the plasma conditions, films having similar bulk crystallinity characteristics (JCPDS data) were successfully obtained.

Deposition of IGZO thin film using DC and ICP at magnetron sputtering system

  • Lee, C.H.;Kim, K.N.;Kim, T.H.;Lee, S.M.;Bae, J.W.;Yeom, G.Y.
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2015.05a
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    • pp.95-95
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    • 2015
  • IGZO (Indium Gallium Zinc Oxide) 물질은 기존에 사용되던 Amorphous Silicon에 비해 전자 이동도가 더욱 빠르기 때문에 차세대 디스플레이 재료로서 각광받고 있으며, 이러한 빠른 전자 이동도는 디스플레이 소자에 있어서 매우 중요한 요소 중 하나이다. 이를 향상시키기 위하여 본 연구에서는 ICP(inductively coupled plasma) antenna를 이용하여 rf power와 requency를 변화함으로써 박막 증착 시 발생되는 플라즈마의 특성을 조절하여, 박막의 특성을 조절하고자 했다. 이렇게 증착된 IGZO 박막은 Hall Effect Measurement를 이용하여 전기적 특성을 분석하였으며, XPS(x-ray photoelectron spectroscopy)를 이용하여 박막의 조성을 분석하였다.

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Terahertz Time Domain Spectroscopy, T-Ray Imaging and Wireless Data Transfer Technologies

  • Paek, Mun-Cheol;Kwak, Min-Hwan;Kang, Seung-Beom;Kim, Sung-Il;Ryu, Han-Cheol;Choi, Sang-Kuk;Jeong, Se-Young;Kang, Dae-Won;Jun, Dong-Suk;Kang, Kwang-Yong
    • Journal of electromagnetic engineering and science
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    • v.10 no.3
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    • pp.158-165
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    • 2010
  • This study reviewed terahertz technologies of time domain spectroscopy, T-ray imaging, and high rate wireless data transfer. The main topics of the terahertz research area were investigation of materials and package modules for terahertz wave generation and detection, and setup of the terahertz system for time domain spectroscopy(TDS), T-ray imaging and sub-THz wireless communication. In addition to Poly-GaAs film as a photoconductive switching antenna material, a table-top scale for the THz-TDS/imaging system and terahertz continuous wave(CW) generation systems for sub-THz data transfer and narrow band T-ray imaging were designed. Dielectric properties of ferroelectric BSTO($Ba_xSr_{1-x}TiO_3$) films and chalcogenide glass systems were characterized with the THz-TDS system at the THz frequency range. Package modules for terahertz wave transmitter/receiver(Tx/Rx) photoconductive antenna were developed.

Fabrication and characteristic analysis of High-Tc superconducting microstrip antennas using direct inset feeding technique (직접삽입 급전 방식을 이용한 고온초전도 마이크로스트립 안테나의 제작 및 특성 해석)

  • Chung, Dong-Chul;Han, Byoung-Sung;Kim, Jin;Ryu, Ki-Su;Hong, Suck-Yong;Lee, Jong-Ha
    • Journal of the Institute of Electronics Engineers of Korea TE
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    • v.37 no.1
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    • pp.70-78
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    • 2000
  • In applying high-${\underline{T_c}}$ superconducting material to microwave devices, Uncertainty of electromagnetics of high-${\underline{T_c}}$ superconductor(HTS) and the temperature dependence of the substrate fits with HTS thin film cause difficulty in realization of such antenna for industrial applications. It must be noted to characteristic the HTS antenna in contrast with normal conducting counterpart for this real application. In this paper, a comparative study between HTS microstrip antennas and gold antennas was reported in terms of the return loss, the characteristic impedance, efficiency, and other various characteristics. HTS thin films were $YBa_2Cu_3O_{7-x}$ (YBCO) on MgO substrates. Superconducting microstrip antennas used in this work were to directly inset a microstrip transmission line into the 50 ${\Omega}$ region of the radiating patch. Measurement results of HTS antennas and gold antennas showed that usable antennas can be made using this architecture.

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Analysis of Shielding Effectiveness of Low Conductivity Shield Layers within Near-field Region (근거리장에 놓인 저전도율 차폐막의 차폐 효과 분석)

  • Lee, Won-Seon;Lee, Won-Hui;Hur, Jung
    • The Journal of the Institute of Internet, Broadcasting and Communication
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    • v.19 no.2
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    • pp.59-65
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    • 2019
  • The EMI shielding effectiveness of shielding layers thickness was analyzed when the low conductivity shielding layers was placed in the near field of the noise source. A spiral antenna with broadband characteristics was used as the noise source, and graphite was selected as the low conductivity shielding material. Two spiral antennas were constructed to analyze the transmission coefficient between two antennas, and the distances between the transmitting and receiving antennas were 5 cm and 10 cm. The thickness of the shielding layers was changed from 1 um to 200 um. The frequency was changed from 100 MHz to 6 GHz to obtain a maximum SE(Shielding Effectiveness) of 70 dB. In this simulation, electronic shielding was used due to the nature of graphite, which is a shielding film material. Based on these results, we will study how to improve the shielding performance by implementing magnetic shielding in the future.