• 제목/요약/키워드: Ferroelectric hysteresis

검색결과 173건 처리시간 0.026초

Fluoride single crystals for UV/VUV nonlinear optical applications

  • Shimamura Kiyoshi;Villora Encarnacion G.;Muramatsu Kenichi;Kitamura Kenji;Ichinose Noboru
    • 한국결정성장학회지
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    • 제16권4호
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    • pp.133-140
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    • 2006
  • The growth characteristics and properties of large size $SrAlF_5$ single crystals are described and compared with those of $BaMgF_4$. Transmission spectra in the vacuum ultraviolet wavelength region indicate a high transparency of $SrAlF_5$ (about 90% without considering surface reflection loses) down to 150 nm, on contrast to the optical loses observed for $BaMgF_4$. The ferroelectric character of $SrAlF_5$ is evidenced by the reversal of the spontaneous polarization in a hysteresis loop. The higher potential of $SrAlF_5$ in comparison with $BaMgF_4$ for the realization of all-solid-state lasers in the ultraviolet wavelength region by the quasi-phase matching (QPM) technique is pointed out. $SrAlF_5$, besides a higher grade of transparency, shows a nonlinear effective coefficient similar to that of quartz and uniaxial nature, on contrast to the one order smaller nonlinear coefficient and biaxial character of $BaMgF_4$. The refractive index of $SrAlF_5$ from the ultraviolet to the near-infrared wavelength region is measured by the minimum deviation method. The Sellmeier and Cauchy coefficients are obtained from the fits to the curves of the ordinary and extraordinary refractive indices, and the grating period for the first order QPM is estimated as a function of the wavelength. The poling periodicity for 193 nm SHG from 386 nm is $4{\mu}m$.

비휘발성 메모리 응용을 위한 VF2-TrFE 박막의 제작 및 특성 (Fabrications and Properties of VF2-TrFE Films for Nonvolatile Memory Application)

  • 정상현;변정현;김현준;김지훈;김광호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.388-388
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    • 2010
  • In this study, Ferroelectric vinylidene fluoride-trifluoroethylene (VF2-TrFE) copolymer films were directly deposited on degenerated Si (n+, $0.002\;{\Omega}{\cdot}cm$) using by spin coating method. A 1~5 wt% diluted solution of purified vinylidene fluoride-trifluoroethylene (VF2:TrFE = 70:30) in a dimethylformamide (DMF) solvent were prepared and deposited on silicon wafers at a spin rate of 2000 ~ 4000 rpm for 2 ~ 30 seconds. After annealing in a vacuum ambient at 100 ~ $200^{\circ}C$ for 60 min, upper aluminum electrodes were deposited by vacuum evaporation for electrical measurement. X-ray diffraction results showed that the VF2-TrFE films on Si substrates had $\beta$-phase of copolymer structures. The capacitance on highly doped Si wafer showed hysteresis behavior like a butterfly shape and this result indicates clearly that the copolymer films have ferroelectric properties. The typical measured remnant polarization ($P_r$) and coercive filed ($E_c$) values were about $5.7\;{\mu}C/cm^2$ and 710 kV/em, respectively, in an applied electric field of ${\pm}$ 1.5 MV/em. The gate leakage current densities measured at room temperature was less than $7{\times}10^{-7}\; A/cm^2$ under a field of 1 MV/cm.

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투광성 Ba(La1/2Nb1/2)O3-PbZrO3-PbTiO3세라믹의 강유전 및 전기광학특성에 관한 연구 (A Study on the Ferroelectic and Electrooptical Properties of the Transparent Ba(LaS11/2TNbS11/2T)OS13T-PbZrOS13T-PbTiOS13T Ceramics)

  • 김준수;류기원;박영희;박창엽
    • 대한전기학회논문지
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    • 제41권8호
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    • pp.858-868
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    • 1992
  • 0.085Ba(LaS11/2TNbS11/2T)OS13T-0.915Pb(ZrS1yTTiS11-yT)OS13T (0.45$\leq$y$\leq$0.65) transparent electrooptic ceramics were fabricated by two-stage sintering method. The structural, ferroelectric and electrooptic properties were investigated varying composition and second sintering time. Also the possibility of application to electrooptic device was studied. If we increase the PbZrOS13T contents, dielectric constants were increased and Curie temperature was decreased. In the composition of 0.55[mol] PbZrOS13T, electromechanical coupling factor and piezoelectric charge constant were the highest values of 43[%] and 173x10S0-12T[C/N], respectively. Mechanical quality factors were decreased with the increasing PbZrOS13T contents. Light transmittance was increased with wavelength when measured from 300[nm] to 900[nm], and with PbZrOS13T contents in the range of 0.50[mol]-0.65[mol], and had the highest value of 67[%] in the composition of 0.65[mol] PbZrOS13T. From the results of ferroelectric hysteresis loop and transmitted light intensity with electric field, the specimens with compositions of 0.65,0.60,0.55[mol] PbZrOS13T were applicable to electrooptic memory device and those with compositions of 0.50,0.45[mol] PbZrOS13T were applicable to linear electrooptic device.

소결 조건이 스크린 인쇄법으로 제조한 PZT계 후막의 물성에 미치는 영향 (Effect of Sintering Conditions on Properties of PZT-based Thick Films Prepared by Screen Printing)

  • 이봉연;천채일;김정석;김준철;방규석;이형규
    • 한국세라믹학회지
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    • 제38권10호
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    • pp.948-952
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    • 2001
  • 스크린 인쇄법으로 알루미나 기판 위에 PZT 후막을 제조하였으며, 공기 또는 Pb 분위기의 $750{\sim}1050^{\circ}C$에서 1시간 동안 소결하여 소결 조건이 후막의 물성에 미치는 영향을 조사하였다. 공기 중에서 $950^{\circ}C$ 이상의 온도로 소결한 PZT 후막에는 파이로클로 상이 제 2상으로 존재하고 있었으며, Pb분위기에서 소결한 PZT 후막이 공기 중에서 소결한 후막보다 치밀한 미세구조와 큰 유전상수 그리고 잘 발달된 P-E 이력특성을 보였다. $900^{\circ}C$의 Pb 분위기에서 소결한 PZT 후막은 잘 포화된 전형적인 강유전 P-E 이력곡선 모양을 보였으며, 잔류분극과 항전계가 각각 $29.8{\mu}C/cm^2$, 48.4 kV/cm이었다.

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강유전막의 잔류 분극 상태와 내부 전계가 Pt/Pb(Zr,Ti)O3/Pt 커패시터의 수소 열화 특성에 미치는 영향 (Effects of Remanent Polarization State and Internal Field in Ferroelctric Film on the Hydrogen-induced Degradation Characteristics in Pt/Pb(Zr, Ti)O3/Pt Capacitor)

  • 김동천;이강운;이원종
    • 한국재료학회지
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    • 제12권1호
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    • pp.75-81
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    • 2002
  • The ferroelectric properties of Pb(Zr,Ti)O$_3$[PZT] films degrade when the films with Pt top electrodes are annealed in hydrogen containing environment. This is due to the reduction activity of atomic hydrogen that is generated by the catalytic activity of the Pt top electrode. At the initial stage of hydrogen annealing, oxygen vacancies are formed by the reduction activity of hydrogen mainly at the vicinity of top Pt/PZT interface, resulting in a shift of P-E (polarization-electric field) hysteresis curve toward the negative electric field direction. As the hydrogen annealing time increases, oxygen vacancies are formed inside the PZT film by the inward diffusion of hydrogen ions, as a result, the polarization degrades significantly and the degree of P-E curve shift decreases gradually. The direction and the magnitude of the remnant polarization in the PZT film affect the motion of hydrogen ions which determines the degradation of polarization characteristics and the shift in the P-E hysteresis curve of the PZT capacitor during hydrogen annealing. When the remnant polarization is formed in the PZT film by applying a pre-poling voltage prior to hydrogen annealing, the direction of the P-E curve shift induced by hydrogen annealing is opposite to the polarity of the pre-poling voltage. The hydrogen-induced degradation behavior of the PZT capacitor is also affected by the internal field that has been generated in the PZT film by the charges located at the top interface prior to hydrogen annealing.

RF 마그네트론 스퍼터링법에 의한 MFM 구조의 $SrBi_2Ta_2O_9$ 박막 특성에 관한 연구 (A study on the characteristics of MEM structure of $SrBi_2Ta_2O_9$ thin films by RE magnetron sputtering)

  • 이후용;최훈상;최인훈
    • 한국진공학회지
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    • 제9권2호
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    • pp.136-143
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    • 2000
  • RF magnetron sputtering법으로 $SrBi_2Ta_2O_9$ (SBT)박막을 상온에서 p-type Si(100) 기판위에 증착하여 DRO 강유전체 메모리(destructive read out ferroelectric random access memory)에 사용되는 강유전체막으로 Pt/SBT/Pt/Ti/$SiO_2$/Si (MFM)구조의 응용가능성을 확인하였다. 구조적인 특징들이 열처리 시간의 변화와 Ar/$O_2$의 가스 유량비의 변화에 따라서 XRD(x-ray diffractometer)에 의해 관찰되었으며 표면 특성은 FE-SEM(field emission scanning electron microscopy)에 의해서 관찰하고 박막의 전기적 특성들은 P-V(polarization-voltage measurement)와 I-V(current-voltage measurement)를 사용하여 관찰하였다. 스퍼터링 증착시 Ar/$O_2$의 가스 유량비는 1:4에서 4:1까지 변화 시켰고 SBT박막은 상온에서 증착시켰다. XRD 측정시 박막들은 SBT의 (105), (110) peak들을 나타내었다. 상온에서 증착시킨 박막은 1시간, 2시간 동안 산소 분위기에서 $800^{\circ}C$ 열처리를 하여 결정화 시켰다. SBT 박막의 P-V곡선은 이력 곡선의 모양을 갖추었으며 비대칭적인 강유전체 특성을 나타내었다. Ar/$O_2$ 가스유량비가 1 : 1, 2 : 1인 경우에 박막의 누설 전류밀도 값이 제일 좋았으며, 그 값은 3V 5V 7V에서 각각 $3.11\times10^{-8} \textrm{A/cm}^2$, $5\times10^{-8}\textrm{A/cm}^2$, $7\times10^{-8}\textrm{A/cm}^2$ 이었다. 열처리 시간을 2시간으로 증가시킨 후, 그들의 전기적 특성과 결정화특성이 개선됨을 확인하였다. AES 분석 및 EPMA분석으로 SBT박막의 깊이 분포 및 조성을 확인하였다.

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압전재료의 기초 물성 측정 (Practical Guide to the Characterization of Piezoelectric Properties)

  • 강우석;이건주;조욱
    • 한국전기전자재료학회논문지
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    • 제34권5호
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    • pp.301-313
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    • 2021
  • 본 논문은 대학 연구실과 산업현장에서 강유전 압전 분야 연구를 갓 시작한 이들이 압전 소재의 특성에 대한 기초적, 이론적 개념에 대해서는 각종 교과서와 논문을 통해 쉽게 접할 수 있는 반면, 그 특성들이 실제로 어떻게 측정되고 평가되는 지에 대한 정보를 얻기가 힘들다는 점에 착안하여 압전 분야 입문자가 관련 측정 기술을 보다 쉽게 이해하고 접근할 수 있도록 돕는 것을 목적으로 한다. 기초 유전 물성인 임피던스에 기반한 유전상수와 유전손실 측정법을 시작으로 압전상수, 전기기계결합계수, 품질계수 및 측정 방법에 대해 논의하고, 강유전성을 대표하는 전계에 따른 분극 변화 측정법에 대해 기술하였다. 본 논문에서는 이미 표준화되어 있는 측정법들을 소개하고 있지만, 이를 숙지하고 응용한다면 보다 도전적이고 창의적인 측정법을 도출할 수 있을 것으로 기대한다.

고상 반응법에 의해 제조된 Pb$(Zr_xTi_{1-x})O_3$ 세라믹스에서 펄스 전계에 의한 전자 방출 (Pulse electric field-excited electron emission from Pb$(Zr_xTi_{1-x})O_3$ ceramics prepared by conventional solid state reaction)

  • 곽상희;김태희;박경봉;김창수
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 D
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    • pp.1867-1869
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    • 1999
  • Pulse electric field induced electron emission from ferroelectrics has been studied with Pb$(Zr_xTi_{1-x})O_3$ ceramics with varying Zr/Ti ratio from 35/65 to 65/35, Electron emission was proved to be concentrated on the electrode edge by emission profile test and emission capture photographs. The 65/35 composition showed largest emission charge in lowest field and lowest emission threshold field. The emission characteristics are closely dependent on their ferroelectric properties in hysteresis curve. Electron emission charge increases with the polarization charge and emission threshold voltage is dependent on coercive field regardless of their composition. But dielectric constant has little relation with emission property. Electron emission charge increases exponentially with pulse electric field irrespective of composition. On the assumption that the surface potential is linear with the pulse electric field, electron emission can be regarded as a field emission at the electrode edge using Fowler-Nordheim plot of ln$(Q_e/E_{fe})$ to $1/E_{fe}$.

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하부전극 변화에 따른 PZT 박막 특성에 관한 연구 (The effects of PZT thin film capacitor with various bottom electrode)

  • 박영;정규원;임승혁;송준태
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 D
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    • pp.1986-1988
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    • 1999
  • Ferroelectric lead zirconate titanate(PZT) thin films were prepared on various bottom electrodes by rf magnetron sputtering methode. The structural phase and surface morphology of the PZT thin films were largely affected by the bottom electrodes. P-E curves of PZT thin films deposited on Pt. $RuO_2$ and Ru/$RuO_2$ bottom electrode showed typical P-E hysteresis loop. The measure values of $P_r,\;E_c$ of the Ru/PZT/Ru/$RuO_2$ capacitor were $16.9{\mu}C/Cm^2$, 140kV/ cm, respectively. The Ru/PZT/Ru/$RuO_2$ capacitors were fatigue free uP to nearly $10^9$ switching cycle but Pt/PZT/Pt capacitor showed 34% degradation uP to $10^9$ switching cycle.

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새로운 방법으로 제조된 적층구조 $BaTiO_3$ 박막의 전기적 특성에 관한 연구 (Study on the electric properties of layered $BaTiO_3$ films prepared new stacking method)

  • 송만호;이윤희;한택상;오명환;윤기현
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 하계학술대회 논문집 C
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    • pp.1129-1132
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    • 1995
  • In the preparation of the layered $BaTiO_3$ thin films with high performance, the new stacking method using the continuous cooling of the substrate was introduced. Amorphous/polycrystalline $BaTiO_3$ layered structure was confirmed by SEM and index of refraction. The layered $BaTiO_3$ thin films formed by the new stacking method showed such a high dielectric constant that the layered structure could not be explained by a stacking structure of the two defined layers but could only be explained by multi-layered structure, i.e. amorphous/micro crystalline/polycrystalline structure. The layered $BaTiO_3$ thin film with a thickness of 240 nm showed higher capacitance per unit area and breakdown strength than the double layered $BaTiO_3$ thin film prepared by the conventional stacking method. And well defined ferroelectric hysteresis leer was observed in the layered $BaTiO_3$ thin film with a thickness of 200 nm.

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