• Title/Summary/Keyword: Fermi Function

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Electronic Structure of Pd(111) using Angle-Resolved Phothemission Spectroscopy (각분해 광전자 분광법을 이용한 Pd(111)의 전자구조 연구)

  • Hwang, Do-Weon;Kang, Jeong-Soo;Hong, Jae-Hwa;Jeong, Jae-In;Moon, Jong-Ho;Kim, Kun-Ho;Lee, Jeoung-Ju;Lee, Young-Pak;Hong, Soon-Cheol;Min, Byung-Il
    • Journal of the Korean Vacuum Society
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    • v.5 no.1
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    • pp.14-24
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    • 1996
  • We have investigated atomic and electronic structures of a clean Pd(111) surface using low energy electron diffraction (LEED) and angle-resolved photoemission spectroscopy (ARPES). A typical clean LEED pattern with a 3-fold symmetry has been observed, corresponding to that for an fcc (111) surface. ARPES measurements have been performed along the $\Gamma-M,\Gamma-K,\Gamma-M$TEX> symmetry lines, from which the experimental band structure of Pd(111) has been determined. The experimental band structure and work function of Pd(111) surface are found to agree well with the calculated band structure of bulk Pd and the calculated work function of Pd(111), respectively. However, the peak positions in the experimental band structure are located closer to the Fermi level than in the theoretical band structure by 0.1~0.8 eV, depending on the $\kappa$-points in the Brillouin zone. In additin, the experimental band widths are narrower than the theoretical band widths by about 0.5eV. The effects of the localized surface Pd 4d states and the Coulomb interaction between Pd 4d bulk electrons have been discussed as possible origins of such discrepancies between experiment and theory.

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Perpendicular Spin-transfer Torque in Asymmetric Magnetic Tunnel Junctions: Material Parameter Dependence (비대칭 자기터널접합에서의 수직 스핀 전달 토크: 물질 변수에 대한 의존성)

  • Han, Jae-Ho;Lee, Hyun-Woo
    • Journal of the Korean Magnetics Society
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    • v.21 no.2
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    • pp.52-55
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    • 2011
  • Spin-transfer torque is a useful tool to control the magnetic state in nanostructures. In magnetic tunnel junctions, the spin-transfer torque has two components, the in-plane spin torque and the perpendicular spin torque. While properties of the in-plane spin-transfer torque are relatively well understood, properties of the perpendicular spin-transfer torque still remain controversial. A recent experiment demonstrated that in asymmetric magnetic tunnel junctions, the bias voltage dependence of the perpendicular spin-transfer torque contains both linear and quadratic terms in the bias. However it still remains unexplored how the bias voltage dependence changes as a function of material parameters. In this paper, we systematically investigate the perpendicular spin-transfer torque in asymmetric magnetic tunnel junction by varying spin splitting energy, work function difference, and Fermi energy of the ferromagnetic metal leads.

Phonon Scattering and Impact ionization for Silicon using Full Band Model at 77K (풀밴드 모델을 이용한 77K Si의 포논산란 및 임팩트이온화에 관한 연구)

  • 유창관;고석웅;정학기;이종인
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 1999.11a
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    • pp.552-554
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    • 1999
  • Phonon scattering and impact ionization models have been presented to analyze hot carrier transport in high energy region, using full band model and Fermi's golden rule. We have investigated temperature dependent properties for impact ionization process of Si using realistic energy band structures at 77K and look. The realistic full band model, obtained from the empirical pseudopotential method with local from factors, is used to calculate scattering rate. The accurate calculation of impact ionization rate requires the use of a wavevector- and frequency-dependent dielectric function ξ ( q,$\omega$). The empirical phonon scattering rate P$\sub$ph/, is given by deriving from linear function for P$\sub$ph/ versus D(E) since the phonon scattering rate is linearly depended on density of states D(E). Impact ionization rate p,, is calculated from the first principle's theory. and fitted by modified Keldysh formula having power of above 2.

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A Graphene-electrode-based Infrared Fresnel Lens with Multifocal Function (다초점 기능을 갖는 그래핀 전극 기반 적외선 프레넬 렌즈)

  • Nam, Guk Hyun;Lee, Jong-Kwon
    • Korean Journal of Optics and Photonics
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    • v.33 no.1
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    • pp.28-34
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    • 2022
  • We study through computational simulation the focal performance of an infrared (IR) Fresnel lens, composed of a multilayer-graphene zone plate formed under a graphene electrode. Here the Fermi level EF of the patterned multilayer graphene is adjusted by the overlying graphene electrode. The Fresnel lens effect, with respect to the reflectance contrast between the graphene electrode and the 8-layer graphene zone plate placed on a glass substrate, has been analyzed over a broad wavelength range from 4 to 30 ㎛. As the optimal wavelength of 8 ㎛ (considering the reflectance and the reflectance-contrast ratio) is incident upon the Fresnel lens with a focal length of 240 ㎛, the focal intensity is enhanced by a factor of 4.3 as the EF of multilayer graphene increases from 0.4 eV to 1.6 eV, and is improved by a factor of 5.8 as the number of graphene layers increases from two to eight. As a result, an all-graphene-based IR Fresnel zone-plate lens, exhibiting multifocal function (240 ㎛ and 360 ㎛) according to the selected EF, is proposed as an ultrathin lens platform.

Analysis of Channel Doping Profile Dependent Threshold Voltage Characteristics for Double Gate MOSFET (이중게이트 MOSFET의 채널도핑분포의 형태에 따른 문턱전압특성분석)

  • Jung, Hak-Kee;Han, Ji-Hyung;Lee, Jae-Hyung;Jeong, Dong-Soo;Lee, Jong-In;Kwon, Oh-Shin
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2011.05a
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    • pp.664-667
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    • 2011
  • In this paper, threshold voltage characteristics have been analyzed as one of short channel effects occurred in double gate(DG)MOSFET to be next-generation devices. The Gaussian function to be nearly experimental distribution has been used as carrier distribution to solve Poisson's equation, and threshold voltage has been investigated according to projected range and standard projected deviation, variables of Gaussian function. The analytical potential distribution model has been derived from Poisson's equation, and threshold voltage has been obtained from this model. Since threshold voltage has been defined as gate voltage when surface potential is twice of Fermi potential, threshold voltage has been derived from analytical model of surface potential. Those results of this potential model are compared with those of numerical simulation to verify this model. As a result, since potential model presented in this paper is good agreement with numerical model, the threshold voltage characteristics have been considered according to the doping profile of DGMOSFET.

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Effects of sulfur treatments on metal/InP schottky contact and $Si_3$$N_4$/InP interfaces (황처리가 금속/InP Schootky 접촉과 $Si_3$$N_4$/InP 계면들에 미치는 영향)

  • Her, J.;Lim, H.;Kim, C.H.;Han, I.K.;Lee, J.I.;Kang, K.N.
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.31A no.12
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    • pp.56-63
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    • 1994
  • The effects of sulfur treatments on the barrier heithts of Schottky contacts and the interface-state density of metal-insulator-semiconductor (MIS) capacitors on InP have been investigated. Schottky contacts were formed by the evaporation of Al, Au, and Pt on n-InP substrate before and after (NH$_{4}$)$_{2}$S$_{x}$ treatments, respectively. The barrier height of InP Schottky contacts was measured by their current-voltage (I-V) and capacitance-voltage (C_V) characteristics. We observed that the barrier heights of Schottky contacks on bare InP were 0.35~0.45 eV nearly independent of the metal work function, which is known to be due to the surface Fermi level pinning. In the case of sulfur-treated Au/InP ar Pt/InP Schottky diodes, However, the barrier heights were not only increased above 0.7 eV but also highly dependent on the metal work function. We have also investigated effects of (NH$_{4}$)$_{2}$S$_{x}$ treatments on the distribution of interface states in Si$_{3}$N$_{4}$InP MIS diodes where Si$_{3}$N$_{4}$ was provided by plasma enhanced chemical vapor deposition (PECVD). The typical value of interface-state density extracted feom 1 MHz C-V curve of sulfur-treated SiN$_{x}$/InP MIS diodes was found to be the order of 5${\times}10^{10}cm^{2}eV^{1}$. This value is much lower than that of MiS diodes made on bare InP surface. It is certain, therefore, that the (NH$_{4}$)$_{2}$S$_{x}$ treatment is a very powerful tool to enhance the barrier heights of Au/n-InP and Pt/n-InP Schottky contacts and to reduce the density of interface states in SiN$_{x}$/InP MIS diode.

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