• 방송공학회논문지
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• 제12권5호
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• pp.391-400
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• 2007

애니메이션을 제작함에 있어 표현에 대한 방식은 실로 무궁무진하며 그것이야말로 실사영화에서는 볼 수 없는 애니메이션만이 가진 표현의 강점이며 관객들에게 어필할 수 있는 최대의 무기중 하나이다. 그럼에도 불구하고 극장 상영을 위한 장편 애니메이션을 제작함에 있어서 제작자들에게 선택되어온 제작기법은 Drawing, 3D Computer, Clay등과 같이 지극히 획일적이다. 상업적인 목적을 가지고 제작된 애니메이션은 시각적인 스타일면에서 대중성을 확보해야 하지만 표현성에서 대중적이라 함은 획일화되어 있는 스타일과 제작기법을 의미하는 것은 아니며 대중을 매료시킬 수 있는 예술성이라는 측면에서 이해되어야 한다. 관객은 항상 새로운 소재, 새로운 연출, 새로운 시각적 스타일을 원한다. 천편일률적으로 파일화 된 애니메이션은 관객들에게 외면 당 할 수밖에 없을 것이다 따라서 상업적인 목적으로 기획, 제작되어진 애니메이션이라 할지라도 작품자체가 예술적 가치를 지니고 있지 못한다면 가시적인 상업적 가치 또한 기대하기 어렵다. 애니메이션을 제작하기 위해 시각적 스타일을 디자인한다는 것은 아트워크 자체에 국한되는 문제가 아니며 작품의 내용과 분위기 그리고 캐릭터가 반영된 움직임의 스타일까지 포함되는 디자인이어야 한다. 여기에 더해 완성된 디자인을 제작적인 측면에서 실현할 수 있도록 제작 프로세스 또한 치밀하게 계산되고 실험되어야 한다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2012년도 추계총회 및 학술대회 논문집
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• pp.12-13
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• 2012

An environmentally friendly method for in situ growth of Mg-Al hydrotalcite (HT) film on AZ31 magnesium alloy has been developed. The growth processes and corrosion resistance of the HT film were investigated. Then the HT film was surface modified by phytic acid solution to further improve the corrosion resistance. The film formation involves the dissolution of AZ31 substrate, adsorption of the ions from solution, nucleation of the precursor, followed by the dissolution of $Al^{3+}$, exchanging of $OH^-$ by $CO{_3}^{2-}$ and growth of the HT film. The HT film is very compact and acts as a barrier against $Cl^-$ attack in the early stage of corrosion, and then the surface of the film is dissolved gradually. This dense HT film can provide effective protection to the AZ31 alloy. The HT film with surface modification by phytic acid presents a self-healing feature and exhibits better corrosion resistance.

• 한국생산제조학회지
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• 제24권4호
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• pp.455-462
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• 2015

A feature line is a visually noticeable creased line on outer automotive panels. Feature lines play an important role in creating a good impression of a car. Even though the manufacturing quality of feature lines is important, it is difficult to achieve the designed shape owing to the springback of sheet metal. The current study presents five methods of making samples that will be used in a visual experiment to discover a quality control quantitative manufacturing allowance for feature lines. Measurement and inspection methods for the samples are also presented. The results show that plunge machining is the most accurate way to make the desired shape, and that wrapping the machined surface with sheet film is an appropriate way to emulate the roughness and visual texture of the painted outer panels of a car.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.1038-1039
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• 2004

We developed a new photoresist which was composed of polyaniline, uv-curing agent, N-methyl-2- pyrrolidine (NMP) and N-Butyl alcohol (BuOH) as solution. The photoresist is characterized by the capability of being developed in water. We successfully patterned pentacene thin film, which was vulnerable to organic solvent and thus could not be patterned by the conventional photolithography process, with the water soluble photoresist and the minimum feature size was found to be 2um.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.831-833
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• 2008

150 nm thick Ga-doped ZnO thin film, which was deposited by a sputtering process, was wet-chemically etched by using various organic acids such as oxalic, citric and formic acid. Wet etch parameters including etchant concentration and temperature are investigated for each etchant, and their effects on the etch rate and the feature of edge line are compared.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.229-229
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• 2012

Adhesion of Copper film on the aluminum oxide layer formed by anodizing an aluminum plate was enhanced by applying ion beam mixing method. Forming an conductive metal layer on the insulating oxide surface without using adhesive epoxy bonds provide metal-PCB(Printed Circuit Board) better thermal conductivities, which are crucial for high power electric device working condition. IBM (Ion beam mixing) process consists of 3 steps; a preliminary deposition of an film, ion beam bombardment, and additional deposition of film with a proper thickness for the application. For the deposition of the films, e-beam evaporation method was used and 70 KeV N-ions were applied for the ion beam bombardment in this work. Adhesions of the interfaces measured by the adhesive tape test and the pull-off test showed an enhancement with the aid of IBM and the adhesion of the ion-beam-mixed films were commercially acceptable. The mixing feature of the atoms near the interface was studied by scanning electron microscopy, Auger electron spectroscopy, and X-ray photoelectron spectroscopy.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.782-784
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• 2002

Many compound semiconductors which have high carrier mobility and small band gap have attentive in application of various practical a field. Especially, InSb served for Hall device and magnetic resistor such as magnetic sensor because InSb thin film has high mobility. Many studies on InSb thin film deposition because In and Sb has been very different feature of vapor pressure($10^4$ times) When In and Sb deposited. In this paper studied it In and Sb deposited simultaneously using by method of co-sputtering deposotion. This process, get to effects of manufacture process simplification. After that this paper observed micro structure and electronic behavior of InSb thin film using by co-sputtering.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.370-374
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• 2002

Many compound semiconductors which have high carrier mobility and small band gap have attentive in application of various practical a field. Especially, InSb served for Hall device and magnetic resistor such as magnetic sensor because InSb thin film has high mobility. Many studies on InSb thin film deposistion because In and Sb has been very different feature of vapor pressure ($10^{-4}$ times) When In and Sb deposited. In this paper studied it In and Sb deposited simultaneously using by method of co-sputtering deposotion. This process, get to effects of manufacture process simplification. After that this paper observed micro structure and electronic behavior of InSb thin film using by co-sputtering and we study properties of magneto-resistance by annealing.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 제4회 영호남학술대회 논문집
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• pp.128-132
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• 2002

Many compound semiconductors which have high carrier mobility and small band gap have attentive in application of various practical a field. Especially, InSb served for Hall device and magnetic resistor such as magnetic sensor because InSb thin film has high mobility. Many studies on InSb thin film deposistion because In and Sb has been very different feature of vapor pressure($10^{-4}$ times) When In and. Sb deposited. In this paper studied it In and Sb deposited simultaneously using by method of co-sputtering deposotion. This process, get to effects of manufacture process simplification. After that this paper observed micro structure and electronic behavior of InSb thin film using by co-sputtering and we study properties of magneto-resistance by annealing

• 전자공학회논문지CI
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• 제47권4호
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• pp.25-33
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• 2010

본 논문에서는 단일 카메라를 이용하여 얼굴의 움직임 정보를 추정하고 3차원 모델을 합성하기 위한 기법을 제안한다. 먼저 단일 카메라 입력 영상에서 사용자의 얼굴 영역 특징 점 취득을 위한 4개의 하부 이미지를 획득한다. 획득된 4개의 하부 이미지를 템플릿으로 사용하여 사용자 얼굴 영역의 정보를 추출하며, 이들 4개의 특징 점을 사용하여 사용자 얼굴과 카메라 영상 평면 사이의 사영 관계를 계산한다. 취득된 카메라 행렬로부터 얼굴의 움직임 정보인 이동과 회전 성분을 추정할 수 있으며, 이를 기반으로 3차원 모델의 자세 정보를 설정한 다음 이를 사용자 얼굴에 가상의 객체를 합성하기 위한 정보로 이용한다. 다양한 실험을 통하여 사용자 얼굴의 움직임에 대한 정보 추출의 정확도를 검증하였다.