• Journal of the Korean Magnetics Society
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• v.9 no.6
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• pp.296-300
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• 1999

Cross-shape structures of spin tunneling junctions were fabricated using DC magnetron sputtering and metal masks. The film structures were $substrate/Ta/NiFe/FeMn/NiFe/CoFe/Al_2O_3/CoFe/NiFe$ and $substrate/Ta/NiFe/CoFe/ Al_2O_3/CoFe/NiFe/FeMn/NiFe$. Fabrication conditions of insulating layer ($Al_2O_3$) and thickness and sputtering power of each film layer were varied, and maximum magnetoresistance ratio of 24.3 % was obtained. Magnetic characteristic variations in the above mentioned two structures and two types of substrates (Corning glass 7059 and Si(111)) were compared. Annealing of the junctions was performed to find out magnetic characteristic variations expected from the device fabrication. Magneoresistance Ratio were observed to maintain as-deposited value up to 150 $^{\circ}C$ annealing and then to drop rapidly after 180 $^{\circ}C$ annealing.

• Journal of the Korean Vacuum Society
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• v.16 no.1
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• pp.1-6
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• 2007

We have analyzed the atomic structure of O/Fe(100) and interface atomic structure of MgO deposited on Fe(100) surface using LEED I/V curve analysis. As the O adsorption on the Fe(100) surface, the first substrate interlayer distance is expanded by up to 16%. For 1ML MgO deposited on Fe(100) surface, the oxygen ions of MgO are located on-top of the Fe atoms, the interlayer distance at the MgO/Fe interface are expanded. From the AIA(average intensity mixing approximation) calculation, we find the interface structure of monolayer MgO on Fe(100) system has the two interface structure with MgO/FeO/Fe(100) and MgO/Fe(100). This supports the results of EELS experiment that shown existence of stretched FeO layer and coexistance of MgO/FeO/Fe(100) and MgO/Fe(100) structure.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.212-212
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• 2003

Many of the spin valve multilayer structures with FeMn as antiferromagnetic layer consist of a NiFe/FeMn/NiFe trilayer where the bottom NiFe layer is the seed layer to facilitate the growth of (111) gama-FeMn antiferromagnetic phase and the top NiFe layer forms the pinned layer[1], In this study, exchange bias of bottom NiFe layer has been investigated as functions of thicknesses of top and bottom NiFe in NiFe/FeMn/NiFe, prepared by rf magnetron sputtering, MH-loop was measured by vibration sample magnetometer (VSM). Two hysteresis loops are corresponded to bottom and top layers, similar to reported loops in spin valve structure. Exchange bias of bottom NiFe could be induced by the interfacial coupling between bottom NiFe and FeMn. But those coupling are strongly dependent on the top and bottom NiFe thicknesses, revealing anomalous character ul exchange bias of bottom NiFe layer.

• Journal of the Korean Magnetics Society
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• v.12 no.4
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• pp.132-136
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• 2002

Enhancement of crystallinity and exchange bias characteristics for NiFe/FeMn/NiFe trilayer with Si buffer layer fabricated by ion-beam deposition were examined. A Si buffer layer promoted (111) texture of fcc crystallities in the initial growth region of NiFe layer deposited on it. FeMn layers deposited on Si/NiFe bilayer exhibited excellent (111) crystal texture. The antiferromagnetic FeMn layer between top and bottom NiFe films with the buffer Si 50 ${\AA}$-thick induced a large exchange coupling field Hex with a different dependence. It was found that H$\sub$ex/ of the bottom and top NiFe films with Si buffer layer revealed large value of about 110 Oe and 300 Oe, respectively. In the comparison of two Ta and Si buffer layers, the NiFe/FeMn/NiFe trilayer with Si could possess larger exchange coupling field and higher crystallinity.

• Journal of Magnetics
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• v.13 no.3
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• pp.97-101
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• 2008

We investigated the exchange bias fields at the NiFe/FeMn and FeMn/CoFe interfaces in 18.9-nm NiFe/15.0-nm FeMn/17.6-nm CoFe trilayer thin films as the annealing temperature was varied from room temperature to $250^{\circ}C$ in a vacuum for 1 hour in a magnetic field of 150 Oe. Interestingly, magnetic hysteresis (M-H) measurements showed that NiFe/FeMn/CoFe trilayer thin films exhibited a completely contrasting variation of the exchange bias fields at both the NiFe/FeMn and FeMn/CoFe interfaces with annealing temperatures. High-angle X-ray diffraction (XRD) measurements indicated the absence of any discernible effect of thermal treatment on the NiFe(111) and FeMn(111) peaks. The compositional depth profile obtained from X-ray photoelectron spectroscopy (XPS) results presented the asymmetric compositional depth profiles of the Mn and Fe atoms throughout the FeMn layer. We contend that this asymmetric compositional depth profile and the preferential Mn diffusion into the NiFe layer, compared to that into the CoFe layer, are conclusive experimental evidence of the contrasting variation of the exchange bias fields at two interfaces having a common polycrystalline FeMn(111) layer.

• Journal of Korean Society of Environmental Engineers
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• v.30 no.3
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• pp.323-330
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• 2008

The study presents the results of 1,4-dioxane degradation using zero valent (Fe$^0$) or Fe$^{2+}$ ions with and without UV. During the reaction, the change of [Fe$^{2+}$] and [Fe$^{2+}$]/[Fe(t)], the concentration ratio of ferrous ion to total iron ion in solution was measured. Less than 10% degradation of 1,4-dioxane was observed by UV-only, Fe$^0$-only, and Fe$^{2+}$-only conditions, and also the changes of [Fe$^{2+}$] and [Fe$^{2+}$]/[Fe(t)] were minimal in each reaction. However, the oxidation of Fe$^0$ was enhanced with the irradiation of UV by approximately 25% and the improvement of 1,4-dioxane degradation was observed. Fenton reaction ($Fe^{2+}+H_2O_2$) showed higher degradation efficiency of 1,4-dioxane until 90 min, which of the degradation was stopped after that time. In the reaction of Fe$^{2+}$ and UV, the ratio of [Fe$^{2+}$]/[Fe(t)] decreased then slowly increased after a certain time indicating the reduction of Fe3+ to Fe$^{2+}$. In case of Fe$^0$ in the presence of UV, the first-order rate constant was found to be 1.84$\times$10$^{-3}$ min$^{-1}$ until 90 min, and then changed to 9.33$\times$10$^{-3}$ min$^{-1}$ when the oxidation of Fe$^{2+}$ mainly occurred. In this case [Fe$^{2+}$]/[Fe(t)] kept decreasing for the reaction. However, the addition of perchlortae (ClO$_4^-$) in the reaction of Fe$^0$ and UV induced the continuous increase of [Fe$^{2+}$]/[Fe(t)] ratio. The results mean the primary degradation factor of 1,4-dioxane is the oxidation by the radicals generated from the redox reaction between Fe$^{2+}$ and Fe$^{3+}$. Also, both UV and ClO$_4^-$ played the role inducing the reduction of Fe$^{3+}$, which is important to degrade 1,4-dioxane by enhancing the generation of radicals.

• Journal of the Korean Magnetics Society
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• v.21 no.4
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• pp.132-135
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• 2011

The exchange bias field ($H_{EX}$) and the coercivity ($H_C$) variation and change depending on the thickness of intermediately super-soft magnetic NiFeCuMo layer with different thickness of the bottom NiFe layer were investigated. The $H_{EX}$ of triple pinned NiFe(4 nm)/NiFeCuMo($t_{NiFeCuMo}$= 1 nm)/NiFe(4 nm)/FeMn multilayer has the maximum value more less than one of single pinned NiFe(8 nm)/FeMn layer. If NiFeCuMo layer is inserted each into between the pinned and free NiFe layers, we can be used as GMR-SV device for a bio-sensor that has improved magnetic sensitivity.

• Journal of the Korean Magnetics Society
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• v.11 no.5
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• pp.196-201
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• 2001

The dependence of CoFe interfacial layer thickness and plasma oxidation condition on tunneling magnetoresistance (TMR) in Ta/NiFe/FeMn/NiFe/Al$_2$O$_3$/NiFe/Ta tunnel junctions was investigated. As the CoFe layer thickness increases, TMR ratio rapidly increases to 13.7 % and decreases with further increase of the CoFe layer thickness. The increase of TMR with the CoFe thickness up to 25 was thought to be due mails to the high spin-polarization of CoFe. The maximum MR of 15.3% was obtained in the Si(100)/Ta(50 )/NiFe(60 )/FeMn(250 )/NiFe(70 )/Al$_2$O$_3$/NiFe(150 )/Ta(50 ) magnetic tunnel junction with a 16 Al oxidized for 40 sec using a Ar/O$_2$ (1:4) mixture gas.

• Journal of the Korean Magnetics Society
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• v.1 no.2
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• pp.9-14
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• 1991

In order to investigate electronic and magnetic properties of $Fe_{16}N_{2}$ ferromagnet, we have performed electronic structure calculations employing the self-consistent local density functional LMTO(linearized muffin tin orbital) band method. We have obtained the ground state parameters, such as band structures, density of states, Stoner parameters, and magnetic moments. Based on these results, we have investigated microscopically the magnetic structure and the enhancement of Fe magnetic moments in this compound. Magnetic moments of 3 types of Fe(Fe I, Fe II and Fe III) in $Fe_{16}N_{2}$ are 2.13, 2.50, and $2.85\;{\mu}_{B}$, respectively. Large enhancement of Fe magnetic moment is observed in Fe II and Fe III, which are located rather far from N. This implies that local environment is very important in determining the Fe magnetic moments in this compound. Our value of average magnetic moment per Fe atom. $2.50\;{\mu}_{B}$, is a bit smaller than the reported estimate, $-3.0\;{\mu}_{B}$, from the experiment.

• Journal of the Korean Magnetics Society
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• v.11 no.4
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• pp.146-150
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• 2001

The effect of H$_2$ content in Ar sputtering gas on exchange coupling field(H$_{ex}$) for NiFe/FeMn interface was studied. When NiFe layer of Si(100)/Ta(50 $\AA$)/NiFe(60 $\AA$)/FeMn(250 $\AA$)Ta(50 $\AA$) was deposited at 8% H$_2$ in sputtering gas, the maximum exchange coupling field(H$_{ex}$) and minimum coercivity(H$_{c}$) were obtained. When Si(100)/Ta(50 $\AA$)/NiFe(60 $\AA$)/FeMn(250 $\AA$)/NiFe(70 $\AA$)/Ta(50 $\AA$) was deposited at 5% H$_2$ in sputtering gas, the maximum exchange coupling field(H$_{ex}$) of 148 Oe was obtained. The (111) preferred orientation and grain size of underlayer NiFe were increased and the internal stress was reduced by H$_2$ in sputtering gas. And the (111) preferred orientation and grain size of FeMn layer were also increased.d.ased.