• Proceedings of the IEEK Conference
• /
• 2008.06a
• /
• pp.385-386
• /
• 2008

Reducing the PR(Photoresist) dispense Rate is one of the important issues in Photolithography. It is a main concern that variation in PR dispense rate and existance of microbubble. so we need to measure the photoresist dispense rate more precisely. This paper presented a noble sensor of measuring the PR dispense and detecting the microbubble.

• Proceedings of the Korean Society for Noise and Vibration Engineering Conference
• /
• 2011.04a
• /
• pp.97-102
• /
• 2011

The size of TV and TFT-LCD are bigger and bigger for the next generation exposure equipment install that existing fab are getting a lot of additions. When the new fab build an extension that the shortening of the construction and non-vibration are use cast in place concrete pile method. In this study when lay the foundation of existing fab adjoin use vibration monitoring system are rotator type all casing method among cast in place concrete pile method. The evaluation of ground vibration of rotator type all casing method effect to precision equipment and vibration area of influence.

• Proceedings of the Korea Society for Simulation Conference
• /
• 1998.10a
• /
• pp.133-136
• /
• 1998

본 연구는 복잡하고 다양한 반도체 공저의 모델링을 통하여 반도체 공정 표준화 작업을 목적으로 하고 있다. 급변하는 세계 반도체 시장에서 국내 반도체 업체가 수위를 지킬 수 있는 방안은 공정의 표준화를 제시함으로써 생산업체에서의 신기술 개발에 따른 어려움을 해소하고 기술 개발과 더불어 생산관리 쪽으로의 이동에 대응할 수 있도록 하여 국제 경쟁력을 키워야 할 것이다. 본 연구의 기대효과로는 현장기술자와 장비운용자의 질적 향상을 위한 교육용 자료로의 활용이 가능하다는 것이다. Presentation Tool을 이용한 시청각 교육효과와 시뮬레이션을 이용한 Process Flow Wide View 증진은 현재 국내 반도체 업체들의 신입사원 교육 시 상당한 효과를 거둘 것이라 예상된다. 이는 생산업체에 국한되어지는 것만은 아니며 반도체 공정에 관련된 대학 학과목에서도 활용되어지리라 생각된다. 또한 Modeling & Simulation Tool을 사용하여 공정을 모델링함으로써 표준화를 만든 후 각 제조 업체들은 이러한 모델들은 이용하여 회사의 실정에 맞추어 자사에 대한 시뮬레이션을 손쉽게 수행함으로써 공정 최적화에 따른 경비 절감의 효과를 거둘 수 있을 것이다. 제품별 혹은 같은 제품이라도 Version이 다를 경우 FAB 공정가운데 약 10% 내외만이 바뀌는 점을 감안하면 본 연구를 통해 얻어지는 결과물인 Computer Model과 Simulator는 쉽게 생산현장에 적용할 수 있으리라 여겨진다.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
• /
• 2004.05a
• /
• pp.195-201
• /
• 2004

In design stage of high precision manufacture/inspect ion FAB building, it is necessary to investigate the vibration allowable limits of high precision equipment and to study a structure dynamic characteristics of C/R and Sub-structure in order to provide a structure vibration environment to satisfy thess allowable limits. The aim of this study is to investigate the dynamic characteristics of PC-Type mock-up structures designed for next TFT LCD FAB through vibration measurement and analysis procedure, therefore, to provide a proper dynamic structure design for high precision manufacture/inspection work process, which satisfy thess allowable limits.

• Proceedings of the Korea Information Processing Society Conference
• /
• 2012.04a
• /
• pp.868-871
• /
• 2012

반도체와 LCD 산업 분야, 나노급 공정 및 검사 기술이 요구되는 산업 분야의 수요 증가에 따라 초정밀 가공/생산/검사 장비를 설치, 운용하는 FAB. 구조물의 설계 요구가 층증대 되고 있다. 이에 따라 건물의 환경진동 규제치도 강화되고 있는 실정이다. 이와 같은, 대형 구조물에서 서브마이크로 수준의 미진동(微振動)을 제어하는 문제는 여전히 어려운 과제로 남아 있다. 이는 진동 응답을 결정하는 구조와 재료가 복잡하고 다양한 형태를 갖고 있는 반면, 다루어야 할 동적 응답은 극한적으로 작은 마이크로(micro) 이하의 값을 다루어야 한다. 그러므로, 기존에 이용되고 있는 해석과 실험의 결과만으로는 신모델 설계에 적용하는 것은 어렵다. 따라서, 본 논문에서는 이러한 영역의 경험적 데이터물을 체계적인 데이터베이스로 구축하여 새로운 동적 구조 설계 기술의 기반을 제공하고자 한다.

• Journal of Korean Society of Occupational and Environmental Hygiene
• /
• v.25 no.2
• /
• pp.202-210
• /
• 2015

Objectives: The purpose of this study was to examine clean room(C/R) structure, air conditioning and contamination control systems and to provide basic information for identifying a correlation between the semiconductor work environment and workers' disease. Methods: This study was conducted at 200 mm and 300 mm semiconductor wafer fabrication facilities. The C/R structure and air conditioning method were investigated using basic engineering data from documentation for C/R construction. Furthermore, contamination parameters such as airborne particles, temperature, humidity, acids, ammonia, organic compounds, and vibration in the C/R were based on the International Technology Roadmap for Semiconductors(ITRS). The properties of contamination control systems and the current status of monitoring of various contaminants in the C/R were investigated. Results: 200 mm and 300 mm wafer fabrication facilities were divided into fab(C/R) and sub fab(Plenum), and fab, clean sub fab and facility sub fab, respectively. Fresh air(FA) is supplied in the plenum or clean sub fab by the outdoor air handling unit system which purifies outdoor air. FA supply or contaminated indoor air ventilation rates in the 200 mm and 300 mm wafer fabrication facilities are approximately 10-25%. Furthermore, semiconductor clean rooms strictly controlled airborne particles(${\leq}1,000{\sharp}/ft^3$), temperature($23{\pm}0.5^{\circ}C$), humidity($45{\pm}5%$), air velocity(0.4 m/s), air change(60-80 cycles/hr), vibration(${\leq}1cm/s^2$), and differential pressure(atmospheric pressure$+1.0-2.5mmH_2O$) through air handling and contamination control systems. In addition, acids, alkali and ozone are managed at less than internal criteria by chemical filters. Conclusions: Semiconductor clean rooms can be a pleasant environment for workers as well as semiconductor devices. However, based on the precautionary principle, it may be necessary to continuously improve semiconductor processes and the work environment.

• Natural Product Sciences
• /
• v.6 no.2
• /
• pp.82-85
• /
• 2000

The aqueous ethanolic whole plant extract of Rosa arabica was found to contain the new natural dimeric phenolic compound, ellagic acid 3,3'-dimethyl ether $4-O-{\alpha}-rhamnopyranoside$, 9, along with ten known phenolic metabolites (1-8, 10 and 11). Structures of all compounds (1-11) were established by routine methods of analysis and confirmed by FAB-MS, $^1H\;and\;^{13}C$ NMR spectral analysis.

• Proceedings of the Korea Society for Simulation Conference
• /
• 2002.11a
• /
• pp.115-121
• /
• 2002

The growth of semiconductor industry attracted to researchers like design, facility technique and making small size chip areas. But nowadays, cause of technology extension and oversupply and price down, yield improvement is the most important point on growth. This paper describes the computer mode]ing technique as the solutions to analyze the problem, to formalize the semiconductor manufacturing process and to build advanced manufacturing environments. The computer models are built referring an existing 8' wafer production line in Korea.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
• /
• 1998.10a
• /
• pp.306-312
• /
• 1998

This paper describes syntheses of thickener for di-urea grease using constant velocity joint. The thickeners of di-urea grease were synthesized by reaction of diisocyanate with various alkylamines, hexylamine, octylamine, stearylamine and cyclohexylamine at high temperatxire. The synthesized thickener were analyzed by FT-IR spectroscopy and two kinds of Mass spectroscopy (EI & FAB). Dropping point and Consistency of synthesized di-urea grease were determined.

• Natural Product Sciences
• /
• v.4 no.4
• /
• pp.221-225
• /
• 1998

A novel flavonol trisulphate, quercetin 7-methyl ether $3,3',4'-tri-O-KSO_3$ was isolated from the fresh leaves of Tamarix amplexicaulis (Tamaricaceae) along with the known flavonol mono sulphates, quercetin $3-O-KSO_3$ and quercetin 4'-methyl ether $3-O-KSO_3$. Structures were achieved through conventional analytical methods, including electrophoretic analysis and confirmed by FAB-MS and NMR spectroscopy.