• 제목/요약/키워드: Etching glass

검색결과 258건 처리시간 0.026초

Photosensitive Barrier Rib Paste and Materials and Process

  • Park, Lee-Soon;Kim, Soon-Hak;Jang, Dong-Gyu;Kim, Duck-Gon;Hur, Young-June;Tawfik, Ayman
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.823-827
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    • 2005
  • Barrier ribs in the plasma display panel (PDP) function to maintain the discharge space between the glass plates as well as to prevent optical crosstalk. Patterning of barrier ribs is one of unique processes for making PDP. Barrier ribs could be formed by screen-printing, sand blasting, etching, and photolithographic process. In this work photosensitive barrier rib pastes were prepared by incorporating binder polymer, solvent, functional monomers photoinitiator, and barrier rib powder of which surface was treated with fumed silica particles. Studies on the function of materials for the barrier rib paste were undertaken. After optimization of paste formulation and photolithographic process, it was applied to the photosensitive barrier rib green sheet and was found that photolithographic patterning of barrier ribs could be formed with good resolution up to $110{\mu}m$ height and $60{\mu}m$ width after sintering.

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두 개의 챔버를 갖는 마이크로 버블펌프의 개발 (Development of having double-chamber in micro-bubble pump)

  • 최종필;박대섭;반준호;김병희;장인배;김헌영
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.1186-1190
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    • 2003
  • In this paper, a valveless bubble-actuated fluid micropump was has been developed and its performance was tested. The valveless micropump consists of the lower plate, the middle plate, the upper plate and a resistive heater. The lower plate includes the nozzle-diffuser elements and the double-chamber. Nozzle-diffuser elements and a double-chamber are fabricated on the silicon wafer by the DRIE(Deep Reactive Ion Etching) process. The lower plate also has inlet/outlet channels for fluid flow. The middle plate is made of glass and plays the role of the diaphragm. The chamber in the upper plate is filled with deionized water, and which contacts with the resistive heater. The resistive heater is patterned on a silicon substrate by Ti/Pt sputtering. Three plates and the resister heater are laminated by the aligner and bonded in the anodic bonder. Since the bubble is evaporated and condensed periodically in the chamber, the fluid flows from inlet to outlet with respect to the diffusion effect. In order to avoid backflow, the double chamber system is introduced. Analytical and experimental results show the validity of the developed double-chamber micropump.

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355nm UV 레이저를 이용한 마이크로 렌즈 어레이 쾌속 제작에 관한 연구 (A Study on Rapid Fabrication of Micro Lens Array using 355nm UV Laser Irradiation)

  • 제순규;박상후;최춘기;신보성
    • 소성∙가공
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    • 제18권4호
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    • pp.310-316
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    • 2009
  • Micro lens array(MLA) is widely used in information technology(IT) industry fields for various applications such as a projection display, an optical power regulator, a micro mass spectrometer and for medical appliances. Recently, MLA have been fabricated and developed by using a reflow method having the processes of micro etching, electroplating, micro machining and laser local heating. Laser thermal relaxation method is introduced in marking of microdots on the surface of densified glass. In this paper, we have proposed a new direct fabrication process using UV laser local thermal-expansion(UV-LLTE) and investigated the optimal processing conditions of MLA on the surface of negative photo-resist material. We have also studied the 3D shape of the micro lens obtained by UV laser irradiation and the optimal process conditions. And then, we made chrome mold by electroplating. After that, we made MLA using chrome mold by hot embossing processing. Finally, we have measured the opto-physical properties of micro lens and then have also tested the possibility of MLA applications.

rf 마그네트론 스파터법에 의해 제조된 태양전지용 ZnO:Al 박막의 전기 광학적 특성 (Electrical and Optical Characteristics of ZnO:Al Films Prepared by rf Magnetron Sputtering for Thin Film Solar Cells Application)

  • 전상원;이정철;박병옥;송진수;윤경훈
    • 한국재료학회지
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    • 제16권1호
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    • pp.19-24
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    • 2006
  • ZnO:Al(AZO) films prepared by rf magnetron sputtering on glass substrate and textured by post-deposition chemical etching were applied as front contact and back reflectors for ${\mu}c$-Si:H thin film solar cells. For the front transparent electrode contact, AZO films were prepared at various working pressures and substrate temperature and then were chemically etched in diluted HCl(1%). The front AZO films deposited at low working pressure(1 mTorr) and low temperature ($240^{\circ}C$) exhibited uniform and high transmittance ($\geq$80%) and excellent electrical properties. The solar cells were optimized in terms of optical and electrical properties to demonstrate a high short-circuit current.

High Temperature Durability Amorphous ITO:Yb Films Deposited by Magnetron Co-Sputtering

  • Jung, Tae Dong;Song, Pung Keun
    • 한국표면공학회지
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    • 제45권6호
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    • pp.242-247
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    • 2012
  • Yb-doped ITO (ITO:Yb) films were deposited on unheated non-alkali glass substrates by magnetron cosputtering using two cathodes (DC, RF) equipped with the ITO and $Yb_2O_3$ target, respectively. The composition of the ITO:Yb films was controlled by adjusting the RF powers from 0 W to 480 W in 120 W steps with the DC power fixed at 70 W. The ITO:Yb films had a higher crystallization temperature ($200^{\circ}C$) than that of the ITO films ($170^{\circ}C$), which was attributed to both larger ionic radius of $Yb^{3+}$ and higher bond enthalpy of $Yb_2O_3$, compared to ITO. This amorphous ITO:Yb film post-annealed at $170^{\circ}C$ showed a resistivity of $5.52{\times}10^{-4}{\Omega}cm$, indicating that a introduction of Yb increased resistivity of the ITO film. However, these amorphous ITO:Yb films showed a high etching rate, fine pattering property, and a very smooth surface morphology above the crystallization temperature of the amorphous ITO films (about $170^{\circ}C$). The transmittance of all films was >80% in the visible region.

Electrical Characteristics of Pentacene Thin Film Transistors.

  • Kim, Dae-Yop;Lee, Jae-Hyuk;Kang, Dou-Youl;Choi, Jong-Sun;Kim, Young-Kwan;Shin, Dong-Myung
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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    • pp.69-70
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    • 2000
  • There are currently considerable interest in the applications of conjugated polymers, oligomers, and small molecules for thin-film electronic devices. Organic materials have potential advantages to be utilized as semiconductors in field-effect transistors and light-emitting diodes. In this study, pentacene thin-film transistors (TFTs) were fabricated on glass substrate. Aluminums were used for gate electrodes. Silicon dioxide was deposited as a gate insulator by PECVD and patterned by reactive ion etching (R.I.E). Gold was used for the electrodes of source and drain. The active semiconductor pentacene layer was thermally evaporated in vacuum at a pressure of about $10^{-8}$ Torr and a deposition rate $0.3{\AA}/s$. The fabricated devices exhibited the field-effect mobility as large as 0.07 $cm^2/V.s$ and on/off current ratio as larger than $10^7$.

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다단계 습식 식각을 통한 수소처리된 Al-doped ZnO 박막의 특성 (Properties of Hydorogenated Al-Doped ZnO Films by Multi-Step Texture)

  • 탁성주;강민구;박성은;김용현;김원목;김동환
    • 한국재료학회지
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    • 제19권5호
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    • pp.259-264
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    • 2009
  • In this study we investigated the effect of the multi-step texturing process on the electrical and optical properties of hydrogenated Al-doped zinc oxide (HAZO) thin films deposited by rf magnetron sputtering. AZO films on glass were prepared by changing the $H_2/(Ar+H_2)$ ratio at a low temperature of $150^{\circ}C$. The prepared HAZO films showed lower resistivity and higher carrier concentration and mobility than those of non-hydrogenated AZO films. After deposition, the surface of the HAZO films was multi-step textured in diluted HCl (0.5%) for the investigation of the change in the optical properties and the surface morphology due to etching. As a result, the HAZO film fabricated under the type III condition showed excellent optical properties with a haze value of 52.3%.

4.1” Transparent QCIF AMOLED Display Driven by High Mobility Bottom Gate a-IGZO Thin-film Transistors

  • Jeong, J.K.;Kim, M.;Jeong, J.H.;Lee, H.J.;Ahn, T.K.;Shin, H.S.;Kang, K.Y.;Park, J.S.;Yang, H,;Chung, H.J.;Mo, Y.G.;Kim, H.D.;Seo, H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.145-148
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    • 2007
  • The authors report on the fabrication of thin film transistors (TFTs) that use amorphous indium-gallium-zinc oxide (a-IGZO) channel and have the channel length (L) and width (W) patterned by dry etching. To prevent the plasma damage of active channel, a 100-nm-thckness $SiO_{x}$ by PECVD was adopted as an etch-stopper structure. IGZO TFT (W/L=10/50${\mu}m$) fabricated on glass exhibited the high performance mobility of $35.8\;cm^2/Vs$, a subthreshold gate voltage swing of $0.59V/dec$, and $I_{on/off}$ of $4.9{\times}10^6$. In addition, 4.1” transparent QCIF active-matrix organic light-emitting diode display were successfully fabricated, which was driven by a-IGZO TFTs.

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Study of metal dopants and/or Ag nanoparticles incorporated direct-patternable ZnO film by photochemical solution deposition

  • Kim, Hyun-Cheol;Reddy, A.Sivasankar;Park, Hyung-Ho
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.368-368
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    • 2007
  • Zinc oxide (ZnO) has drawn much interest as a potential transparent conducting oxide (TCO) for applying to solar cell and front electrode of electro-luminescent devices. For the enhancement of electrical property of TCOs, dopant introduction and hybridization with conductive nanoparticles have been investigated. In this work, ZnO films were formed on glass substrate by using photochemical solution deposition of Ag nanoparticles dispersed or various metal (Ag, Cd, In, or Sn) contained photosensitive ZnO solutions. The usage of photosensitive solution permits us to obtain a micron-sized direct patterning of ZnO film without using conventional dry etching procedure. The structural, optical, and electrical characteristics of ZnO films with the introduction of metal dopants with/without Ag nanoparticles have been investigated to check whether there is a combined effect between metal dopants and Ag nanoparticles on the characteristics of ZnO film. The phase formation and crystallinity of ZnO film were monitored with X-ray diffractometer. The optical transmittance measurement was carried out using UV-VIS-NIR spectrometer and the electrical properties such as sheet resistance and conductivity were observed by using four-point probe.

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나노 복화공정의 역방향 적층법을 이용한 직접적 나노패턴 생성에 관한 연구 (Directly Nano-precision Feature Patterning on Thin Metal Layer using Top-down Building Approach in nRP Process)

  • 박상후;임태우;양동열;공홍진
    • 한국정밀공학회지
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    • 제21권6호
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    • pp.153-159
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    • 2004
  • In this study, a new process to pattern directly on a thin metal layer using improved nano replication printing (nRP) process is suggested to evaluate the possibilities of fabricating a stamp for nano-imprinting. In the nRP process, any figure can be replicated from a bitmap figure file in the range of several micrometers with nano-scaled details. In the process, liquid-state resins are polymerized by two-photon absorption which is induced by femto-second laser. A thin gold layer was sputtered on a glass plate and then, designed patterns or figures were developed on the gold layer by newly developed top-down building approach. Generally, stamps fur nano-imprinting have been fabricated by using the costly electron-beam lithography process combined with a reactive ion-etching process. Through this study, the effectiveness of the improved nRP process is evaluated to make a stamp with the resolution of around 200nm with reduced cost.