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Effect of Blood Decontamination on Orthodontic Bracket Bonding (혈액 오염 처리 과정이 교정용 브라켓 접착에 미치는 영향)

  • Lee, Jaehee;Shin, Jisun;Kim, Jongsoo
    • Journal of the korean academy of Pediatric Dentistry
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    • v.44 no.3
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    • pp.341-349
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    • 2017
  • Blood decontamination is an important factor in success of the orthodontic bracket. The purpose of this study is to evaluate the shear bond strength affected by blood decontamination. The shear bond strength was measured on blood decontamination before and after primer photopolymerization. And the adhesive remnants type and surface patterns was evaluated under scanning electron microscopy. A total of 50 human premolars were prepared. Group I was attached using conventional resin-acid etching method as control group. Group II and III were blood contaminated before curing primer and groups IV and V were blood contaminated after curing primer. Group II and IV were treated only with cotton pellet and Groups III and V were treated with cotton pellet after water washing. The mean shear bond strengths were in the order of groups I, V, III, II, and IV. In scanning electron micrographs group III and V showed more uniform surface than group II and IV. The ARI was significantly different between the control group and the experimental groups (p <0.05).

EC-STM Studies on Electrochemical Preparation of Si(111)-H Surfaces (Si(111)-H 표면의 전기화학적 제조에 관한 전기화학적 주사터널링현미경법 연구)

  • Bae, Sang-Eun;Lee, Chi-Woo
    • Journal of the Korean Electrochemical Society
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    • v.5 no.3
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    • pp.111-116
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    • 2002
  • Electrochemical scanning tunneling microscopy was employed to study the evolution of surface morphology during electrochemical preparation of Si(111)-H from Si(111) oxide. Anodic dark current of cyclic voltammogram in 0.2M $NH_4F$ solution (pH 4.7) decreased as the number of cycles increased and remained nearly constant after the second cycle. Then, the Si(111) oxide was entirely stripped, which was followed by H termination on the Si(111) surface. Hydrides at kink and step sites were etched more rapidly than on the terrace, which remained triangle pits with [112] oriented steps where existed stable monohydride. Then, triangle pits deepened. During chronomamperometry at 0.4V anodic dark current shoulder appeared and decreased slowly, indicated the stripping of Si(111) oxide and the formation of stable (112) oriented steps with monohydride. Additionally, the etching mechanism of Si(111)-H in 0.2M $NH_4F(pH 4.7)$ solution at +0.4V was discussed.

Study on the Flame Retardation and Thermal Resistance for CPE Rubber Material Added Etching By-product of Aluminum (알루미늄 엣칭부산물을 첨가한 CPE 고무재료의 난연성 및 내열성 연구)

  • Kim, Kyung Hwan;Lee, Chang Seop
    • Journal of the Korean Chemical Society
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    • v.45 no.4
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    • pp.341-350
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    • 2001
  • Aluminum Hydroxide was employed as a thermal retardent and flame retardent for Chloropolyethylene (CPE) rubbery materials which is the construction material of automotive oil cooler hose. and then cure characteristics, physical properties, thermal resistance and flame retardation of compounded rubber were investigated, and optimum mixing conditions of rubber and flame retarding agent were deduced from the experimental results. CPE rubber material which has excellent properties of chemical corrosion resistance and cold resistance and inexpensive in price was used to prepare rubber specimen. The by-product of ething, produced from the process of surface treatment of aluminum was processed to aluminum hydroxide via crushing and purification, which is characterized by XRD, PSA, SEM and ICP-AES techniques in terms of phase, size, distribution, morphology and components of particles and then mixed to CPE rubber materials in the range of 0~80 phr. Hardness, tensile strength, elongation and thermal properties of compounded rubber specimens were tested. The optimum mixing ratio of rubber to additives to give maximum effect on thermal resistance and flame retardation, within the range of tolerable specification for rubber materials, was determined to be 40 phr. The flame retardation of CPE rubber materials was found to be increased by 5 times at this mixing ratio.

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Property of Composite Titanium Silicides on Amorphous and Crystalline Silicon Substrates (아몰퍼스실리콘의 결정화에 따른 복합티타늄실리사이드의 물성변화)

  • Song Oh-Sung;Kim Sang-Yeob
    • Journal of the Microelectronics and Packaging Society
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    • v.13 no.1 s.38
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    • pp.1-5
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    • 2006
  • We prepared 80 nm-thick TiSix on each 70 nm-thick amorphous silicon and polysilicon substrate using an RF sputtering with $TiSi_2$ target. TiSix composite silicide layers were stabilized by rapid thermal annealing(RTA) of $800^{\circ}C$ for 20 seconds. Line width of $0.5{\mu}m$ patterns were embodied by photolithography and dry etching process, then each additional annealing process at $750^{\circ}C\;and\;850^{\circ}C$ for 3 hours was executed. We investigated the change of sheet resistance with a four-point probe, and cross sectional microstructure with a field emission scanning electron microscope(FE-SEM) and transmission electron microscope(TEM), respectively. We observe an abrupt change of resistivity and voids at the silicide surface due to interdiffusion of silicide and composite titanium silicide in the amorphous substrates with additional $850^{\circ}C$ annealing. Our result implies that the electrical resistance of composite titanium silicide may be tunned by employing appropriate substrates and annealing condition.

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Fabrication of a Ultrathin Ag Film on a Thin Cu Film by Low-Temperature Immersion Plating in an Grycol-Based Solution (글리콜 용매 기반 저온 치환 은도금법으로 형성시킨 동박막 상 극박 두께 Ag 도금층)

  • Kim, Ji Hwan;Cho, Young Hak;Lee, Jong-Hyun
    • Journal of the Microelectronics and Packaging Society
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    • v.21 no.2
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    • pp.79-84
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    • 2014
  • To investigate the plating properties of a diethylene glycol-based Ag immersion plating solution containing citric acid, silver immersion plating was performed in a range from room temperature to $50^{\circ}C$ using sputtered Cu specimens. The used Cu specimens possessed surface structure with large numbers of pinholes which were created with over-acid etching. The Ag immersion plating performed at $40^{\circ}C$ exhibited that the pinholes and copper surface were completely filled with Ag just after 5 min mainly due to galvanic displacement reaction, indicating the best plating properties. Subsequently, the surface morphology of Ag-coated Cu became rougher as the plating time increased to 30 min because of the deposition of silver nanoparticles created by chemical reduction in the solution. The specimen that its overall surface was covered with silver indicated the start of oxidation at temperature higher than around $50^{\circ}C$ in air as compared with pure Cu, indicating enhanced anti-oxidation properties.

Analysis of Shear Stress Type Piezoresistive Characteristics in Silicon Diaphragm Structure (실리콘 다이아프램 구조에서 전단응력형 압전저항의 특성 분석)

  • Choi, Chae-Hyoung;Choi, Deuk-Sung;Ahn, Chang-Hoi
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.3
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    • pp.55-59
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    • 2018
  • In this paper, we investigated the characteristics of shear stress type piezoresistor on a diaphragm structure formed by MEMS (Microelectromechanical System) technology of silicon-direct-bonding (SDB) wafers with Si/$SiO_2$/Si-sub. The diaphragm structure formed by etching the backside of the wafer using a TMAH aqueous solution can be used for manufacturing various sensors. In this study, the optimum shape condition of the shear stress type piezoresistor formed on the diaphragm is found through ANSYS simulation, and the diaphragm structure is formed by using the semiconductor microfabrication technique and the shear stress formed by boron implantation. The characteristics of the piezoelectric resistance are compared with the simulation results. The sensing diaphragm was made in the shape of an exact square. It has been experimentally found that the maximum shear stress for the same pressure at the center of the edge of the diaphragm is generated when the structure is in the exact square shape. Thus, the sensing part of the sensor has been designed to be placed at the center of the edge of the diaphragm. The prepared shear stress type piezoresistor was in good agreement with the simulation results, and the sensitivity of the piezoresistor formed on the $2200{\mu}m{\times}2200{\mu}m$ diaphragm was $183.7{\mu}V/kPa$ and the linearity of 1.3 %FS at the pressure range of 0~100 kPa and the symmetry of sensitivity was also excellent.

The Effect of Energy Drink on Enamel Erosion (에너지 음료가 법랑질 부식에 미치는 영향)

  • Oh, Han-Na;Lee, Hye-Jin
    • Journal of dental hygiene science
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    • v.15 no.4
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    • pp.419-423
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    • 2015
  • Recently, energy drink consumption is rising. The purpose of this study was to examine the effect of energy drink on enamel erosion by measuring pH and titratable acidity in energy drink on the market. pH and titrable acidity in drink were measured by selecting 3 kinds of energy drinks with high sales volume among energy drinks on the domestic market. To evaluate the erosion level of normal enamel, the erosion level was measured by using a surface micro-hardness after soaking it in drink for 1 minute, for 3 minutes, for 5 minutes, for 10 minutes, and for 30 minutes while using 10 pieces of bovine specimens per each group. All the energy drinks were containing citric acid. As for pH in drinks, pH of Burn intense was the lowest with $2.51{\pm}0.01$. Hotsix stood at $3.16{\pm}0.01$. Redbull stood at $3.37{\pm}0.00$. In pH 5.5, the titrable acidity of Burn intense was 3.59 ml. Redbull was 3.43 ml. Hotsix was 1.92 ml. All the energy drinks were reduced the surface micro-hardness according to a rise in time of immersion. Following the 30-minute treatment in drinks, the surface micro-hardness value was indicated to be the lowest in Redbull with $119.72{\pm}15.16$ VHN. It was shown to be in order of Hotsix $208.75{\pm}10.99$ and Burn intense $210.47{\pm}8.01$. Hotsix and Burn intense had no statistically significant difference (p>0.05). Accordingly, all the energy drinks, which were used in the experiment, caused the tooth enamel erosion. Among them, Redbull led to the largest enamel erosion. Thus, energy drink containing citric acid and low pH can cause the enamel erosion. However, it is thought to be necessarily progressed by considering factors of influencing etching a little more diversely by additionally analyzing intraoral factors, acid kinds, and even the content in calcium, phosphate and fluoride.

Magnetoresistance of Bi Nanowires Grown by On-Film Formation of Nanowires for In-situ Self-assembled Interconnection

  • Ham, Jin-Hee;Kang, Joo-Hoon;Noh, Jin-Seo;Lee, Woo-Young
    • Proceedings of the Korean Magnestics Society Conference
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    • 2010.06a
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    • pp.79-79
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    • 2010
  • Semimetallic bismuth (Bi) has been extensively investigated over the last decade since it exhibits very intriguing transport properties due to their highly anisotropic Fermi surface, low carrier concentration, long carrier mean free path l, and small effective carrier mass $m^*$. In particular, the great interest in Bi nanowires lies in the development of nanowire fabrication methods and the opportunity for exploring novel low-dimensional phenomena as well as practical application such as thermoelectricity[1]. In this work, we introduce a self-assembled interconnection of nanostructures produced by an on-film formation of nanowires (OFF-ON) method in order to form a highly ohmic Bi nanobridge. A Bi thin film was first deposited on a thermally oxidized Si (100) substrate at a rate of $40\;{\AA}/s$ by radio frequency (RF) sputtering at 300 K. The sputter system was kept in an ultra high vacuum (UHV) of $10^{-6}$ Torr before deposition, and sputtering was performed under an Ar gas pressure of 2m Torr for 180s. For the lateral growth of Bi nanowires, we sputtered a thin Cr (or $SiO_2$) layer on top of the Bi film. The Bi thin films were subsequently put into a custom-made vacuum furnace for thermal annealing to grow Bi nanowires by the OFF-ON method. After thermal annealing, the Bi nanowires cannot be pushed out from the topside of the Bi films due to the Cr (or $SiO_2$) layer. Instead, Bi nanowires grow laterally as a mean s of releasing the compressive stress. We fabricated a self-assembled Bi nanobridge (d=192 nm) device in-situ using OFF-ON through annealing at $250^{\circ}C$ for 10hours. From I-V measurements taken on the Bi nanobridge device, contacts to the nanobridge were found highly ohmic. The quality of the Bi nanobridge was also proved by the high MR of 123% obtained from transverse MR measurements. These results manifest the possibility of self-assembled nanowire interconnection between various nanostructures for a variety of applications and provide a simple device fabrication method to investigate transport properties on nanowires without complex patterning and etching processes.

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Oxyfluorination of Pitch-based Activated Carbon Fibers for High Power Electric Double Layer Capacitor (고출력 전기이중층 캐패시터를 위한 핏치계 활성탄소섬유의 함산소불소화 처리)

  • Jung, Min-Jung;Ko, Yoonyoung;Kim, Kyung Hoon;Lee, Young-Seak
    • Applied Chemistry for Engineering
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    • v.28 no.6
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    • pp.638-644
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    • 2017
  • Pitch based activated carbon fibers for electric double layer capacitor (EDLC) electrodes were treated by oxyfluorination via varying the ratio of fluorine and oxygen gases to improve high power property. As the partial pressure of fluorine increased, the oxyfluorinated activated carbon fibers showed an increase of linear fluorine functional groups. While the oxygen functional groups increased, no changes was observed with respect to the partial gas pressure. The specific surface area and pore volume decreased due to the etching reaction on the activated carbon fiber surface through oxyfluorination, but the mesopore volume increased about 4.5 times. In the case of activated carbon fibers treated with 50% of the fluorine gas partial pressure, the specific capacitance increased to about 29% and 61% at scan rates of 5 and 50 mV/s, respectively. The improvement of the specific capacitance was believed to be due to the introduction of oxygen and fluorine functional groups on the activated carbon fiber surface and the increase of mesopores through oxyfluorination.

Effects of Oxygen Functional Groups introduced onto Activated Carbon Fibers on Gas Sensing Property of Chemical Warfare Agent (활성탄소섬유에 도입된 산소작용기가 유독성 화학작용제 감응특성에 미치는 영향)

  • Kim, Su Hyun;Kim, Min-Ji;Song, Eun Ji;Lee, Young-Seak
    • Applied Chemistry for Engineering
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    • v.30 no.6
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    • pp.719-725
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    • 2019
  • In this study, activated carbon fibers were treated with oxygen plasma to investigate gas sensing properties of the dimethyl methylphosphonate (DMMP), which is a simulant gas of the chemical warfare agent, according to oxygen functional group contents. As the flow rate of oxygen plasma treatment increased, oxygen groups were introduced to the surface of activated carbon fibers from 6.90 up to 36.6%, increasing the -OH group which influences the DMMP gas sensing properties. However, as the flow rate of oxygen plasma increases, the specific surface area tends to decrease because etching on the surface of activated carbon fibers occurs due to active species generated during the oxygen plasma treatment. The resistance change rate of the DMMP gas sensor increased from 4.2 up to 25.1% as the oxygen plasma treatment flow rate increased. This is attributed to the hydrogen bonding between DMMP gas and introduced hydroxyl functional group on activated carbon fibers by the oxygen plasma treatment. Therefore, the oxygen plasma is considered to be one of the important surface treatment methods for detecting chemical warfare agents at room temperature.